KR101963924B1 - 박막의 유도 조립을 위한 블록 공중합체 재료 - Google Patents

박막의 유도 조립을 위한 블록 공중합체 재료 Download PDF

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KR101963924B1
KR101963924B1 KR1020147005407A KR20147005407A KR101963924B1 KR 101963924 B1 KR101963924 B1 KR 101963924B1 KR 1020147005407 A KR1020147005407 A KR 1020147005407A KR 20147005407 A KR20147005407 A KR 20147005407A KR 101963924 B1 KR101963924 B1 KR 101963924B1
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block
block copolymer
copolymer
bcp
blocks
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KR20140061431A (ko
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프랑크 에스. 베이츠
상원 김
폴 프랭클린 니알리
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위스콘신 얼럼나이 리서어치 화운데이션
리전츠 오브 더 유니버시티 오브 미네소타
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/08—Isoprene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/04—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising vinyl aromatic monomers and conjugated dienes
    • C08F297/046—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising vinyl aromatic monomers and conjugated dienes polymerising vinyl aromatic monomers and isoprene, optionally with other conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/08—Epoxidation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • C08C19/04—Oxidation
    • C08C19/06—Epoxidation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/02—Stable Free Radical Polymerisation [SFRP]; Nitroxide Mediated Polymerisation [NMP] for, e.g. using 2,2,6,6-tetramethylpiperidine-1-oxyl [TEMPO]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Graft Or Block Polymers (AREA)
KR1020147005407A 2011-07-29 2012-07-27 박막의 유도 조립을 위한 블록 공중합체 재료 Active KR101963924B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161513343P 2011-07-29 2011-07-29
US61/513,343 2011-07-29
PCT/US2012/048720 WO2013019679A1 (en) 2011-07-29 2012-07-27 Block copolymer materials for directed assembly of thin films

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Publication Number Publication Date
KR20140061431A KR20140061431A (ko) 2014-05-21
KR101963924B1 true KR101963924B1 (ko) 2019-03-29

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US (1) US9580534B2 (https=)
EP (1) EP2736931A1 (https=)
JP (1) JP6218241B2 (https=)
KR (1) KR101963924B1 (https=)
WO (1) WO2013019679A1 (https=)

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US7763319B2 (en) 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
JP2014531615A (ja) * 2011-09-06 2014-11-27 コーネル ユニバーシティー ブロックコポリマー及び該ブロックコポリマーを用いたリソグラフィーパターニング
US8821739B2 (en) * 2012-07-12 2014-09-02 Rohm And Haas Electronic Materials Llc High temperature thermal annealing process
US8821738B2 (en) * 2012-07-12 2014-09-02 Rohm And Haas Electronic Materials Llc Thermal annealing process
CN105264642B (zh) 2013-04-03 2018-03-09 布鲁尔科技公司 用于定向自组装的嵌段共聚物中的高度耐蚀刻的聚合物嵌段
FR3014877B1 (fr) 2013-12-17 2017-03-31 Arkema France Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
US9518907B2 (en) * 2014-01-16 2016-12-13 The Boeing Company Methods and apparatus to determine integrity of composite structures
CN106104754B (zh) * 2014-01-16 2020-07-28 布鲁尔科技公司 用于直接自组装的高chi嵌段共聚物
FR3022249B1 (fr) 2014-06-11 2018-01-19 Arkema France Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
TWI618749B (zh) * 2015-03-30 2018-03-21 科騰聚合物美國有限責任公司 可固化透明橡膠組合物，由其製得之固化透明橡膠組合物及其製法
FR3037071B1 (fr) * 2015-06-02 2019-06-21 Arkema France Procede de reduction de la defectivite d'un film de copolymere a blocs
KR102508525B1 (ko) 2015-10-19 2023-03-09 삼성전자주식회사 블록 코폴리머 및 이를 이용한 집적회로 소자의 제조 방법
FR3045643A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3045642A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs
FR3045644A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
CN109153760B (zh) 2016-02-23 2021-10-29 得克萨斯大学体系董事会 用于10nm以下构图的嵌段共聚物
WO2018112121A1 (en) 2016-12-14 2018-06-21 Brewer Science Inc. High-chi block copolymers for directed self-assembly
EP3830645A1 (en) * 2018-07-29 2021-06-09 Yissum Research Development Company of the Hebrew University of Jerusalem Ltd. Multi-morphology block co-polymer films and processes for their preparation
JP2020189930A (ja) 2019-05-22 2020-11-26 東京応化工業株式会社 相分離構造形成用樹脂組成物、相分離構造を含む構造体の製造方法、及びブロックコポリマー
JP7541306B2 (ja) * 2020-01-24 2024-08-28 東京応化工業株式会社 相分離構造形成用樹脂組成物、相分離構造を含む構造体の製造方法、及びブロックコポリマー
KR102788408B1 (ko) * 2022-06-29 2025-03-27 충북대학교 산학협력단 알킬금속을 첨가제로 이용하는 이소프렌의 음이온 중합방법
CN121378558A (zh) * 2025-12-24 2026-01-23 华南理工大学 一种多羟基无规共聚物及其制备方法和应用

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US20130029113A1 (en) 2013-01-31
KR20140061431A (ko) 2014-05-21
WO2013019679A1 (en) 2013-02-07
JP6218241B2 (ja) 2017-10-25
US9580534B2 (en) 2017-02-28
EP2736931A1 (en) 2014-06-04
JP2014521790A (ja) 2014-08-28

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