JP2015004871A - 光学用部材およびその製造方法 - Google Patents
光学用部材およびその製造方法 Download PDFInfo
- Publication number
- JP2015004871A JP2015004871A JP2013130772A JP2013130772A JP2015004871A JP 2015004871 A JP2015004871 A JP 2015004871A JP 2013130772 A JP2013130772 A JP 2013130772A JP 2013130772 A JP2013130772 A JP 2013130772A JP 2015004871 A JP2015004871 A JP 2015004871A
- Authority
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- Prior art keywords
- aluminum oxide
- optical member
- aluminum
- refractive index
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 66
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 148
- -1 silane compound Chemical class 0.000 claims abstract description 65
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 239000002243 precursor Substances 0.000 claims abstract description 57
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000002904 solvent Substances 0.000 claims abstract description 24
- 230000003301 hydrolyzing effect Effects 0.000 claims abstract description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- 125000001424 substituent group Chemical group 0.000 claims description 12
- 125000004103 aminoalkyl group Chemical group 0.000 claims description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 9
- 229910018540 Si C Inorganic materials 0.000 claims description 7
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 6
- 239000002086 nanomaterial Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 238000004458 analytical method Methods 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 230000003252 repetitive effect Effects 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 229940126062 Compound A Drugs 0.000 claims 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 claims 1
- 150000001282 organosilanes Chemical class 0.000 claims 1
- 238000002798 spectrophotometry method Methods 0.000 claims 1
- 239000013078 crystal Substances 0.000 abstract description 11
- 229910000077 silane Inorganic materials 0.000 abstract description 7
- 239000000047 product Substances 0.000 abstract description 3
- 239000007859 condensation product Substances 0.000 abstract 2
- 238000006068 polycondensation reaction Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 87
- 239000010410 layer Substances 0.000 description 76
- 238000000034 method Methods 0.000 description 40
- 239000000463 material Substances 0.000 description 36
- 239000002585 base Substances 0.000 description 27
- 150000001875 compounds Chemical class 0.000 description 25
- 230000000052 comparative effect Effects 0.000 description 22
- 238000005259 measurement Methods 0.000 description 19
- 239000002245 particle Substances 0.000 description 16
- 238000000576 coating method Methods 0.000 description 14
- 239000003381 stabilizer Substances 0.000 description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- 150000002736 metal compounds Chemical class 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 150000004703 alkoxides Chemical class 0.000 description 9
- 238000010304 firing Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 101100203596 Caenorhabditis elegans sol-1 gene Proteins 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000006460 hydrolysis reaction Methods 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- 239000003021 water soluble solvent Substances 0.000 description 8
- 238000004220 aggregation Methods 0.000 description 7
- 230000002776 aggregation Effects 0.000 description 7
- 238000009835 boiling Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- WOZZOSDBXABUFO-UHFFFAOYSA-N tri(butan-2-yloxy)alumane Chemical compound [Al+3].CCC(C)[O-].CCC(C)[O-].CCC(C)[O-] WOZZOSDBXABUFO-UHFFFAOYSA-N 0.000 description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 230000007062 hydrolysis Effects 0.000 description 6
- 238000003980 solgel method Methods 0.000 description 6
- 229910001593 boehmite Inorganic materials 0.000 description 5
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 5
- 125000000962 organic group Chemical group 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- TZYRSLHNPKPEFV-UHFFFAOYSA-N 2-ethyl-1-butanol Chemical compound CCC(CC)CO TZYRSLHNPKPEFV-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910002808 Si–O–Si Inorganic materials 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000003892 spreading Methods 0.000 description 3
- 230000007480 spreading Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- OVBFMEVBMNZIBR-UHFFFAOYSA-N -2-Methylpentanoic acid Natural products CCCC(C)C(O)=O OVBFMEVBMNZIBR-UHFFFAOYSA-N 0.000 description 2
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- CEGGECULKVTYMM-UHFFFAOYSA-N 2,6-dimethylheptane-3,5-dione Chemical compound CC(C)C(=O)CC(=O)C(C)C CEGGECULKVTYMM-UHFFFAOYSA-N 0.000 description 2
- CETWDUZRCINIHU-UHFFFAOYSA-N 2-heptanol Chemical compound CCCCCC(C)O CETWDUZRCINIHU-UHFFFAOYSA-N 0.000 description 2
- PFNHSEQQEPMLNI-UHFFFAOYSA-N 2-methyl-1-pentanol Chemical compound CCCC(C)CO PFNHSEQQEPMLNI-UHFFFAOYSA-N 0.000 description 2
- QPRQEDXDYOZYLA-UHFFFAOYSA-N 2-methylbutan-1-ol Chemical compound CCC(C)CO QPRQEDXDYOZYLA-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- QNVRIHYSUZMSGM-UHFFFAOYSA-N hexan-2-ol Chemical compound CCCCC(C)O QNVRIHYSUZMSGM-UHFFFAOYSA-N 0.000 description 2
- ZOCHHNOQQHDWHG-UHFFFAOYSA-N hexan-3-ol Chemical compound CCCC(O)CC ZOCHHNOQQHDWHG-UHFFFAOYSA-N 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910001512 metal fluoride Inorganic materials 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- SJWFXCIHNDVPSH-UHFFFAOYSA-N octan-2-ol Chemical compound CCCCCCC(C)O SJWFXCIHNDVPSH-UHFFFAOYSA-N 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- JYVLIDXNZAXMDK-UHFFFAOYSA-N pentan-2-ol Chemical compound CCCC(C)O JYVLIDXNZAXMDK-UHFFFAOYSA-N 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- MYWQGROTKMBNKN-UHFFFAOYSA-N tributoxyalumane Chemical compound [Al+3].CCCC[O-].CCCC[O-].CCCC[O-] MYWQGROTKMBNKN-UHFFFAOYSA-N 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- SHXHPUAKLCCLDV-UHFFFAOYSA-N 1,1,1-trifluoropentane-2,4-dione Chemical compound CC(=O)CC(=O)C(F)(F)F SHXHPUAKLCCLDV-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 description 1
- 229940054273 1-propoxy-2-propanol Drugs 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- BAYAKMPRFGNNFW-UHFFFAOYSA-N 2,4-dimethylpentan-3-ol Chemical compound CC(C)C(O)C(C)C BAYAKMPRFGNNFW-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- QNVRIHYSUZMSGM-LURJTMIESA-N 2-Hexanol Natural products CCCC[C@H](C)O QNVRIHYSUZMSGM-LURJTMIESA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
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- SQYMLEVHMMDXCW-UHFFFAOYSA-N 3-(2-methylpropyl)pentane-2,4-dione Chemical compound CC(C)CC(C(C)=O)C(C)=O SQYMLEVHMMDXCW-UHFFFAOYSA-N 0.000 description 1
- VHWDQUBHJZEUNV-UHFFFAOYSA-N 3-(3-methylbutyl)pentane-2,4-dione Chemical compound CC(C)CCC(C(C)=O)C(C)=O VHWDQUBHJZEUNV-UHFFFAOYSA-N 0.000 description 1
- CXXPFYOOKAURIH-UHFFFAOYSA-N 3-(4-methylpentyl)pentane-2,4-dione Chemical compound CC(C)CCCC(C(C)=O)C(C)=O CXXPFYOOKAURIH-UHFFFAOYSA-N 0.000 description 1
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- XBIUWALDKXACEA-UHFFFAOYSA-N 3-[bis(2,4-dioxopentan-3-yl)alumanyl]pentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)[Al](C(C(C)=O)C(C)=O)C(C(C)=O)C(C)=O XBIUWALDKXACEA-UHFFFAOYSA-N 0.000 description 1
- MBXOOYPCIDHXGH-UHFFFAOYSA-N 3-butylpentane-2,4-dione Chemical compound CCCCC(C(C)=O)C(C)=O MBXOOYPCIDHXGH-UHFFFAOYSA-N 0.000 description 1
- VLRGXXKFHVJQOL-UHFFFAOYSA-N 3-chloropentane-2,4-dione Chemical compound CC(=O)C(Cl)C(C)=O VLRGXXKFHVJQOL-UHFFFAOYSA-N 0.000 description 1
- GUARKOVVHJSMRW-UHFFFAOYSA-N 3-ethylpentane-2,4-dione Chemical compound CCC(C(C)=O)C(C)=O GUARKOVVHJSMRW-UHFFFAOYSA-N 0.000 description 1
- JFVHJEAFFUQLGS-UHFFFAOYSA-N 3-hexylpentane-2,4-dione Chemical compound CCCCCCC(C(C)=O)C(C)=O JFVHJEAFFUQLGS-UHFFFAOYSA-N 0.000 description 1
- GSOHKPVFCOWKPU-UHFFFAOYSA-N 3-methylpentane-2,4-dione Chemical compound CC(=O)C(C)C(C)=O GSOHKPVFCOWKPU-UHFFFAOYSA-N 0.000 description 1
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- YIWTXSVNRCWBAC-UHFFFAOYSA-N 3-phenylpentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)C1=CC=CC=C1 YIWTXSVNRCWBAC-UHFFFAOYSA-N 0.000 description 1
- BPIHCIRSGQKCLT-UHFFFAOYSA-N 3-propan-2-ylpentane-2,4-dione Chemical compound CC(C)C(C(C)=O)C(C)=O BPIHCIRSGQKCLT-UHFFFAOYSA-N 0.000 description 1
- WVYWICLMDOOCFB-UHFFFAOYSA-N 4-methyl-2-pentanol Chemical compound CC(C)CC(C)O WVYWICLMDOOCFB-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- WOFAGNLBCJWEOE-UHFFFAOYSA-N Benzyl acetoacetate Chemical compound CC(=O)CC(=O)OCC1=CC=CC=C1 WOFAGNLBCJWEOE-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- JGLMVXWAHNTPRF-CMDGGOBGSA-N CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O Chemical compound CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O JGLMVXWAHNTPRF-CMDGGOBGSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
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Images
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Abstract
Description
S0:測定面が理想的にフラットであるとした時の面積、|XR−XL|×|YT−YB|、F(X,Y):測定点(X,Y)における高さ、XはX座標、YはY座標、
XLからXR:測定面のX座標の範囲、
YBからYT:測定面のY座標の範囲、
Z0:測定面内の平均の高さ。
アルミニウム−sec−ブトキシド(ASBD、川研ファインケミカル製)24gと、アルミニウム−sec−ブトキシドに対して0.5当量の安定化剤と、2−エチルブタノールとを均一になるまで混合攪拌した。アルミニウム−sec−ブトキシドに対して1.5当量の0.01M希塩酸を2−エチルブタノール/1−エトキシ−2−プロパノールの混合溶媒に溶解してから、前記アルミニウム−sec−ブトキシドの溶液にゆっくり加え、60分間攪拌した。溶媒は最終的に2−エチルブタノールと1−エトキシ−2−プロパノールの混合比が重量比で7/3の混合溶媒になるように調整した。
14.6gのケイ酸エチルに、3.15gの0.01M希塩酸と、29.5gの1−ブタノール/2−プロパノールの1/1(wt.)混合溶媒をゆっくり加えてから、室温で撹拌した、6時間撹拌した後、94.6gの1−ブタノール/2−プロパノールの1/1(wt.)混合溶媒で希釈して中間層溶液1を調製した。
片面だけ研磨され、もう一方の面がスリガラス状の直径約φ30mm、厚さ約1mmの円盤状ガラス基板をアルカリ洗剤中で超音波洗浄した後、オーブン中で乾燥した。
絶対反射率測定装置(USPM−RU、オリンパス製)を用い、波長400nmから700nmの範囲の入射角0°時の反射率測定を行った。測定範囲の反射率の平均値と、比視感度が高い領域である波長530nmから570nmにおける反射率の平均値と、測定範囲の最低反射率を求めた。
X線光電子分光分析装置(アルバック・ファイ製、Quantera SXM)を用い、酸化アルミニウムの突起を有する層を大きさ約φ30mm、厚さ約1mmのL−BAL42円盤状ガラス基板上に形成し、表面から深さ方向分析を行った。測定光源はAl(モノクロメータ)、ビーム径は100μm、スペクトル測定はNarrowモードを選択し、測定元素にはAl、Si、C、O、F、Baを指定した。検出領域は500μm×500μmとした。スパッタはAr+イオンビームを用いて加速電圧2kVでおこなった。
前記の方法で洗浄したL−BAL42(OHARA社製)(nd=1.583)円盤状ガラス基板に酸化アルミニウム前駆体ゾル1を適量滴下し、スピンコートによって反射率を下げるのに適した膜厚になるように塗布を行った後、140℃の熱風循環オーブンで30分加熱処理し、非晶性酸化アルミニウム膜を被膜した。その後、非晶性酸化アルミニウム膜を75℃の温水に浸漬することにより、平板ガラス上に酸化アルミニウムからなる突起を有する層を形成した。
酸化アルミニウム前駆体ゾル1の代わりに酸化アルミニウムゾル2から6を用い、非晶性酸化アルミニウム膜を形成した以外は実施例1と同様の操作を行った。
基材にS−LAL8(OHARA社製)(nd=1.713)円盤状ガラス基板を用い、非晶性酸化アルミニウム膜を形成した以外は実施例1と同様の操作を行った。
基材にS−TIM25(OHARA社製)(nd=1.673)円盤状ガラス基板を用い、非晶性酸化アルミニウム膜を形成した以外は実施例1と同様の操作を行った。
基材にS−TIM3(OHARA社製)(nd=1.613)円盤状ガラス基板を用い、非晶性酸化アルミニウム膜を形成した以外は実施例1と同様の操作を行った。
基材にS−FSL5(OHARA社製)(nd=1.488)円盤状ガラス基板を用い、非晶性酸化アルミニウム膜を形成した以外は実施例1と同様の操作を行った。
酸化アルミニウム前駆体ゾル1の代わりに酸化アルミニウム前駆体ゾル7、9、10を用い、非晶性酸化アルミニウム膜を形成した以外は実施例1と同様の操作を行った。
酸化アルミニウム前駆体ゾル1の代わりに酸化アルミニウム前駆体ゾル8を用い、成膜条件を温度200℃2時間焼成にし、非晶性酸化アルミニウム膜を形成した以外は実施例1と同様の操作を行った。
(注2)*平均反射率2(%)は、光の波長530nmから570nmの範囲の入射角0°時における絶対反射率の平均値を示す。
(注3)*最低反射率(%)は、光の波長400nmから700nmの範囲の入射角0°時における反射率の最低反射率を示す。
(注5)*平均反射率2(%)は、光の波長530nmから570nmの範囲の入射角0°時における絶対反射率の平均値を示す。
(注6)*最低反射率(%)は、光の波長400nmから700nmの範囲の入射角0°時における反射率の最低反射率を示す。
実施例1から6と比較例1から4の平均反射率1、平均反射率2、最低反射率の結果を比較すると、本発明に係る光学用部材はすべての項目において良好な反射率特性を示すことが確認された。特に、比視感度が高い領域である波長530nmから570nmにおける反射率の平均値と、測定範囲の最低反射率の特性に優れていた。
前記の方法で洗浄したL−BAL42(OHARA社製)(nd=1.583)円盤状ガラス基板に中間層溶液1を適量滴下し、スピンコートによって反射率を下げるのに適した膜厚になるように塗布を行った後、200℃の熱風循環オーブンで60分加熱処理し、中間層膜を被膜した。
酸化アルミニウム前駆体ゾル1の代わりに酸化アルミニウム前駆体ゾル3を用い、非晶性酸化アルミニウム膜を形成した以外は実施例11と同様の操作を行った。
酸化アルミニウム前駆体ゾル1の代わりに酸化アルミニウム前駆体ゾル7を用い、非晶性酸化アルミニウム膜を形成した以外は実施例11と同様の操作を行った。
酸化アルミニウム前駆体ゾル1の代わりに酸化アルミニウム前駆体ゾル10を用い、非晶性酸化アルミニウム膜を形成した以外は実施例11と同様の操作を行った。
(注8)*平均反射率2(%)は、光の波長530nmから570nmの範囲の入射角0°時における絶対反射率の平均値を示す。
(注9)*最低反射率(%)は、光の波長400nmから700nmの範囲の入射角0°時における反射率の最低反射率を示す。
実施例11から12と比較例5から6の平均反射率1、平均反射率2、最低反射率の結果を比較すると、本発明に係る光学用部材は低屈折率硝材に対応した中間層と組み合わせることでも良好な反射率特性を示すことが確認された。特に、比視感度が高い領域である530nmから570nmにおける反射率の平均値と、測定範囲の最低反射率の特性に優れていた。
2 酸化アルミニウム前駆体ゾル
3 酸化アルミニウム膜
4 積層体
5 突起
6 支持層
7 積層体
8 突起
9 支持層
10 傾斜方向
11 基材表面の接線
12 酸化アルミニウム以外を主成分とする層
Claims (6)
- 前記突起を支持する支持層のX線分光光度分析(XPS)による深さ方向の分析によりAlとSiが検出され、前記突起を支持する支持層において検出されたAl含有量(A)に対するSiピーク中のSi−C基の含有量(S)の比[(S/A)×100]が0.01%以上10%以下であることを特徴とする請求項1に記載の光学用部材。
- 前記酸化アルミニウムを主成分とする突起の微細構造がナノ構造であって、酸化アルミニウム固有の屈折率より低い見かけの屈折率が積層体の厚さ方向に変化していることを特徴とする請求項1又は2に記載の光学用部材。
- 前記基材の屈折率ndが1.48以上1.71以下であることを特徴とする請求項1乃至3のいずれかの項に記載の光学用部材。
- 光学用部材の製造方法であって、(a)基材の少なくとも一方の面上にアルミニウムアルコキシドまたはアルミニウム塩化合物を加水分解して得られた重縮合物、溶媒及び有機シラン化合物を含有する酸化アルミニウム前駆体ゾルを供給する工程、(b)前記基材を乾燥および/または焼成を行うことにより酸化アルミニウム膜を形成する工程、(c)前記酸化アルミニウム膜を60℃以上100℃以下の温水中に浸漬して、酸化アルミニウムを主成分とする突起および前記突起を支持する、下記一般式(1)で表わされる繰り返し構造を有する酸化アルミニウム膜を形成する工程を有することを特徴とする光学用部材の製造方法。
(式中、R1、R2は炭素数1から10のアルキル基、フッ化アルキル基、フェニル基またはアミノアルキル基を示し、それらの基は置換基を有していても有していなくてもよい。mおよびnは1以上の整数である。) - 前記酸化アルミニウム前駆体ゾルに含まれる有機シラン化合物が、R1−Si(OR3)3(R1は炭素数1から10のアルキル基、フッ化アルキル基、フェニル基またはアミノアルキル基を示し、それらの基は置換基を有していても有していなくてもよい。R3は水素原子、メチル基またはエチル基を表し、それぞれ同一でも異なっていてもよい。)で表わされる化合物であることを特徴とする請求項5に記載の光学用部材の製造方法。
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