JP2014034488A5 - - Google Patents
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- Publication number
- JP2014034488A5 JP2014034488A5 JP2012176026A JP2012176026A JP2014034488A5 JP 2014034488 A5 JP2014034488 A5 JP 2014034488A5 JP 2012176026 A JP2012176026 A JP 2012176026A JP 2012176026 A JP2012176026 A JP 2012176026A JP 2014034488 A5 JP2014034488 A5 JP 2014034488A5
- Authority
- JP
- Japan
- Prior art keywords
- dispersion
- hollow particles
- hollow
- core
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims 27
- 239000006185 dispersion Substances 0.000 claims 18
- 238000004519 manufacturing process Methods 0.000 claims 12
- 239000007788 liquid Substances 0.000 claims 4
- 239000012736 aqueous medium Substances 0.000 claims 3
- 230000002209 hydrophobic effect Effects 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 239000002635 aromatic organic solvent Substances 0.000 claims 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims 2
- 150000002484 inorganic compounds Chemical class 0.000 claims 2
- 229910010272 inorganic material Inorganic materials 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- MASDFXZJIDNRTR-UHFFFAOYSA-N 1,3-bis(trimethylsilyl)urea Chemical compound C[Si](C)(C)NC(=O)N[Si](C)(C)C MASDFXZJIDNRTR-UHFFFAOYSA-N 0.000 claims 1
- NDVMCQUOSYOQMZ-UHFFFAOYSA-N 2,2-bis(trimethylsilyl)acetamide Chemical compound C[Si](C)(C)C(C(N)=O)[Si](C)(C)C NDVMCQUOSYOQMZ-UHFFFAOYSA-N 0.000 claims 1
- 239000005046 Chlorosilane Substances 0.000 claims 1
- YKFRUJSEPGHZFJ-UHFFFAOYSA-N N-trimethylsilylimidazole Chemical compound C[Si](C)(C)N1C=CN=C1 YKFRUJSEPGHZFJ-UHFFFAOYSA-N 0.000 claims 1
- 239000006087 Silane Coupling Agent Substances 0.000 claims 1
- KOOADCGQJDGAGA-UHFFFAOYSA-N [amino(dimethyl)silyl]methane Chemical compound C[Si](C)(C)N KOOADCGQJDGAGA-UHFFFAOYSA-N 0.000 claims 1
- 239000003849 aromatic solvent Substances 0.000 claims 1
- ABHNFDUSOVXXOA-UHFFFAOYSA-N benzyl-chloro-dimethylsilane Chemical compound C[Si](C)(Cl)CC1=CC=CC=C1 ABHNFDUSOVXXOA-UHFFFAOYSA-N 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- ITKVLPYNJQOCPW-UHFFFAOYSA-N chloro-(chloromethyl)-dimethylsilane Chemical compound C[Si](C)(Cl)CCl ITKVLPYNJQOCPW-UHFFFAOYSA-N 0.000 claims 1
- DBKNGKYVNBJWHL-UHFFFAOYSA-N chloro-dimethyl-octylsilane Chemical compound CCCCCCCC[Si](C)(C)Cl DBKNGKYVNBJWHL-UHFFFAOYSA-N 0.000 claims 1
- KMVZWUQHMJAWSY-UHFFFAOYSA-N chloro-dimethyl-prop-2-enylsilane Chemical compound C[Si](C)(Cl)CC=C KMVZWUQHMJAWSY-UHFFFAOYSA-N 0.000 claims 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims 1
- 239000011258 core-shell material Substances 0.000 claims 1
- IGFFTOVGRACDBL-UHFFFAOYSA-N dichloro-phenyl-prop-2-enylsilane Chemical compound C=CC[Si](Cl)(Cl)C1=CC=CC=C1 IGFFTOVGRACDBL-UHFFFAOYSA-N 0.000 claims 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 claims 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 claims 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000005055 methyl trichlorosilane Substances 0.000 claims 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 claims 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims 1
- 150000002894 organic compounds Chemical class 0.000 claims 1
- -1 siloxane compound Chemical class 0.000 claims 1
- 238000000638 solvent extraction Methods 0.000 claims 1
- CAPIMQICDAJXSB-UHFFFAOYSA-N trichloro(1-chloroethyl)silane Chemical compound CC(Cl)[Si](Cl)(Cl)Cl CAPIMQICDAJXSB-UHFFFAOYSA-N 0.000 claims 1
- FLPXNJHYVOVLSD-UHFFFAOYSA-N trichloro(2-chloroethyl)silane Chemical compound ClCC[Si](Cl)(Cl)Cl FLPXNJHYVOVLSD-UHFFFAOYSA-N 0.000 claims 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 claims 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims 1
- KHOQXNHADJBILQ-UHFFFAOYSA-N trimethyl(sulfanyl)silane Chemical compound C[Si](C)(C)S KHOQXNHADJBILQ-UHFFFAOYSA-N 0.000 claims 1
- 239000005051 trimethylchlorosilane Substances 0.000 claims 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012176026A JP2014034488A (ja) | 2012-08-08 | 2012-08-08 | 中空粒子の分散液の製造方法、反射防止膜の製造方法及び光学素子の製造方法 |
| EP13003693.2A EP2695917A3 (en) | 2012-08-08 | 2013-07-23 | Method for manufacturing a dispersion of hollow particles, an antireflective film, and an optical element |
| US13/960,536 US20140045957A1 (en) | 2012-08-08 | 2013-08-06 | Method for manufacturing dispersion of hollow particles, method for manufacturing antireflective film, and method for manufacturing optical element |
| CN201310342590.1A CN103570030A (zh) | 2012-08-08 | 2013-08-08 | 中空颗粒的分散体的制造方法、减反射膜的制造方法和光学元件的制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012176026A JP2014034488A (ja) | 2012-08-08 | 2012-08-08 | 中空粒子の分散液の製造方法、反射防止膜の製造方法及び光学素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014034488A JP2014034488A (ja) | 2014-02-24 |
| JP2014034488A5 true JP2014034488A5 (https=) | 2015-09-24 |
Family
ID=49028873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012176026A Pending JP2014034488A (ja) | 2012-08-08 | 2012-08-08 | 中空粒子の分散液の製造方法、反射防止膜の製造方法及び光学素子の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20140045957A1 (https=) |
| EP (1) | EP2695917A3 (https=) |
| JP (1) | JP2014034488A (https=) |
| CN (1) | CN103570030A (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130245759A1 (en) * | 2012-03-09 | 2013-09-19 | The Florida International University Board Of Trustees | Medical devices incorporating silicone nanoparticles, and uses thereof |
| EP3199984A1 (en) | 2016-02-01 | 2017-08-02 | Canon Kabushiki Kaisha | Antireflection film, optical member, and method for manufacturing optical member |
| CN107758674B (zh) * | 2016-08-19 | 2021-03-23 | 陈建宏 | 气凝胶颗粒制备方法 |
| WO2020196851A1 (ja) * | 2019-03-28 | 2020-10-01 | 株式会社ニコン | 多孔質膜、光学素子、光学系、交換レンズ、光学装置および多孔質膜の製造方法 |
| TWI854015B (zh) | 2019-09-06 | 2024-09-01 | 日商富士軟片股份有限公司 | 組成物、膜、結構體、濾色器、固體攝像元件及圖像顯示裝置 |
| WO2021044987A1 (ja) | 2019-09-06 | 2021-03-11 | 富士フイルム株式会社 | 組成物、膜、構造体、カラーフィルタ、固体撮像素子および画像表示装置 |
| KR102948778B1 (ko) | 2021-08-19 | 2026-04-06 | 후지필름 가부시키가이샤 | 조성물, 막, 광학 필터, 광학 센서, 화상 표시 장치 및 구조체 |
| EP4729164A1 (en) * | 2024-10-17 | 2026-04-22 | Covestro (Netherlands) B.V. | Core-shell particles as opacifiers |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4046921B2 (ja) * | 2000-02-24 | 2008-02-13 | 触媒化成工業株式会社 | シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材 |
| JP2008201908A (ja) * | 2007-02-20 | 2008-09-04 | Kaneka Corp | 中空シリコーン系微粒子とフッ素系樹脂を含む被膜を有する被膜付基材 |
| KR20100038170A (ko) * | 2007-06-26 | 2010-04-13 | 덴끼 가가꾸 고교 가부시키가이샤 | 구상 유기 폴리머-실리콘 화합물 복합 입자, 중공 입자 및 그들의 제조 방법 |
| JP5194935B2 (ja) | 2008-03-27 | 2013-05-08 | Ｊｓｒ株式会社 | シリカ系中空粒子の製造方法およびシリカ系中空粒子分散体の製造方法 |
| CN102046522A (zh) * | 2008-06-03 | 2011-05-04 | 旭硝子株式会社 | 核—壳粒子的制造方法、核—壳粒子、中空粒子的制造方法、涂料组合物及物品 |
| EP2351707A4 (en) * | 2008-10-31 | 2012-06-06 | Asahi Glass Co Ltd | HOLLOW PARTICLES, MANUFACTURING METHOD, COATING COMPOSITION AND ARTICLES |
| JP5387331B2 (ja) * | 2008-10-31 | 2014-01-15 | 日立化成株式会社 | 中空状無機粒子の前駆体、中空状無機粒子及びこの製造方法、並びに中空状無機粒子を用いた光学部材及び光学部材体 |
| WO2010090596A1 (en) * | 2009-02-04 | 2010-08-12 | Agency For Science, Technology And Research | Hollow silica particle with a polymer thereon |
| JP5463099B2 (ja) * | 2009-08-21 | 2014-04-09 | 電気化学工業株式会社 | 中空シリカ粉末、その製造方法及び用途 |
| JP5614968B2 (ja) * | 2009-10-22 | 2014-10-29 | 株式会社Adeka | 疎水性コアシェルシリカ粒子、中空シリカ粒子およびこれらの製造方法 |
| JP5818523B2 (ja) * | 2010-06-24 | 2015-11-18 | キヤノン株式会社 | メソポーラスシリカ膜、メソポーラスシリカ膜を有する構造体、反射防止膜、光学部材及びそれらの製造方法 |
| CN102040244B (zh) * | 2010-12-25 | 2013-05-29 | 锦州钛业有限公司 | 一种可延长生产周期的粗四氯化钛精制工艺 |
| US20120267585A1 (en) * | 2010-12-30 | 2012-10-25 | Ut-Battelle, Llc | Volume-labeled nanoparticles and methods of preparation |
| JP6103950B2 (ja) * | 2012-03-26 | 2017-03-29 | キヤノン株式会社 | 中空粒子の製造方法、反射防止膜の製造方法及び光学素子の製造方法 |
-
2012
- 2012-08-08 JP JP2012176026A patent/JP2014034488A/ja active Pending
-
2013
- 2013-07-23 EP EP13003693.2A patent/EP2695917A3/en not_active Withdrawn
- 2013-08-06 US US13/960,536 patent/US20140045957A1/en not_active Abandoned
- 2013-08-08 CN CN201310342590.1A patent/CN103570030A/zh active Pending
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