JP5482656B2 - 耐候性物品、耐候性フィルム及び光学部材 - Google Patents
耐候性物品、耐候性フィルム及び光学部材 Download PDFInfo
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- JP5482656B2 JP5482656B2 JP2010526677A JP2010526677A JP5482656B2 JP 5482656 B2 JP5482656 B2 JP 5482656B2 JP 2010526677 A JP2010526677 A JP 2010526677A JP 2010526677 A JP2010526677 A JP 2010526677A JP 5482656 B2 JP5482656 B2 JP 5482656B2
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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Description
本発明においては、ガラス、樹脂基材など上記ポリマー層や紫外線反射層を保持することができるものであればなんでも良い。本発明の耐候性物品とは、基材の少なくとも片面に後述する光安定剤を含有するポリマー層と紫外線反射膜層を設けたものである。
本発明において樹脂基材とは、樹脂フィルム単体、または樹脂フィルムの片面または両面に光安定剤を含有するポリマー層等の有機層を積層した樹脂フィルムをいう。
本発明においては、基材と前記紫外線反射層の間に、光安定剤を含有するポリマー層を設けることを特徴とする。
光硬化性もしくは熱硬化性の樹脂を主成分とするポリマー膜(層)は一般に紫外線のような活性光線硬化性樹脂より構成され、多官能アクリレートが好ましい。該多官能アクリレートとしては、ペンタエリスリトール多官能アクリレート、ジペンタエリスリトール多官能アクリレート、ペンタエリスリトール多官能メタクリレート、およびジペンタエリスリトール多官能メタクリレートよりなる群から選ばれることが好ましい。ここで、多官能アクリレートとは、分子中に2個以上のアクリロイルオキシ基及び/またはメタクロイルオキシ基を有する化合物である。
ここで光安定剤とは基材等を紫外線反射膜では遮蔽しきれなかった紫外線照射での劣化から防ぐ効果を有するものであり、例えば紫外線(UV)吸収剤、ラジカル補足剤、酸化防止剤などが例示され、このような光安定剤としては、ヒンダードアミン系、サリチル酸系、ベンゾフェノン系、ベンゾトリアゾール系、シアノアクリレート系、トリアジン系、ベンゾエート系、蓚酸アニリド系などの有機系の光安定剤、あるいはゾルゲルなどの無機系の光安定剤を用いることができる。好適に用いられる光安定剤の具体例を以下に示すが、もちろんこれらに限定されるものではない。
サリチル酸系:p−t−ブチルフェニルサリシレート、p−オクチルフェニルサリシレート
ベンゾフェノン系:2,4−ジヒドロキシベンゾフェノン、2−ヒドロキシ−4−メトキシベンゾフェノン、2−ヒドロキシ−4−メトキシ−5−スルホベンゾフェノン、2,2′−4,4′−テトラヒドロキシベンゾフェノン、2,2′−ジヒドロキシ−4−メトキシベンゾフェノン、2,2′−ジヒドロキシ−4,4′−ジメトキシベンゾフェノン、ビス(2−メトキシ−4−ヒドロキシ−5−ベンゾイルフェニル)メタン
ベンゾトリアゾール系:2−(2′−ヒドロキシ−5′−メチルフェニル)ベンゾトリアゾール、2−(2′−ヒドロキシ−5′−t−ブチルフェニル)ベンゾトリアゾール、2−(2′−ヒドロキシ−3′,5′−ジ−t−ブチルフェニル)ベンゾトリアゾール、2−(2′−ヒドロキシ−3′−t−ブチル−5′−メチルフェニル)−5−クロロベンゾトリアゾール、2−(2′−ヒドロキシ−3′,5′−ジ・t−ブチルフェニル)−5−クロロベンゾトリアゾール、2−(2′−ヒドロキシ−5′−t−オクチルフェノール)ベンゾトリアゾール、2−(2′−ヒドロキシ−3′,5′−ジ・t−アミルフェニル)ベンゾトリアゾール、2,2′−メチレンビス[4−(1,1,3,3−テトラメチルブチル)−6−(2H−ベンゾトリアゾール−2−イル)フェノール]、2(2′ヒドロキシ−5′−メタアクリロキシフェニル)−2H−ベンゾトリアゾール、2−[2′−ヒドロキシ−3′−(3″,4″,5″,6″−テトラヒドロフタルイミドメチル)−5′−メチルフェニル]ベンゾトリアゾール、2−(2′−ヒドロキシ−5−アクリロイルオキシエチルフェニル)−2H−ベンゾトリアゾール、2−(2′−ヒドロキシ−5′−メタクリロキシエチルフェニル)−2H−ベンゾトリアゾール、2−(2′−ヒドロキシ−3′−t−ブチル−5′−アクリロイルエチルフェニル)−5−クロロ−2H−ベンゾトリアゾール
シアノアクリレート系:エチル−2−シアノ−3,3′−ジフェニルアクリレート
上記以外:ニッケルビス(オクチルフェニル)サルファイド、[2,2′−チオビス(4−t−オクチルフェノラート)]−n−ブチルアミンニッケル、ニッケルコンプレックス−3,5−ジ・t−ブチル−4−ヒドロキシベンジル・リン酸モノエチレート、ニッケル・ジブチルジチオカーバメート、2,4−ジ−t−ブチルフェニル−3′,5′−ジ・t−ブチル−4′−ヒドロキシベンゾエート、2,4−ジ・t−ブチルフェニル−3′,5′−ジ・t−ブチル−4′−ハイドロキシベンゾエート、2−エトキシ−2′−エチルオキザックアシッドビスアニリド、2−(4,6−ジフェニル−1,3,5−トリアジン−2−イル)−5−[(ヘキシル)オキシ]−フェノール。
本発明の耐候性物品は、基材の少なくとも片面に、複数の異なる屈折率を有する材料から構成される紫外線反射層を設けたことを特徴とする。紫外線反射層は、屈折率の異なる材料から成る層を交互に積層して、紫外線を反射できるように光学設計された積層体が代表的な構成であるが、積層体に限られるものではなく、屈折率の異なる複数の材料の混合割合を膜厚方向で傾斜させて紫外線を反射できるようにしてもよい。また、同じ主成分の膜でも、主成分の割合を膜厚方向に傾斜させても良い。また、紫外線反射層は、後述の水蒸気バリア層と別に設けてもよいが、両者を兼ねることも可能である。
本発明の耐候性物品は、水蒸気バリア層を少なくとも1層設けても良い。水蒸気バリア層とは、水分、またガス透過率が低い層のことである。水蒸気バリア層は水蒸気透過率(JIS K7129−1992 B法、40℃、90%RH条件下)が、0.1g/(m2・24h)以下であることが好ましい。さらに水蒸気透過率(JIS K7129−1992 B法、40℃、90%RH条件下)が、0.01g/(m2・24h)以下であることがより好ましい。
X線反射率法の概要は、X線回折ハンドブック 151ページ(理学電機株式会社編 2000年 国際文献印刷社)や化学工業1999年1月No.22を参照して行うことができる。
XPS表面分析装置は、本発明では、VGサイエンティフィックス社製ESCALAB−200Rを用いた。具体的には、X線アノードにはMgを用い、出力600W(加速電圧15kV、エミッション電流40mA)で測定した。エネルギー分解能は、清浄なAg3d5/2ピークの半値幅で規定したとき、1.5eV〜1.7eVとなるように設定した。
各電極部に高周波電圧プローブ(P6015A)を設置し、該高周波電圧プローブの出力信号をオシロスコープ(Tektronix社製、TDS3012B)に接続し、所定の時点の電界強度を測定する。
電極間に放電ガスを供給し、この電極間の電界強度を増大させていき、放電が始まる電界強度を放電開始電界強度IVと定義する。測定器は上記印加電界強度測定と同じである。
水蒸気バリア層を片面に設けた基材において、裏面に、ポリマー層や、紫外線反射層等、さらに層(例えば、Al等の金属層、誘電体、Ag(または合金)、誘電体を順次積層した熱線反射層等、Alなどミラー層)を設ける際は、既に設けた水蒸気バリア層を傷や異物付着防止のため、離形性の樹脂基材を設けてもよい。
本発明の耐候性物品の製造方法においては、基材の一方の面側(A面)に、水蒸気バリア層を形成した後、裏面側(B面)に紫外線反射層を設ける前に、既に形成したA面側の水蒸気バリア層上に、離型性を有する樹脂材料をラミネート後、形成することが好ましい。
本発明に係る離形性を有する樹脂基材としては、特に制限はないが、ポリエチレンフィルム、ポリプロピレンフィルム等のポリオレフィン系フィルム;ポリエチレンテレフタレート、ポリブチレンテレフタレート等のポリエステルフィルム;ヘキサメチレンアジパミド等のポリアミド系フィルム;ポリビニルクロライド、ポリビニリデンクロライド、ポリフルオロエチレン等の含ハロゲン系フィルム;ポリ酢酸ビニル、ポリビニルアルコール、エチレン酢酸ビニル共重合体等の酢酸ビニル及びその誘導体フィルム等のプラスチックフィルムが、紙とは異なり微細塵を発生しないことから好ましい。なお、本発明においては、耐熱性及び入手の容易性の観点からポリエチレンテレフタレートフィルムが好ましく用いられる。また、前記光安定剤を含有させた耐候性のある樹脂基材が更に好ましい。
本発明においては、粘着剤の種類として、特に制限はなく、例えば、アクリル系粘着剤、ゴム系粘着剤、ウレタン系粘着剤、シリコン系粘着剤、紫外線硬化型粘着剤等を挙げることができるが、アクリル系粘着剤、シリコン系粘着剤及びゴム系粘着剤から選ばれる少なくとも1種であることが好ましい。
アクリル系粘着剤としては、例えば、(メタ)アクリル酸エステルの単独重合体または他の共重合性モノマーとの共重合体が用いられる。さらに、これらの共重合体を構成するモノマーもしくは共重合性モノマーとしては、例えば、(メタ)アクリル酸のアルキルエステル(例えば、メチルエステル、エチルエステル、ブチルエステル、2−エチルヘキシルエステル、オクチルエステル、イソノニルエステル等)、(メタ)アクリル酸のヒドロキシアルキルエステル(例えば、ヒドロキシエチルエステル、ヒドロキシブチルエステル、ヒドロキシヘキシルエステル)、(メタ)アクリル酸グリシジルエステル、(メタ)アクリル酸、イタコン酸、無水マレイン酸、(メタ)アクリル酸アミド、(メタ)アクリル酸N−ヒドロキシメチルアミド、(メタ)アクリル酸アルキルアミノアルキルエステル(例えば、ジメチルアミノエチルメタクリレート、t−ブチルアミノエチルメタクリレート等)、酢酸ビニル、スチレン、アクリロニトリル等が挙げられる。主要成分のモノマーとしては、通常、ホモポリマーのガラス転移点が−50℃以下のアクリル酸アルキルエステルが使用される。
ゴム系粘着剤としては、ポリイソブチレンゴム、ブチルゴムとこれらの混合物、あるいは、これらゴム系粘着剤にアビエチン酸ロジンエステル、テルペン・フェノール共重合体、テルペン・インデン共重合体等の粘着付与剤を配合したものが用いられる。
本発明に係る粘着層においては、シリコン系粘着剤としては付加反応硬化型シリコン粘着剤と縮重合硬化型シリコン粘着剤があるが、本発明では付加反応硬化型が好ましく用いられる。
(B)SiH基を含有するポリオルガノシロキサン
(C)制御剤
(D)白金触媒
(E)導電性微粒子
ここで、(A)成分は、1分子中に2個以上のアルケニル基を有するポリジオルガノシロキサンであり、このようなアルケニル基含有ポリジオルガノシロキサンとしては、下記一般式(1)で示されるものが例示できる。
R(3−a)XaSiO−(RXSiO)m−(R2SiO)n−(RXSiO)p−R(3−a)XaSiO
一般式(1)において、Rは炭素数1〜10の1価炭化水素基であり、Xはアルケニル基含有の有機基である。aは0〜3の整数で1が好ましく、mは0以上であるが、a=0の場合、mは2以上であり、m及びnは、それぞれ100≦m+n≦20,000を満足する数であり、pは2以上である。
HbR1 (3−b)SiO−(HR1SiO)x−(R1 2SiO)y−SiR1 (3−b)Hb
一般式(2)において、R1は炭素数1〜6の脂肪族不飽和結合を含有しない1価炭化水素基である。bは0〜3の整数、x、yはそれぞれ整数であり、このオルガノヒドロポリシロキサンの25℃における粘度が1〜5,000mPa・sとなる数を示す。
3−メチル−1−ブチン−3−オール、
3−メチル−1−ペンチン−3−オール、
3,5−ジメチル−1−ヘキシン−3−オール、
1−エチニルシクロヘキサノール、
3−メチル−3−トリメチルシロキシ−1−ブチン、
3−メチル−3−トリメチルシロキシ−1−ペンチン、
3,5−ジメチル−3−トリメチルシロキシ−1−ヘキシン、
1−エチニル−1−トリメチルシロキシシクロヘキサン、
ビス(2,2−ジメチル−3−ブチノキシ)ジメチルシラン、
1,3,5,7−テトラメチル−1,3,5,7−テトラビニルシクロテトラシロキサン、
1,1,3,3−テトラメチル−1,3−ジビニルジシロキサン
等が挙げられる。
剥離層として用いられる素材は、塵埃を発生しないプラスチックフィルム等が好ましい。本発明の剥離層に用いられるプラスチックフィルムとしては、特に制限はないが、ポリエチレンフィルム、ポリプロピレンフィルム等のポリオレフィン系フィルム;ポリエチレンテレフタレート、ポリブチレンテレフタレート等のポリエステルフィルム;ヘキサメチレンアジパミド等のポリアミド系フィルム;ポリビニルクロライド、ポリビニリデンクロライド、ポリフルオロエチレン等の含ハロゲン系フィルム;ポリ酢酸ビニル、ポリビニルアルコール、エチレン酢酸ビニル共重合体等の酢酸ビニル及びその誘導体フィルムが用いられる。好ましくは、ポリエステル系フィルムであり、例えば、ポリエチレンテレフタレートである。適度な弾性を有するからである。剥離層に用いられるプラスチックフィルムは、剥離剤が塗布されているものであってもよい。離型処理を施すための塗布液の具体例を挙げると、旭化成ワッカーシリコン株式会社製のDEHESIVEシリーズのうち、無溶剤型の636、919、920、921、924、エマルジョン型の929、430、440、39005、39006、溶剤型の940、942、952、953、811等が、GE東芝シリコン株式会社製の剥離紙用シリコン:TPR6500、TPR6501、UV9300、UV9315、XS56−A2775、XS56−A2982、TPR6600、TPR6605、TPR6604、TPR6705、TPR6722、TPR6721、TPR6702、XS56−B3884、XS56−A8012、XS56−B2654、TPR6700、TPR6701、TPR6707、TPR6710、TPR6712、XS56−A3969、XS56−A3075、YSR3022等が挙げられる。離型性を有する保護フィルムは熱線遮断構成層形成後に容易に除くことができる。
本発明により作製される耐候性部品は、幅広い分野に応用することができる。例えば、鉄道車両、自動車、自動販売機等の表面に貼付して用いられるマーキング用フィルムの表面保護、光沢向上、変退色・劣化防止等を目的としたオーバーレイフィルムや、外装看板の表面保護用フィルム、液晶ディスプレイ反射防止用シート、太陽電池用バックシート、電子ペーパー用フィルム、プラズマディスプレーの電磁波遮蔽性フィルム、有機エレクトロルミネッセンス用フィルム、建物の屋外の窓や自動車窓等長期間太陽光に晒らされる設備に貼り合せ、熱線反射効果を付与する熱線反射フィルム等の窓貼用フィルムの基材、反射板の基材、集光板の基材、農業用ビニールハウス用フィルム等として、主として耐候性を高める目的で用いられる。特に、紫外線に晒される環境下で使用され、紫外線に晒されることにより、基材の光学性能、例えば、透過率、反射率、ヘイズ、色味等や、機械強度が変化することにより、その機能が大きく損なわれる光学部材に好適である。具体的には液晶ディスプレイ反射防止用シート、太陽電池用バックシート、電子ペーパー用フィルム、プラズマディスプレーの電磁波遮蔽性フィルム、有機エレクトロルミネッセンス用フィルム、建物の屋外の窓や自動車窓等長期間太陽光に晒らされる設備に貼り合せ、熱線反射効果を付与する熱線反射フィルム等の窓貼用フィルムの基材、反射板の基材、ビニールハウス用フィルム等の光学部材が挙げられる。さらに、屋外で使用される部材にはさらに好適である。具体的には太陽電池用バックシート、建物の屋外の窓や自動車窓等長期間太陽光に晒らされる設備に貼り合せ、熱線反射効果を付与する熱線反射フィルム等の窓貼用フィルムの基材、反射板、集光板、ビニールハウス用フィルム等が挙げられる。
本発明は、特に紫外線により劣化が発生しやすい、樹脂基材において、有用である。特に、可視光透過率が高く、クリアなため、光学部材に好適である。
〈実施例1〉
〔試料1の作製〕
〈樹脂基材1の作製〉
帝人デュポン社製PET(ポリエチレンテレフタレート)フィルム(厚さ50μm)HSを樹脂基材として、この上に、下記組成の光安定剤として紫外線吸収剤を含有した塗布液1を調製し、硬化後の膜厚が5μmとなるようにマイクログラビアコーターを用いて塗布し、乾燥は80℃/110℃/125℃(各ゾーンは30sec)と段階的に熱風乾燥し、ポリマー層1を設けた。
メチルメタクリレート65質量%、2−ヒドロキシエチルメタクリレート35質量%を共重合し、平均分子量50000の水酸基導入メタクリル酸エステル樹脂を得た。この樹脂に対して、紫外線吸収剤としてベンゾトリアゾール系紫外線吸収剤である2−(2H−ベンゾトリアゾール−2−イル)−4,6−ジ−t−ペンチルフェノール(TINUVIN328;チバ・ジャパン(株)製)を5質量%、光安定剤としてヒンダードアミン系光安定剤であるデカン二酸ビス[2,2,6,6−テトラメチル−1(オクチルオキシ)−4−ピペリジニル]エステル(TINUVIN123;チバ・ジャパン(株)製)を5質量%配合し、粘度調整のためメチルエチルケトンにて希釈し、固形分が20質量%となるよう調整した主剤(a)を得た。一方、架橋剤(硬化剤)となるポリイソシアネート化合物として、アダクト型のヘキサメチレンジイソシアネートをメチルエチルケトンで固形分が75質量%となるように調整した硬化剤(b)を得た。上記主剤(a)に対して、上記硬化剤(b)を15質量%添加して塗布液1を調製した。
上記樹脂基材1のポリマー層上に、下記条件で高屈折率層(厚み:35nm、屈折率:2.1)、低屈折率層(厚み:52nm、屈折率1.46)、を交互に9層設け、9層からなる紫外線反射層を形成し、試料1を作製した(図6)。この試料の紫外線反射層から光を入射して測定した波長350nmの紫外線反射率は82%であった。
〈高屈折率層形成混合ガス組成物〉
放電ガス:窒素 97.9体積%
薄膜形成ガス:テトライソプロポキシチタン 0.1体積%
添加ガス:水素 2.0体積%
〈高屈折率層成膜条件〉
第1電極側
電源種類 ハイデン研究所 100kHz(連続モード) PHF−6k
周波数 100kHz
出力密度 10W/cm2(この時の電圧Vpは7kVであった)
電極温度 120℃
第2電極側
電源種類 パール工業 13.56MHz CF−5000−13M
周波数 13.56MHz
出力密度 5W/cm2(この時の電圧Vpは1kVであった)
電極温度 90℃
(低屈折率層の作製)
〈低屈折率層混合ガス組成物〉
放電ガス:窒素 98.9体積%
薄膜形成ガス:テトラエトキシシラン 0.1体積%
添加ガス:酸素 1.0体積%
〈低屈折率層成膜条件〉
第1電極側
電源種類 ハイデン研究所 100kHz(連続モード) PHF−6k
周波数 100kHz
出力密度 10W/cm2(この時の電圧Vpは7kVであった)
電極温度 120℃
第2電極側
電源種類 パール工業 13.56MHz CF−5000−13M
周波数 13.56MHz
出力密度 10W/cm2(この時の電圧Vpは2kVであった)
電極温度 90℃
〈実施例2〉
〔試料2の作製〕
紫外線反射層が5層から構成されること以外は試料1と同様の方法で試料2を作製した。この試料2の紫外線反射率は72%であった。
〔試料3の作製〕
ポリマー層と紫外線反射層との間かつポリマー層上に、以下に記載した条件で順次、SiO2膜1(厚み:50nm、炭素含有量7.8at%)、SiO2膜2(厚み;50nm、C含有量0.1at%以下)、SiO2膜3(厚み:100nm、C含有量:7.8at%)を積層した水蒸気バリア層を形成したこと以外は、試料1と同様にして、試料3を作製した。このときの紫外線反射率は82%であった。
(SiO2膜1の作製)
〈SiO2膜1混合ガス組成物〉
放電ガス:窒素ガス 94.85体積%
薄膜形成ガス:ヘキサメチルジシロキサン 0.15体積%
添加ガス:酸素ガス 5.0体積%
〈SiO2膜1成膜条件〉
第1電極側
電源種類 ハイデン研究所 100kHz(連続モード) PHF−6k
周波数 100kHz
出力密度 10W/cm2(この時の電圧Vpは7kVであった)
電極温度 120℃
第2電極側
電源種類 パール工業 13.56MHz CF−5000−13M
周波数 13.56MHz
出力密度 5W/cm2(この時の電圧Vpは1kVであった)
電極温度 90℃
(SiO2膜2の作製)
〈SiO2膜2混合ガス組成物〉
放電ガス:窒素ガス 94.99体積%
薄膜形成ガス:テトラエトキシシラン 0.01体積%
添加ガス:酸素ガス 5.0体積%
〈SiO2膜2成膜条件〉
第1電極側
電源種類 ハイデン研究所 100kHz(連続モード) PHF−6k
周波数 100kHz
出力密度 10W/cm2(この時の電圧Vpは7kVであった)
電極温度 120℃
第2電極側
電源種類 パール工業 13.56MHz CF−5000−13M
周波数 13.56MHz
出力密度 10W/cm2(この時の電圧Vpは2kVであった)
電極温度 90℃
(SiO2膜3の作製)
〈SiO2膜3混合ガス組成物〉
放電ガス:窒素ガス 94.5体積%
薄膜形成ガス:ヘキサメチルジシロキサン 0.5体積%
添加ガス:酸素ガス 5.0体積%
〈SiO2膜3成膜条件〉
第1電極側
電源種類 ハイデン研究所 100kHz(連続モード) PHF−6k
周波数 100kHz
出力密度 10W/cm2(この時の電圧Vpは7kVであった)
電極温度 120℃
第2電極側
電源種類 パール工業 13.56MHz CF−5000−13M
周波数 13.56MHz
出力密度 5W/cm2(この時の電圧Vpは1kVであった)
電極温度 90℃
〈実施例4〉
〔試料4の作製〕
紫外線反射膜の低屈折率層のうち、基材に一番近い層を、上記記載の方法で形成される水蒸気バリア層で置き換えた以外は、試料1と同様である試料4を作製した。このときの紫外線反射率は70%であった。
試料1において、光安定剤を含有するポリマー層を除いたこと以外は、試料1と同様に試料5を作製した。
試料1において、紫外線反射膜を設けないこと以外は試料1と同様である試料6を作製した。
試料3において、紫外線反射膜を設けないこと以外は試料3と同様である試料7を作製した。
作製した試料は、基材側をガラスに貼り付けて、下記評価を行った。
水蒸気透過率は、JIS K 7129Bで規定の方法(40℃、90%RH)に準拠して、MOCON社製水蒸気透過率測定装置 PERMATRAN−W3/33MGモジュールにより測定した。
紫外線劣化促進試験機アイスーパーUVテスターSUV−W131(岩崎電気(株)製)を用い、下記の条件で強制紫外線照射試験を行い、照射後のサンプルについて各測定を実施した。
「紫外線照射条件」
照度:100mW/cm2
温度:60℃
相対湿度:50%RH
照射時間:100時間
照射面:紫外線反射層側が光源向き
[耐候性評価2:耐湿性]
高加速寿命試験装置HAST CHAMBER EHS−211M(エスペック(株)製)を用い、下記の条件で強制高湿試験を行い、試験後のサンプルについて各測定を実施した。
「高湿暴露条件」
温度:120℃
相対湿度:100%RH、(2.0265×10−1MPa)
暴露時間:48時間
(ヘイズ)
ヘイズメーターT−2600DA(東京電色(株)製)を用いて、試験後のフィルム厚み方向のヘイズ(%)を測定した。
分光式色差計SE−2000型(日本電色工業(株)製)を用い、JIS−K−7105に従って透過法で上記耐候試験前後の試料のL、a、bを測定し、黄変をbで評価し、下記基準で評価した。
△:耐候試験後のbの増加量が2.0以上6.0未満
×:耐候試験後のbの増加量が6.0以上
(機械強度)
上記耐候試験前後の試料の機械強度を、ISO 527−1−2に従い、引張応力測定装置(Ulm社製Zwick 010、ドイツ)を用いて測定し、下記基準で評価した。
△:耐候試験前に対して、耐候試験後の機械強度が60%以上80%未満
×:耐候試験前に対して、耐候試験後の機械強度が60%未満
評価の結果を表1に示す。
日立製作所製U−4000型分光光度計を使用して、JIS R5759に基づいて透過スペクトルを測定して可視光透過率(%)を算出した。
日立製作所製U−4000型分光光度計を使用して、ISO 9050に基づいて紫外線の反射スペクトルを測定して紫外線反射率(%)を算出した。
11 第1電極
12 第2電極
21 第1電源
23、43 第1フィルタ
24、44 第2フィルタ
30 プラズマ放電処理装置
32 放電空間
35 ロール回転電極
35a ロール電極
35A 金属質母材
35B 誘電体
36a 固定電極
36A 金属質母材
36B 誘電体
40 電界印加手段
41 第1電源
42 第2電源
50 ガス供給手段
51 ガス発生装置
52 給気口
53 排気口
60 電極温度調節手段
70 酸導入手段
G 薄膜形成ガス
G° プラズマ状態のガス
G′ 処理排ガス
Claims (21)
- 基材上に、光安定剤を含有するポリマー層を設け、さらに前記ポリマー層上に、複数の異なる屈折率を有する材料から構成される紫外線反射層を設け、さらに屈折率1.4〜1.8の水蒸気バリア層を設けたことを特徴とする耐候性物品。
- 前記基材が、透明基材であることを特徴とする請求項1に記載の耐候性物品。
- 前記透明基材が、樹脂であることを特徴とする請求項2に記載の耐候性物品。
- 前記光安定剤が、紫外線吸収剤であることを特徴とする請求項1に記載の耐候性物品。
- 前記紫外線反射層が、屈折率の異なる複数の層から構成されることを特徴とする請求項1〜4のいずれか1項に記載の耐候性物品。
- 前記紫外線反射層が、屈折率1.4〜1.8の厚み5〜1000nmの低屈折率膜層、屈折率1.8〜2.4の厚み5〜400nmの高屈折率膜層を交互に合計3層以上積層された構成を有していることを特徴とする請求項1〜5のいずれか1項に記載の耐候性物品。
- 前記紫外線反射層の低屈折率膜層は、SiまたはAlを含む酸化物、または窒酸化物を含有し、前記高屈折率膜層が、Zn、Ti、Sn、In、Nb、Si、TaまたはAlを含む酸化物、窒酸化物、または窒化物を含有することを特徴とする請求項6に記載の耐候性物品。
- 前記紫外線反射層は、大気圧もしくはその近傍の圧力下、放電空間に薄膜形成ガス及び放電ガスを含有するガスを供給し、該放電空間に高周波電界を形成することにより該ガスを励起し、基材を励起したガスに晒すことにより、形成されたことを特徴とする請求項1〜7のいずれか1項に記載の耐候性物品。
- 前記放電ガスが窒素ガスであり、放電空間に印加される高周波電界は、第一の高周波電界及び第二の高周波電界を重畳したものであり、該第一の高周波電界の周波数ω1より該第二の高周波電界の周波数ω2が高く、該第一の高周波電界の強さ(V1)、該第2の高周波電界の強さ(V2)および放電開始電界の強さ(IV)との関係が、V1≧IV>V2またはV1>IV≧V2の関係を満たし、かつ、該第二の高周波電界の出力密度が1W/cm2以上であることを特徴とする請求項8に記載の耐候性物品。
- 前記ポリマー層が、光硬化性もしくは熱硬化性の樹脂を主成分とすることを特徴とする請求項1〜9のいずれか1項に記載の耐候性物品。
- 前記基材が、樹脂基材であって、ポリエチレンテレフタレート、ポリブチレンテレフタレートまたはポリエチレンナフタレートを含有することを特徴とする請求項1〜10のいずれか1項に記載の耐候性物品。
- 前記水蒸気バリア層を前記ポリマー層と前記紫外線反射層との間に設けたことを特徴とする請求項1〜11のいずれか1項に記載の耐候性物品。
- 前記水蒸気バリア層が、SiまたはAlを含む酸化物、窒酸化物または窒化物を含有する金属酸化物層を少なくとも1層有することを特徴とする請求項1〜12のいずれか1項に記載の耐候性物品。
- 前記水蒸気バリア層が、大気圧もしくはその近傍の圧力下、放電空間に薄膜形成ガスおよび放電ガスを含有するガスを供給し、該放電空間に高周波電界を形成することにより該ガスを励起し、樹脂基材を励起したガスに晒すことにより、該樹脂基材上に薄膜を形成する薄膜形成方法により形成されたことを特徴とする請求項1〜13のいずれか1項に記載の耐候性物品。
- 前記放電ガスが窒素ガスであり、放電空間に印加される高周波電界は、第1の高周波電界および第2の高周波電界を重畳したものであり、該第1の高周波電界の周波数ω1より該第2の高周波電界の周波数ω2が高く、該第1の高周波電界の強さV1、該第2の高周波電界の強さV2および放電開始電界の強さIVとの関係が、V1≧IV>V2またはV1>IV≧V2の関係を満たし、且つ、該第2の高周波電界の出力密度が1W/cm2以上であることを特徴とする請求項14に記載の耐候性物品。
- 前記水蒸気バリア層が、炭素含有量0.1at%未満である酸化ケイ素膜と炭素含有量が1〜40at%である酸化ケイ素膜を少なくともそれぞれ1層以上ずつ含むことを特徴とする請求項1〜15のいずれか1項に記載の耐候性物品。
- 前記耐候性物品が、可視光透過率75%以上であることを特徴とする請求項1〜16のいずれか1項に記載の耐候性物品。
- 前記耐候性物品が、ヘイズ1.5%以下であることを特徴とする請求項1〜17のいずれか1項に記載の耐候性物品。
- 水蒸気バリア層が、前記紫外線反射層を構成する低屈折率膜層の少なくとも1層に用いられていることを特徴とする請求項1〜18のいずれか1項に記載の耐候性物品。
- 請求項1〜19のいずれか1項に記載の耐候性物品からなる耐候性フィルム。
- 請求項1〜19のいずれか1項に記載の耐候性物品を含む光学部材。
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WO2012050869A1 (en) * | 2010-09-28 | 2012-04-19 | Ndsu Research Foundation | Atmospheric-pressure plasma-enhanced chemical vapor deposition |
US9927094B2 (en) * | 2012-01-17 | 2018-03-27 | Kla-Tencor Corporation | Plasma cell for providing VUV filtering in a laser-sustained plasma light source |
JP6048498B2 (ja) * | 2012-04-24 | 2016-12-21 | コニカミノルタ株式会社 | 積層ガスバリア性樹脂基材の製造方法 |
JP6119113B2 (ja) * | 2012-05-17 | 2017-04-26 | 大日本印刷株式会社 | ガスバリア性フィルム及びその製造方法 |
US20150367611A1 (en) * | 2013-01-17 | 2015-12-24 | Nirotek A.C.S Ltd. | Transfer tape comprising adhesive for a protective wrap |
US9263359B2 (en) | 2013-02-27 | 2016-02-16 | Lotus Applied Technology, Llc | Mixed metal-silicon-oxide barriers |
JP5468167B1 (ja) * | 2013-05-20 | 2014-04-09 | 尾池工業株式会社 | 積層体 |
TWI480416B (zh) * | 2013-11-20 | 2015-04-11 | Ind Tech Res Inst | 大氣電漿前趨物供料裝置 |
KR101985923B1 (ko) * | 2014-05-16 | 2019-06-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 배리어 층 스택, 배리어 층 스택을 제조하기 위한 방법, 및 울트라-하이 배리어 층 및 반사방지 시스템 |
US9611999B2 (en) * | 2014-07-21 | 2017-04-04 | GE Lighting Solutions, LLC | Reflecting apparatus including enhanced aluminum optical coatings |
WO2017173361A1 (en) | 2016-04-01 | 2017-10-05 | Certainteed Gypsum, Inc. | Building board having high fastener sealability |
KR101796382B1 (ko) * | 2016-05-20 | 2017-11-09 | 한국기초과학지원연구원 | 플라스틱 소재의 내스크래치 특성 향상 및 자외선 차단을 위한 고경도 투명 코팅막 |
JP7295113B2 (ja) | 2017-12-19 | 2023-06-20 | サン-ゴバン アドフォース カナダ,リミティド | 補強層、セメント質ボード、およびセメント質ボードの形成方法 |
JP7362063B2 (ja) * | 2019-02-18 | 2023-10-18 | Toppanホールディングス株式会社 | 捕虫シート |
JP2020179645A (ja) * | 2019-04-26 | 2020-11-05 | 株式会社クラレ | 積層体およびヘッドアップディスプレイ装置。 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5941249A (ja) * | 1982-09-01 | 1984-03-07 | 平岡織染株式会社 | 耐紫外線積層シ−ト |
JP2006261287A (ja) * | 2005-03-16 | 2006-09-28 | Teijin Dupont Films Japan Ltd | 太陽電池用表面保護フィルムおよびそれを用いた太陽電池積層体 |
JP2007065232A (ja) * | 2005-08-31 | 2007-03-15 | National Institute Of Advanced Industrial & Technology | 紫外線熱線反射多層膜 |
JP2007248883A (ja) * | 2006-03-16 | 2007-09-27 | Fujifilm Corp | 紫外線カット透明フィルムおよびこれを用いた画像表示媒体 |
JP2007277631A (ja) * | 2006-04-06 | 2007-10-25 | Konica Minolta Holdings Inc | ガスバリア性薄膜積層体の製造方法、ガスバリア性薄膜積層体、ガスバリア性樹脂基材及び有機エレクトロルミネッセンスデバイス |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5332618A (en) * | 1992-02-07 | 1994-07-26 | Tru Vue, Inc. | Antireflection layer system with integral UV blocking properties |
US6793981B2 (en) * | 1999-03-23 | 2004-09-21 | Dai Nippon Printing Co., Ltd. | Process for producing laminated film, and reflection reducing film |
AU756842B2 (en) * | 2000-08-29 | 2003-01-23 | Hoya Corporation | Optical element having antireflection film |
EP2233607A1 (en) * | 2000-12-12 | 2010-09-29 | Konica Corporation | Dielectric coated electrode, and plasma discharge apparatus using the electrode |
JP2003025510A (ja) * | 2001-07-16 | 2003-01-29 | Shin Etsu Chem Co Ltd | 反射防止性及び耐擦傷性を有する多層積層体 |
US7488683B2 (en) * | 2003-03-28 | 2009-02-10 | Toyo Seikan Kaisha, Ltd. | Chemical vapor deposited film based on a plasma CVD method and method of forming the film |
JP2005015557A (ja) | 2003-06-24 | 2005-01-20 | Toppan Printing Co Ltd | 高耐候性ポリエステルフィルム |
TWI352105B (en) | 2004-07-26 | 2011-11-11 | Eternal Chemical Co Ltd | Optical film resistant to uv light |
-
2009
- 2009-08-21 JP JP2010526677A patent/JP5482656B2/ja not_active Expired - Fee Related
- 2009-08-21 WO PCT/JP2009/064628 patent/WO2010024193A1/ja active Application Filing
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5941249A (ja) * | 1982-09-01 | 1984-03-07 | 平岡織染株式会社 | 耐紫外線積層シ−ト |
JP2006261287A (ja) * | 2005-03-16 | 2006-09-28 | Teijin Dupont Films Japan Ltd | 太陽電池用表面保護フィルムおよびそれを用いた太陽電池積層体 |
JP2007065232A (ja) * | 2005-08-31 | 2007-03-15 | National Institute Of Advanced Industrial & Technology | 紫外線熱線反射多層膜 |
JP2007248883A (ja) * | 2006-03-16 | 2007-09-27 | Fujifilm Corp | 紫外線カット透明フィルムおよびこれを用いた画像表示媒体 |
JP2007277631A (ja) * | 2006-04-06 | 2007-10-25 | Konica Minolta Holdings Inc | ガスバリア性薄膜積層体の製造方法、ガスバリア性薄膜積層体、ガスバリア性樹脂基材及び有機エレクトロルミネッセンスデバイス |
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JPWO2010024193A1 (ja) | 2012-01-26 |
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