JP2016505646A - 太陽電池モジュールのフィルムに好適なフルオロポリマーコーティング - Google Patents
太陽電池モジュールのフィルムに好適なフルオロポリマーコーティング Download PDFInfo
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- JP2016505646A JP2016505646A JP2015542129A JP2015542129A JP2016505646A JP 2016505646 A JP2016505646 A JP 2016505646A JP 2015542129 A JP2015542129 A JP 2015542129A JP 2015542129 A JP2015542129 A JP 2015542129A JP 2016505646 A JP2016505646 A JP 2016505646A
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Abstract
Description
一実施形態において、コーティング組成物の作製方法が記述される。この方法は水性フルオロポリマーラテックス分散液を提供する工程を備える。この分散液は、VF、VDF、又はこれらの組み合わせから誘導された繰り返し単位部分を有する少なくとも1種のフルオロポリマーを含む。この方法は、水性フルオロポリマーラテックスと無機酸化物ナノ粒子とを組み合わせて混合物を形成する工程と、この混合物のpHを少なくとも8に調節する工程と、VF及びVDFから誘導された繰り返し単位部分と反応する化合物を添加して、フルオロポリマーを架橋させる、及び/又は、フルオロポリマーと無機酸化物ナノ粒子とを結合させる工程とを備える。好ましい実施形態において、この化合物は少なくとも2個のアミノ基を、又は、例えばアミノ置換オルガノシランエステル又はエステル等価物により提供されるもののような、少なくとも1個のアミノ基と少なくとも1個のアルコキシシラン基とを、有する。いくつかの実施形態において、この方法は、第2フルオロポリマー(例えばVF及び/又はVDFから誘導された繰り返し単位部分を有しないもの)を少なくとも1種添加する工程を更に備える。この第2フルオロポリマーは、TFE又はクロロトリフルオロエチレンから誘導された繰り返し単位部分を有し、必要に応じてビニルエーテルから誘導された繰り返し単位部分と組み合わせて、有し得る。
以下の定義は、本明細書及び特許請求の範囲を通して適用される。
TFE:CF2=CF2
VDF:CH2=CF2
HFP:CF2=CF−CF3
(Z2N−L−SiX’X’’X’’’)、式中、
Zは水素、アルキル、又は置換アリール若しくはアルキル(アミノ置換アルキルを含む)であり、
Lは二価の直鎖C1〜12アルキレンであり、又はC3〜8シクロアルキレン、3〜8員環ヘテロシクロアルキレン、C2〜12アルケニレン、C4〜8シクロアルケニレン、3〜8員環ヘテロシクロアルケニレン又はヘテロアリーレン単位であり、かつ、
各X’、X’’及びX’’’はC1〜18アルキル、ハロゲン、C1〜8アルコキシ、C1〜8アルキルカルボニルオキシ、又はアミノ基であるが、ただしX’、X’’、及びX’’’の中の少なくとも1種が不安定な基である。更に、X’、X’’及びX’’’の任意の2種類又は全てが、共有結合を介して連結されてもよい。アミノ基はアルキルアミノ基であってよい。
特に記載のない限り、実施例及び本明細書の残りの部分におけるすべての部、%、及び比率等は、重量による。特に記載のない限り、すべての化学物質は、Aldrich Chemical Company(Milwaukee、WI)などの化学物質供給元から入手した又は入手可能である。
下記に従って調製した、厚さ50マイクロメートルのPET基材上にコーティングされた寸法約5cm×5cmのサンプルに、鋭いかみそり刃を用いて、コーティング面に切り込み(クロスハッチ)を入れ、約16の正方形を形成した。この切り込みを入れたサンプルを、50℃の水に一晩浸した。次に、コーティングされたサンプルを水から取り出し、拭き取り、コーティング面に接着テープを貼った。接着テープによってPET基材のコーティング面から除去された正方形の数を記録して、PET基材に対するコーティングの接着品質を示した。
下記の実施例で調製された、コーティングされたサンプルの表面を、様々な硬度(すなわち2H、3H、など)のASTM標準鉛筆で引っ掻いた。鉛筆の引っ掻き跡を顕微鏡で調べた。PETが引っ掻かれていないが、圧縮されて鉛筆の溝を形成している場合は、コーティングは損傷していないことになり、より硬度の高い鉛筆で同じ試験を行った。コーティングに損傷を与えなかった鉛筆の最高硬度を決定し、報告した。
150mLのガラス瓶に、NALCO 1050(40g、50重量%水溶液)と40gの脱イオン水を別々に入れた。それぞれの瓶に、3−グリシドキシプロピルトリメトキシシラン(100%被覆用:8gエタノール中に12.4mmol、2.93g、25%被覆用:3gエタノール中に3.1mmol、0.73g)をゆっくりと加え、両方の溶液を室温で撹拌し続けた。この2つの溶液を、続いて60℃で撹拌しながら混合した。表面改質されたシリカナノ粒子を含む、非常に薄い青色の分散液が得られた。
150mLのガラス瓶に、NALCO 2329(40g、50重量%水溶液)と40gの脱イオン水を別々に入れた。それぞれの瓶に、3−グリシドキシプロピルトリメトキシシラン(100%被覆用:9gエタノール中に2.7mmol、0.64g、50%被覆用:3gエタノール中に1.3mmol、0.31g)をゆっくりと加え、両方の溶液を室温で撹拌し続けた。この2つの溶液を、続いて60℃で撹拌しながら混合した。表面改質されたシリカナノ粒子を含む、非常に薄い青色の分散液が得られた。
150mLのガラス瓶に、NALCO 1115(100g、16重量%水溶液)を別々に入れた。それぞれの瓶に、3−グリシドキシプロピルトリメトキシシラン(100%被覆用:15gエタノール中に51.2mmol、12.1g、50%被覆用:10gエタノール中に25.6mmol、6.05g)をゆっくりと加え、両方の溶液を室温で撹拌し続けた。この2つの溶液を、続いて60℃で撹拌しながら混合した。表面改質されたシリカナノ粒子を含む、透明な分散液が得られた。
EX1〜EX7用に、最初に、THV 340Zラテックスを、脱イオン(DI)水を用いて10、20、又は40重量%に希釈した。希釈したTHV 340Z分散液に、望ましい粒径の様々なナノシリカ分散液を加え、THV340Zとシリカナノ粒子分散液との重量比が90:10となるようにした。上記のPE1及びPE2の100%被覆で、シリカナノ粒子の表面は、3−グリシドキシプロピルトリメトキシシランで改質された。水酸化アンモニウム水溶液を加えて、混合分散液のpHを9.5〜10.5に調節し、更に3−(2−アミノエチル)アミノプロピルトリメトキシシランをこの分散液に加えた。結果として得られる分散液中の3−(2−アミノエチル)アミノプロピルトリメトキシシランの量は、コーティング組成物全体の2、3、4、又は5固形分重量%であった。
EX8〜EX17は、シリカナノ粒子が表面改質されていないこと以外、EX1〜EX7と同様に調製した。EX18は、EX1〜EX7と同様に表面改質された。THV 340Zとシリカナノ粒子分散液との重量比は、EX8〜11及びEX13〜EX18で、90:10とした。THV 340Zとシリカナノ粒子分散液との重量比は、EX12で、70:30とした。EX8〜EX17は、No.12メイヤーバーを使ってコーティングし、EX18はNo.6メイヤーバーを使ってコーティングした。EX18は、PET基材の代わりにガラス基材上にコーティングした。下記の表2に、EX8〜EX18のコーティング分散液の組成と、試験データをまとめる。乾燥したコーティング組成物中の各成分の固形分重量%は、カッコ内に示されている。
EX19〜EX27用に、最初に、THV 340Zラテックスを、脱イオン(DI)水を用いて20又は40重量%に希釈した。希釈したTHV 340Zラテックスに、望ましい粒径の様々なナノシリカ分散液を加え、THV340Zとシリカナノ粒子分散液との重量比が90:10となるようにした。水酸化アンモニウム水溶液を加えて、混合分散液のpHを9.5〜10.5に調節し、更に3固形分重量%の3−(2−アミノエチル)アミノプロピルトリメトキシシランを加えた。上記の分散液に、望ましい量のPTFE 5032と、2固形分重量%のR−966を加えた。THV 340ZとPTFE 5032との比を様々に変えた。乾燥したコーティング組成物中の各成分の固形分重量%は、カッコ内に示されている。EX19〜EX27コーティング分散液のそれぞれを、PET基材上にコーティングした。
Claims (29)
- VF、VDF、又はこれらの組み合わせから誘導された繰り返し単位部分を有する少なくとも1種類のフルオロポリマーを含む水性フルオロポリマーラテックス分散液を提供する工程と、
前記水性フルオロポリマーラテックス分散液と、無機酸化物ナノ粒子とを合わせて、混合物を作製する工程と、
前記混合物のpHを少なくとも8に調節する工程と、
前記VF及びVDFから誘導された繰り返し単位部分と反応して、前記フルオロポリマーを架橋させる、及び/又は、前記フルオロポリマーと前記無機酸化物ナノ粒子とを連結させる化合物を添加する工程と、
を備える、コーティング組成物の製造方法。 - 前記化合物が、少なくとも2個のアミノ基、又は、少なくとも1個のアミノ基及び少なくとも1個のアルコキシシラン基、を有する、請求項1に記載の方法。
- 前記化合物が、1000g/モル以下の分子量を有する、請求項1又は2に記載の方法。
- 前記化合物がアミノ置換オルガノシランエステル又はエステル等価物である、請求項1〜3のいずれか一項に記載の方法。
- 前記無機酸化物ナノ粒子が表面改質されていない、請求項1〜4のいずれか一項に記載の方法。
- 前記無機酸化物ナノ粒子が少なくとも30ナノメートルの粒径を有する、請求項1〜5のいずれか一項に記載の方法。
- 前記無機酸化物ナノ粒子が親水性表面処理剤で表面改質されている、請求項1〜4のいずれか一項に記載の方法。
- 前記フルオロポリマーが、HFP、TFE、クロロトリフルオロエチレン、又はこれらの混合物から誘導された繰り返し単位部分を更に有する、請求項1〜6のいずれか一項に記載の方法。
- 前記コーティング組成物が20〜95固形分重量%の前記フルオロポリマーを含む、請求項1〜8のいずれか一項に記載の方法。
- 前記コーティング組成物が1〜60固形分重量%の無機酸化物ナノ粒子を含む、請求項1〜9のいずれか一項に記載の方法。
- 前記無機酸化物ナノ粒子がシリカを含む、請求項1〜10のいずれか一項に記載の方法。
- 前記方法が、VF又はVDFから誘導された繰り返し単位部分を有しない第2フルオロポリマーを、少なくとも1種添加する工程を更に備える、請求項1〜11のいずれか一項に記載の方法。
- 前記第2フルオロポリマーが、TFEから誘導された繰り返し単位部分を有する、請求項1〜12のいずれか一項に記載の方法。
- 前記第2フルオロポリマーが、ビニルエーテルから誘導された繰り返し単位部分を更に有する、請求項1〜13のいずれか一項に記載の方法。
- 水性液体媒体と、
前記水性液体媒体中に分散したフルオロポリマー粒子であって、前記フルオロポリマー又はフルオロポリマー混合物が、VF、VDF、又はこれらの組み合わせから誘導された繰り返し単位部分を有する、フルオロポリマー粒子と、
無機酸化物ナノ粒子と、
前記VF及びVDFから誘導された繰り返し単位部分と反応して、前記フルオロポリマーを架橋させる、及び/又は、前記フルオロポリマーと前記無機酸化物ナノ粒子とを連結させる化合物と、
を含む、フルオロポリマーコーティング組成物。 - 前記コーティング組成物が、請求項2〜15のいずれか一項又はそれらの組み合わせによって更に特徴付けられる、請求項15に記載のフルオロポリマーコーティング組成物。
- 前記フルオロポリマーが、15〜35モル%の、VF、VDF、又はこれらの組み合わせから誘導された繰り返し単位部分を有する、請求項15〜16のいずれか一項に記載のフルオロポリマーコーティング組成物。
- 前記フルオロポリマーが、少なくとも45モル%の、TFEから誘導された繰り返し単位部分を有する、請求項15〜17のいずれか一項に記載のフルオロポリマーコーティング組成物。
- 基材を提供する工程と、前記基材を請求項1〜18のいずれか一項に記載の前記フルオロポリマーコーティング組成物でコーティングする工程と、を備える、基材のコーティング方法。
- 前記コーティングされた基材の表面が、請求項15〜18のいずれか一項に記載の前記乾燥したコーティング組成物を有している基材を含む、コーティングされた基材。
- 前記基材が、無機又はポリマー基材である、請求項20に記載のコーティングされた基材。
- 前記基材が光透過性である、請求項20又は21に記載のコーティングされた基材。
- 前記基材が太陽電池モジュールの裏面フィルムである、請求項20〜22のいずれか一項に記載のコーティングされた基材。
- 前記乾燥したコーティングが、0.1mils〜2milsの範囲の厚さを有する、請求項20〜23のいずれか一項に記載のコーティングされた基材。
- 裏面フィルムを含む太陽電池モジュールであって、前記裏面フィルムが、
VF、VDF、又はこれらの組み合わせから誘導された繰り返し単位部分を有する、少なくとも1種類のフルオロポリマー、
無機酸化物ナノ粒子、及び、
前記VF及びVDFから誘導された繰り返し単位部分と反応して、前記フルオロポリマーを架橋させる、及び/又は、前記フルオロポリマーと前記無機酸化物ナノ粒子とを連結させる化合物、
を含む、太陽電池モジュール。 - 前記フルオロポリマー及び/又は無機酸化物ナノ粒子が、請求項2〜14及び17〜18のいずれか一項又はそれらの組み合わせにより更に記述される、請求項25に記載の太陽電池モジュール。
- 裏面フィルムを含む太陽電池モジュールであって、前記裏面フィルムが、
VF、VDF、又はこれらの組み合わせから誘導された繰り返し単位部分を有する、少なくとも1種類のフルオロポリマー、及び
アミノ置換オルガノシランエステル化合物又はエステル等価物架橋性化合物、
を含む、太陽電池モジュール。 - 表面層が、無機酸化物ナノ粒子を更に含む、請求項27に記載の太陽電池モジュール。
- 前記フルオロポリマー及び/又は無機酸化物ナノ粒子が、請求項2〜3、5〜14及び17〜18のいずれか一項又はそれらの組み合わせにより更に記述される、請求項27又は28に記載の太陽電池モジュール。
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Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104583764B (zh) | 2012-08-02 | 2017-03-22 | 3M创新有限公司 | 便携式电子设备和蒸汽传感器卡 |
JP6478998B2 (ja) | 2013-11-07 | 2019-03-06 | スリーエム イノベイティブ プロパティズ カンパニー | アジリジン化合物を含むフルオロポリマーコーティング |
US10526503B2 (en) | 2013-11-07 | 2020-01-07 | 3M Innovative Properties Company | Fluoropolymer coatings comprising aziridine compounds and non-fluorinated polymer |
ES2748292T3 (es) * | 2014-10-30 | 2020-03-16 | Dow Global Technologies Llc | Módulo PV con capa de película que comprende gel de sílice micronizada |
JP6471501B2 (ja) * | 2015-01-08 | 2019-02-20 | 大日本印刷株式会社 | 太陽電池モジュール用裏面保護シート及びこれを用いた太陽電池モジュール |
EP3046151B1 (en) * | 2015-01-16 | 2019-04-03 | Somont GmbH | Method and apparatus of fabricating an interconnector assembly |
WO2017075499A1 (en) | 2015-10-28 | 2017-05-04 | Madico, Inc. | Multilayer composite films for architectural applications |
CN109671614B (zh) | 2017-08-10 | 2020-08-21 | 长江存储科技有限责任公司 | 一种晶圆键合方法 |
US11820908B2 (en) | 2018-04-10 | 2023-11-21 | Swimc Llc | Exterior coating for aluminum and glass |
US12018144B2 (en) | 2018-06-12 | 2024-06-25 | 3M Innovative Properties Company | Fluoropolymer coating compositions comprising amine curing agents, coated substrates and related methods |
US11866602B2 (en) | 2018-06-12 | 2024-01-09 | 3M Innovative Properties Company | Fluoropolymer compositions comprising fluorinated additives, coated substrates and methods |
CN112243450B (zh) | 2018-06-12 | 2023-01-13 | 3M创新有限公司 | 含氟聚合物纳米颗粒涂料组合物 |
EP3670617A1 (de) * | 2018-12-21 | 2020-06-24 | Nedschroef Fraulautern GmbH | Beschichtung und verfahren zur verbesserung des warmlöseverhaltens von schrauben, insbesondere von aluminiumschrauben |
US11254838B2 (en) | 2019-03-29 | 2022-02-22 | Ppg Industries Ohio, Inc. | Single component hydrophobic coating |
CN110620161B (zh) * | 2019-09-06 | 2024-07-23 | 泰州中来光电科技有限公司 | 一种轻质柔性光伏组件 |
WO2021088198A1 (en) | 2019-11-04 | 2021-05-14 | 3M Innovative Properties Company | Electronic telecommunications articles comprising crosslinked fluoropolymers and methods |
CN114630874B (zh) | 2019-11-04 | 2023-12-05 | 3M创新有限公司 | 包含具有烯键式不饱和基团和电子供体基团的固化剂的含氟聚合物组合物及用其涂覆的基底 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000290536A (ja) * | 1999-04-09 | 2000-10-17 | Daikin Ind Ltd | 水性塗料用樹脂組成物 |
JP2002201227A (ja) * | 2000-12-28 | 2002-07-19 | Asahi Glass Co Ltd | フッ素系共重合体の水性分散液 |
JP2011162598A (ja) * | 2010-02-05 | 2011-08-25 | Dic Corp | コーティング剤組成物 |
Family Cites Families (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5656121A (en) | 1994-08-19 | 1997-08-12 | Minnesota Mining And Manufacturing Company | Method of making multi-layer composites having a fluoropolymer layer |
US5855977A (en) | 1996-08-26 | 1999-01-05 | Minnesota Mining And Manufacturing Company | Multi-layer compositions comprising a fluoropolymer |
JP3387392B2 (ja) * | 1997-10-24 | 2003-03-17 | ダイキン工業株式会社 | 含フッ素系重合体水性分散組成物 |
US7351471B2 (en) | 2000-12-06 | 2008-04-01 | 3M Innovative Properties Company | Fluoropolymer coating compositions with multifunctional fluoroalkyl crosslinkers for anti-reflective polymer films |
JP2002290536A (ja) | 2001-03-28 | 2002-10-04 | Tsubasa System Co Ltd | 携帯端末での電話番号登録方法 |
US20050208308A1 (en) | 2001-05-21 | 2005-09-22 | 3M Innovative Properties Company | Bonding compositions |
US6753087B2 (en) | 2001-05-21 | 2004-06-22 | 3M Innovative Properties Company | Fluoropolymer bonding |
US7485371B2 (en) | 2004-04-16 | 2009-02-03 | 3M Innovative Properties Company | Bonding compositions |
US6759129B2 (en) | 2002-04-18 | 2004-07-06 | 3M Innovative Properties Company | Adhesion and bonding of multi-layer articles including a fluoropolymer layer |
US20110114148A1 (en) | 2003-04-11 | 2011-05-19 | Marina Temchenko | Bright white protective laminates |
US20040244829A1 (en) | 2003-06-04 | 2004-12-09 | Rearick Brian K. | Coatings for encapsulation of photovoltaic cells |
US7374812B2 (en) | 2004-12-30 | 2008-05-20 | 3M Innovative Properties Company | Low refractive index coating composition for use in antireflection polymer film coatings and manufacturing method |
US7323514B2 (en) | 2004-12-30 | 2008-01-29 | 3M Innovative Properties Company | Low refractive index fluoropolymer coating compositions for use in antireflective polymer films |
US20060148996A1 (en) | 2004-12-30 | 2006-07-06 | Coggio William D | Low refractive index fluoropolymer compositions having improved coating and durability properties |
US20060147177A1 (en) * | 2004-12-30 | 2006-07-06 | Naiyong Jing | Fluoropolymer coating compositions with olefinic silanes for anti-reflective polymer films |
EP1831288B1 (en) | 2004-12-30 | 2012-06-27 | 3M Innovative Properties Company | Fluoropolymer nanoparticle coating composition |
US7579397B2 (en) | 2005-01-27 | 2009-08-25 | Rensselaer Polytechnic Institute | Nanostructured dielectric composite materials |
JP2008546557A (ja) | 2005-06-13 | 2008-12-25 | スリーエム イノベイティブ プロパティズ カンパニー | 積層体を含有するフルオロポリマー |
WO2007075803A2 (en) | 2005-12-21 | 2007-07-05 | 3M Innovative Properties Company | Highly water repellent fluoropolymer coating |
US7553540B2 (en) | 2005-12-30 | 2009-06-30 | E. I. Du Pont De Nemours And Company | Fluoropolymer coated films useful for photovoltaic modules |
US8012542B2 (en) | 2005-12-30 | 2011-09-06 | E.I. Du Pont De Nemours And Company | Fluoropolymer coating compositions containing adhesive polymers and substrate coating process |
US20070286994A1 (en) | 2006-06-13 | 2007-12-13 | Walker Christopher B | Durable antireflective film |
US8354160B2 (en) | 2006-06-23 | 2013-01-15 | 3M Innovative Properties Company | Articles having durable hydrophobic surfaces |
JP2010514140A (ja) * | 2006-12-21 | 2010-04-30 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | リチウムイオン電池および電気二重層キャパシタのための電極バインダー組成物および電極 |
US7842765B2 (en) | 2006-12-21 | 2010-11-30 | E. I. Du Pont De Nemours And Company | Crosslinkable vinyl fluoride copolymers |
US9735298B2 (en) | 2007-02-16 | 2017-08-15 | Madico, Inc. | Backing sheet for photovoltaic modules |
US20080264484A1 (en) | 2007-02-16 | 2008-10-30 | Marina Temchenko | Backing sheet for photovoltaic modules and method for repairing same |
US8507029B2 (en) | 2007-02-16 | 2013-08-13 | Madico, Inc. | Backing sheet for photovoltaic modules |
US8168297B2 (en) | 2007-04-23 | 2012-05-01 | E. I. Du Pont De Nemours And Company | Fluoropolymer coated film, process for forming the same, and fluoropolymer liquid composition |
BRPI0908530A2 (pt) | 2008-02-27 | 2015-09-29 | Sharp Kk | dispositivo para iluminação, dispisitivo de tela e aparelho receptor de televisão |
TWI478365B (zh) | 2008-06-23 | 2015-03-21 | Asahi Glass Co Ltd | Solar battery module with backplane and solar module |
EP2350704A1 (en) | 2008-11-26 | 2011-08-03 | E. I. du Pont de Nemours and Company | Concentrator solar cell modules with light concentrating articles comprising ionomeric materials |
WO2010093671A1 (en) | 2009-02-13 | 2010-08-19 | Whitford Corporation | Nanoparticle-modified fluoropolymer coatings |
JP5362408B2 (ja) | 2009-03-30 | 2013-12-11 | リンテック株式会社 | 太陽電池モジュール用裏面保護シート及び太陽電池モジュール、太陽電池モジュール用裏面保護シートのフッ素樹脂硬化塗膜形成用塗工液 |
CN102414836A (zh) | 2009-04-27 | 2012-04-11 | 大金工业株式会社 | 太阳能电池及其背板 |
DE102009026679A1 (de) | 2009-06-03 | 2010-12-16 | Henkel Ag & Co. Kgaa | Kleb- und Dichtstoffe auf Basis silanterminierter Bindemittel zum Verkleben und Abdichten von flexiblen Solarfolien / Photovoltaikmodulen |
CN101941001B (zh) | 2009-07-03 | 2014-04-02 | 3M创新有限公司 | 亲水涂层、制品、涂料组合物和方法 |
CN101948647B (zh) * | 2009-07-10 | 2015-04-29 | 3M创新有限公司 | 含氟聚合物水性涂料组合物和使用该组合物制备的涂覆制品 |
US20110120525A1 (en) | 2009-11-25 | 2011-05-26 | E. I. Du Pont De Nemours And Company | Molding processes for light concentrating articles that are used in solar cell modules |
CN102127347A (zh) | 2010-01-14 | 2011-07-20 | 3M创新有限公司 | 用于玻璃的含氟聚合物涂料以及包含它的制品 |
US8652318B2 (en) | 2010-05-14 | 2014-02-18 | Xerox Corporation | Oleophobic surface coatings |
US8211265B2 (en) | 2010-06-07 | 2012-07-03 | E. I. Du Pont De Nemours And Company | Method for preparing multilayer structures containing a perfluorinated copolymer resin layer |
US8211264B2 (en) | 2010-06-07 | 2012-07-03 | E I Du Pont De Nemours And Company | Method for preparing transparent multilayer film structures having a perfluorinated copolymer resin layer |
WO2012016123A1 (en) | 2010-07-30 | 2012-02-02 | E. I. Du Pont De Nemours And Company | Multilayer films containing a fluorinated copolymer resin layer and an encapsulant layer |
US8409379B2 (en) | 2010-07-30 | 2013-04-02 | E I Du Pont De Nemours And Company | Multilayer structures containing a fluorinated copolymer resin layer and an ethylene terpolymer layer |
US20130216784A1 (en) | 2010-10-28 | 2013-08-22 | 3M Innovative Properties Company | Superhydrophobic films |
CN103221479B (zh) | 2010-11-18 | 2016-06-22 | 3M创新有限公司 | 凝聚无定形含氟聚合物胶乳的方法 |
US8507097B2 (en) | 2010-12-21 | 2013-08-13 | E I Du Pont De Nemours And Company | Multilayer films containing a fluorinated copolymer resin layer and a cross-linkable ionomeric encapsulant layer |
-
2012
- 2012-11-14 CN CN201280077086.7A patent/CN104781350B/zh not_active Expired - Fee Related
- 2012-11-14 US US14/425,645 patent/US9221990B2/en not_active Expired - Fee Related
- 2012-11-14 EP EP12888302.2A patent/EP2920261B1/en not_active Not-in-force
- 2012-11-14 WO PCT/CN2012/084609 patent/WO2014075246A1/en active Application Filing
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000290536A (ja) * | 1999-04-09 | 2000-10-17 | Daikin Ind Ltd | 水性塗料用樹脂組成物 |
JP2002201227A (ja) * | 2000-12-28 | 2002-07-19 | Asahi Glass Co Ltd | フッ素系共重合体の水性分散液 |
JP2011162598A (ja) * | 2010-02-05 | 2011-08-25 | Dic Corp | コーティング剤組成物 |
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EP2920261A4 (en) | 2016-05-25 |
US9221990B2 (en) | 2015-12-29 |
US20150240105A1 (en) | 2015-08-27 |
CN104781350B (zh) | 2017-09-05 |
WO2014075246A1 (en) | 2014-05-22 |
JP6184510B2 (ja) | 2017-08-23 |
CN104781350A (zh) | 2015-07-15 |
EP2920261B1 (en) | 2017-09-13 |
US20160046822A1 (en) | 2016-02-18 |
EP2920261A1 (en) | 2015-09-23 |
US9562168B2 (en) | 2017-02-07 |
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