JP2016515166A5 - - Google Patents
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- Publication number
- JP2016515166A5 JP2016515166A5 JP2015559305A JP2015559305A JP2016515166A5 JP 2016515166 A5 JP2016515166 A5 JP 2016515166A5 JP 2015559305 A JP2015559305 A JP 2015559305A JP 2015559305 A JP2015559305 A JP 2015559305A JP 2016515166 A5 JP2016515166 A5 JP 2016515166A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- moisture
- film
- silicon
- precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 19
- 239000010408 film Substances 0.000 claims 18
- 239000000758 substrate Substances 0.000 claims 16
- 239000002243 precursor Substances 0.000 claims 15
- 229910052760 oxygen Inorganic materials 0.000 claims 13
- 239000001301 oxygen Substances 0.000 claims 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 12
- 230000004888 barrier function Effects 0.000 claims 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims 9
- 150000001875 compounds Chemical class 0.000 claims 8
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims 4
- 229910002091 carbon monoxide Inorganic materials 0.000 claims 4
- 238000005336 cracking Methods 0.000 claims 4
- 150000003376 silicon Chemical class 0.000 claims 4
- 230000005540 biological transmission Effects 0.000 claims 3
- 229910052751 metal Inorganic materials 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 3
- 239000000203 mixture Substances 0.000 claims 3
- 229910052757 nitrogen Inorganic materials 0.000 claims 3
- 125000002524 organometallic group Chemical group 0.000 claims 3
- 239000003642 reactive oxygen metabolite Substances 0.000 claims 3
- 238000000926 separation method Methods 0.000 claims 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 2
- 229920005570 flexible polymer Polymers 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 claims 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 claims 1
- NRUDICNDZOYWRM-UHFFFAOYSA-N N-(disilanyl)ethanamine Chemical class C(C)N[SiH2][SiH3] NRUDICNDZOYWRM-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- VOSJXMPCFODQAR-UHFFFAOYSA-N ac1l3fa4 Chemical compound [SiH3]N([SiH3])[SiH3] VOSJXMPCFODQAR-UHFFFAOYSA-N 0.000 claims 1
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 1
- 239000001569 carbon dioxide Substances 0.000 claims 1
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 claims 1
- 230000005284 excitation Effects 0.000 claims 1
- HOXINJBQVZWYGZ-UHFFFAOYSA-N fenbutatin oxide Chemical compound C=1C=CC=CC=1C(C)(C)C[Sn](O[Sn](CC(C)(C)C=1C=CC=CC=1)(CC(C)(C)C=1C=CC=CC=1)CC(C)(C)C=1C=CC=CC=1)(CC(C)(C)C=1C=CC=CC=1)CC(C)(C)C1=CC=CC=C1 HOXINJBQVZWYGZ-UHFFFAOYSA-N 0.000 claims 1
- 230000009477 glass transition Effects 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- VYIRVGYSUZPNLF-UHFFFAOYSA-N n-(tert-butylamino)silyl-2-methylpropan-2-amine Chemical compound CC(C)(C)N[SiH2]NC(C)(C)C VYIRVGYSUZPNLF-UHFFFAOYSA-N 0.000 claims 1
- SSCVMVQLICADPI-UHFFFAOYSA-N n-methyl-n-[tris(dimethylamino)silyl]methanamine Chemical compound CN(C)[Si](N(C)C)(N(C)C)N(C)C SSCVMVQLICADPI-UHFFFAOYSA-N 0.000 claims 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims 1
- -1 oxygen radicals Chemical class 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims 1
- GIRKRMUMWJFNRI-UHFFFAOYSA-N tris(dimethylamino)silicon Chemical compound CN(C)[Si](N(C)C)N(C)C GIRKRMUMWJFNRI-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361770230P | 2013-02-27 | 2013-02-27 | |
| US61/770,230 | 2013-02-27 | ||
| PCT/US2014/018765 WO2014134204A1 (en) | 2013-02-27 | 2014-02-26 | Mixed metal-silicon-oxide barriers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016515166A JP2016515166A (ja) | 2016-05-26 |
| JP2016515166A5 true JP2016515166A5 (enExample) | 2017-04-06 |
| JP6437463B2 JP6437463B2 (ja) | 2018-12-12 |
Family
ID=51388551
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015559305A Active JP6437463B2 (ja) | 2013-02-27 | 2014-02-26 | 混合金属‐シリコン‐酸化物バリア |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9263359B2 (enExample) |
| EP (1) | EP2922979B1 (enExample) |
| JP (1) | JP6437463B2 (enExample) |
| KR (1) | KR102213047B1 (enExample) |
| CN (1) | CN105143501B (enExample) |
| WO (1) | WO2014134204A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014211720A1 (de) * | 2014-06-18 | 2015-12-24 | Robert Bosch Gmbh | Optikträger, Verfahren zur Herstellung eines Optikträgers, Vorrichtung zur Herstellung eines Optikträgers und Kamerasystem |
| CN107108917B (zh) * | 2014-07-24 | 2020-04-28 | 欧司朗Oled股份有限公司 | 屏障层的制备方法和包含这种屏障层的载体主体 |
| DE102015102535B4 (de) * | 2015-02-23 | 2023-08-03 | Infineon Technologies Ag | Verbundsystem und Verfahren zum haftenden Verbinden eines hygroskopischen Materials |
| KR20180025901A (ko) | 2015-06-29 | 2018-03-09 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 초박형 배리어 라미네이트 및 장치 |
| WO2017057228A1 (ja) * | 2015-10-01 | 2017-04-06 | シャープ株式会社 | エレクトロルミネッセンス装置 |
| CN105405986A (zh) * | 2015-12-16 | 2016-03-16 | 张家港康得新光电材料有限公司 | 水汽阻隔膜、其制备方法与包含其的显示器 |
| US10354950B2 (en) * | 2016-02-25 | 2019-07-16 | Ferric Inc. | Systems and methods for microelectronics fabrication and packaging using a magnetic polymer |
| EP3436620A1 (en) | 2016-04-01 | 2019-02-06 | 3M Innovative Properties Company | Roll-to-roll atomic layer deposition apparatus and method |
| US10049869B2 (en) * | 2016-09-30 | 2018-08-14 | Lam Research Corporation | Composite dielectric interface layers for interconnect structures |
| KR102799270B1 (ko) * | 2017-01-05 | 2025-04-23 | 주성엔지니어링(주) | 투습 방지막과 그 제조 방법 |
| US11769682B2 (en) | 2017-08-09 | 2023-09-26 | Asm Ip Holding B.V. | Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith |
| US11685991B2 (en) * | 2018-02-14 | 2023-06-27 | Asm Ip Holding B.V. | Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process |
| US10655217B2 (en) * | 2018-05-01 | 2020-05-19 | Spts Technologies Limited | Method of forming a passivation layer on a substrate |
| US20200017970A1 (en) * | 2018-07-12 | 2020-01-16 | Lotus Applied Technology, Llc | Water-insensitive methods of forming metal oxide films and products related thereto |
| JP2020113494A (ja) * | 2019-01-16 | 2020-07-27 | セイコーエプソン株式会社 | 有機エレクトロルミネッセンス装置の製造方法 |
| CN113906579B (zh) * | 2019-03-08 | 2025-02-11 | Dnf有限公司 | 硅金属氧化物封装膜及其制备方法 |
| KR102288163B1 (ko) * | 2019-03-08 | 2021-08-11 | (주)디엔에프 | 박막 내 금속 또는 금속 산화물을 포함하는 실리콘 금속 산화물 봉지막 및 이의 제조방법 |
| KR102385042B1 (ko) * | 2020-03-20 | 2022-04-11 | 한양대학교 산학협력단 | 봉지막 및 그 제조방법 |
| WO2021250477A1 (en) | 2020-06-10 | 2021-12-16 | 3M Innovative Properties Company | Roll-to-roll vapor deposition apparatus and method |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI119941B (fi) * | 1999-10-15 | 2009-05-15 | Asm Int | Menetelmä nanolaminaattien valmistamiseksi |
| JP2917432B2 (ja) * | 1989-08-01 | 1999-07-12 | 旭硝子株式会社 | 電導性ガラスの製造方法 |
| KR0185716B1 (en) * | 1989-08-01 | 1999-05-01 | Asahi Glass Co Ltd | Laminated glass structure |
| EP0436741B1 (en) * | 1989-08-01 | 1996-06-26 | Asahi Glass Company Ltd. | DC sputtering method and target for producing films based on silicon dioxide |
| KR100815038B1 (ko) * | 2000-12-12 | 2008-03-18 | 코니카 미놀타 홀딩스 가부시키가이샤 | 박막 형성 방법, 박막을 갖는 물품, 광학 필름, 유전체피복 전극 및 플라즈마 방전 처리 장치 |
| EP1546054A1 (en) * | 2002-09-17 | 2005-06-29 | 3M Innovative Properties Company | Porous surfactant mediated metal oxide films |
| US7018713B2 (en) | 2003-04-02 | 2006-03-28 | 3M Innovative Properties Company | Flexible high-temperature ultrabarrier |
| WO2005074330A1 (en) | 2004-01-28 | 2005-08-11 | Agency For Science, Technology And Research | Multicolor organic light emitting devices |
| US20050221021A1 (en) | 2004-03-31 | 2005-10-06 | Tokyo Electron Limited | Method and system for performing atomic layer deposition |
| US20080226924A1 (en) * | 2004-03-31 | 2008-09-18 | Yasushi Okubo | Transparent Conductive Film, Method For Producing Transparent Conductive Film and Organic Electroluminescent Device |
| US7687409B2 (en) * | 2005-03-29 | 2010-03-30 | Micron Technology, Inc. | Atomic layer deposited titanium silicon oxide films |
| KR100647702B1 (ko) * | 2005-09-15 | 2006-11-23 | 삼성에스디아이 주식회사 | 플렉시블 장치, 및 플렉시블 평판 표시장치 |
| US20090130414A1 (en) * | 2007-11-08 | 2009-05-21 | Air Products And Chemicals, Inc. | Preparation of A Metal-containing Film Via ALD or CVD Processes |
| JP5482656B2 (ja) * | 2008-08-25 | 2014-05-07 | コニカミノルタ株式会社 | 耐候性物品、耐候性フィルム及び光学部材 |
| FR2936651B1 (fr) * | 2008-09-30 | 2011-04-08 | Commissariat Energie Atomique | Dispositif optoelectronique organique et son procede d'encapsulation. |
| US8939606B2 (en) * | 2010-02-26 | 2015-01-27 | Guardian Industries Corp. | Heatable lens for luminaires, and/or methods of making the same |
| US9254506B2 (en) * | 2010-07-02 | 2016-02-09 | 3M Innovative Properties Company | Moisture resistant coating for barrier films |
| CN103079807A (zh) * | 2010-08-13 | 2013-05-01 | 旭硝子株式会社 | 层叠体和层叠体的制造方法 |
| US8101531B1 (en) * | 2010-09-23 | 2012-01-24 | Novellus Systems, Inc. | Plasma-activated deposition of conformal films |
-
2014
- 2014-02-26 WO PCT/US2014/018765 patent/WO2014134204A1/en not_active Ceased
- 2014-02-26 EP EP14757288.7A patent/EP2922979B1/en active Active
- 2014-02-26 JP JP2015559305A patent/JP6437463B2/ja active Active
- 2014-02-26 CN CN201480005971.3A patent/CN105143501B/zh active Active
- 2014-02-26 KR KR1020157023229A patent/KR102213047B1/ko active Active
- 2014-02-26 US US14/191,235 patent/US9263359B2/en active Active
-
2016
- 2016-02-16 US US15/044,890 patent/US20170025635A1/en not_active Abandoned
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