CN101495920B - 负性辐射敏感组合物和可成像材料 - Google Patents

负性辐射敏感组合物和可成像材料 Download PDF

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Publication number
CN101495920B
CN101495920B CN200780028508.0A CN200780028508A CN101495920B CN 101495920 B CN101495920 B CN 101495920B CN 200780028508 A CN200780028508 A CN 200780028508A CN 101495920 B CN101495920 B CN 101495920B
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contain
carbon atoms
weight
phenyl
repetitive
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Chinese (zh)
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CN101495920A (zh
Inventor
T·陶
S·A·贝克利
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Eastman Kodak Co
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Eastman Kodak Co
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02—Cover layers; Protective layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08—Developable by water or the fountain solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/10—Developable by an acidic solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/12—Developable by an organic solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Printing Plates And Materials Therefor (AREA)
CN200780028508.0A 2006-07-27 2007-07-23 负性辐射敏感组合物和可成像材料 Active CN101495920B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/494,235 US7332253B1 (en) 2006-07-27 2006-07-27 Negative-working radiation-sensitive compositions and imageable materials
US11/494,235 2006-07-27
PCT/US2007/016541 WO2008013766A1 (en) 2006-07-27 2007-07-23 Negative-working radiation-sensitive compositions and imageable materials

Publications (2)

Publication Number Publication Date
CN101495920A CN101495920A (zh) 2009-07-29
CN101495920B true CN101495920B (zh) 2013-01-02

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US (2) US7332253B1 (enExample)
EP (1) EP2047333B1 (enExample)
JP (1) JP5431931B2 (enExample)
CN (1) CN101495920B (enExample)
DE (1) DE602007005655D1 (enExample)
WO (1) WO2008013766A1 (enExample)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7592128B2 (en) * 2001-04-04 2009-09-22 Eastman Kodak Company On-press developable negative-working imageable elements
US7781143B2 (en) * 2007-05-31 2010-08-24 Eastman Kodak Company Negative-working imageable elements and methods of use
US20090047599A1 (en) * 2007-08-15 2009-02-19 Geoffrey Horne Negative-working imageable elements and methods of use
EP2098367A1 (en) * 2008-03-05 2009-09-09 Eastman Kodak Company Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates
JP5183268B2 (ja) * 2008-03-27 2013-04-17 富士フイルム株式会社 平版印刷版原版
US8293846B2 (en) * 2008-09-26 2012-10-23 Fujifilm Corporation Composition for forming layer to be plated, method of producing metal pattern material, metal pattern material
JP2010079083A (ja) * 2008-09-26 2010-04-08 Fujifilm Corp 平版印刷版の製版方法
US20100129616A1 (en) * 2008-11-21 2010-05-27 Collins Jeffrey J Negative-working on-press developable imageable elements
US20100151385A1 (en) * 2008-12-17 2010-06-17 Ray Kevin B Stack of negative-working imageable elements
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US20100215919A1 (en) 2009-02-20 2010-08-26 Ting Tao On-press developable imageable elements
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
US8318405B2 (en) 2009-03-13 2012-11-27 Eastman Kodak Company Negative-working imageable elements with overcoat
US8507182B2 (en) * 2009-06-09 2013-08-13 Eastman Kodak Company Method of providing lithographic printing plates
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
US8426104B2 (en) 2009-10-08 2013-04-23 Eastman Kodak Company Negative-working imageable elements
US8329383B2 (en) 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
JP2011213782A (ja) * 2010-03-31 2011-10-27 Fujifilm Corp ポリマー溶液の製造方法、ポリマーの精製方法
US20120090486A1 (en) 2010-10-18 2012-04-19 Celin Savariar-Hauck Lithographic printing plate precursors and methods of use
US8900798B2 (en) 2010-10-18 2014-12-02 Eastman Kodak Company On-press developable lithographic printing plate precursors
CN102030855B (zh) * 2010-11-21 2014-02-26 乐凯集团第二胶片厂 氨酯化不饱和水溶性乙烯基多元共聚物及其制备方法
US20120141941A1 (en) 2010-12-03 2012-06-07 Mathias Jarek Developing lithographic printing plate precursors in simple manner
US20120141935A1 (en) 2010-12-03 2012-06-07 Bernd Strehmel Developer and its use to prepare lithographic printing plates
US20120141942A1 (en) 2010-12-03 2012-06-07 Domenico Balbinot Method of preparing lithographic printing plates
US20120199028A1 (en) 2011-02-08 2012-08-09 Mathias Jarek Preparing lithographic printing plates
JP5705584B2 (ja) * 2011-02-24 2015-04-22 富士フイルム株式会社 平版印刷版の製版方法
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8703381B2 (en) 2011-08-31 2014-04-22 Eastman Kodak Company Lithographic printing plate precursors for on-press development
US9029063B2 (en) 2011-09-22 2015-05-12 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8632941B2 (en) 2011-09-22 2014-01-21 Eastman Kodak Company Negative-working lithographic printing plate precursors with IR dyes
JP5613207B2 (ja) * 2011-09-26 2014-10-22 富士フイルム株式会社 平版印刷版の製版方法
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8889341B2 (en) 2012-08-22 2014-11-18 Eastman Kodak Company Negative-working lithographic printing plate precursors and use
US8927197B2 (en) 2012-11-16 2015-01-06 Eastman Kodak Company Negative-working lithographic printing plate precursors
EP2735903B1 (en) 2012-11-22 2019-02-27 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a hyperbranched binder material
JP5830041B2 (ja) * 2013-01-24 2015-12-09 信越化学工業株式会社 ポリシロキサン含有レジスト下層膜形成用組成物、及びこれを用いたパターン形成方法
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
EP2778782B1 (en) 2013-03-13 2015-12-30 Kodak Graphic Communications GmbH Negative working radiation-sensitive elements
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
CN104289152B (zh) * 2014-10-08 2016-01-13 西南石油大学 一类两性磺酸盐型可聚表面活性剂及其合成方法
US11485874B2 (en) * 2019-06-27 2022-11-01 Prc-Desoto International, Inc. Addition polymer for electrodepositable coating compositions
US12252561B2 (en) 2019-08-30 2025-03-18 Stratasys, Inc. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
WO2021042013A1 (en) * 2019-08-30 2021-03-04 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates
CN115725015B (zh) * 2022-11-11 2025-10-17 阜阳欣奕华新材料科技股份有限公司 KrF树脂及其制备方法和化学放大型光致抗蚀剂

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1322309A (zh) * 1998-10-05 2001-11-14 纳幕尔杜邦公司 可电离辐射成象的感光聚合物组合物
CN1406747A (zh) * 2001-08-23 2003-04-02 富士胶片株式会社 影像记录材料
EP1389521A2 (en) * 2002-08-16 2004-02-18 Fuji Photo Film Co., Ltd. Thermosensitive/photosensitive resin composition
CN1591187A (zh) * 2003-07-29 2005-03-09 富士胶片株式会社 碱溶性聚合物及其可聚合组合物
CN1650233A (zh) * 2002-04-10 2005-08-03 柯达保丽光印艺有限责任公司 使用具有聚氧乙烯片段的粘合剂树脂的施压时可显影的红外敏感的印刷板
EP1653281A1 (en) * 2003-06-18 2006-05-03 Kodak Polychrome Graphics Japan Ltd. Negative photosensitive composition and negative photosensitive lithographic printing plate

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG98433A1 (en) * 1999-12-21 2003-09-19 Ciba Sc Holding Ag Iodonium salts as latent acid donors
ATE362846T1 (de) 2000-08-21 2007-06-15 Fujifilm Corp Bildaufzeichnungsmaterial
US6548222B2 (en) * 2000-09-06 2003-04-15 Gary Ganghui Teng On-press developable thermosensitive lithographic printing plates
JP4191887B2 (ja) * 2000-09-27 2008-12-03 富士フイルム株式会社 平版印刷版原版
JP2004510442A (ja) 2000-10-03 2004-04-08 グラクソ　グループ　リミテッド 腫瘍マーカーおよび使用方法
JP4680399B2 (ja) * 2001-02-15 2011-05-11 コダック株式会社 感光性平版印刷版及び画像形成方法
US7261998B2 (en) * 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
US7592128B2 (en) * 2001-04-04 2009-09-22 Eastman Kodak Company On-press developable negative-working imageable elements
JP4213876B2 (ja) 2001-04-13 2009-01-21 富士フイルム株式会社 感光性組成物及びネガ型平版印刷版
US7172850B2 (en) * 2002-04-10 2007-02-06 Eastman Kodak Company Preparation of solvent-resistant binder for an imageable element
JP4262945B2 (ja) * 2002-08-16 2009-05-13 富士フイルム株式会社 感熱／感光性組成物
JP4090307B2 (ja) 2002-08-22 2008-05-28 富士フイルム株式会社 平版印刷版の作製方法
JP4248345B2 (ja) 2003-09-01 2009-04-02 富士フイルム株式会社 感光性組成物
JPWO2005064402A1 (ja) 2003-12-25 2007-07-19 コダックポリクロームグラフィックス株式会社 ネガ型感光性組成物およびネガ型感光性平版印刷版
CN101010633A (zh) * 2004-09-01 2007-08-01 柯达彩色绘图有限责任公司 平版印刷板的夹层
US7175949B1 (en) * 2006-02-17 2007-02-13 Eastman Kodak Company Radiation-sensitive compositions and imageable materials
US7524614B2 (en) * 2006-05-26 2009-04-28 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1322309A (zh) * 1998-10-05 2001-11-14 纳幕尔杜邦公司 可电离辐射成象的感光聚合物组合物
CN1406747A (zh) * 2001-08-23 2003-04-02 富士胶片株式会社 影像记录材料
CN1650233A (zh) * 2002-04-10 2005-08-03 柯达保丽光印艺有限责任公司 使用具有聚氧乙烯片段的粘合剂树脂的施压时可显影的红外敏感的印刷板
EP1389521A2 (en) * 2002-08-16 2004-02-18 Fuji Photo Film Co., Ltd. Thermosensitive/photosensitive resin composition
EP1653281A1 (en) * 2003-06-18 2006-05-03 Kodak Polychrome Graphics Japan Ltd. Negative photosensitive composition and negative photosensitive lithographic printing plate
CN1591187A (zh) * 2003-07-29 2005-03-09 富士胶片株式会社 碱溶性聚合物及其可聚合组合物

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CN101495920A (zh) 2009-07-29
EP2047333B1 (en) 2010-03-31
US7332253B1 (en) 2008-02-19
US20080044767A1 (en) 2008-02-21
WO2008013766A1 (en) 2008-01-31
JP2009545005A (ja) 2009-12-17
US20080044758A1 (en) 2008-02-21
DE602007005655D1 (de) 2010-05-12
EP2047333A1 (en) 2009-04-15
JP5431931B2 (ja) 2014-03-05

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