JP2014166942A - 圧電材料、圧電素子、および電子機器 - Google Patents
圧電材料、圧電素子、および電子機器 Download PDFInfo
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- JP2014166942A JP2014166942A JP2014013648A JP2014013648A JP2014166942A JP 2014166942 A JP2014166942 A JP 2014166942A JP 2014013648 A JP2014013648 A JP 2014013648A JP 2014013648 A JP2014013648 A JP 2014013648A JP 2014166942 A JP2014166942 A JP 2014166942A
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- piezoelectric
- piezoelectric element
- piezoelectric material
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/495—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on vanadium, niobium, tantalum, molybdenum or tungsten oxides or solid solutions thereof with other oxides, e.g. vanadates, niobates, tantalates, molybdates or tungstates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B41J2/14—Structure thereof only for on-demand ink jet heads
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- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
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- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/04—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
- G02B7/09—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification adapted for automatic focusing or varying magnification
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/0005—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing non-specific motion; Details common to machines covered by H02N2/02 - H02N2/16
- H02N2/001—Driving devices, e.g. vibrators
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/10—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing rotary motion, e.g. rotary motors
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/10—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing rotary motion, e.g. rotary motors
- H02N2/16—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing rotary motion, e.g. rotary motors using travelling waves, i.e. Rayleigh surface waves
- H02N2/163—Motors with ring stator
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- H—ELECTRICITY
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- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/80—Camera processing pipelines; Components thereof
- H04N23/81—Camera processing pipelines; Components thereof for suppressing or minimising disturbance in the image signal generation
- H04N23/811—Camera processing pipelines; Components thereof for suppressing or minimising disturbance in the image signal generation by dust removal, e.g. from surfaces of the image sensor or processing of the image signal output by the electronic image sensor
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/09—Forming piezoelectric or electrostrictive materials
- H10N30/093—Forming inorganic materials
- H10N30/097—Forming inorganic materials by sintering
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/50—Piezoelectric or electrostrictive devices having a stacked or multilayer structure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8542—Alkali metal based oxides, e.g. lithium, sodium or potassium niobates
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/87—Electrodes or interconnections, e.g. leads or terminals
- H10N30/871—Single-layered electrodes of multilayer piezoelectric or electrostrictive devices, e.g. internal electrodes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/03—Specific materials used
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3201—Alkali metal oxides or oxide-forming salts thereof
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Abstract
【解決手段】 一般式(1):(NaxBa1−y)(NbyTi1−y)O3(式中、xは0.80≦x≦0.95、yは0.85≦y≦0.95を示す。)で表されるペロブスカイト型金属酸化物と、La、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、YbおよびLuから選ばれる少なくとも1種の希土類元素とを含有する圧電材料であって、前記希土類元素の含有量が前記ペロブスカイト型金属酸化物1molに対して0mol%以上5mol%以下(但し、0mol%は除く)である圧電材料およびそれを用いた圧電素子。
【選択図】 図1
Description
(NaxBa1−y)(NbyTi1−y)O3 (1)
(式中、xは0.80≦x≦0.95、yは0.85≦y≦0.95を示す。)
で表されるペロブスカイト型金属酸化物と、La、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、YbおよびLuから選ばれる少なくとも1種の希土類元素とを含有する圧電材料であって、前記希土類元素の含有量が前記ペロブスカイト型金属酸化物1molに対して0mol%以上5mol%以下(但し、0mol%は除く)であることを特徴とする。
(NaxBa1−y)(NbyTi1−y)O3 (1)
(式中、xは0.80≦x≦0.95、yは0.85≦y≦0.95を示す。)
で表されるペロブスカイト型金属酸化物と、La、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、YbおよびLuから選ばれる少なくとも1種の希土類元素とを含有する圧電材料であって、前記希土類元素の含有量が前記ペロブスカイト型金属酸化物1molに対して0mol%以上5mol%以下(但し、0mol%は除く)であることを特徴とする。
以下に本発明の圧電材料を用いた圧電素子について説明する。
次に、本発明の圧電材料を用いた積層圧電素子について説明する。
本発明に係る液体吐出ヘッドは、前記圧電素子または前記積層圧電素子を配した振動部を備えた液室と、前記液室と連通する吐出口を少なくとも有することを特徴とする。本発明の液体吐出ヘッドによって吐出する液体は流動体であれば特に限定されず、水、インク、燃料などの水系液体や非水系液体を吐出することができる。
次に、本発明の液体吐出装置について説明する。本発明の液体吐出装置は、被転写体の載置部と前記液体吐出ヘッドを備えたものである。
本発明に係る超音波モータは、前記圧電素子または前記積層圧電素子を配した振動体と、前記振動体と接触する移動体とを少なくとも有することを特徴とする。
次に、本発明の光学機器について説明する。本発明の光学機器は、駆動部に前記超音波モータを備えたことを特徴とする。
粒子、粉体、液滴の搬送、除去等で利用される振動装置は、電子機器等で広く使用されている。
次に、本発明の撮像装置について説明する。本発明の撮像装置は、前記塵埃除去装置と撮像素子ユニットとを少なくとも有する撮像装置であって、前記塵埃除去装置の振動板を前記撮像素子ユニットの受光面側に設けたことを特徴とする。図12および図13は本発明の撮像装置の好適な実施形態の一例であるデジタル一眼レフカメラを示す図である。
次に、本発明の電子機器について説明する。本発明の電子機器は、前記圧電素子または前記積層圧電素子を備えた圧電音響部品を配したことを特徴とする。圧電音響部品にはスピーカ、ブザー、マイク、表面弾性波(SAW)素子が含まれる。
表1には、本発明の実施例1から42の圧電材料と比較例1から9の焼結体の組成を示す。
実施例1から42を比較例1から9のサンプルと比較する。
実施例1に相当する原料を以下に述べる要領で秤量した。
ニオブ酸ナトリウム(NaNbO3)、チタン酸バリウム(BaTiO3)、酸化ランタン(La2O3)、および酸化銅(Cu(II)O)粉末を、Na、Nb、Ba、Ti、LaおよびCuが表1の実施例2記載の組成になるよう秤量した。秤量した原料粉末をボールミルで一晩混合し、1000℃から1100℃で仮焼して仮焼物を得た。
実施例14の圧電素子を用いて、図3に示される液体吐出ヘッドを作製した。入力した電気信号に追随したインクの吐出が確認された。
実施例45の液体吐出ヘッドを用いて、図4に示される液体吐出装置を作製した。入力した電気信号に追随したインクの吐出、付着が記録媒体上に確認された。
実施例14の圧電素子を用いて、図6(a)に示される超音波モータを作製した。交番電圧の印加に応じたモータの回転が確認された。
実施例47の超音波モータを用いて、図7に示される光学機器を作製した。交番電圧の印加に応じたオートフォーカス動作が確認された。
実施例14の圧電素子を用いて、図9に示される塵埃除去装置を作製した。プラスチック製ビーズを散布し、交番電圧を印加したところ、良好な塵埃除去率を示すことが確認された。
実施例49の塵埃除去装置を用いて、図12に示される撮像装置を作製した。動作させたところ、撮像ユニットの表面の塵を良好に除去し、塵欠陥の無い画像が得られた。
実施例43、44の積層圧電素子を用いて、図3に示される液体吐出ヘッドを作製した。入力した電気信号に追随したインクの吐出が確認された。
実施例51の液体吐出ヘッドを用いて、図4に示される液体吐出装置を作製した。入力した電気信号に追随したインクの吐出、付着が記録媒体上に確認された。
実施例43、44の積層圧電素子を用いて、図6(b)に示される超音波モータを作製した。交番電圧の印加に応じたモータの回転が確認された。
実施例53の超音波モータを用いて、図7に示される光学機器を作製した。交番電圧の印加に応じたオートフォーカス動作が確認された。
実施例43、44の積層圧電素子を用いて、図9に示される塵埃除去装置を作製した。プラスチック製ビーズを散布し、交番電圧を印加したところ、良好な塵埃除去率を示すことが確認された。
実施例55の塵埃除去装置を用いて、図12に示される撮像装置を作製した。動作させたところ、撮像ユニットの表面の塵を良好に除去し、塵欠陥の無い画像が得られた。
実施例43、44の積層圧電素子を用いて、図14に示される電子機器を作製した。交番電圧の印加に応じたスピーカ動作が確認された。
2 圧電材料部
3 第二の電極
101 圧電素子
102 個別液室
103 振動板
104 液室隔壁
105 吐出口
106 連通孔
107 共通液室
108 バッファ層
1011 第一の電極
1012 圧電材料
1013 第二の電極
201 振動子
202 ロータ
203 出力軸
204 振動子
205 ロータ
206 バネ
2011 弾性体リング
2012 圧電素子
2013 有機系接着剤
2041 金属弾性体
2042 積層圧電素子
310 塵埃除去装置
330 圧電素子
320 振動板
330 圧電素子
331 圧電材料
332 第1の電極
333 第2の電極
336 第1の電極面
337 第2の電極面
51 第一の電極
53 第二の電極
54 圧電材料層
55 内部電極
56 積層体
501 第一の電極
503 第二の電極
504 圧電材料層
505a 内部電極
505b 内部電極
506a 外部電極
506b 外部電極
601 カメラ本体
602 マウント部
605 ミラーボックス
606 メインミラー
200 シャッタユニット
300 本体シャーシ
400 撮像ユニット
701 前群レンズ
702 後群レンズ(フォーカスレンズ)
711 着脱マウント
712 固定筒
713 直進案内筒
714 前群鏡筒
715 カム環
716 後群鏡筒
717 カムローラ
718 軸ビス
719 ローラ
720 回転伝達環
722 コロ
724 マニュアルフォーカス環
725 超音波モータ
726 波ワッシャ
727 ボールレース
728 フォーカスキー
729 接合部材
732 ワッシャ
733 低摩擦シート
881 液体吐出装置
882 外装
883 外装
884 外装
885 外装
887 外装
890 回復部
891 記録部
892 キャリッジ
896 装置本体
897 自動給送部
898 排出口
899 搬送部
901 光学装置
908 レリーズボタン
909 ストロボ発光部
912 スピーカ
914 マイク
916 補助光部
931 本体
932 ズームレバー
933 電源ボタン
Claims (15)
- 下記一般式(1)
(NaxBa1−y)(NbyTi1−y)O3 (1)
(式中、xは0.80≦x≦0.95、yは0.85≦y≦0.95を示す。)
で表されるペロブスカイト型金属酸化物と、La、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、YbおよびLuから選ばれる少なくとも1種の希土類元素とを含有する圧電材料であって、前記希土類元素の含有量が前記ペロブスカイト型金属酸化物1molに対して0mol%以上5mol%以下(但し、0mol%は除く)であることを特徴とする圧電材料。 - 前記圧電材料は、前記ペロブスカイト型金属酸化物と、前記希土類元素と、Cuとを含有し、前記Cuの含有量が前記ペロブスカイト型金属酸化物1molに対して2mol%以下(但し、0mol%は除く)であることを特徴とする請求項1に記載の圧電材料。
- 前記一般式(1)において、x<yであることを特徴とする請求項1または2に記載の圧電材料。
- 第一の電極、圧電材料部および第二の電極を少なくとも有する圧電素子であって、前記圧電材料部を構成する圧電材料が請求項1乃至3のいずれかに記載の圧電材料であることを特徴とする圧電素子。
- 複数の圧電材料層と、内部電極を含む複数の電極層とが交互に積層された積層圧電素子であって、前記圧電材料層が請求項1乃至3のいずれかに記載の圧電材料よりなることを特徴とする積層圧電素子。
- 前記内部電極がAgとPdを含み、前記Agの含有重量M1と前記Pdの含有重量M2との重量比M1/M2が1.5≦M1/M2≦9.0であることを特徴とする請求項5に記載の積層圧電素子。
- 前記内部電極がNiおよびCuの少なくともいずれか1種を含むことを特徴とする請求項5に記載の積層圧電素子。
- 請求項4に記載の圧電素子または請求項5乃至7のいずれかに記載の積層圧電素子を配した振動部を備えた液室と、前記液室と連通する吐出口を少なくとも有することを特徴とする液体吐出ヘッド。
- 被転写体の載置部と、請求項8に記載の液体吐出ヘッドを備えたことを特徴とする液体吐出装置。
- 請求項4に記載の圧電素子または請求項5乃至7のいずれかに記載の積層圧電素子を配した振動体と、前記振動体と接触する移動体とを少なくとも有することを特徴とする超音波モータ。
- 駆動部に請求項10に記載の超音波モータを備えたことを特徴とする光学機器。
- 請求項4に記載の圧電素子または請求項5乃至7のいずれかに記載の積層圧電素子を振動板に配した振動体を有することを特徴とする振動装置。
- 請求項12に記載の振動装置を振動部に備えたことを特徴とする塵埃除去装置。
- 請求項13に記載の塵埃除去装置と撮像素子ユニットとを少なくとも有する撮像装置であって、前記塵埃除去装置の振動板を前記撮像素子ユニットの受光面側に設けたことを特徴とする撮像装置。
- 請求項4に記載の圧電素子または請求項5乃至7のいずれかに記載の積層圧電素子を備えた圧電音響部品を配したことを特徴とする電子機器。
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EP (1) | EP2946417B1 (ja) |
JP (1) | JP6366284B2 (ja) |
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EP2867929B1 (en) * | 2012-08-27 | 2016-11-30 | Canon Kabushiki Kaisha | Piezoelectric material |
EP2873103B1 (en) * | 2012-08-27 | 2020-10-28 | Canon Kabushiki Kaisha | Piezoelectric material and piezoelectric element using the same, and electronic apparatus using the piezoelectronic element |
EP2936576B1 (en) * | 2012-12-21 | 2017-03-15 | Canon Kabushiki Kaisha | Vibration wave driving device, image pickup device, optical apparatus, liquid discharge device, and electronic apparatus |
JPWO2017018222A1 (ja) * | 2015-07-24 | 2018-06-07 | 株式会社ユーテック | 圧電体膜及びその製造方法、バイモルフ素子、圧電体素子及びその製造方法 |
KR101792381B1 (ko) * | 2016-01-04 | 2017-11-01 | 삼성전기주식회사 | 전자부품 및 그 제조방법 |
JP2017179416A (ja) * | 2016-03-29 | 2017-10-05 | Tdk株式会社 | 圧電磁器スパッタリングターゲット、非鉛圧電薄膜およびそれを用いた圧電薄膜素子 |
USD857020S1 (en) * | 2016-05-25 | 2019-08-20 | Tdk Corporation | Piezoelectric element |
JP1565481S (ja) * | 2016-05-25 | 2016-12-19 | ||
US10069061B2 (en) * | 2016-06-02 | 2018-09-04 | eLux Inc. | Fabrication and harvest of piezoelectric plates |
JP6772728B2 (ja) * | 2016-09-29 | 2020-10-21 | Tdk株式会社 | 圧電素子 |
JP7057941B2 (ja) * | 2017-08-04 | 2022-04-21 | キヤノン株式会社 | 圧電材料、圧電素子、および電子機器 |
US11988640B2 (en) * | 2020-03-11 | 2024-05-21 | Bfly Operations, Inc. | Bottom electrode material stack for micromachined ultrasonic transducer devices |
JP2022117116A (ja) * | 2021-01-29 | 2022-08-10 | 株式会社ディスコ | 剥離装置 |
CN114907847B (zh) * | 2022-05-18 | 2023-01-03 | 五邑大学 | 一种荧光测温材料及其制备方法和应用 |
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TW201434789A (zh) | 2014-09-16 |
US20180222802A1 (en) | 2018-08-09 |
US9932273B2 (en) | 2018-04-03 |
EP2946417A1 (en) | 2015-11-25 |
EP2946417B1 (en) | 2017-06-07 |
US20150368162A1 (en) | 2015-12-24 |
JP6366284B2 (ja) | 2018-08-01 |
WO2014119703A1 (en) | 2014-08-07 |
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