JP2015511398A5 - - Google Patents

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Publication number
JP2015511398A5
JP2015511398A5 JP2014553736A JP2014553736A JP2015511398A5 JP 2015511398 A5 JP2015511398 A5 JP 2015511398A5 JP 2014553736 A JP2014553736 A JP 2014553736A JP 2014553736 A JP2014553736 A JP 2014553736A JP 2015511398 A5 JP2015511398 A5 JP 2015511398A5
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JP
Japan
Prior art keywords
deformation
optical element
temperature control
channel
medium
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Application number
JP2014553736A
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English (en)
Japanese (ja)
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JP2015511398A (ja
JP6140191B2 (ja
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Priority claimed from PCT/EP2013/051480 external-priority patent/WO2013113634A2/en
Publication of JP2015511398A publication Critical patent/JP2015511398A/ja
Publication of JP2015511398A5 publication Critical patent/JP2015511398A5/ja
Application granted granted Critical
Publication of JP6140191B2 publication Critical patent/JP6140191B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014553736A 2012-01-30 2013-01-25 リソグラフィ装置及びデバイス製造方法 Expired - Fee Related JP6140191B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201261592243P 2012-01-30 2012-01-30
US61/592,243 2012-01-30
US201261652924P 2012-05-30 2012-05-30
US61/652,924 2012-05-30
US201261710288P 2012-10-05 2012-10-05
US61/710,288 2012-10-05
PCT/EP2013/051480 WO2013113634A2 (en) 2012-01-30 2013-01-25 Lithographic apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2015511398A JP2015511398A (ja) 2015-04-16
JP2015511398A5 true JP2015511398A5 (enExample) 2016-03-10
JP6140191B2 JP6140191B2 (ja) 2017-05-31

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014553736A Expired - Fee Related JP6140191B2 (ja) 2012-01-30 2013-01-25 リソグラフィ装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US9618859B2 (enExample)
JP (1) JP6140191B2 (enExample)
NL (1) NL2010185A (enExample)
WO (1) WO2013113634A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013113633A1 (en) 2012-01-30 2013-08-08 Asml Netherlands B.V. Lithographic apparatus with a metrology system for measuring a position of a substrate table
DE102014203144A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
USRE49142E1 (en) * 2014-08-06 2022-07-19 Asml Netherlands B.V. Lithographic apparatus and an object positioning system
CN109856921A (zh) * 2017-11-30 2019-06-07 上海微电子装备（集团）股份有限公司 光刻装置及其主基板结构与主基板单元
CN109900199B (zh) * 2019-03-25 2021-03-30 西安电子科技大学 一种用于管道形变检测的弯曲传感器结构及方法
CN110763357A (zh) * 2019-11-08 2020-02-07 江苏科技大学 一种电容式温度传感器及使用方法
DE102019219179A1 (de) * 2019-12-09 2021-06-10 Carl Zeiss Smt Gmbh Optisches Element und Lithographiesystem
DE102021200604A1 (de) * 2021-01-25 2022-07-28 Carl Zeiss Smt Gmbh Optisches system, lithographieanlage und verfahren
KR20230131202A (ko) * 2021-01-28 2023-09-12 칼 짜이스 에스엠테 게엠베하 광학 시스템 및 광학 시스템을 동작시키는 방법

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JP3149472B2 (ja) 1991-08-30 2001-03-26 株式会社ニコン 走査露光装置および物体の移動測定装置
JPH07270122A (ja) 1994-03-30 1995-10-20 Canon Inc 変位検出装置、該変位検出装置を備えた露光装置およびデバイスの製造方法
EP1039510A4 (en) 1997-11-14 2003-11-12 Nikon Corp EXPOSURE DEVICE, MANUFACTURING METHOD THEREOF, AND EXPOSURE METHOD
JPH11243052A (ja) 1997-11-14 1999-09-07 Nikon Corp 露光装置
DE10046379A1 (de) 2000-09-20 2002-03-28 Zeiss Carl System zur gezielten Deformation von optischen Elementen
US20040244963A1 (en) * 2003-06-05 2004-12-09 Nikon Corporation Heat pipe with temperature control
US20050057102A1 (en) * 2003-09-11 2005-03-17 Nikon Corporation Holding member, coolant, cooling method and cooling device, linear motor device, stage device, and exposure apparatus
US7102729B2 (en) 2004-02-03 2006-09-05 Asml Netherlands B.V. Lithographic apparatus, measurement system, and device manufacturing method
US20100163221A1 (en) * 2005-11-30 2010-07-01 Koninklijke Philips Electronics, N.V. Local control of heat flow to more accurately regulate machine temperatures
US20080073563A1 (en) * 2006-07-01 2008-03-27 Nikon Corporation Exposure apparatus that includes a phase change circulation system for movers
US8687166B2 (en) 2007-05-24 2014-04-01 Asml Netherlands B.V. Lithographic apparatus having an encoder position sensor system
US7740362B1 (en) * 2008-02-19 2010-06-22 Jefferson Science Associates Mirror with thermally controlled radius of curvature
NL2003223A (en) 2008-09-30 2010-03-31 Asml Netherlands Bv Projection system, lithographic apparatus, method of postitioning an optical element and method of projecting a beam of radiation onto a substrate.
DE102009039400A1 (de) 2009-08-31 2011-03-03 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element zur Verwendung in einem EUV-System
US8767174B2 (en) 2010-02-18 2014-07-01 Nikon Corporation Temperature-controlled holding devices for planar articles
NL2006809A (en) * 2010-06-23 2011-12-27 Asml Netherlands Bv Lithographic apparatus and lithographic apparatus cooling method.
NL2007155A (en) 2010-08-25 2012-02-28 Asml Netherlands Bv Stage apparatus, lithographic apparatus and method of positioning an object table.
EP2515170B1 (en) * 2011-04-20 2020-02-19 ASML Netherlands BV Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method
WO2013113633A1 (en) 2012-01-30 2013-08-08 Asml Netherlands B.V. Lithographic apparatus with a metrology system for measuring a position of a substrate table

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