JP2013226539A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2013226539A5 JP2013226539A5 JP2013008619A JP2013008619A JP2013226539A5 JP 2013226539 A5 JP2013226539 A5 JP 2013226539A5 JP 2013008619 A JP2013008619 A JP 2013008619A JP 2013008619 A JP2013008619 A JP 2013008619A JP 2013226539 A5 JP2013226539 A5 JP 2013226539A5
- Authority
- JP
- Japan
- Prior art keywords
- producing
- hollow particles
- particles
- core
- hollow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims description 27
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 8
- 239000007771 core particle Substances 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 239000010420 shell particle Substances 0.000 claims description 4
- 239000012736 aqueous medium Substances 0.000 claims description 2
- 150000002894 organic compounds Chemical class 0.000 claims description 2
- 150000002484 inorganic compounds Chemical class 0.000 claims 3
- 229910010272 inorganic material Inorganic materials 0.000 claims 3
- 238000010438 heat treatment Methods 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 150000002430 hydrocarbons Chemical group 0.000 claims 1
- 230000002209 hydrophobic effect Effects 0.000 claims 1
- -1 siloxane compound Chemical class 0.000 claims 1
- 230000002194 synthesizing effect Effects 0.000 claims 1
- 239000012528 membrane Substances 0.000 description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013008619A JP6103950B2 (ja) | 2012-03-26 | 2013-01-21 | 中空粒子の製造方法、反射防止膜の製造方法及び光学素子の製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012069662 | 2012-03-26 | ||
| JP2012069662 | 2012-03-26 | ||
| JP2013008619A JP6103950B2 (ja) | 2012-03-26 | 2013-01-21 | 中空粒子の製造方法、反射防止膜の製造方法及び光学素子の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013226539A JP2013226539A (ja) | 2013-11-07 |
| JP2013226539A5 true JP2013226539A5 (https=) | 2016-03-10 |
| JP6103950B2 JP6103950B2 (ja) | 2017-03-29 |
Family
ID=48050200
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013008619A Expired - Fee Related JP6103950B2 (ja) | 2012-03-26 | 2013-01-21 | 中空粒子の製造方法、反射防止膜の製造方法及び光学素子の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9802175B2 (https=) |
| EP (1) | EP2812108A1 (https=) |
| JP (1) | JP6103950B2 (https=) |
| CN (1) | CN104203391B (https=) |
| WO (1) | WO2013145548A1 (https=) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IN2014DN08762A (https=) | 2012-05-22 | 2015-05-22 | Dsm Ip Assets Bv | |
| JP2014034488A (ja) * | 2012-08-08 | 2014-02-24 | Canon Inc | 中空粒子の分散液の製造方法、反射防止膜の製造方法及び光学素子の製造方法 |
| MY182820A (en) * | 2013-11-22 | 2021-02-05 | Dsm Ip Assets Bv | Process for making an anti-reflective coating composition and a porous coating made therefrom |
| WO2015138162A1 (en) * | 2014-03-11 | 2015-09-17 | E I Du Pont De Nemours And Company | Coating compositions comprising functionalized hollow silica particles with low porosity prepared using water-based silica precursors |
| WO2015138144A1 (en) * | 2014-03-11 | 2015-09-17 | E I Du Pont De Nemours And Company | Coating compositions comprising functionalized hollow silica particles with low porosity |
| KR101672532B1 (ko) * | 2015-04-27 | 2016-11-07 | 계명대학교 산학협력단 | 메조기공 중공형 나노 실리카 물질 합성에 사용되는 코어물질 합성방법 및 그 방법으로 제조된 코어물질 |
| JP2017114950A (ja) * | 2015-12-21 | 2017-06-29 | 旭化成株式会社 | 塗膜及び塗膜の製造方法 |
| JP6953114B2 (ja) * | 2016-06-21 | 2021-10-27 | 扶桑化学工業株式会社 | シリカ系中空粒子、コアシェル粒子及びポリスチレン粒子、並びに、それらの製造方法 |
| KR102166236B1 (ko) * | 2018-12-19 | 2020-10-15 | 동의대학교 산학협력단 | 3d 스캔 및 스캔 이미지 보정 방법 |
| JP7071418B2 (ja) * | 2019-02-15 | 2022-05-18 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシー | 反射防止コーティング |
| CN110064063B (zh) * | 2019-03-15 | 2021-11-19 | 徐州医科大学 | 一种双层疏水-亲水改性中空纳米硅球、其制备方法及应用 |
| CN110669362B (zh) * | 2019-10-16 | 2021-11-23 | 宁波甬安光科新材料科技有限公司 | 一种减反射涂料及其制备方法和用途 |
| JP2022164313A (ja) * | 2021-04-16 | 2022-10-27 | 株式会社リコー | 白色組成液、組成液収容容器、インクジェット記録方法、インクジェット記録装置及び記録物 |
| US20230124794A1 (en) * | 2021-10-14 | 2023-04-20 | Lumileds Llc | Micro-led with reflectance redistribution |
| EP4638584A1 (de) | 2022-12-19 | 2025-10-29 | Wacker Chemie AG | Siliconharz-hohlpartikel und verfahren zu deren herstellung |
| KR20250145516A (ko) | 2024-03-28 | 2025-10-13 | 니끼 쇼꾸바이 카세이 가부시키가이샤 | 규소를 포함하는 외각과, 그 내측에 공동을 갖는 입자 및 그 제조 방법 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5939805A (ja) | 1982-08-31 | 1984-03-05 | Mitsui Toatsu Chem Inc | 水田用除草剤組成物 |
| JP4046921B2 (ja) | 2000-02-24 | 2008-02-13 | 触媒化成工業株式会社 | シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材 |
| US20070036705A1 (en) | 2005-08-10 | 2007-02-15 | Butts Matthew D | Hollow silica particles and methods for making same |
| US9051490B2 (en) | 2006-03-02 | 2015-06-09 | Kaneka Corporation | Method for producing hollow silicone fine particles |
| JP2008201908A (ja) * | 2007-02-20 | 2008-09-04 | Kaneka Corp | 中空シリコーン系微粒子とフッ素系樹脂を含む被膜を有する被膜付基材 |
| KR20100038170A (ko) | 2007-06-26 | 2010-04-13 | 덴끼 가가꾸 고교 가부시키가이샤 | 구상 유기 폴리머-실리콘 화합물 복합 입자, 중공 입자 및 그들의 제조 방법 |
| JP5194935B2 (ja) * | 2008-03-27 | 2013-05-08 | Ｊｓｒ株式会社 | シリカ系中空粒子の製造方法およびシリカ系中空粒子分散体の製造方法 |
| CN102046522A (zh) | 2008-06-03 | 2011-05-04 | 旭硝子株式会社 | 核—壳粒子的制造方法、核—壳粒子、中空粒子的制造方法、涂料组合物及物品 |
| EP2351707A4 (en) | 2008-10-31 | 2012-06-06 | Asahi Glass Co Ltd | HOLLOW PARTICLES, MANUFACTURING METHOD, COATING COMPOSITION AND ARTICLES |
| WO2010074063A1 (ja) * | 2008-12-25 | 2010-07-01 | 電気化学工業株式会社 | 複合粒子及びその製造方法、中空粒子、その製造方法及び用途 |
-
2013
- 2013-01-21 JP JP2013008619A patent/JP6103950B2/ja not_active Expired - Fee Related
- 2013-02-26 CN CN201380016681.4A patent/CN104203391B/zh not_active Expired - Fee Related
- 2013-02-26 US US14/388,380 patent/US9802175B2/en not_active Expired - Fee Related
- 2013-02-26 EP EP13714703.9A patent/EP2812108A1/en not_active Withdrawn
- 2013-02-26 WO PCT/JP2013/001114 patent/WO2013145548A1/en not_active Ceased
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2013226539A5 (https=) | ||
| CN103382389B (zh) | 一种荧光碳量子点及其发光聚合物基复合材料与制备方法 | |
| TWI736524B (zh) | 氣凝膠複合體、帶有氣凝膠複合體的支撐構件及絕熱材 | |
| JP2015034281A5 (https=) | ||
| CN105452393B (zh) | 可热固化涂层体系 | |
| US20170073237A1 (en) | Method for manufacturing hollow silica particles, hollow silica particles, and composition and thermal insulation sheet comprising same | |
| JP6507838B2 (ja) | エアロゲル、エアロゲルの製造方法及びエアロゲルフィルム | |
| CN104789124A (zh) | 一种制备稳定超双疏表面的方法 | |
| JP2016041643A5 (ja) | 中空シリカ粒子の製造方法及び中空シリカ粒子 | |
| WO2012032868A1 (ja) | 表面修飾チタニア粒子の製造方法、チタニア粒子分散液およびチタニア粒子分散樹脂 | |
| CN105016354A (zh) | 一种制备亚微米全硅dd3r分子筛的方法 | |
| JP2019065133A5 (https=) | ||
| JP2014034488A5 (https=) | ||
| JP2005200294A5 (https=) | ||
| JP2016011993A5 (https=) | ||
| CN103449453A (zh) | 一种以阴离子表面活性剂为模板的介孔二氧化硅的制备方法 | |
| JP2014019626A5 (ja) | 中空粒子の製造方法、反射防止膜の製造方法、光学素子の製造方法、中空粒子、反射防止膜及び光学素子 | |
| JP2017015916A5 (https=) | ||
| CN103265713A (zh) | 一种多彩薄膜的制备方法 | |
| JP2017167271A5 (https=) | ||
| JP2014152226A5 (https=) | ||
| JP2016011992A5 (https=) | ||
| CN102765726A (zh) | 一种以稻壳灰为原料制备二氧化硅气凝胶的方法 | |
| CN203849440U (zh) | 一种近红外3d探测滤波器 | |
| TW201806862A (zh) | 氣凝膠複合體、帶氣凝膠複合體的支撐構件及絕熱材料 |