JP2016038468A5 - - Google Patents
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- Publication number
- JP2016038468A5 JP2016038468A5 JP2014161635A JP2014161635A JP2016038468A5 JP 2016038468 A5 JP2016038468 A5 JP 2016038468A5 JP 2014161635 A JP2014161635 A JP 2014161635A JP 2014161635 A JP2014161635 A JP 2014161635A JP 2016038468 A5 JP2016038468 A5 JP 2016038468A5
- Authority
- JP
- Japan
- Prior art keywords
- resin layer
- photosensitive resin
- patterning
- group
- atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 claims description 54
- 239000011347 resin Substances 0.000 claims description 54
- 238000000059 patterning Methods 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 19
- 239000002904 solvent Substances 0.000 claims description 10
- 238000010030 laminating Methods 0.000 claims description 4
- 239000003822 epoxy resin Substances 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
- -1 E is -S (= O) 2 - Chemical group 0.000 claims 8
- 229910000077 silane Inorganic materials 0.000 claims 7
- 125000001424 substituent group Chemical group 0.000 claims 6
- 125000004432 carbon atom Chemical group C* 0.000 claims 5
- 125000003700 epoxy group Chemical group 0.000 claims 4
- 239000010702 perfluoropolyether Substances 0.000 claims 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 2
- 150000001298 alcohols Chemical class 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 229910052787 antimony Inorganic materials 0.000 claims 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical group [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 2
- 125000004437 phosphorous atom Chemical group 0.000 claims 2
- 229910052698 phosphorus Inorganic materials 0.000 claims 2
- 206010034972 Photosensitivity reaction Diseases 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 150000001450 anions Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 claims 1
- 125000002091 cationic group Chemical group 0.000 claims 1
- 150000001768 cations Chemical group 0.000 claims 1
- 238000006482 condensation reaction Methods 0.000 claims 1
- 239000000470 constituent Substances 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 150000002170 ethers Chemical class 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 150000002334 glycols Chemical class 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 150000002576 ketones Chemical class 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 230000036211 photosensitivity Effects 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014161635A JP2016038468A (ja) | 2014-08-07 | 2014-08-07 | 感光性樹脂層のパターニング方法 |
| US14/817,022 US20160041469A1 (en) | 2014-08-07 | 2015-08-03 | Method for patterning photosensitive resin layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014161635A JP2016038468A (ja) | 2014-08-07 | 2014-08-07 | 感光性樹脂層のパターニング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016038468A JP2016038468A (ja) | 2016-03-22 |
| JP2016038468A5 true JP2016038468A5 (enExample) | 2017-09-07 |
Family
ID=55267329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014161635A Pending JP2016038468A (ja) | 2014-08-07 | 2014-08-07 | 感光性樹脂層のパターニング方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20160041469A1 (enExample) |
| JP (1) | JP2016038468A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10599034B2 (en) * | 2017-08-21 | 2020-03-24 | Funai Electric Co., Ltd. | Method for manufacturing MEMS devices and nano devices with varying degrees of hydrophobicity and hydrophilicity in a composite photoimageable dry film |
| JP7348456B2 (ja) * | 2018-03-19 | 2023-09-21 | 東京エレクトロン株式会社 | 較正されたトリム量を用いて限界寸法を補正するための方法 |
| JP2023034044A (ja) * | 2021-08-30 | 2023-03-13 | 東京応化工業株式会社 | 積層体の製造方法、硬化パターン形成方法、積層体及び感光性組成物 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4497633B2 (ja) * | 1999-03-15 | 2010-07-07 | キヤノン株式会社 | 撥液体層の形成方法及び液体吐出ヘッドの製造方法 |
| JP5473645B2 (ja) * | 2010-02-05 | 2014-04-16 | キヤノン株式会社 | 感光性樹脂組成物及び液体吐出ヘッド |
| JP5967969B2 (ja) * | 2012-02-17 | 2016-08-10 | キヤノン株式会社 | 撥液膜及びその製造方法、並びにこの撥液膜を用いた微細構造体及びその製造方法 |
| JP5591361B2 (ja) * | 2012-04-18 | 2014-09-17 | キヤノン株式会社 | インクジェット記録ヘッド |
| JP6270363B2 (ja) * | 2012-09-11 | 2018-01-31 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP6053580B2 (ja) * | 2013-03-13 | 2016-12-27 | キヤノン株式会社 | 微細パターン表面の撥水処理方法 |
| JP6207212B2 (ja) * | 2013-04-23 | 2017-10-04 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
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2014
- 2014-08-07 JP JP2014161635A patent/JP2016038468A/ja active Pending
-
2015
- 2015-08-03 US US14/817,022 patent/US20160041469A1/en not_active Abandoned