JP2015508184A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2015508184A5 JP2015508184A5 JP2014556147A JP2014556147A JP2015508184A5 JP 2015508184 A5 JP2015508184 A5 JP 2015508184A5 JP 2014556147 A JP2014556147 A JP 2014556147A JP 2014556147 A JP2014556147 A JP 2014556147A JP 2015508184 A5 JP2015508184 A5 JP 2015508184A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- alkali
- crosslinking catalyst
- soluble
- soluble polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 claims 3
- 239000003054 catalyst Substances 0.000 claims 2
- 238000004132 cross linking Methods 0.000 claims 2
- 229920000620 organic polymer Polymers 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/369,809 | 2012-02-09 | ||
| US13/369,809 US8871425B2 (en) | 2012-02-09 | 2012-02-09 | Low dielectric photoimageable compositions and electronic devices made therefrom |
| PCT/IB2013/000170 WO2013117989A1 (en) | 2012-02-09 | 2013-02-08 | Low dielectric photoimageable compositions and electronic devices made therefrom |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015508184A JP2015508184A (ja) | 2015-03-16 |
| JP2015508184A5 true JP2015508184A5 (enExample) | 2016-01-14 |
| JP5941559B2 JP5941559B2 (ja) | 2016-06-29 |
Family
ID=47913498
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014556147A Expired - Fee Related JP5941559B2 (ja) | 2012-02-09 | 2013-02-08 | 低誘電性光画像形成性組成物及びそれから製造した電子デバイス |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8871425B2 (enExample) |
| EP (1) | EP2812399B1 (enExample) |
| JP (1) | JP5941559B2 (enExample) |
| KR (1) | KR101904582B1 (enExample) |
| CN (1) | CN104093784B (enExample) |
| PH (1) | PH12014501731B1 (enExample) |
| SG (1) | SG11201403059WA (enExample) |
| TW (1) | TWI544280B (enExample) |
| WO (1) | WO2013117989A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6213270B2 (ja) * | 2014-01-31 | 2017-10-18 | 住友化学株式会社 | Ｕｖ−ｌｅｄ用ポリシルセスキオキサン系封止材組成物及びそのための溶媒の使用 |
| CN104282250B (zh) * | 2014-10-24 | 2016-08-31 | 深圳市华星光电技术有限公司 | Tft 中mis 结构设计的控制方法及系统 |
| US10544329B2 (en) | 2015-04-13 | 2020-01-28 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
| US10254650B2 (en) * | 2016-06-29 | 2019-04-09 | Honeywell International Inc. | Low temperature SC1 strippable oxysilane-containing coatings |
| US20190211259A1 (en) | 2016-08-22 | 2019-07-11 | Merck Patent Gmbh | Mixture for optical devices |
| EP3512919A1 (en) | 2016-09-13 | 2019-07-24 | Merck Patent GmbH | Light luminescent particle |
| US10544330B2 (en) * | 2017-01-20 | 2020-01-28 | Honeywell International Inc. | Gap filling dielectric materials |
| JP2021005625A (ja) * | 2019-06-26 | 2021-01-14 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ | ゲート絶縁膜形成組成物 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4442197A (en) | 1982-01-11 | 1984-04-10 | General Electric Company | Photocurable compositions |
| ATE37242T1 (de) | 1984-02-10 | 1988-09-15 | Ciba Geigy Ag | Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung. |
| US4603101A (en) | 1985-09-27 | 1986-07-29 | General Electric Company | Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials |
| JPH06148895A (ja) | 1992-11-06 | 1994-05-27 | Toray Ind Inc | 感光性樹脂組成物およびこれを用いたパターン形成方法 |
| TW526390B (en) | 1997-06-26 | 2003-04-01 | Shinetsu Chemical Co | Resist compositions |
| US5962067A (en) * | 1997-09-09 | 1999-10-05 | Lucent Technologies Inc. | Method for coating an article with a ladder siloxane polymer and coated article |
| TW588072B (en) | 2000-10-10 | 2004-05-21 | Shipley Co Llc | Antireflective porogens |
| TW594416B (en) * | 2001-05-08 | 2004-06-21 | Shipley Co Llc | Photoimageable composition |
| JP2004165613A (ja) | 2002-06-03 | 2004-06-10 | Shipley Co Llc | 電子デバイスの製造 |
| US7041748B2 (en) * | 2003-01-08 | 2006-05-09 | International Business Machines Corporation | Patternable low dielectric constant materials and their use in ULSI interconnection |
| JP5102428B2 (ja) * | 2003-11-25 | 2012-12-19 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 導波路組成物およびこれから形成された導波路 |
| DE602005001341T2 (de) * | 2004-04-14 | 2008-02-21 | Rohm and Haas Electronic Materials, L.L.C., Marlborough | Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter |
| JP4491283B2 (ja) * | 2004-06-10 | 2010-06-30 | 信越化学工業株式会社 | 反射防止膜形成用組成物を用いたパターン形成方法 |
| JP2009510216A (ja) * | 2005-09-29 | 2009-03-12 | ダウ・コーニング・コーポレイション | 金属基材からの高温用フィルムおよび／またはデバイスの剥離方法 |
| US8013077B2 (en) * | 2007-03-02 | 2011-09-06 | Fujifilm Corporation | Insulating film forming composition and production method of insulating film |
| US7754510B2 (en) * | 2007-04-02 | 2010-07-13 | Xerox Corporation | Phase-separated dielectric structure fabrication process |
| JP2009199061A (ja) * | 2007-11-12 | 2009-09-03 | Rohm & Haas Electronic Materials Llc | オーバーコートされたフォトレジストと共に用いるためのコーティング組成物 |
| TWI384025B (zh) * | 2009-04-27 | 2013-02-01 | Ind Tech Res Inst | 聚乙烯醇膜組成物及包含其之偏光板 |
| US8431670B2 (en) | 2009-08-31 | 2013-04-30 | International Business Machines Corporation | Photo-patternable dielectric materials and formulations and methods of use |
| US8196655B2 (en) * | 2009-08-31 | 2012-06-12 | Halliburton Energy Services, Inc. | Selective placement of conformance treatments in multi-zone well completions |
| US8389663B2 (en) * | 2009-10-08 | 2013-03-05 | International Business Machines Corporation | Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof |
| JP2011154214A (ja) * | 2010-01-27 | 2011-08-11 | Jsr Corp | ネガ型感放射線性組成物、硬化パターン形成方法及び硬化パターン |
| JP5544239B2 (ja) * | 2010-07-29 | 2014-07-09 | 富士フイルム株式会社 | 重合性組成物 |
| WO2012133617A1 (ja) * | 2011-03-30 | 2012-10-04 | 日本ゼオン株式会社 | 樹脂組成物および半導体素子基板 |
-
2012
- 2012-02-09 US US13/369,809 patent/US8871425B2/en active Active
-
2013
- 2013-02-08 JP JP2014556147A patent/JP5941559B2/ja not_active Expired - Fee Related
- 2013-02-08 TW TW102105212A patent/TWI544280B/zh active
- 2013-02-08 KR KR1020147018889A patent/KR101904582B1/ko active Active
- 2013-02-08 EP EP13711124.1A patent/EP2812399B1/en not_active Not-in-force
- 2013-02-08 CN CN201380006618.2A patent/CN104093784B/zh active Active
- 2013-02-08 SG SG11201403059WA patent/SG11201403059WA/en unknown
- 2013-02-08 WO PCT/IB2013/000170 patent/WO2013117989A1/en not_active Ceased
-
2014
- 2014-07-31 PH PH12014501731A patent/PH12014501731B1/en unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2015508184A5 (enExample) | ||
| JP2012140620A5 (enExample) | ||
| JP2010164933A5 (ja) | 化学増幅型レジスト組成物 | |
| JP2015522045A5 (enExample) | ||
| JP2015536739A5 (enExample) | ||
| JP2014533756A5 (enExample) | ||
| JP2013167669A5 (enExample) | ||
| JP2007327074A5 (enExample) | ||
| RU2016121713A (ru) | Композиция высоконасыщенного сополимерного каучука, содержащего нитрильные группы, и сшитый каучук | |
| JP2017536332A5 (enExample) | ||
| JP2012527468A5 (enExample) | ||
| JP2014136796A5 (enExample) | ||
| JP2014063186A5 (enExample) | ||
| JP2018500404A5 (enExample) | ||
| JP2015518492A5 (enExample) | ||
| JP2012045385A5 (enExample) | ||
| JP2013544907A5 (enExample) | ||
| JP2013500200A5 (enExample) | ||
| JP2013209366A5 (enExample) | ||
| RU2016124167A (ru) | Содержащий концевые эпоксигруппы сложный полиэфир | |
| RU2016124165A (ru) | Содержащий концевые эпоксигруппы сложной полиэфир | |
| JP2015105851A5 (enExample) | ||
| JP2013227283A5 (enExample) | ||
| JP2008308572A5 (enExample) | ||
| JP2011507698A5 (enExample) |