JP2014500358A - イソインジゴユニットを含有する共役ポリマー、その作製方法、及び、その使用方法 - Google Patents
イソインジゴユニットを含有する共役ポリマー、その作製方法、及び、その使用方法 Download PDFInfo
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- JP2014500358A JP2014500358A JP2013540206A JP2013540206A JP2014500358A JP 2014500358 A JP2014500358 A JP 2014500358A JP 2013540206 A JP2013540206 A JP 2013540206A JP 2013540206 A JP2013540206 A JP 2013540206A JP 2014500358 A JP2014500358 A JP 2014500358A
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- conjugated polymer
- compound
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- formula
- isoindigo
- Prior art date
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- 229920000547 conjugated polymer Polymers 0.000 title claims abstract description 74
- MLCPSWPIYHDOKG-BUHFOSPRSA-N (3e)-3-(2-oxo-1h-indol-3-ylidene)-1h-indol-2-one Chemical group O=C\1NC2=CC=CC=C2C/1=C1/C2=CC=CC=C2NC1=O MLCPSWPIYHDOKG-BUHFOSPRSA-N 0.000 title claims abstract description 51
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 238000006243 chemical reaction Methods 0.000 claims abstract description 30
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 13
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 claims abstract 2
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 68
- 150000001875 compounds Chemical class 0.000 claims description 41
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 36
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 36
- YMWUJEATGCHHMB-UHFFFAOYSA-N dichloromethane Substances ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 26
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 24
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 22
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 22
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 21
- 239000000243 solution Substances 0.000 claims description 21
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 229940126062 Compound A Drugs 0.000 claims description 11
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 125000006539 C12 alkyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 10
- 230000005669 field effect Effects 0.000 claims description 10
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 claims description 10
- 239000003446 ligand Substances 0.000 claims description 9
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 9
- 239000003054 catalyst Substances 0.000 claims description 7
- 238000007341 Heck reaction Methods 0.000 claims description 6
- 239000011259 mixed solution Substances 0.000 claims description 6
- 239000002244 precipitate Substances 0.000 claims description 6
- JNGZXGGOCLZBFB-IVCQMTBJSA-N compound E Chemical compound N([C@@H](C)C(=O)N[C@@H]1C(N(C)C2=CC=CC=C2C(C=2C=CC=CC=2)=N1)=O)C(=O)CC1=CC(F)=CC(F)=C1 JNGZXGGOCLZBFB-IVCQMTBJSA-N 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 5
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 claims description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 5
- 150000001347 alkyl bromides Chemical class 0.000 claims description 4
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 claims description 4
- 238000001914 filtration Methods 0.000 claims description 3
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical group [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 claims description 3
- 238000005401 electroluminescence Methods 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 abstract description 5
- 238000004770 highest occupied molecular orbital Methods 0.000 abstract description 5
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 50
- 229910052757 nitrogen Inorganic materials 0.000 description 34
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 0 CC=Cc(cc1)ccc1N(c1ccc(*)cc1)c1ccc(C=CC)cc1 Chemical compound CC=Cc(cc1)ccc1N(c1ccc(*)cc1)c1ccc(C=CC)cc1 0.000 description 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- 238000002360 preparation method Methods 0.000 description 14
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 12
- 210000003097 mucus Anatomy 0.000 description 10
- -1 2-ethylhexyl Chemical group 0.000 description 9
- 239000003480 eluent Substances 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 8
- 238000010898 silica gel chromatography Methods 0.000 description 8
- 239000003208 petroleum Substances 0.000 description 7
- 229910000104 sodium hydride Inorganic materials 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- CFERYHPYXAAGEV-UHFFFAOYSA-N 10-octylphenothiazine Chemical compound C1=CC=C2N(CCCCCCCC)C3=CC=CC=C3SC2=C1 CFERYHPYXAAGEV-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 239000012074 organic phase Substances 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 4
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 4
- 239000005457 ice water Substances 0.000 description 4
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 4
- 229950000688 phenothiazine Drugs 0.000 description 4
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000012312 sodium hydride Substances 0.000 description 4
- SCDJSEFDVDOKPA-UHFFFAOYSA-N 9-octylcarbazole Chemical compound C1=CC=C2N(CCCCCCCC)C3=CC=CC=C3C2=C1 SCDJSEFDVDOKPA-UHFFFAOYSA-N 0.000 description 3
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 229920000144 PEDOT:PSS Polymers 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 3
- LSEFCHWGJNHZNT-UHFFFAOYSA-M methyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(C)C1=CC=CC=C1 LSEFCHWGJNHZNT-UHFFFAOYSA-M 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 2
- UHLJGAAELQAWQO-UHFFFAOYSA-N 4-ethenyl-n-(4-ethenylphenyl)-n-(4-octoxyphenyl)aniline Chemical compound C1=CC(OCCCCCCCC)=CC=C1N(C=1C=CC(C=C)=CC=1)C1=CC=C(C=C)C=C1 UHLJGAAELQAWQO-UHFFFAOYSA-N 0.000 description 2
- HVPQMLZLINVIHW-UHFFFAOYSA-N 6-bromo-1h-indole-2,3-dione Chemical compound BrC1=CC=C2C(=O)C(=O)NC2=C1 HVPQMLZLINVIHW-UHFFFAOYSA-N 0.000 description 2
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- JARRYVQFBQVOBE-UHFFFAOYSA-N O=C(C1)Nc2c1ccc(Br)c2 Chemical compound O=C(C1)Nc2c1ccc(Br)c2 JARRYVQFBQVOBE-UHFFFAOYSA-N 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 2
- 229960000583 acetic acid Drugs 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229940126214 compound 3 Drugs 0.000 description 2
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000012362 glacial acetic acid Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000000075 oxide glass Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- VMKOFRJSULQZRM-UHFFFAOYSA-N 1-bromooctane Chemical compound CCCCCCCCBr VMKOFRJSULQZRM-UHFFFAOYSA-N 0.000 description 1
- NKHUXLDXYURVLX-UHFFFAOYSA-N 2h-pyrrolo[3,4-c]pyrrole-4,6-dione Chemical compound N1C=C2C(=O)NC(=O)C2=C1 NKHUXLDXYURVLX-UHFFFAOYSA-N 0.000 description 1
- NZWIYPLSXWYKLH-UHFFFAOYSA-N 3-(bromomethyl)heptane Chemical compound CCCCC(CC)CBr NZWIYPLSXWYKLH-UHFFFAOYSA-N 0.000 description 1
- MCSXGCZMEPXKIW-UHFFFAOYSA-N 3-hydroxy-4-[(4-methyl-2-nitrophenyl)diazenyl]-N-(3-nitrophenyl)naphthalene-2-carboxamide Chemical compound Cc1ccc(N=Nc2c(O)c(cc3ccccc23)C(=O)Nc2cccc(c2)[N+]([O-])=O)c(c1)[N+]([O-])=O MCSXGCZMEPXKIW-UHFFFAOYSA-N 0.000 description 1
- IEBJWEMCPNDIHA-UHFFFAOYSA-N 4-(4-formyl-n-(4-octoxyphenyl)anilino)benzaldehyde Chemical compound C1=CC(OCCCCCCCC)=CC=C1N(C=1C=CC(C=O)=CC=1)C1=CC=C(C=O)C=C1 IEBJWEMCPNDIHA-UHFFFAOYSA-N 0.000 description 1
- VCVQPPYJWHKCFR-UHFFFAOYSA-N 4-octoxy-n,n-diphenylaniline Chemical compound C1=CC(OCCCCCCCC)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 VCVQPPYJWHKCFR-UHFFFAOYSA-N 0.000 description 1
- JVOSZWHAJJCTCR-UHFFFAOYSA-N 6-bromoindol-2-one Chemical compound C1=C(Br)C=CC2=CC(=O)N=C21 JVOSZWHAJJCTCR-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- HUEXOUHCCSVYLP-QVIHXGFCSA-N CCCCC(CC)CN(c1cc(Br)ccc1/C1=C(/c(ccc(Br)c2)c2N2CC(CC)CCCC)\C2=O)C1=O Chemical compound CCCCC(CC)CN(c1cc(Br)ccc1/C1=C(/c(ccc(Br)c2)c2N2CC(CC)CCCC)\C2=O)C1=O HUEXOUHCCSVYLP-QVIHXGFCSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- JGFBQFKZKSSODQ-UHFFFAOYSA-N Isothiocyanatocyclopropane Chemical compound S=C=NC1CC1 JGFBQFKZKSSODQ-UHFFFAOYSA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- PWLNAUNEAKQYLH-UHFFFAOYSA-N butyric acid octyl ester Natural products CCCCCCCCOC(=O)CCC PWLNAUNEAKQYLH-UHFFFAOYSA-N 0.000 description 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- AQEFLFZSWDEAIP-UHFFFAOYSA-N di-tert-butyl ether Chemical compound CC(C)(C)OC(C)(C)C AQEFLFZSWDEAIP-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- UUIQMZJEGPQKFD-UHFFFAOYSA-N n-butyric acid methyl ester Natural products CCCC(=O)OC UUIQMZJEGPQKFD-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 150000004040 pyrrolidinones Chemical class 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 238000002390 rotary evaporation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
-
- C—CHEMISTRY; METALLURGY
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Abstract
イソインジゴを含有する共役ポリマーユニットが開示される。
【解決手段】
Arの構造式は、式II、式IIIまたは式IVである。R1は、C8〜C20のアルキル基であり、R2は、C1〜C12のアルキル基であり、nは2−50の整数である。このイソインジゴを含有する共役ポリマーユニットは、良好な溶解性と皮膜形成特性を有し、さらに、高い耐熱性も有する。HOMOエネルギーレベルとLUMOエネルギーレベルは効果的に調整され、吸収域は広くなり、エネルギー変換効率は大いに向上する。また、イソインジゴユニットの作製方法と、関連分におけるその使用方法も提供される。
Description
Ar対応化合物を作製する。
イソインジゴユニットを含有する共役ポリマーの作製。
共役ポリマーPの精製。
Claims (10)
- イソインジゴユニットを含有する共役ポリマーの作製方法であって、
以下の式38で示される化合物Aと、式39で示される内から一つ選択されるAr対応化合物を作製し、
嫌気性環境で、有機パラジウムと有機ホスフィンリガンドの混合物を触媒として利用し、有機パラジウムと有機ホスフィンリガンドのモル比を1:2〜1:20とし、化合物AとAr対応化合物を有機溶媒中で混合してHeck反応を進行させ、以下の式40の構造式で表されるイソインジゴユニットを含有する共役ポリマーユニットPを得ることとし、
R2は、C1〜C12のアルキル基であり、
nは2〜50までの整数であり、
反応式は、以下の式42の通りとするイソインジゴユニットを含有する共役ポリマーの作製方法。
- 前記有機溶媒は,N,N−ジメチルホルムアミドとトリエチルアミンの混合物であり、
前記有機パラジウムは酢酸パラジウムであり、前記有機ホスフィン配位子は、P(o−Tol)3であることを特徴とする請求項2に記載のイソインジゴユニットを含有する共役ポリマーの作製方法。 - Heck反応の条件は、90℃から110℃までの温度において、48〜72時間の反応とする、ことを特徴とする請求項2に記載のイソインジゴユニットを含有する共役ポリマーの作製方法。
- イソインジゴユニットを含有する共役ポリマーの作製方法であって、化合物Aが、
以下の式43の各構造式で示される化合物Dと化合物Eを作製するステップと、
ここで、Br−R1はアルキル臭化物であり、
R1は、C8〜C20のアルキル基であり、
反応式は、以下の式45の通りとする、
ことを特徴とする請求項2に記載のイソインジゴユニットを含有する共役ポリマーの作製方法。
- イソインジゴユニットを含有する共役ポリマーの作製方法であって、
Ar対応化合物が、
以下の式46で示される3つのうちから一つが選択される化合物Bを作製するステップと、
氷浴条件において、N,N−ジメチルホルムアミドにPOCl3を加えて混合系を形成し、化合物Bの1,2−ジクロロメタン溶液を混合系に加えることで、以下の式47で示される3つの内の一つである化合物Cを得るステップと、
により作製される、
ことを特徴とする請求項2に記載のイソインジゴユニットを含有する共役ポリマーの作製方法。 - 共役ポリマーPを精製するステップであって、共役ポリマーPを沈殿させるためにメタノール溶液に加え、沈殿物を濾過して収集するステップと、メタノールとヘキサンで沈殿物を洗浄し、クロロホルムに溶解させるステップと、旋回蒸発によりクロロホルム溶液を集め、精製された共役ポリマーPを得るステップと、を含む共役ポリマーを精製するステップをさらに含む、
ことを特徴とする請求項2に記載のイソインジゴユニットを含有する共役ポリマーの作製方法。 - 有機太陽電池デバイスであって、基板と、基質の表面に蒸着される導電層と、導電層にコーティングされた活動層と、活性層の上に配置された金属アルミニウム陰極層と、を有し、
電子供与体の材料が、請求項1に記載の前記共役ポリマーPで構成される、ことを特徴とする有機太陽電池デバイス。 - 有機エレクトロルミネッセンスデバイスであって、基板と、基質の表面に蒸着される導電層と、導電層にコーティングされた発光層と、発光層に蒸着されたバッファ層と、バッファ層の上に配置された金属アルミニウム陰極層と、を有し、
発光層の材料が、請求項1に記載の前記共役ポリマーPで構成される、ことを特徴とする有機エレクトロルミネッセンスデバイス。 - 有機電界効果トランジスタであって、絶縁層と、有機半導体層と、有機半導体層上に互いに離間して配置されるソース電極とドレイン電極と、を順に積層してなる構造を含み、
有機半導体層の材料が、請求項1に記載の前記共役ポリマーPで構成される、ことを特徴とする有機電界効果トランジスタ。
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Cited By (4)
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JP2017512855A (ja) * | 2014-03-17 | 2017-05-25 | メルク パテント ゲーエムベーハー | 有機半導体化合物 |
US10367143B2 (en) | 2014-03-17 | 2019-07-30 | Merck Patent Gmbh | Organic semiconducting compounds |
KR20170106991A (ko) * | 2015-01-16 | 2017-09-22 | 바스프 에스이 | 벤조티에노티오펜 이소인디고 중합체 |
KR102410745B1 (ko) | 2015-01-16 | 2022-06-20 | 주식회사 클랩 | 벤조티에노티오펜 이소인디고 중합체 |
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CN103154057A (zh) | 2013-06-12 |
US8889825B2 (en) | 2014-11-18 |
CN103154057B (zh) | 2015-04-01 |
WO2012068733A1 (zh) | 2012-05-31 |
EP2644629A1 (en) | 2013-10-02 |
JP5560379B2 (ja) | 2014-07-23 |
EP2644629B1 (en) | 2018-11-07 |
US20130220415A1 (en) | 2013-08-29 |
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