JP2015535859A - 高屈折層コーティング用組成物及び透明導電性フィルム - Google Patents
高屈折層コーティング用組成物及び透明導電性フィルム Download PDFInfo
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Abstract
Description
本発明の一具現例において、アクリレート樹脂、フルオレン誘導体樹脂及び金属酸化物粒子を含む高屈折層コーティング用組成物を提供する。
本発明の更に他の具現例において、アクリレート樹脂、フルオレン誘導体樹脂及び金属酸化物粒子を含む高屈折層コーティング用組成物を用いて形成された高屈折層を含む透明導電性フィルムを提供する。
(製造例1―高屈折層コーティング用組成物)
紫外線硬化型アクリレート樹脂、紫外線硬化型フルオレン誘導体樹脂及び金属酸化物ナノ粒子を下記の表1に記載した構成及び含量で含むことによって、高屈折層コーティング用組成物を製造した。
総固形分100重量部に対して、ジペンタエリスリトールヘキサアクリレート20重量部、HX―920UV 60重量部(Kyoeisha)、シリカ微粒子15重量部(商品名XBA―ST、日産化学)、光重合開始剤Irgacure―184 5重量部(Ciba社)を混合し、これを希釈溶剤であるメチルエチルケトン(MEK)で希釈し、固形分45%のハードコーティング層組成物(屈折率1.52)を製造した。
テトラ―エトキシオルソシリケート(Tetra―ethoxy ortho silicate)、水及びエチルアルコールを1:2:2で混合し、これに硝酸0.1mol溶液を投入して24時間反応させ、屈折率1.43のゾルを合成した。合成されたゾルをメチルエチルケトン(MEK)で希釈し、固形分5%の低屈折層コーティング用組成物を製造した。
(実施例1)
製造例2で製造したハードコーティング層組成物を、メイヤーバー(Meyer bar)を用いて125μmのPETフィルム上に乾燥膜の厚さが1.5μmになるように塗布し、180Wの高圧水銀灯で300mJの紫外線を照射して硬化させることによってフィルムを製作した。前記の製作したフィルムの反対面に前記と同一の方法で製造例2で製造したハードコーティング層組成物を乾燥膜の厚さが1.5μmになるように塗布して硬化させ、両面にハードコーティング層を含むフィルムを製作した。
高屈折層コーティング用組成物を製造例1―2に適用し、高屈折層の厚さが45nmになるようにコーティングしたこと以外は、前記実施例1と同一の方法で透明導電性フィルムを製作した。
高屈折層コーティング用組成物を製造例1―3に適用し、高屈折層の厚さが40nmになるようにコーティングしたこと以外は、前記実施例1と同一の方法で透明導電性フィルムを製作した。
高屈折層コーティング用組成物を製造例1―4に適用し、高屈折層の厚さを50nmにしてコーティングしたこと以外は、前記実施例1と同一の方法で透明導電性フィルムを製作した。
高屈折層コーティング用組成物を製造例1―5に適用し、高屈折層の厚さが50nmになるようにコーティングしたこと以外は、前記実施例1と同一の方法で透明導電性フィルムを製作した。
高屈折層コーティング用組成物を製造例1―6に適用し、高屈折層の厚さが45nmになるようにコーティングしたこと以外は、前記実施例1と同一の方法で透明導電性フィルムを製作した。
前記実施例及び比較例の透明導電性フィルムを用いて下記の各物性を測定し、その結果を下記の表2に記載した。
2)鉛筆硬度:JIS K 5600―5―4に準じて測定した。
3)密着性:コーティング層の表面をカッターを用いて1mmの間隔及び10mm×10mm(横×縦)の碁盤の目状にカットし、セロハンテープ(Nichiban社)を用いて剥離試験をした。同一の部位に対してテープを用いて3回剥離試験をし、評価後、密着している数字を/100で表記した。
4)透過率、透過b*/反射b*:CM―5(Konica minolta社)を用いて全光線透過率及び透過b*/反射b*値を測定した。
5)エッチング(Etching)評価:ITO層に、正四角形がパターン化されているマスクを用いて感光性樹脂を塗布、乾燥・硬化した後、25℃で5%の塩酸水溶液に1分間浸漬し、ITO層のエッチング評価を実施した。
6)エッチング前/後の反射率差(ΔR)の測定及びパターン隠蔽力の確認:エッチング前/後にCM―5を用いて反射率を測定することによって反射率差を求め、肉眼を通じてパターン隠蔽力を確認した。
Claims (16)
- アクリレート樹脂、フルオレン誘導体樹脂及び金属酸化物粒子を含む高屈折層コーティング用組成物。
- 前記アクリレート樹脂または前記フルオレン誘導体樹脂は光硬化型樹脂である、請求項1に記載の高屈折層コーティング用組成物。
- 総固形分100重量部に対して、前記アクリレート樹脂1重量部〜50重量部、前記フルオレン誘導体樹脂1重量部〜50重量部及び前記金属酸化物粒子5重量部〜80重量部を含む、請求項1に記載の高屈折層コーティング用組成物。
- 前記フルオレン誘導体樹脂は、フルオレン、フルオレノン、2―アセトアミドフルオレン、2―アセチルフルオレン、2―アセトアミノフルオレン、9―ブロモフルオレン、9―ブロモ―9―フェニルフルオレン、2,7―ジアミノフルオレン、2,7―ジ(アセトアミド)フルオレン、2,7―ジアセチルフルオレン、9,9―ビス[4―(2―ヒドロキシエトキシ)フェニル]フルオレン、9,9―ビス(3、4―ジカルボキシフェニル)フルオレンアンハイドライド、9,9―ビス(3―メチル―4―ヒドロキシフェニル)フルオレン、9,9―ビス(4―ヒドロキシフェニル)フルオレン、9,9―ビス(4―アミノフェニル)フルオレン、9,9―ビス(4―ヒドロキシ―3―メチルフェニル)フルオレン、9,9―ビス[4―(2―アクリロイルオキシエトキシ)フェニル]フルオレン、9,9―ビス[4―(2―ヒドロキシ―3―アクリロイルオキシプロポキシ)フェニル]フルオレン、9,9―ビス(4―ヒドロキシフェニル)フルオレン、2―プロペン酸、1,1’―[9H―フルオレン―9―イリデンビス[4,1―フェニレンオキシ(2―ヒドロキシ―3,1―プロパンチル)]]エステル及びこれらの組み合わせからなる群から選ばれたいずれか一つである、請求項1に記載の高屈折層コーティング用組成物。
- 前記金属酸化物粒子は、TiO2、ZrO2、Al2O3、SnO2、ITO(indium―tin oxide)、Sb2O5、Nb2O3、Y2O3、SiO2及びこれらの組み合わせからなる群から選ばれたいずれか一つである、請求項1に記載の高屈折層コーティング用組成物。
- 前記金属酸化物粒子の平均粒子直径が1nm〜100nmである、請求項1に記載の高屈折層コーティング用組成物。
- 光開始剤をさらに含む、請求項1に記載の高屈折層コーティング用組成物。
- 総固形分100重量部に対して、前記光開始剤は1重量部〜15重量部含む、請求項7に記載の高屈折層コーティング用組成物。
- 請求項1の高屈折層コーティング用組成物を用いて形成された高屈折層を含む透明導電性フィルム。
- 前記透明導電性フィルムは、透明基材、前記高屈折層、低屈折層及び導電層の積層構造である、請求項9に記載の透明導電性フィルム。
- 前記高屈折層の屈折率は1.6〜1.8である、請求項9に記載の透明導電性フィルム。
- 前記高屈折層の厚さは20nm〜150nmである、請求項9に記載の透明導電性フィルム。
- 前記低屈折層の厚さは5nm〜100nmである、請求項10に記載の透明導電性フィルム。
- 前記透明基材は、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリエーテルスルホン(PES)、ポリカーボネート(PC)、ポリプロピレン(PP)、ポリビニルクロライド(PVC)、ポリエチレン(PE)、ポリメチルメタクリレート(PMMA)、エチレンビニルアルコール(EVA)、ポリビニルアルコール(PVA)及びこれらの組み合わせからなる群から選ばれたいずれか一つを含む単一または積層フィルムである、請求項10に記載の透明伝導性フィルム。
- 前記導電層は、ITO(Indium Tin Oxide)またはFTO(Fluorine―doped Tin Oxide)を含む、請求項10に記載の透明伝導性フィルム。
- 前記透明基材の一面または両面にハードコーティング層をさらに含む、請求項10に記載の透明伝導性フィルム。
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