JP2009545005A5 - - Google Patents
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- Publication number
- JP2009545005A5 JP2009545005A5 JP2009521788A JP2009521788A JP2009545005A5 JP 2009545005 A5 JP2009545005 A5 JP 2009545005A5 JP 2009521788 A JP2009521788 A JP 2009521788A JP 2009521788 A JP2009521788 A JP 2009521788A JP 2009545005 A5 JP2009545005 A5 JP 2009545005A5
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- sensitive composition
- repeating unit
- represented
- following structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims 9
- 230000005855 radiation Effects 0.000 claims 8
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 239000011230 binding agent Substances 0.000 claims 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims 2
- 125000000623 heterocyclic group Chemical group 0.000 claims 2
- 239000003999 initiator Substances 0.000 claims 2
- 150000003839 salts Chemical class 0.000 claims 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 1
- VEUHPWRDBGGGBU-UHFFFAOYSA-N OB(O)O.I.I.I Chemical compound OB(O)O.I.I.I VEUHPWRDBGGGBU-UHFFFAOYSA-N 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000000304 alkynyl group Chemical group 0.000 claims 1
- 239000007864 aqueous solution Substances 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 239000012955 diaryliodonium Substances 0.000 claims 1
- -1 diaryliodonium borate compound Chemical class 0.000 claims 1
- 125000001475 halogen functional group Chemical group 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 150000002891 organic anions Chemical class 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/494,235 US7332253B1 (en) | 2006-07-27 | 2006-07-27 | Negative-working radiation-sensitive compositions and imageable materials |
| US11/494,235 | 2006-07-27 | ||
| PCT/US2007/016541 WO2008013766A1 (en) | 2006-07-27 | 2007-07-23 | Negative-working radiation-sensitive compositions and imageable materials |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009545005A JP2009545005A (ja) | 2009-12-17 |
| JP2009545005A5 true JP2009545005A5 (enExample) | 2010-09-02 |
| JP5431931B2 JP5431931B2 (ja) | 2014-03-05 |
Family
ID=38695520
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009521788A Expired - Fee Related JP5431931B2 (ja) | 2006-07-27 | 2007-07-23 | ネガ型輻射線感光性組成物及び画像形成性材料 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7332253B1 (enExample) |
| EP (1) | EP2047333B1 (enExample) |
| JP (1) | JP5431931B2 (enExample) |
| CN (1) | CN101495920B (enExample) |
| DE (1) | DE602007005655D1 (enExample) |
| WO (1) | WO2008013766A1 (enExample) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7592128B2 (en) * | 2001-04-04 | 2009-09-22 | Eastman Kodak Company | On-press developable negative-working imageable elements |
| US7781143B2 (en) * | 2007-05-31 | 2010-08-24 | Eastman Kodak Company | Negative-working imageable elements and methods of use |
| US20090047599A1 (en) * | 2007-08-15 | 2009-02-19 | Geoffrey Horne | Negative-working imageable elements and methods of use |
| EP2098367A1 (en) * | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates |
| JP5183268B2 (ja) * | 2008-03-27 | 2013-04-17 | 富士フイルム株式会社 | 平版印刷版原版 |
| US8293846B2 (en) * | 2008-09-26 | 2012-10-23 | Fujifilm Corporation | Composition for forming layer to be plated, method of producing metal pattern material, metal pattern material |
| JP2010079083A (ja) * | 2008-09-26 | 2010-04-08 | Fujifilm Corp | 平版印刷版の製版方法 |
| US20100129616A1 (en) * | 2008-11-21 | 2010-05-27 | Collins Jeffrey J | Negative-working on-press developable imageable elements |
| US20100151385A1 (en) * | 2008-12-17 | 2010-06-17 | Ray Kevin B | Stack of negative-working imageable elements |
| US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
| US20100215919A1 (en) | 2009-02-20 | 2010-08-26 | Ting Tao | On-press developable imageable elements |
| US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
| US8318405B2 (en) | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
| US8507182B2 (en) * | 2009-06-09 | 2013-08-13 | Eastman Kodak Company | Method of providing lithographic printing plates |
| US8257907B2 (en) | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
| US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
| US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
| US8426104B2 (en) | 2009-10-08 | 2013-04-23 | Eastman Kodak Company | Negative-working imageable elements |
| US8329383B2 (en) | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| JP2011213782A (ja) * | 2010-03-31 | 2011-10-27 | Fujifilm Corp | ポリマー溶液の製造方法、ポリマーの精製方法 |
| US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
| US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
| CN102030855B (zh) * | 2010-11-21 | 2014-02-26 | 乐凯集团第二胶片厂 | 氨酯化不饱和水溶性乙烯基多元共聚物及其制备方法 |
| US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
| US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
| JP5705584B2 (ja) * | 2011-02-24 | 2015-04-22 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8703381B2 (en) | 2011-08-31 | 2014-04-22 | Eastman Kodak Company | Lithographic printing plate precursors for on-press development |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| BR112014007143A2 (pt) * | 2011-09-26 | 2017-06-13 | Fujifilm Corp | processo para fabricar chapa de impressão litográfica |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| US8927197B2 (en) | 2012-11-16 | 2015-01-06 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| EP2735903B1 (en) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a hyperbranched binder material |
| JP5830041B2 (ja) * | 2013-01-24 | 2015-12-09 | 信越化学工業株式会社 | ポリシロキサン含有レジスト下層膜形成用組成物、及びこれを用いたパターン形成方法 |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP2778782B1 (en) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| CN104289152B (zh) * | 2014-10-08 | 2016-01-13 | 西南石油大学 | 一类两性磺酸盐型可聚表面活性剂及其合成方法 |
| US11485874B2 (en) * | 2019-06-27 | 2022-11-01 | Prc-Desoto International, Inc. | Addition polymer for electrodepositable coating compositions |
| US12252561B2 (en) | 2019-08-30 | 2025-03-18 | Stratasys, Inc. | Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication |
| WO2021042013A1 (en) * | 2019-08-30 | 2021-03-04 | Dsm Ip Assets B.V. | Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
| CN115725015B (zh) * | 2022-11-11 | 2025-10-17 | 阜阳欣奕华新材料科技股份有限公司 | KrF树脂及其制备方法和化学放大型光致抗蚀剂 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6569602B1 (en) * | 1998-10-05 | 2003-05-27 | E. I. Du Pont De Nemours And Company | Ionization radiation imageable photopolymer compositions |
| SG98433A1 (en) * | 1999-12-21 | 2003-09-19 | Ciba Sc Holding Ag | Iodonium salts as latent acid donors |
| ATE345928T1 (de) | 2000-08-21 | 2006-12-15 | Fuji Photo Film Co Ltd | Bildaufzeichnungsmaterial |
| US6548222B2 (en) * | 2000-09-06 | 2003-04-15 | Gary Ganghui Teng | On-press developable thermosensitive lithographic printing plates |
| JP4191887B2 (ja) * | 2000-09-27 | 2008-12-03 | 富士フイルム株式会社 | 平版印刷版原版 |
| EP1425410A2 (en) | 2000-10-03 | 2004-06-09 | Glaxo Group Limited | Tumor marker and methods of use |
| JP4680399B2 (ja) * | 2001-02-15 | 2011-05-11 | コダック株式会社 | 感光性平版印刷版及び画像形成方法 |
| US7592128B2 (en) * | 2001-04-04 | 2009-09-22 | Eastman Kodak Company | On-press developable negative-working imageable elements |
| US6899994B2 (en) * | 2001-04-04 | 2005-05-31 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments |
| US7261998B2 (en) * | 2001-04-04 | 2007-08-28 | Eastman Kodak Company | Imageable element with solvent-resistant polymeric binder |
| JP4213876B2 (ja) | 2001-04-13 | 2009-01-21 | 富士フイルム株式会社 | 感光性組成物及びネガ型平版印刷版 |
| US6702437B2 (en) * | 2001-08-23 | 2004-03-09 | Fuji Photo Film Co., Ltd. | Image recording material |
| US7172850B2 (en) * | 2002-04-10 | 2007-02-06 | Eastman Kodak Company | Preparation of solvent-resistant binder for an imageable element |
| US7569328B2 (en) | 2002-08-16 | 2009-08-04 | Fujifilm Corporation | Resin composition and thermo/photosensitive composition |
| JP4262945B2 (ja) * | 2002-08-16 | 2009-05-13 | 富士フイルム株式会社 | 感熱／感光性組成物 |
| JP4090307B2 (ja) | 2002-08-22 | 2008-05-28 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP4213715B2 (ja) | 2003-06-18 | 2009-01-21 | コダックグラフィックコミュニケーションズ株式会社 | ネガ型感光性組成物およびネガ型感光性平版印刷版 |
| JP4291638B2 (ja) * | 2003-07-29 | 2009-07-08 | 富士フイルム株式会社 | アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版 |
| JP4248345B2 (ja) | 2003-09-01 | 2009-04-02 | 富士フイルム株式会社 | 感光性組成物 |
| DE602004019981D1 (de) | 2003-12-25 | 2009-04-23 | Kodak Polychrome Graphics Jp | Negativ-lichtempfindliche zusammensetzung und negativ-lichtempfindliche lithographische druckplatte |
| US20090022961A1 (en) * | 2004-09-01 | 2009-01-22 | Bernd Strehmel | Interlayer for lithographic plates |
| US7175949B1 (en) * | 2006-02-17 | 2007-02-13 | Eastman Kodak Company | Radiation-sensitive compositions and imageable materials |
| US7524614B2 (en) * | 2006-05-26 | 2009-04-28 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
-
2006
- 2006-07-27 US US11/494,235 patent/US7332253B1/en not_active Expired - Fee Related
-
2007
- 2007-07-23 EP EP07810685A patent/EP2047333B1/en not_active Not-in-force
- 2007-07-23 WO PCT/US2007/016541 patent/WO2008013766A1/en not_active Ceased
- 2007-07-23 DE DE602007005655T patent/DE602007005655D1/de active Active
- 2007-07-23 CN CN200780028508.0A patent/CN101495920B/zh active Active
- 2007-07-23 JP JP2009521788A patent/JP5431931B2/ja not_active Expired - Fee Related
- 2007-10-25 US US11/923,697 patent/US20080044767A1/en not_active Abandoned