JP2016111068A - 分解検出装置、濃度測定装置、及び、濃度制御装置 - Google Patents
分解検出装置、濃度測定装置、及び、濃度制御装置 Download PDFInfo
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- 238000000354 decomposition reaction Methods 0.000 title claims abstract description 154
- 238000005259 measurement Methods 0.000 title claims abstract description 35
- 238000002835 absorbance Methods 0.000 claims abstract description 178
- 239000000463 material Substances 0.000 claims abstract description 178
- 239000004065 semiconductor Substances 0.000 claims abstract description 113
- 230000007246 mechanism Effects 0.000 claims abstract description 33
- 239000000126 substance Substances 0.000 claims abstract description 18
- 238000001285 laser absorption spectroscopy Methods 0.000 claims abstract description 4
- 238000001745 non-dispersive infrared spectroscopy Methods 0.000 claims abstract 3
- 239000007789 gas Substances 0.000 claims description 111
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- 230000007423 decrease Effects 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims 2
- 230000008016 vaporization Effects 0.000 abstract description 5
- 238000009834 vaporization Methods 0.000 abstract 2
- 238000004364 calculation method Methods 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 230000003247 decreasing effect Effects 0.000 description 8
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 208000035404 Autolysis Diseases 0.000 description 3
- 206010057248 Cell death Diseases 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 3
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- 230000001276 controlling effect Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000028043 self proteolysis Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002259 gallium compounds Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
200・・・濃度測定装置
100・・・分解検出装置
1 ・・・吸光度測定機構
2 ・・・調整バルブ
P ・・・圧力センサ
COM・・・制御機構
3 ・・・濃度算出部
4 ・・・分解検出部
5 ・・・バルブ制御部
51 ・・・目標全圧設定部
52 ・・・操作量算出部
53 ・・・電圧印加部
B ・・・バブリングシステム
B1 ・・・タンク
B2 ・・・導入管
B3 ・・・導出管
Claims (9)
- 半導体材料が気化した材料ガスを含む混合ガスについて、前記半導体材料が吸収する波長の吸光度である第1吸光度と、前記半導体材料が分解した際に生じる物質が吸収する波長の吸光度である第2吸光度とを測定するNDIR方式又はレーザ吸収分光方式の吸光度測定機構と、
前記第1吸光度と前記第2吸光度とに基づいて、前記半導体材料の分解を検出する分解検出部とを備えたことを特徴とする分解検出装置。 - 前記分解検出部が、前記半導体材料に分解が生じていない状態で測定された前記第1吸光度と前記第2吸光度の比と、現在の第1吸光度と第2吸光度の比との比較結果に基づいて前記半導体材料の分解を検出するように構成されている請求項1記載の分解検出装置。
- 前記分解検出部が、前記半導体材料に分解が生じていない状態で測定された前記第1吸光度と前記第2吸光度の差と、現在の第1吸光度と第2吸光度の差との比較結果に基づいて前記半導体材料の分解を検出するように構成されている1又は2記載の分解検出装置。
- 前記分解検出部が、同時刻における前記第1吸光度の増減傾向と前記第2吸光度の増減傾向が異なっている場合に前記半導体材料に分解を検出するように構成されている請求項1乃至3いずれかに記載の分解検出装置。
- 前記吸光度測定機構が、
混合ガスが通過する測定セルと、
所定の波長帯域幅を有する光を前記測定セルへ射出する光源部と、
前記測定セルを通過した光のうち前記半導体材料が吸収する波長の光を通過させる第1フィルタと、
前記測定セルを通過した光のうち前記半導体材料が分解した際に生じる物質が吸収する波長の光を通過させる第2フィルタと、
前記第1フィルタ又は前記第2フィルタを通過した光を検出する光検出部とを備えたNDIR方式のガス分析計である請求項1乃至4いずれかに記載の分解検出装置。 - 前記吸光度測定機構が、
混合ガスが通過する測定セルと、
前記半導体材料が吸収する波長のレーザ光と、前記半導体材料が分解した際に生じる物質が吸収する波長のレーザ光とを前記測定セルへ射出する光源部と、
前記測定セルを通過した光を検出する光検出部とを備えたレーザ吸収分光方式のガス分析計である請求項1乃至5いずれかに記載の分解検出装置。 - 前記半導体材料が、有機金属である請求項1乃至6いずれかに記載の分解検出装置。
- 請求項1乃至7に記載の分解検出装置と、
前記第1吸光度に基づいて、前記混合ガス中の前記材料ガスの濃度を算出する濃度算出部と、を備えた濃度測定装置。 - 前記半導体材料が収容されるタンクと、前記タンク内にキャリアガスを導入する導入管と、前記タンクから前記材料ガスと前記キャリアガスを含む混合ガスを導出する導出管とを備えたバブリングシステムに用いられる濃度制御装置であって、
請求項8記載の濃度測定装置と、
前記導出管に設けられる調整バルブと、
予め設定される目標濃度と、前記濃度測定装置で測定される材料ガスの測定濃度とに基づいて前記調整バルブを制御するバルブ制御部とを備えた濃度制御装置。
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JP2014244540A JP6435175B2 (ja) | 2014-12-02 | 2014-12-02 | 分解検出装置、分解検出方法、分解検出装置用プログラム、濃度測定装置、及び、濃度制御装置 |
US14/952,735 US9970865B2 (en) | 2014-12-02 | 2015-11-25 | Decomposition detecting unit, concentration measuring unit, and concentration control apparatus |
KR1020150166223A KR102320188B1 (ko) | 2014-12-02 | 2015-11-26 | 분해 검출 장치, 농도 측정 장치 및 농도 제어 장치 |
CN201510857091.5A CN105651729B (zh) | 2014-12-02 | 2015-11-30 | 分解检测装置、浓度测量装置和浓度控制装置 |
TW104139894A TWI675198B (zh) | 2014-12-02 | 2015-11-30 | 分解檢測裝置、濃度測量裝置及濃度控制裝置 |
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JP2021009031A (ja) * | 2019-06-28 | 2021-01-28 | 株式会社堀場製作所 | 分析装置及び分析方法 |
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JP6914063B2 (ja) * | 2017-03-10 | 2021-08-04 | 株式会社堀場エステック | ガス制御システム、該ガス制御システムを備えた成膜装置、該ガス制御システムに用いるプログラム及びガス制御方法。 |
KR102100822B1 (ko) | 2018-07-13 | 2020-04-14 | 주식회사 케이엔텍 | 흡광도를 이용한 농도 측정 방법 |
KR20210027267A (ko) * | 2018-07-31 | 2021-03-10 | 어플라이드 머티어리얼스, 인코포레이티드 | 전구체 전달 시스템 및 이와 관련된 방법들 |
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JP7281285B2 (ja) * | 2019-01-28 | 2023-05-25 | 株式会社堀場エステック | 濃度制御装置、及び、ゼロ点調整方法、濃度制御装置用プログラム |
JP7221127B2 (ja) * | 2019-04-26 | 2023-02-13 | 株式会社堀場エステック | 吸光分析装置、及び、吸光分析装置用プログラム |
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JP7011626B2 (ja) | 2019-06-28 | 2022-01-26 | 株式会社堀場製作所 | 分析装置及び分析方法 |
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US9970865B2 (en) | 2018-05-15 |
KR20160066504A (ko) | 2016-06-10 |
CN105651729B (zh) | 2020-07-07 |
TWI675198B (zh) | 2019-10-21 |
TW201621299A (zh) | 2016-06-16 |
US20160153898A1 (en) | 2016-06-02 |
JP6435175B2 (ja) | 2018-12-05 |
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CN105651729A (zh) | 2016-06-08 |
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