JP2014521790A5 - - Google Patents

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Publication number
JP2014521790A5
JP2014521790A5 JP2014523098A JP2014523098A JP2014521790A5 JP 2014521790 A5 JP2014521790 A5 JP 2014521790A5 JP 2014523098 A JP2014523098 A JP 2014523098A JP 2014523098 A JP2014523098 A JP 2014523098A JP 2014521790 A5 JP2014521790 A5 JP 2014521790A5
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JP
Japan
Prior art keywords
block copolymer
block
modified
copolymer
isoprene
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JP2014523098A
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English (en)
Japanese (ja)
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JP6218241B2 (ja
JP2014521790A (ja
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Priority claimed from PCT/US2012/048720 external-priority patent/WO2013019679A1/en
Publication of JP2014521790A publication Critical patent/JP2014521790A/ja
Publication of JP2014521790A5 publication Critical patent/JP2014521790A5/ja
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Publication of JP6218241B2 publication Critical patent/JP6218241B2/ja
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JP2014523098A 2011-07-29 2012-07-27 薄膜の誘導組織化用ブロック共重合体物質を調製する方法並びにブロック共重合体を有する組成物および構造物 Active JP6218241B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161513343P 2011-07-29 2011-07-29
US61/513,343 2011-07-29
PCT/US2012/048720 WO2013019679A1 (en) 2011-07-29 2012-07-27 Block copolymer materials for directed assembly of thin films

Publications (3)

Publication Number Publication Date
JP2014521790A JP2014521790A (ja) 2014-08-28
JP2014521790A5 true JP2014521790A5 (https=) 2015-09-10
JP6218241B2 JP6218241B2 (ja) 2017-10-25

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JP2014523098A Active JP6218241B2 (ja) 2011-07-29 2012-07-27 薄膜の誘導組織化用ブロック共重合体物質を調製する方法並びにブロック共重合体を有する組成物および構造物

Country Status (5)

Country Link
US (1) US9580534B2 (https=)
EP (1) EP2736931A1 (https=)
JP (1) JP6218241B2 (https=)
KR (1) KR101963924B1 (https=)
WO (1) WO2013019679A1 (https=)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7763319B2 (en) 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
JP2014531615A (ja) * 2011-09-06 2014-11-27 コーネル ユニバーシティー ブロックコポリマー及び該ブロックコポリマーを用いたリソグラフィーパターニング
US8821739B2 (en) * 2012-07-12 2014-09-02 Rohm And Haas Electronic Materials Llc High temperature thermal annealing process
US8821738B2 (en) * 2012-07-12 2014-09-02 Rohm And Haas Electronic Materials Llc Thermal annealing process
CN105264642B (zh) 2013-04-03 2018-03-09 布鲁尔科技公司 用于定向自组装的嵌段共聚物中的高度耐蚀刻的聚合物嵌段
FR3014877B1 (fr) 2013-12-17 2017-03-31 Arkema France Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
US9518907B2 (en) * 2014-01-16 2016-12-13 The Boeing Company Methods and apparatus to determine integrity of composite structures
CN106104754B (zh) * 2014-01-16 2020-07-28 布鲁尔科技公司 用于直接自组装的高chi嵌段共聚物
FR3022249B1 (fr) 2014-06-11 2018-01-19 Arkema France Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
TWI618749B (zh) * 2015-03-30 2018-03-21 科騰聚合物美國有限責任公司 可固化透明橡膠組合物，由其製得之固化透明橡膠組合物及其製法
FR3037071B1 (fr) * 2015-06-02 2019-06-21 Arkema France Procede de reduction de la defectivite d'un film de copolymere a blocs
KR102508525B1 (ko) 2015-10-19 2023-03-09 삼성전자주식회사 블록 코폴리머 및 이를 이용한 집적회로 소자의 제조 방법
FR3045643A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3045642A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs
FR3045644A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
CN109153760B (zh) 2016-02-23 2021-10-29 得克萨斯大学体系董事会 用于10nm以下构图的嵌段共聚物
WO2018112121A1 (en) 2016-12-14 2018-06-21 Brewer Science Inc. High-chi block copolymers for directed self-assembly
EP3830645A1 (en) * 2018-07-29 2021-06-09 Yissum Research Development Company of the Hebrew University of Jerusalem Ltd. Multi-morphology block co-polymer films and processes for their preparation
JP2020189930A (ja) 2019-05-22 2020-11-26 東京応化工業株式会社 相分離構造形成用樹脂組成物、相分離構造を含む構造体の製造方法、及びブロックコポリマー
JP7541306B2 (ja) * 2020-01-24 2024-08-28 東京応化工業株式会社 相分離構造形成用樹脂組成物、相分離構造を含む構造体の製造方法、及びブロックコポリマー
KR102788408B1 (ko) * 2022-06-29 2025-03-27 충북대학교 산학협력단 알킬금속을 첨가제로 이용하는 이소프렌의 음이온 중합방법
CN121378558A (zh) * 2025-12-24 2026-01-23 华南理工大学 一种多羟基无规共聚物及其制备方法和应用

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JPS61126105A (ja) * 1984-11-21 1986-06-13 Toyo Soda Mfg Co Ltd 架橋を伴う陽イオン交換基の導入方法
US6576692B1 (en) * 1994-10-06 2003-06-10 Daicel Chemical Industries, Ltd. Epoxidized block copolymer, its production, and its composition
WO1997030095A1 (en) * 1996-02-16 1997-08-21 Daicel Chemical Industries, Ltd. Process for producing epoxidized block copolymer
JPH09328533A (ja) * 1996-04-10 1997-12-22 Daicel Chem Ind Ltd エポキシ化ブロック共重合体及びその製造方法並びに該共重合体を含有する組成物
WO2009151834A2 (en) * 2008-05-08 2009-12-17 The Regents Of The University Of California Supramolecular block copolymer compositions for sub-micron lithography
JP2001055552A (ja) * 1999-08-20 2001-02-27 Daicel Chem Ind Ltd ポリオレフィン用接着剤組成物
JP3686381B2 (ja) * 2001-02-19 2005-08-24 株式会社クラレ エポキシ化重合体の製造方法
JP4707855B2 (ja) * 2001-03-16 2011-06-22 株式会社クラレ エポキシ化重合体の製造方法
JP3942927B2 (ja) * 2001-04-13 2007-07-11 株式会社クラレ エポキシ化重合体の製造方法
JP2003020325A (ja) * 2001-07-06 2003-01-24 Asahi Kasei Corp 半導体チップ用封止材料
JP4673266B2 (ja) * 2006-08-03 2011-04-20 日本電信電話株式会社 パターン形成方法及びモールド
BRPI0912379A2 (pt) 2008-05-06 2015-10-13 Merit Medical Systems Inc dspositivo de compressão de artéria radial
US8398868B2 (en) * 2009-05-19 2013-03-19 International Business Machines Corporation Directed self-assembly of block copolymers using segmented prepatterns

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