JP2015505291A5 - - Google Patents
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- Publication number
- JP2015505291A5 JP2015505291A5 JP2014546502A JP2014546502A JP2015505291A5 JP 2015505291 A5 JP2015505291 A5 JP 2015505291A5 JP 2014546502 A JP2014546502 A JP 2014546502A JP 2014546502 A JP2014546502 A JP 2014546502A JP 2015505291 A5 JP2015505291 A5 JP 2015505291A5
- Authority
- JP
- Japan
- Prior art keywords
- sio
- droplets
- starting material
- carrier gas
- gas stream
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229910004298 SiO 2 Inorganic materials 0.000 claims 10
- 239000007858 starting material Substances 0.000 claims 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 4
- 239000012159 carrier gas Substances 0.000 claims 4
- 238000000034 method Methods 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 239000004071 soot Substances 0.000 claims 2
- 229910052681 coesite Inorganic materials 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000002663 nebulization Methods 0.000 claims 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 229910052682 stishovite Inorganic materials 0.000 claims 1
- 229910052905 tridymite Inorganic materials 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011121190.3 | 2011-12-16 | ||
| DE102011121190A DE102011121190A1 (de) | 2011-12-16 | 2011-12-16 | OMCTS-Verdampfungsverfahren |
| PCT/EP2012/075346 WO2013087751A1 (de) | 2011-12-16 | 2012-12-13 | Verfahren zur herstellung von synthetischem quarzglas |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015505291A JP2015505291A (ja) | 2015-02-19 |
| JP2015505291A5 true JP2015505291A5 (https=) | 2016-01-28 |
| JP6138145B2 JP6138145B2 (ja) | 2017-05-31 |
Family
ID=47435939
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014546502A Active JP6138145B2 (ja) | 2011-12-16 | 2012-12-13 | 合成石英ガラスの製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9481597B2 (https=) |
| EP (1) | EP2791069B1 (https=) |
| JP (1) | JP6138145B2 (https=) |
| KR (1) | KR101614339B1 (https=) |
| CN (1) | CN103987667B (https=) |
| DE (1) | DE102011121190A1 (https=) |
| IN (1) | IN2014CN04381A (https=) |
| WO (1) | WO2013087751A1 (https=) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6236866B2 (ja) * | 2013-05-15 | 2017-11-29 | 住友電気工業株式会社 | ガラス微粒子堆積体の製造方法およびガラス微粒子堆積体製造用バーナー |
| DE102013209673B3 (de) | 2013-05-24 | 2014-05-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren und Verdampfer zur Herstellung von synthetischem Quarzglas |
| EP3034476A1 (de) | 2014-12-16 | 2016-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung |
| EP3059212A1 (de) | 2015-02-18 | 2016-08-24 | Heraeus Quarzglas GmbH & Co. KG | Verfahren und vorrichtung zur herstellung von quarzglas aus einer polymerisierbaren polyalkylsiloxanverbindung mit membranfilter als reinigungsvorrichtung |
| EP3434653A1 (de) | 2017-07-24 | 2019-01-30 | Heraeus Quarzglas GmbH & Co. KG | Einsatz von einer polyalkylsiloxanverbindung mit geringem siloxanolgehalt für die herstellung von synthetischem quarzglas |
| JP6978991B2 (ja) | 2018-08-23 | 2021-12-08 | 信越化学工業株式会社 | 光ファイバ用多孔質ガラス母材の製造方法および製造装置 |
| CN113227000B (zh) * | 2018-12-04 | 2022-10-21 | 住友电气工业株式会社 | 玻璃微粒沉积体的制造装置以及制造方法 |
| CN109373196A (zh) * | 2018-12-05 | 2019-02-22 | 上海正帆科技股份有限公司 | 一种八甲基环四硅氧烷的输送及汽化系统和方法 |
| JP7058627B2 (ja) * | 2019-06-11 | 2022-04-22 | 信越化学工業株式会社 | 光ファイバ用多孔質ガラス母材の製造装置および製造方法 |
| JP7450023B2 (ja) | 2020-05-01 | 2024-03-14 | 信越化学工業株式会社 | 多孔質ガラス母材製造装置、多孔質ガラス母材の製造方法、および光ファイバ用ガラス母材の製造方法 |
| EP3950610A1 (de) | 2020-08-06 | 2022-02-09 | Heraeus Quarzglas GmbH & Co. KG | Alternative fluorierungsmittel ii: fluosil und sootaufbau |
| EP3950611A1 (de) | 2020-08-06 | 2022-02-09 | Heraeus Quarzglas GmbH & Co. KG | Alternative fluorierungsmittel zur herstellung von fluoriertem quarzglas |
| JP7428632B2 (ja) * | 2020-12-14 | 2024-02-06 | 信越化学工業株式会社 | 多孔質ガラス母材の製造方法及び製造装置 |
| EP4015467A1 (de) | 2020-12-16 | 2022-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas |
| EP4015466A1 (de) | 2020-12-16 | 2022-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas |
| EP4015468A1 (de) | 2020-12-16 | 2022-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas |
| USD982401S1 (en) * | 2021-05-09 | 2023-04-04 | Weber Product Development, Llc | Cap designed to reseal a partially used tube of caulk for later reuse |
| EP4428106A1 (de) | 2023-03-07 | 2024-09-11 | Heraeus Quarzglas GmbH & Co. KG | Antriebssynchronisation für soot-abscheidemaschine zur vermeidung von strukturbildungen in abscheideprozessen |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8905966D0 (en) | 1989-03-15 | 1989-04-26 | Tsl Group Plc | Improved vitreous silica products |
| US5152819A (en) * | 1990-08-16 | 1992-10-06 | Corning Incorporated | Method of making fused silica |
| US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| US5558687A (en) | 1994-12-30 | 1996-09-24 | Corning Incorporated | Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds |
| US5632797A (en) * | 1994-12-30 | 1997-05-27 | Corning Incorporated | Method of providing vaporized halide-free, silicon-containing compounds |
| US5703191A (en) * | 1995-09-01 | 1997-12-30 | Corning Incorporated | Method for purifying polyalkylsiloxanes and the resulting products |
| US6312656B1 (en) * | 1995-12-19 | 2001-11-06 | Corning Incorporated | Method for forming silica by combustion of liquid reactants using oxygen |
| US6244575B1 (en) * | 1996-10-02 | 2001-06-12 | Micron Technology, Inc. | Method and apparatus for vaporizing liquid precursors and system for using same |
| AU751971B2 (en) * | 1997-12-19 | 2002-09-05 | Corning Incorporated | Method for producing metal oxide soot |
| JP2000017438A (ja) * | 1998-06-30 | 2000-01-18 | Japan Pionics Co Ltd | 気化器及び気化供給方法 |
| US6546757B1 (en) * | 1998-07-28 | 2003-04-15 | Brown University Research Foundation | Liquid spray pyrolysis method for the fabrication of optical fiber preforms, with reactant mixing |
| US6260385B1 (en) * | 1998-08-07 | 2001-07-17 | Corning Incorporated | Method and burner for forming silica-containing soot |
| US6672106B1 (en) * | 1998-08-07 | 2004-01-06 | Corning Incorporated | Method and apparatus for forming soot for the manufacture of glass |
| US6705127B1 (en) * | 1998-10-30 | 2004-03-16 | Corning Incorporated | Methods of manufacturing soot for optical fiber preforms and preforms made by the methods |
| JP3685251B2 (ja) * | 2000-08-31 | 2005-08-17 | 信越化学工業株式会社 | 球状シリカ粉末の製造方法 |
| US6766702B2 (en) * | 2001-07-16 | 2004-07-27 | Institute For Tropospheric Research, A German Non-Profit Organization | Method and apparatus for investigating temporal development of particles or droplets in gas-vapor mixture |
| EP1451386A1 (en) * | 2001-12-04 | 2004-09-01 | Primaxx, Inc. | Chemical vapor deposition vaporizer |
| DE10302914B4 (de) * | 2003-01-24 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
| GB2478307A (en) * | 2010-03-02 | 2011-09-07 | Heraeus Quartz Uk Ltd | Manufacture of silica glass |
| DE102011119339A1 (de) * | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas |
| DE102011119374A1 (de) * | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
| DE102011119341A1 (de) * | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode |
| DE102011119373A1 (de) * | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
| DE102011121153B3 (de) * | 2011-12-15 | 2013-03-21 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas sowie Quarzglas für den Einsatz als Mantelmaterial einer optischen Faser |
-
2011
- 2011-12-16 DE DE102011121190A patent/DE102011121190A1/de not_active Withdrawn
-
2012
- 2012-12-13 CN CN201280062054.XA patent/CN103987667B/zh active Active
- 2012-12-13 EP EP12806426.8A patent/EP2791069B1/de active Active
- 2012-12-13 IN IN4381CHN2014 patent/IN2014CN04381A/en unknown
- 2012-12-13 US US14/365,944 patent/US9481597B2/en active Active
- 2012-12-13 WO PCT/EP2012/075346 patent/WO2013087751A1/de not_active Ceased
- 2012-12-13 JP JP2014546502A patent/JP6138145B2/ja active Active
- 2012-12-13 KR KR1020147016084A patent/KR101614339B1/ko active Active
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