JP2019516065A5 - - Google Patents

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JP2019516065A5
JP2019516065A5 JP2018541392A JP2018541392A JP2019516065A5 JP 2019516065 A5 JP2019516065 A5 JP 2019516065A5 JP 2018541392 A JP2018541392 A JP 2018541392A JP 2018541392 A JP2018541392 A JP 2018541392A JP 2019516065 A5 JP2019516065 A5 JP 2019516065A5
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defect
wave plate
incident beam
map
scatter
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JP2018541392A
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JP6755323B2 (ja
JP2019516065A (ja
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Priority claimed from US15/468,608 external-priority patent/US9874526B2/en
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JP2018541392A 2016-03-28 2017-03-27 偏光形ウエハ検査のための方法及び装置 Active JP6755323B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201662314362P 2016-03-28 2016-03-28
US62/314,362 2016-03-28
US15/468,608 US9874526B2 (en) 2016-03-28 2017-03-24 Methods and apparatus for polarized wafer inspection
US15/468,608 2017-03-24
PCT/US2017/024326 WO2017172624A1 (en) 2016-03-28 2017-03-27 Method and apparatus for polarized light wafer inspection

Publications (3)

Publication Number Publication Date
JP2019516065A JP2019516065A (ja) 2019-06-13
JP2019516065A5 true JP2019516065A5 (https=) 2020-05-07
JP6755323B2 JP6755323B2 (ja) 2020-09-16

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JP2018541392A Active JP6755323B2 (ja) 2016-03-28 2017-03-27 偏光形ウエハ検査のための方法及び装置

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US (2) US9874526B2 (https=)
JP (1) JP6755323B2 (https=)
KR (1) KR102182566B1 (https=)
CN (1) CN109075091B (https=)
IL (1) IL261450B (https=)
TW (1) TWI724144B (https=)
WO (1) WO2017172624A1 (https=)

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CN112347527B (zh) * 2020-11-09 2022-06-03 武汉科技大学 一种用于暗场缺陷检测的光罩掩模板图形设计方法
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CN113916798B (zh) * 2021-10-11 2023-06-06 北京航空航天大学 一种适用于典型偏振多谱段探测系统的信噪比估算方法
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