JP2016200254A - 断熱構造体 - Google Patents
断熱構造体 Download PDFInfo
- Publication number
- JP2016200254A JP2016200254A JP2015082300A JP2015082300A JP2016200254A JP 2016200254 A JP2016200254 A JP 2016200254A JP 2015082300 A JP2015082300 A JP 2015082300A JP 2015082300 A JP2015082300 A JP 2015082300A JP 2016200254 A JP2016200254 A JP 2016200254A
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- JP
- Japan
- Prior art keywords
- heat insulating
- insulating material
- single crystal
- heat
- heat insulation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000009413 insulation Methods 0.000 title claims abstract description 28
- 238000010438 heat treatment Methods 0.000 claims abstract description 19
- 239000011810 insulating material Substances 0.000 claims description 156
- 239000012774 insulation material Substances 0.000 abstract description 14
- 230000005855 radiation Effects 0.000 abstract description 2
- 239000013078 crystal Substances 0.000 description 77
- 239000002994 raw material Substances 0.000 description 34
- 239000007789 gas Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 7
- 229910052594 sapphire Inorganic materials 0.000 description 7
- 239000010980 sapphire Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000010899 nucleation Methods 0.000 description 4
- 239000000498 cooling water Substances 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000009530 blood pressure measurement Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000002109 crystal growth method Methods 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
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- Thermal Insulation (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
高さ方向に沿って積層された複数の断熱材を有しており、
高さ方向に隣接する一方の断熱材と、他方の断熱材において、
前記一方の断熱材の前記他方の断熱材と対向する面には凹部が形成されており、
前記他方の断熱材の、前記一方の断熱材と対向する面には前記凹部に対応した凸部が形成されている断熱構造体を提供することができる。
[実施例1]
図1に示した断熱構造体19を備えた単結晶育成装置10を用いて、サファイア単結晶の製造を行った。
そして、図1に示した単結晶育成装置10において、坩堝11内に単結晶用原料として酸化アルミニウム原料を150kg充填し、坩堝支持台13上に載置した。
[比較例]
単結晶育成装置30を用いた点以外は、実施例と同様にしてサファイア単結晶の育成を実施した。
191、192、193、194、195 断熱材
23 凹部
24 凸部
Claims (2)
- 発熱体の周りに配置する断熱構造体であって、
高さ方向に沿って積層された複数の断熱材を有しており、
高さ方向に隣接する一方の断熱材と、他方の断熱材において、
前記一方の断熱材の前記他方の断熱材と対向する面には凹部が形成されており、
前記他方の断熱材の、前記一方の断熱材と対向する面には前記凹部に対応した凸部が形成されている断熱構造体。 - 前記断熱材が、水平方向に沿って複数に分割されている請求項1に記載の断熱構造体。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015082300A JP6697847B2 (ja) | 2015-04-14 | 2015-04-14 | 断熱構造体 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015082300A JP6697847B2 (ja) | 2015-04-14 | 2015-04-14 | 断熱構造体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016200254A true JP2016200254A (ja) | 2016-12-01 |
JP6697847B2 JP6697847B2 (ja) | 2020-05-27 |
Family
ID=57422520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015082300A Expired - Fee Related JP6697847B2 (ja) | 2015-04-14 | 2015-04-14 | 断熱構造体 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6697847B2 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180101174A (ko) * | 2017-03-02 | 2018-09-12 | 후지코시 기카이 고교 가부시키가이샤 | 단결정 제조 장치 |
JP2019182707A (ja) * | 2018-04-11 | 2019-10-24 | 住友金属鉱山株式会社 | 単結晶育成装置 |
KR20200099408A (ko) * | 2019-02-14 | 2020-08-24 | 한국세라믹기술원 | 결정 성장 장치용 가변 리플렉터 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6199795U (ja) * | 1984-12-05 | 1986-06-26 | ||
JPS6353393A (ja) * | 1986-08-22 | 1988-03-07 | 株式会社東芝 | 保温装置 |
JP2001010890A (ja) * | 1999-06-23 | 2001-01-16 | Mitsubishi Materials Silicon Corp | 単結晶引上装置 |
JP2013049608A (ja) * | 2011-08-31 | 2013-03-14 | Tokuyama Corp | 大口径サファイア単結晶基板 |
-
2015
- 2015-04-14 JP JP2015082300A patent/JP6697847B2/ja not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6199795U (ja) * | 1984-12-05 | 1986-06-26 | ||
JPS6353393A (ja) * | 1986-08-22 | 1988-03-07 | 株式会社東芝 | 保温装置 |
JP2001010890A (ja) * | 1999-06-23 | 2001-01-16 | Mitsubishi Materials Silicon Corp | 単結晶引上装置 |
JP2013049608A (ja) * | 2011-08-31 | 2013-03-14 | Tokuyama Corp | 大口径サファイア単結晶基板 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180101174A (ko) * | 2017-03-02 | 2018-09-12 | 후지코시 기카이 고교 가부시키가이샤 | 단결정 제조 장치 |
JP2018145029A (ja) * | 2017-03-02 | 2018-09-20 | 不二越機械工業株式会社 | 単結晶製造装置 |
US10280530B2 (en) | 2017-03-02 | 2019-05-07 | Fujikoshi Machinery Corp. | Apparatus for producing a single crystal of a metal oxide comprising a Pt-Rh alloy heater coated with zirconia |
KR102492855B1 (ko) * | 2017-03-02 | 2023-01-31 | 후지코시 기카이 고교 가부시키가이샤 | 단결정 제조 장치 |
JP2019182707A (ja) * | 2018-04-11 | 2019-10-24 | 住友金属鉱山株式会社 | 単結晶育成装置 |
KR20200099408A (ko) * | 2019-02-14 | 2020-08-24 | 한국세라믹기술원 | 결정 성장 장치용 가변 리플렉터 |
KR102227148B1 (ko) | 2019-02-14 | 2021-03-15 | 한국세라믹기술원 | 결정 성장 장치용 가변 리플렉터 |
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