JP2015537249A - ハードコーティング層を含む光特性に優れた反射防止フィルム - Google Patents
ハードコーティング層を含む光特性に優れた反射防止フィルム Download PDFInfo
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- JP2015537249A JP2015537249A JP2015543955A JP2015543955A JP2015537249A JP 2015537249 A JP2015537249 A JP 2015537249A JP 2015543955 A JP2015543955 A JP 2015543955A JP 2015543955 A JP2015543955 A JP 2015543955A JP 2015537249 A JP2015537249 A JP 2015537249A
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- antireflection film
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Abstract
Description
R1 xSi(OR2)4-x
前記式1で、R1は炭素数1ないし10のアルキル基、炭素数6ないし10のアリール基または炭素数3ないし10のアルケニル基で、R2は炭素数1ないし6のアルキル基で、xは0≦x<4の整数を表す。
R3 ySi(OR4)4-y
前記式2で、R3は炭素数1ないし12のフルオロアルキル基で、R4は炭素数1ないし6のアルキル基で、yは0≦x<4の整数を表す。
R1 xSi(OR2)4-x
前記式1で、R1は炭素数1ないし10のアルキル基、炭素数6ないし10のアリール基または炭素数3ないし10のアルケニル基で、R2は炭素数1ないし6のアルキル基で、xは0≦x<4の整数を表す。
R3 ySi(OR4)4-y
前記式2で、R3は炭素数1ないし12のフルオロアルキル基で、R4は炭素数1ないし6のアルキル基で、yは0≦x<4の整数を表す。
前記で製造された反射防止ハードコーティング用組成物をメイヤーバーを用いて125μmのPETフィルム上に、ハードコーティング層の厚さが90nmになるように塗布し、180Wの高圧水銀で300mJの紫外線を照射して硬化させハードコーティング層を形成した。
PETフィルム上にハードコーティング層を形成しないことを除いては、前記実施例と同様の方法で最終反射防止フィルムを製造した。
Konica Minolta社のCM―5 Spectrophotometerを用いて前記実施例および比較例の反射防止フィルムの透過率を測定し、反射防止フィルムの裏面を黒色処理した後、反射率を測定した。また、白色光源D65とCIE1964観察者を指定して前記の実施例および比較例の反射防止フィルム構造に従い、CIE L*、a*、b*値、具体的には透過a*、透過b*および反射a*、反射b*の値を測定した。
Claims (14)
- 透明基材、ハードコーティング層、高屈折層および低屈折層の積層構造で、前記低屈折層が下記式1で表されるシラン化合物と下記式2で表されるオルガノシラン化合物が重合されて形成されるバインダー;および中空シリカ粒子を含む反射防止フィルム。
[式1]
R1 xSi(OR2)4-x
前記式1で、R1は炭素数1ないし10のアルキル基、炭素数6ないし10のアリール基または炭素数3ないし10のアルケニル基で、R2は炭素数1ないし6のアルキル基で、xは0≦x<4の整数を表す。
[式2]
R3 ySi(OR4)4-y
前記式2で、R3は炭素数1ないし12のフルオロアルキル基で、R4は炭素数1ないし6のアルキル基で、yは0≦x<4の整数を表す。 - 前記式1で表されるシラン化合物は、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン、テトライソプロポキシシラン、テトラ―n―ブトキシシラン、テトラ―sec―ブトキシシラン、テトラ―tert―ブトキシシラン、トリメトキシシラン、トリエトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、プロピルトリメトキシシラン、プロピルトリエトキシシラン、イソブチルトリエトキシシラン、シクロヘキシルトリメトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、アリルトリメトキシシラン、アリルトリエトキシシラン、ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシランおよびこれらの組合せからなる群から選ばれる一つ以上の化合物である請求項1に記載の反射防止フィルム。
- 前記式2で表されるオルガノシラン化合物は、トリフルオロメチルトリメトキシシラン、トリフルオロメチルトリエトキシシラン、トリフルオロプロピルトリメトキシシラン、トリフルオロプロピルトリエトキシシラン、ノナフルオロブチルエチルトリメトキシシラン、ノナフルオロブチルエチルトリエトキシシラン、ノナフルオロヘキシルトリメトキシシラン、ノナフルオロヘキシルトリエトキシシラン、トリデカフルオロオクチルトリメトキシシラン、トリデカフルオロオクチルトリエトキシシラン、ヘプタデカフルオロデシルトリメトキシシラン、ヘプタデカフルオロデシルトリエトキシシランおよびこれらの組合せからなる群から選ばれる一つ以上の化合物である請求項1に記載の反射防止フィルム。
- 前記中空シリカ粒子は、数平均直径が1nm〜1,000nmである請求項1に記載の反射防止フィルム。
- 前記バインダーは、前記中空シリカ粒子100重量部に対して、10重量部〜120重量部含まれる請求項1に記載の反射防止フィルム。
- 前記ハードコーティング層の屈折率は、1.5〜1.6である請求項1に記載の反射防止フィルム。
- 前記ハードコーティング層の厚さは、50nm〜200nmである請求項1に記載の反射防止フィルム。
- 前記ハードコーティング層は、無機物ナノ粒子、紫外線硬化型樹脂、硬化開始剤および溶媒を含む請求項1に記載の反射防止フィルム。
- 前記低屈折層の屈折率は、1.2〜1.25である請求項1に記載の反射防止フィルム。
- 前記高屈折層の屈折率は、1.6〜1.7である請求項1に記載の反射防止フィルム。
- 前記反射防止フィルムの鉛筆硬度は、B〜Hである請求項1に記載の反射防止フィルム。
- 前記反射防止フィルムの水に対する接触角は、70°以下である請求項1に記載の反射防止フィルム。
- 前記反射防止フィルムの反射率は、380nm〜780nm波長領域で0.5%未満である請求項1に記載の反射防止フィルム。
- 前記反射防止フィルムに白色光を照射すると、反射光の色相a*値および色相b*値が−1<a*<2、−1<b*<1である請求項1に記載の反射防止フィルム。
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PCT/KR2013/009123 WO2014081119A1 (ko) | 2012-11-21 | 2013-10-14 | 하드코팅층을 포함하는 광특성이 우수한 반사방지 필름 |
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Cited By (2)
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JP2020534563A (ja) * | 2017-09-18 | 2020-11-26 | アマゾン テクノロジーズ インコーポレイテッド | 自己治癒可撓性電気泳動ディスプレイ |
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KR20230081800A (ko) * | 2021-11-29 | 2023-06-08 | 삼성디스플레이 주식회사 | 전자 장치 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001235604A (ja) * | 1999-12-14 | 2001-08-31 | Nissan Chem Ind Ltd | 反射防止膜及び反射防止膜の形成方法並びに反射防止ガラス |
JP2004258267A (ja) * | 2003-02-25 | 2004-09-16 | Matsushita Electric Works Ltd | 反射防止膜、反射防止膜の製造方法、反射防止部材 |
JP2007065191A (ja) * | 2005-08-30 | 2007-03-15 | Nippon Zeon Co Ltd | 偏光板及び液晶表示装置 |
JP2007133386A (ja) * | 2005-10-13 | 2007-05-31 | Toray Ind Inc | 反射防止フィルムおよびそれを備えた光学フィルター |
JP2007156391A (ja) * | 2005-11-14 | 2007-06-21 | Sumitomo Osaka Cement Co Ltd | 反射防止膜付き透明基材 |
JP2008262187A (ja) * | 2007-03-20 | 2008-10-30 | Fujifilm Corp | 反射防止フィルム、偏光板、および画像表示装置 |
JP2010085579A (ja) * | 2008-09-30 | 2010-04-15 | Toray Ind Inc | 反射防止光学物品およびシロキサン系樹脂組成物の製造方法 |
JP2010217873A (ja) * | 2009-02-17 | 2010-09-30 | Toppan Printing Co Ltd | 反射防止フィルム及びその製造方法、偏光板、透過型液晶ディスプレイ |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3540452B2 (ja) * | 1995-07-31 | 2004-07-07 | 東レ・ダウコーニング・シリコーン株式会社 | 硬化性シリコーン組成物 |
JP3657869B2 (ja) * | 1999-10-29 | 2005-06-08 | 株式会社巴川製紙所 | 低反射部材 |
JP4918743B2 (ja) * | 2001-02-16 | 2012-04-18 | 凸版印刷株式会社 | 反射防止フィルム |
KR100906596B1 (ko) * | 2001-04-10 | 2009-07-09 | 후지필름 가부시키가이샤 | 반사방지 필름, 편광판, 및 이미지 디스플레이용 장치 |
JP2003057415A (ja) | 2001-08-21 | 2003-02-26 | Fuji Photo Film Co Ltd | 光拡散フィルム、その製造方法、偏光板および液晶表示装置 |
JP3953922B2 (ja) * | 2001-10-18 | 2007-08-08 | 日東電工株式会社 | 反射防止フィルム、光学素子および表示装置 |
TWI341931B (en) * | 2003-12-24 | 2011-05-11 | Fujifilm Corp | Antireflection film, polarizing plate and liquid crystal display device |
TWI388876B (zh) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | 抗反射膜、偏光板,其製造方法,液晶顯示元件,液晶顯示裝置,及影像顯示裝置 |
JPWO2005121265A1 (ja) * | 2004-06-11 | 2008-04-10 | 東レ株式会社 | シロキサン系塗料、光学物品およびシロキサン系塗料の製造方法 |
WO2006030720A1 (en) * | 2004-09-13 | 2006-03-23 | Fujifilm Corporation | Anti-reflection film, polarizing plate, and liquid crystal display device |
JP4887612B2 (ja) * | 2004-10-20 | 2012-02-29 | 日油株式会社 | 減反射材及びそれを用いた電子画像表示装置 |
KR101182002B1 (ko) | 2005-02-16 | 2012-09-11 | 코니카 미놀타 어드밴스드 레이어즈 인코포레이티드 | 반사 방지 필름, 반사 방지 필름의 제조 방법, 편광판 및표시 장치 |
US7419707B2 (en) * | 2005-02-21 | 2008-09-02 | Fujifilm Corporation | Coating composition for the formation of low refractive index layer, antireflection film, polarizing plate and liquid crystal display device |
JP2008052088A (ja) * | 2006-08-25 | 2008-03-06 | Bridgestone Corp | ディスプレイ用反射防止フィルム、および、これを用いたディスプレイ |
JP4650812B2 (ja) * | 2006-09-06 | 2011-03-16 | 東レフィルム加工株式会社 | ディスプレイ用フィルター及びその製造方法並びにディスプレイの製造方法 |
JP5170083B2 (ja) * | 2007-03-12 | 2013-03-27 | コニカミノルタアドバンストレイヤー株式会社 | 防眩性反射防止フィルムの製造方法、防眩性反射防止フィルム、偏光板及び表示装置 |
KR101523821B1 (ko) * | 2012-10-30 | 2015-05-28 | (주)엘지하우시스 | 실록산 화합물을 포함하는 반사 방지 코팅 조성물, 이를 이용하여 표면 에너지가 조절된 반사 방지 필름 |
KR101526650B1 (ko) * | 2012-11-21 | 2015-06-05 | (주)엘지하우시스 | 광학특성이 우수한 반사방지 필름 |
-
2012
- 2012-11-21 KR KR1020120132542A patent/KR101526649B1/ko not_active IP Right Cessation
-
2013
- 2013-10-14 US US14/443,645 patent/US9606267B2/en not_active Expired - Fee Related
- 2013-10-14 JP JP2015543955A patent/JP6642823B2/ja not_active Expired - Fee Related
- 2013-10-14 CN CN201380060944.1A patent/CN104813198B/zh not_active Expired - Fee Related
- 2013-10-14 WO PCT/KR2013/009123 patent/WO2014081119A1/ko active Application Filing
- 2013-11-05 TW TW102140126A patent/TWI609783B/zh not_active IP Right Cessation
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001235604A (ja) * | 1999-12-14 | 2001-08-31 | Nissan Chem Ind Ltd | 反射防止膜及び反射防止膜の形成方法並びに反射防止ガラス |
JP2004258267A (ja) * | 2003-02-25 | 2004-09-16 | Matsushita Electric Works Ltd | 反射防止膜、反射防止膜の製造方法、反射防止部材 |
JP2007065191A (ja) * | 2005-08-30 | 2007-03-15 | Nippon Zeon Co Ltd | 偏光板及び液晶表示装置 |
JP2007133386A (ja) * | 2005-10-13 | 2007-05-31 | Toray Ind Inc | 反射防止フィルムおよびそれを備えた光学フィルター |
JP2007156391A (ja) * | 2005-11-14 | 2007-06-21 | Sumitomo Osaka Cement Co Ltd | 反射防止膜付き透明基材 |
JP2008262187A (ja) * | 2007-03-20 | 2008-10-30 | Fujifilm Corp | 反射防止フィルム、偏光板、および画像表示装置 |
JP2010085579A (ja) * | 2008-09-30 | 2010-04-15 | Toray Ind Inc | 反射防止光学物品およびシロキサン系樹脂組成物の製造方法 |
JP2010217873A (ja) * | 2009-02-17 | 2010-09-30 | Toppan Printing Co Ltd | 反射防止フィルム及びその製造方法、偏光板、透過型液晶ディスプレイ |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020534563A (ja) * | 2017-09-18 | 2020-11-26 | アマゾン テクノロジーズ インコーポレイテッド | 自己治癒可撓性電気泳動ディスプレイ |
JP7271511B2 (ja) | 2017-09-18 | 2023-05-11 | アマゾン テクノロジーズ インコーポレイテッド | 自己治癒可撓性電気泳動ディスプレイ |
KR101998311B1 (ko) * | 2018-01-10 | 2019-07-09 | 주식회사 씨엔피솔루션즈 | 반사방지 필름 |
Also Published As
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JP6642823B2 (ja) | 2020-02-12 |
CN104813198A (zh) | 2015-07-29 |
TWI609783B (zh) | 2018-01-01 |
US20150301231A1 (en) | 2015-10-22 |
CN104813198B (zh) | 2016-10-12 |
US9606267B2 (en) | 2017-03-28 |
TW201420351A (zh) | 2014-06-01 |
KR101526649B1 (ko) | 2015-06-05 |
KR20140065250A (ko) | 2014-05-29 |
WO2014081119A1 (ko) | 2014-05-30 |
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