JP2016169401A - スパッタリング装置 - Google Patents
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- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
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- H—ELECTRICITY
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- H01J37/3411—Constructional aspects of the reactor
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Abstract
Description
図1および図2には、実施形態のスパッタリング装置100が示されている。スパッタリング装置100は、減圧容器101とロードロック室102を備えている。減圧容器101は、気密性を有し、図示省略した排気ポンプによって内部を減圧状態にできる。ロードロック室102は、減圧容器101とゲイトバルブを介して接続され、減圧容器101と同様な気密構造を有している。ロードロック室102も排気ポンプが接続され、減圧用域101とは独立に内部の減圧状態を制御できる。
以下、自転モード(公転なし)で連続成膜を行う場合の一例を説明する。この例では、レンズを対象に、スパッタリング部108において第1の光学薄膜であるSi酸化膜を成膜し、パッタリング部109において第2の光学薄膜であるNb酸化膜を成膜する。そして、第1の光学薄膜であるSi酸化膜と第2の光学薄膜であるNb酸化膜を交互に多層に積層することで所望の光学薄膜をワークであるレンズ上に成膜(コーティング)する。
(1)上述した減圧容器101内での成膜処理が行われている時間において、未処理の7個のワークを収納した8個のキャリア106をロードロック室102に収納する。
(2)次いで、ロードロック室102を減圧状態にする。なお、減圧容器101での成膜処理中は、ロードロック室102と減圧容器101とを仕切るゲイトバルブは閉鎖しておく。
(3)減圧容器101での成膜処理が終了したら、ロードロック室102と減圧容器01とを同じ圧力の減圧状態とし、次いでロードロック室102と減圧容器11とを仕切るゲイトバルブを開け、図示省略したロボットアームによって、減容器101からロードロック室102へのキャリア106の排出、ロードロッ室102内から減圧容器101へのキャリア106(成膜前のワーク107をせたキャリア106)の搬入を行い、ロードロック室102内の未処理のワーと減圧容器101内の処理済みのワークとの入れ替え行う。
(4)ワークの入れ替えを行ったら、ロードロック室102と減圧容器101とを仕るゲイトバルブを閉鎖し、未処理のワークに対して成膜処理を行う。(4)の成膜処理が行われている間に、ロードロック室102内の処理済のワークを装置外に搬出し、ついで上記(1)の処理を行う。
上記の(1)〜(4)の処理を繰り返すことで、連続的に処理が行われ、高い生産性でもってレンズへの光学薄膜の成膜が行われる。またスパッタリング源の直下の狭い面積で製膜されるため、高速成膜を行うことができる。
以下、多数のワークを同時にまとめて処理するバッチ処理の例を説明する。この例では、公転テーブル104を一定の速度で回転させつつ各キャリア106を自転させる。この場合、各キャリア106は公転しつつ自転する。そして、特定のキャリア106に着目した場合、そのキャリア106がスパッタリング部108を通過した際に当該キャリア106上のワーク107に対する第1の光学薄膜の成膜が行われる。また、スパッタリング部109を通過した際には第2の光学薄膜の成膜が行われる。プラズマ処理部110を通過した際にプラズマ処理が行われる。この3つの処理は、公転する公転テーブル上のすべてのキャリア106に対して均一に行われる。ここで、各スパッタリング部およびプラズマ処理部は独立に制御することが可能であり、また、同時に制御することも可能である。このことによってスパッタリング部108と109のターゲット材料を混合した混合膜を成膜することも可能になる。また、各スパッタリング部で製膜された極薄い薄膜についてプラズマ処理を行うことも同時に可能である。
上記の動作1および動作2において、揺動自転モードを行ってもよい。この場合、キャリア106とスパッタリングターゲット111とが図7に示す位置関係になった状態で、公転テーブル104を図5に示すように揺動させ、その際に自転テーブル105を自転させつつ成膜が行われる。揺動自転モードでは、自転中心が公転軌道上を前後に揺動するので、成膜の均一性をより高くできる。
動作1乃至3では、同じ光学薄膜を多数のキャリアに対して成膜したが、異なるキャリア106において、異なる光学特性の光学薄膜を成膜する処理も可能である。スパッタリング装置100では、スパッタリング部108で成膜される第1の光学薄膜と、スパッタリング部109で成膜される第2の光学薄膜とを交互に多層に積層することで光学薄膜を得ることができる。この構造では、第1の光学薄膜の厚みと第2の光学薄膜の厚みの関係を変更することで、光学特性を制御できる。
Claims (6)
- 減圧容器内に配置される回転を独自に制御可能な自公転テーブルと、
前記自公転テーブル上に配置される複数のワークに対し、前記自公転テーブルの公転軌道上に設けられた複数のスパッタリングターゲットと、
前記自公転テーブル上にワークをセットするためのロードロック室と
を有し、
前記自公転テーブルは、公転テーブル上に複数の自転テーブルが配置された構造を有し、
前記公転テーブルの回転と前記自転テーブルの回転とが独立に制御可能であることを特徴とするスパッタリング装置。 - 前記複数のスパッタリングターゲットのそれぞれは、前記減圧容器内において成膜雰囲気が分離されていることを特徴とする請求項1に記載のスパッタリング装置。
- 前記自転テーブルを自転させ、且つ、前記公転テーブルを公転軌道上で前後に揺動させてのスパッタリングが行われることを特徴とする請求項1または2に記載のスパッタリング装置。
- 前記ロードロック室にワークを載せた複数のキャリアが配置され、前記複数のキャリアそれぞれにおいて異なる自公転の回転制御を行うことを特徴とする請求項1〜3のいずれか一項に記載のスパッタリング装置。
- 前記ロードロック室は前記減圧容器と独立して減圧状態が制御されることを特徴とする請求項1〜4のいずれか1項に記載のスパッタリング装置。
- 前記自公転テーブルの公転軌道上に設けられ、前記自公転テーブル上に配置される複数のワークに対しプラズマ処理またはラジカル処理を行うためのプラズマ源またはラジカル源を有することを特徴とする請求項1〜5のいずれか一項に記載のスパッタリング装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015048191A JP2016169401A (ja) | 2015-03-11 | 2015-03-11 | スパッタリング装置 |
US15/554,841 US20180037983A1 (en) | 2015-03-11 | 2016-03-07 | Sputtering device |
PCT/JP2016/057015 WO2016143747A1 (ja) | 2015-03-11 | 2016-03-07 | スパッタリング装置 |
DE112016001134.2T DE112016001134T5 (de) | 2015-03-11 | 2016-03-07 | Sputtervorrichtung |
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JP2015048191A JP2016169401A (ja) | 2015-03-11 | 2015-03-11 | スパッタリング装置 |
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JP2016169401A true JP2016169401A (ja) | 2016-09-23 |
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JP2015048191A Pending JP2016169401A (ja) | 2015-03-11 | 2015-03-11 | スパッタリング装置 |
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US (1) | US20180037983A1 (ja) |
JP (1) | JP2016169401A (ja) |
DE (1) | DE112016001134T5 (ja) |
WO (1) | WO2016143747A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021199693A1 (ja) * | 2020-04-01 | 2021-10-07 | 株式会社シンクロン | スパッタ装置及びこれを用いた成膜方法 |
US12024769B2 (en) | 2019-05-07 | 2024-07-02 | Oerlikon Surface Solutions Ag, Pfäffikon | Movable work piece carrier device for holding work pieces to be treated |
Families Citing this family (3)
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---|---|---|---|---|
CN113265626B (zh) * | 2020-02-14 | 2023-06-16 | 芝浦机械电子装置株式会社 | 成膜装置及成膜装置的水分去除方法 |
CN114959610B (zh) * | 2022-05-30 | 2023-08-22 | 陕西工业职业技术学院 | 一种平行臂式三自由协同驱动型薄膜掠射角溅射平台 |
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Also Published As
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WO2016143747A1 (ja) | 2016-09-15 |
US20180037983A1 (en) | 2018-02-08 |
DE112016001134T5 (de) | 2017-11-30 |
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