JP2015527962A5 - - Google Patents

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Publication number
JP2015527962A5
JP2015527962A5 JP2015519041A JP2015519041A JP2015527962A5 JP 2015527962 A5 JP2015527962 A5 JP 2015527962A5 JP 2015519041 A JP2015519041 A JP 2015519041A JP 2015519041 A JP2015519041 A JP 2015519041A JP 2015527962 A5 JP2015527962 A5 JP 2015527962A5
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JP
Japan
Prior art keywords
sio
spray
suspension
doped
dope solution
Prior art date
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JP2015519041A
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English (en)
Japanese (ja)
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JP2015527962A (ja
JP6211076B2 (ja
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Priority claimed from DE102012012524A external-priority patent/DE102012012524B3/de
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Publication of JP2015527962A publication Critical patent/JP2015527962A/ja
Publication of JP2015527962A5 publication Critical patent/JP2015527962A5/ja
Application granted granted Critical
Publication of JP6211076B2 publication Critical patent/JP6211076B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015519041A 2012-06-26 2013-06-25 ドープされたＳｉＯ２スラリーの製造方法、ならびにそのＳｉＯ２スラリーの使用 Expired - Fee Related JP6211076B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102012012524A DE102012012524B3 (de) 2012-06-26 2012-06-26 Verfahren zur Herstellung eines dotierten SiO2-Schlickers sowie Verwendung des SiO2-Schlickers
DE102012012524.0 2012-06-26
PCT/EP2013/063213 WO2014001293A1 (de) 2012-06-26 2013-06-25 Verfahren zur herstellung eines dotierten sio2-schlickers sowie verwendung des sio2-schlickers

Publications (3)

Publication Number Publication Date
JP2015527962A JP2015527962A (ja) 2015-09-24
JP2015527962A5 true JP2015527962A5 (enExample) 2016-07-28
JP6211076B2 JP6211076B2 (ja) 2017-10-11

Family

ID=48670589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015519041A Expired - Fee Related JP6211076B2 (ja) 2012-06-26 2013-06-25 ドープされたＳｉＯ２スラリーの製造方法、ならびにそのＳｉＯ２スラリーの使用

Country Status (6)

Country Link
US (1) US9518218B2 (enExample)
EP (1) EP2872454B1 (enExample)
JP (1) JP6211076B2 (enExample)
CN (1) CN104411645A (enExample)
DE (1) DE102012012524B3 (enExample)
WO (1) WO2014001293A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11201508512PA (en) * 2013-05-23 2015-12-30 Applied Materials Inc A coated liner assembly for a semiconductor processing chamber
EP3173386B1 (de) * 2015-11-25 2018-05-02 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung eines verbundkörpers aus hochkieselsäurehaltigem werkstoff
CN105837025B (zh) * 2016-04-21 2018-12-11 烽火通信科技股份有限公司 高效制备掺杂光纤预制棒的方法及掺杂光纤预制棒
US9969621B2 (en) * 2016-05-04 2018-05-15 Saudi Arabian Oil Company Methods for processing fumed metallic oxides
EP3708547A1 (de) * 2019-03-13 2020-09-16 Heraeus Quarzglas GmbH & Co. KG Bauteil aus dotiertem quarzglas für den einsatz in einem plasma-unterstützten fertigungsprozess sowie verfahren zur herstellung des bauteils

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57205334A (en) * 1981-06-13 1982-12-16 Nippon Telegr & Teleph Corp <Ntt> Manufacture of silica glass
JPH09151124A (ja) * 1995-11-29 1997-06-10 Kao Corp 熱線遮蔽性粒子及びその製造方法
JP4271294B2 (ja) * 1999-04-28 2009-06-03 旭化成ケミカルズ株式会社 均一粒子径を有する粒子の製造方法
DE10065028A1 (de) 2000-12-23 2002-07-18 Degussa Mit Kalium dotierte pyrogene Oxide
DE10065027A1 (de) 2000-12-23 2002-07-04 Degussa Wäßrige Dispersion, Verfahren zu deren Herstellung und Verwendung
US20040005352A1 (en) * 2002-04-16 2004-01-08 Lopez Gabriel P. Biologically functionalized porous microspheres
DE10249747A1 (de) 2002-10-25 2004-05-06 Clariant Gmbh Verfahren und Vorrichtung zur Durchführung chemischer und physikalischer Prozesse
US7637126B2 (en) 2003-12-08 2009-12-29 Heraeus Quarzglas Gmbh & Co. Kg Method for the production of laser-active quartz glass and use thereof
DE102004006017B4 (de) * 2003-12-08 2006-08-03 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von laseraktivem Quarzglas und Verwendung desselben
FI116619B (fi) * 2004-07-02 2006-01-13 Liekki Oy Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde
DE102006048508A1 (de) * 2006-10-13 2008-04-17 Evonik Degussa Gmbh Oberflächenmodifizierte Kieselsäuren
DE102007015097A1 (de) 2007-03-29 2008-10-02 Heidelberger Druckmaschinen Ag Farbmessgerät mit Koordinatenabgleich
JP5128162B2 (ja) * 2007-04-06 2013-01-23 岩崎電気株式会社 不透明石英ガラス製品の製造方法、それに用いるシリカ顆粒とその生成方法
DE102007045097B4 (de) * 2007-09-20 2012-11-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von co-dotiertem Quarzglas
CN101850230B (zh) * 2009-03-31 2012-07-04 中国石油化工股份有限公司 一种流体连续反应器及其应用

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