JP2015532432A5 - - Google Patents

Download PDF

Info

Publication number
JP2015532432A5
JP2015532432A5 JP2015537405A JP2015537405A JP2015532432A5 JP 2015532432 A5 JP2015532432 A5 JP 2015532432A5 JP 2015537405 A JP2015537405 A JP 2015537405A JP 2015537405 A JP2015537405 A JP 2015537405A JP 2015532432 A5 JP2015532432 A5 JP 2015532432A5
Authority
JP
Japan
Prior art keywords
birefringent
radiation
polarization
birefringent element
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015537405A
Other languages
English (en)
Japanese (ja)
Other versions
JP6223460B2 (ja
JP2015532432A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/IB2013/059419 external-priority patent/WO2014060983A1/en
Publication of JP2015532432A publication Critical patent/JP2015532432A/ja
Publication of JP2015532432A5 publication Critical patent/JP2015532432A5/ja
Application granted granted Critical
Publication of JP6223460B2 publication Critical patent/JP6223460B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2015537405A 2012-10-18 2013-10-17 分析システムのための装置、該装置を有する分析システム及び該装置を使用する方法 Expired - Fee Related JP6223460B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261715538P 2012-10-18 2012-10-18
US61/715,538 2012-10-18
PCT/IB2013/059419 WO2014060983A1 (en) 2012-10-18 2013-10-17 Arrangement for an analysis system, analysis system having the arrangement and method for use of the arrangement

Publications (3)

Publication Number Publication Date
JP2015532432A JP2015532432A (ja) 2015-11-09
JP2015532432A5 true JP2015532432A5 (https=) 2017-09-21
JP6223460B2 JP6223460B2 (ja) 2017-11-01

Family

ID=49949991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015537405A Expired - Fee Related JP6223460B2 (ja) 2012-10-18 2013-10-17 分析システムのための装置、該装置を有する分析システム及び該装置を使用する方法

Country Status (5)

Country Link
US (1) US9752984B2 (https=)
EP (1) EP2909607A1 (https=)
JP (1) JP6223460B2 (https=)
CN (1) CN104737000B (https=)
WO (1) WO2014060983A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2941274C (en) 2014-03-04 2020-02-25 Novadaq Technologies Inc. Spatial and spectral filtering apertures and optical imaging systems including the same
CN106605164B (zh) 2014-03-04 2020-04-24 诺瓦达克技术公司 用于宽带成像的中继透镜系统
EP3040709B1 (en) * 2014-12-31 2020-07-08 Nuctech Company Limited Liquid object identification apparatus and method
GB201511318D0 (en) * 2015-06-29 2015-08-12 Secr Defence Improved spatially-offset raman spectroscopy
CN108431649B (zh) * 2015-08-31 2021-08-24 史赛克欧洲运营有限公司 偏振依赖滤波器、使用其的系统以及相关联的工具包和方法
DE102017208615A1 (de) * 2017-05-22 2018-11-22 Carl Zeiss Microscopy Gmbh Verfahren und Adapter zur Adaption eines Mikroskopobjektivs an ein Digitalmikroskop
DE102017115661A1 (de) * 2017-07-12 2019-01-17 Endress+Hauser Conducta Gmbh+Co. Kg Optischer Sensor
US10746533B2 (en) * 2017-08-02 2020-08-18 Dmg Mori Co., Ltd. Relative position detection means and displacement detection device
JP7233186B2 (ja) * 2018-09-18 2023-03-06 Dmg森精機株式会社 相対位置検出手段、及び変位検出装置
EP4332557B1 (en) * 2022-08-31 2024-06-26 Unity Semiconductor A system for optical inspection of a substrate using same or different wavelengths
DE102023110269B3 (de) * 2023-04-21 2023-12-28 Sioptica Gmbh Schaltbarer Lichtfilter, Beleuchtungseinrichtung und Bildschirm
EP4671709A1 (en) * 2024-06-25 2025-12-31 Serstech AB RAMAN SPECTROSCOPY DEVICE AND METHOD FOR PERFORMING RAMAN SPECTROSCOPY ON A SAMPLE

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR75792E (fr) * 1959-06-01 1961-08-11 Onera (Off Nat Aerospatiale) Spectromètre
JPH0991738A (ja) * 1995-09-26 1997-04-04 Matsushita Electric Ind Co Ltd マルチビーム生成方法及びマルチビーム光ヘッド
US5930044A (en) * 1997-01-09 1999-07-27 U.S. Philips Corporation Deflecting element having a switchable liquid crystalline material
US6134010A (en) * 1997-11-07 2000-10-17 Lucid, Inc. Imaging system using polarization effects to enhance image quality
GR1004180B (el) * 2000-03-28 2003-03-11 ����������� ����� ��������� (����) Μεθοδος και συστημα χαρακτηρισμου και χαρτογραφησης αλλοιωσεων των ιστων
CA2344021C (en) * 2000-04-20 2010-01-26 Jds Uniphase Inc. Polarization beam splitter or combiner
JP2002277843A (ja) * 2001-03-15 2002-09-25 Mitsubishi Electric Corp 可変光フィルタ
JP2003107407A (ja) * 2001-09-28 2003-04-09 Nec Tokin Corp 偏光分離合成装置
JP2006512226A (ja) 2002-12-30 2006-04-13 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 液晶コンポーネント
WO2004059629A1 (en) 2002-12-30 2004-07-15 Koninklijke Philips Electronics N.V. Dual layer birefringent optical component
JP2006512708A (ja) * 2002-12-30 2006-04-13 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 複屈折光コンポーネント
DE602004003474T2 (de) 2003-02-05 2007-09-13 Ocuity Ltd., Upper Heyford Schaltbare display-vorrichtung
WO2004081549A1 (en) * 2003-03-11 2004-09-23 Koninklijke Philips Electronics N.V. Spectroscopic analysis apparatus and method with excitation system and focus monitoring system
US7079203B1 (en) 2003-06-23 2006-07-18 Research Foundation Of The University Of Central Florida, Inc. Electrically tunable polarization-independent micro lens using polymer network twisted nematic liquid crystal
US7738095B2 (en) 2003-07-18 2010-06-15 Chemimage Corporation Method and apparatus for compact spectrometer for detecting hazardous agents
US7099599B2 (en) 2003-08-15 2006-08-29 Static Control Components, Inc. System and method for port testing and configuration
US7535649B2 (en) 2004-03-09 2009-05-19 Tang Yin S Motionless lens systems and methods
EP1730571A2 (en) * 2004-03-24 2006-12-13 Koninklijke Philips Electronics N.V. Birefringent optical system
WO2006003582A1 (en) 2004-06-29 2006-01-12 Koninklijke Philips Electronics N.V. Polarisation-independent liquid crystal beam deflector
US20060124443A1 (en) 2004-11-03 2006-06-15 David Tuschel Control and monitoring of non-resonant radiation-induced nucleation, crystallization, and polymorph formation
GB0426993D0 (en) * 2004-12-09 2005-01-12 Council Cent Lab Res Councils Apparatus for depth-selective raman spectroscopy
KR20070091678A (ko) * 2004-12-22 2007-09-11 코닌클리케 필립스 일렉트로닉스 엔.브이. 반경 방향으로 편광된 방사빔을 이용하여 작은 구멍을 통한광 전달을 향상시키는 장치 및 방법
US7499608B1 (en) 2004-12-23 2009-03-03 Coadna Photonics, Inc. Apparatus and method for optical switching with liquid crystals and birefringent wedges
DE102006017327A1 (de) * 2006-04-11 2007-10-18 Leica Microsystems Cms Gmbh Polarisations-Interferenzmikroskop
WO2007141678A2 (en) * 2006-06-06 2007-12-13 Koninklijke Philips Electronics N.V. Variable focus lens to isolate or trap small particulate matter
EP2140304B1 (en) 2007-04-17 2011-08-31 Koninklijke Philips Electronics N.V. Beam-shaping device
US7873397B2 (en) * 2007-06-19 2011-01-18 Richard Higgins Spectroscopic optical system
EP2012173A3 (en) * 2007-07-03 2009-12-09 JDS Uniphase Corporation Non-etched flat polarization-selective diffractive optical elements
US8421000B2 (en) * 2007-11-23 2013-04-16 Koninklijke Philips Electronics N.V. Beam shaping without introducing divergence within a light beam
FR2962816B1 (fr) * 2010-07-19 2012-08-24 Horiba Jobin Yvon Sas Convertisseur de polarisation a symetrie cylindrique bidirectionnel et procede de conversion de polarisation cartesien-cylindrique

Similar Documents

Publication Publication Date Title
JP2015532432A5 (https=)
JP7190644B2 (ja) 亀裂検出装置及び亀裂検出方法
CN101821659B (zh) 色差共聚焦传感器
JP6738279B2 (ja) エキシマレーザアニーリングの制御のための監視方法および装置
US11471976B2 (en) Laser light radiation device and laser light radiation method
TWI571180B (zh) 用於監視雷射束的裝置及方法
JP2012078802A5 (https=)
JP2020510838A5 (https=)
TWI686603B (zh) 用於檢查襯底之檢查系統、襯底切割設備、檢查襯底之方法及襯底切割技術
JP2019516065A5 (https=)
JP2010540995A5 (https=)
JP2020509408A (ja) 試料表面を撮像するための方法および機器
US12059746B2 (en) Apparatus and method for forming a laser beam
CN104737000A (zh) 用于分析系统的装置、具有该装置的分析系统和用于使用该装置的方法
CN109014566A (zh) 一种简易控制激光诱导表面周期性结构排布方向的方法
TWI477736B (zh) 多工物件參數光學量測整合裝置與方法
CN104165596A (zh) 一种测定离焦量的方法及系统
JP2014517505A5 (https=)
JP2008513810A (ja) 顕微鏡系およびこれを用いた方法
WO2008095738A3 (de) Verfahren und vorrichtung zum laserschweissen
Liu et al. Front-surface fabrication of moderate aspect ratio micro-channels in fused silica by single picosecond Gaussian–Bessel laser pulse
KR20200075841A (ko) 레이저 가공 방법, 및 레이저 가공 장치
JP2007139870A5 (https=)
KR101938292B1 (ko) 레이저 여기광 조사각 조절 기능을 갖는 범용 형광 영상 장치 및 이의 제어 방법
KR101462848B1 (ko) 색정보를 측정할 수 있는 3차원 형상 측정 장치