JP2015131748A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2015131748A5 JP2015131748A5 JP2014005043A JP2014005043A JP2015131748A5 JP 2015131748 A5 JP2015131748 A5 JP 2015131748A5 JP 2014005043 A JP2014005043 A JP 2014005043A JP 2014005043 A JP2014005043 A JP 2014005043A JP 2015131748 A5 JP2015131748 A5 JP 2015131748A5
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- silicon carbide
- crucible lid
- carbide single
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 description 9
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 8
- 229910010271 silicon carbide Inorganic materials 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014005043A JP6237248B2 (ja) | 2014-01-15 | 2014-01-15 | 炭化珪素単結晶の製造方法 |
| PCT/JP2014/080849 WO2015107772A1 (ja) | 2014-01-15 | 2014-11-21 | 炭化珪素単結晶の製造方法 |
| DE112014006171.9T DE112014006171T5 (de) | 2014-01-15 | 2014-11-21 | Verfahren für die Herstellung eines Siliziumcarbid-Einkristalls |
| CN201480073219.2A CN105917034A (zh) | 2014-01-15 | 2014-11-21 | 碳化硅单晶的制造方法 |
| US15/111,013 US10184191B2 (en) | 2014-01-15 | 2014-11-21 | Method for manufacturing silicon carbide single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014005043A JP6237248B2 (ja) | 2014-01-15 | 2014-01-15 | 炭化珪素単結晶の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015131748A JP2015131748A (ja) | 2015-07-23 |
| JP2015131748A5 true JP2015131748A5 (enExample) | 2016-10-20 |
| JP6237248B2 JP6237248B2 (ja) | 2017-11-29 |
Family
ID=53542676
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014005043A Expired - Fee Related JP6237248B2 (ja) | 2014-01-15 | 2014-01-15 | 炭化珪素単結晶の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10184191B2 (enExample) |
| JP (1) | JP6237248B2 (enExample) |
| CN (1) | CN105917034A (enExample) |
| DE (1) | DE112014006171T5 (enExample) |
| WO (1) | WO2015107772A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7735658B2 (ja) * | 2020-12-28 | 2025-09-09 | 株式会社レゾナック | 炭化珪素単結晶製造装置および炭化珪素単結晶の製造方法 |
| JP7639335B2 (ja) * | 2020-12-28 | 2025-03-05 | 株式会社レゾナック | 炭化珪素単結晶製造装置および炭化珪素単結晶の製造方法 |
| CN112981524B (zh) * | 2021-02-23 | 2023-03-07 | 芜湖予秦半导体科技有限公司 | 一种物理气相传输法用坩埚盖及其制备方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6110279A (en) * | 1996-03-29 | 2000-08-29 | Denso Corporation | Method of producing single-crystal silicon carbide |
| US6328796B1 (en) * | 1999-02-01 | 2001-12-11 | The United States Of America As Represented By The Secretary Of The Navy | Single-crystal material on non-single-crystalline substrate |
| FR2849714B1 (fr) * | 2003-01-07 | 2007-03-09 | Recyclage par des moyens mecaniques d'une plaquette comprenant une structure multicouches apres prelevement d'une couche mince | |
| JP2005255420A (ja) * | 2004-03-09 | 2005-09-22 | Ngk Insulators Ltd | 炭化珪素単結晶膜の製造方法および炭化珪素単結晶膜 |
| JP4556634B2 (ja) * | 2004-11-18 | 2010-10-06 | パナソニック株式会社 | 種結晶固定部及び種結晶固定方法 |
| JP4894717B2 (ja) | 2007-10-23 | 2012-03-14 | 株式会社デンソー | 炭化珪素単結晶基板の製造方法 |
| JP5012655B2 (ja) * | 2008-05-16 | 2012-08-29 | 三菱電機株式会社 | 単結晶成長装置 |
| JP5061038B2 (ja) * | 2008-06-13 | 2012-10-31 | 株式会社ブリヂストン | 炭化ケイ素単結晶の研削方法 |
| JP2010064918A (ja) * | 2008-09-10 | 2010-03-25 | Showa Denko Kk | 炭化珪素単結晶の製造方法、炭化珪素単結晶ウェーハ及び炭化珪素単結晶半導体パワーデバイス |
| JP4985625B2 (ja) * | 2008-12-02 | 2012-07-25 | 三菱電機株式会社 | 炭化珪素単結晶の製造方法 |
| JP5346788B2 (ja) * | 2009-11-30 | 2013-11-20 | 昭和電工株式会社 | 炭化珪素単結晶の製造方法 |
| JP2011251884A (ja) * | 2010-06-03 | 2011-12-15 | Bridgestone Corp | 炭化ケイ素単結晶の製造装置 |
| KR20130014272A (ko) * | 2011-07-29 | 2013-02-07 | 엘지이노텍 주식회사 | 잉곳 제조 장치 |
| JP2013067522A (ja) * | 2011-09-21 | 2013-04-18 | Sumitomo Electric Ind Ltd | 炭化珪素結晶の製造方法 |
-
2014
- 2014-01-15 JP JP2014005043A patent/JP6237248B2/ja not_active Expired - Fee Related
- 2014-11-21 WO PCT/JP2014/080849 patent/WO2015107772A1/ja not_active Ceased
- 2014-11-21 DE DE112014006171.9T patent/DE112014006171T5/de not_active Withdrawn
- 2014-11-21 US US15/111,013 patent/US10184191B2/en not_active Expired - Fee Related
- 2014-11-21 CN CN201480073219.2A patent/CN105917034A/zh active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2392547A3 (en) | Method of graphene manufacturing | |
| JP2018535536A5 (enExample) | ||
| JP2016164120A5 (enExample) | ||
| WO2013061047A3 (en) | Silicon carbide epitaxy | |
| EP3260581C0 (en) | METHOD FOR PRODUCING A SINGLE-CRYSTALLINE EPITAXIAL SILICON CARBIDE WAFER AND SINGLE-CRYSTALLINE EPITAXIAL SILICON CARBIDE WAFER | |
| JP2017152541A5 (enExample) | ||
| WO2012134092A3 (en) | Method of manufacturing single crystal ingot, and single crystal ingot and wafer manufactured thereby | |
| WO2012121940A3 (en) | Methods of forming polycrystalline elements and structures formed by such methods | |
| JP2013212952A5 (enExample) | ||
| BR112013022625A2 (pt) | quadros policristalinos, elementos policristalinos, e métodos relacionados | |
| WO2016049362A3 (en) | High purity polysilocarb derived silicon carbide materials, applications and processes | |
| EP2876190A4 (en) | SIC CRYSTAL WAFERS AND MANUFACTURING METHOD THEREFOR | |
| JP2011525472A5 (enExample) | ||
| EP4012079A4 (en) | SIC SUBSTRATE, SIC EPITALIAL SUBSTRATE, SIC BAR AND METHOD OF PRODUCTION | |
| JP2015079945A5 (enExample) | ||
| JP2016038993A5 (enExample) | ||
| GB2541146A (en) | Method of manufacturing a germanium-on-insulator substrate | |
| SG11201707558SA (en) | Gaas thin film grown on si substrate, and preparation method for gaas thin film grown on si substrate | |
| JP2015131748A5 (enExample) | ||
| EP2995704A3 (en) | Sic single crystal and method for producing same | |
| WO2014081946A3 (en) | Methods for the recycling of wire-saw cutting fluid | |
| EP3388560B8 (en) | Method for preparing sic single crystal | |
| JP2015214448A5 (enExample) | ||
| EP2562800A3 (en) | Removing aluminum nitride sections | |
| JP2013222893A5 (enExample) |