JP2014156585A - 光硬化性組成物 - Google Patents

光硬化性組成物 Download PDF

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Publication number
JP2014156585A
JP2014156585A JP2013248292A JP2013248292A JP2014156585A JP 2014156585 A JP2014156585 A JP 2014156585A JP 2013248292 A JP2013248292 A JP 2013248292A JP 2013248292 A JP2013248292 A JP 2013248292A JP 2014156585 A JP2014156585 A JP 2014156585A
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JP
Japan
Prior art keywords
meth
group
photocurable composition
acrylate
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013248292A
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English (en)
Japanese (ja)
Inventor
Hiroshi Yamaya
宏士 山家
Naomi Okamura
直実 岡村
Atsushi Saito
敦 齋藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cemedine Co Ltd
Original Assignee
Cemedine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cemedine Co Ltd filed Critical Cemedine Co Ltd
Priority to JP2013248292A priority Critical patent/JP2014156585A/ja
Priority to KR1020130161193A priority patent/KR20140092748A/ko
Priority to CN201410008630.3A priority patent/CN103926795A/zh
Publication of JP2014156585A publication Critical patent/JP2014156585A/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Sealing Material Composition (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
JP2013248292A 2013-01-16 2013-11-29 光硬化性組成物 Pending JP2014156585A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013248292A JP2014156585A (ja) 2013-01-16 2013-11-29 光硬化性組成物
KR1020130161193A KR20140092748A (ko) 2013-01-16 2013-12-23 광경화성 조성물
CN201410008630.3A CN103926795A (zh) 2013-01-16 2014-01-08 光固化性组合物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013005467 2013-01-16
JP2013005467 2013-01-16
JP2013248292A JP2014156585A (ja) 2013-01-16 2013-11-29 光硬化性組成物

Publications (1)

Publication Number Publication Date
JP2014156585A true JP2014156585A (ja) 2014-08-28

Family

ID=51577662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013248292A Pending JP2014156585A (ja) 2013-01-16 2013-11-29 光硬化性組成物

Country Status (2)

Country Link
JP (1) JP2014156585A (ko)
KR (1) KR20140092748A (ko)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015120880A (ja) * 2013-11-19 2015-07-02 Jsr株式会社 電子デバイス、有機ｅｌ素子および液晶表示素子
WO2016063978A1 (ja) * 2014-10-24 2016-04-28 セメダイン株式会社 光硬化性組成物
WO2016163353A1 (ja) * 2015-04-09 2016-10-13 積水化学工業株式会社 光湿気硬化型樹脂組成物、電子部品用接着剤、及び、表示素子用接着剤
WO2017018459A1 (ja) * 2015-07-29 2017-02-02 日立化成株式会社 接着剤組成物、硬化物、半導体装置及びその製造方法
JP2017125007A (ja) * 2015-12-31 2017-07-20 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 光酸発生剤
JP2020147698A (ja) * 2019-03-14 2020-09-17 セメダイン株式会社 光硬化性粘着剤組成物
EP4012000A1 (en) 2020-12-11 2022-06-15 Bostik SA Photocurable adhesive composition
US11550217B2 (en) 2015-12-31 2023-01-10 Rohm And Haas Electronic Materials Llc Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device
WO2023127551A1 (ja) * 2021-12-28 2023-07-06 東洋紡株式会社 硬化性樹脂組成物及びホットメルト接着剤
WO2024090459A1 (ja) * 2022-10-27 2024-05-02 積水フーラー株式会社 光硬化性樹脂組成物及び光学用接着剤

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102554567B1 (ko) * 2017-01-18 2023-07-11 동우 화인켐 주식회사 광경화성 조성물 및 이로부터 형성된 광경화 막
EP3839629A1 (en) * 2019-12-18 2021-06-23 Essilor International Radiation curable coating composition, method for coating substrate, and substrate having cured composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008041768A1 (fr) * 2006-10-05 2008-04-10 Kaneka Corporation Composition durcissable
JP2012136685A (ja) * 2010-12-09 2012-07-19 Kaneka Corp （メタ）アクリル系重合体を含有する硬化性組成物
US20120270961A1 (en) * 2009-10-30 2012-10-25 Kaneka Corporation Curable composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008041768A1 (fr) * 2006-10-05 2008-04-10 Kaneka Corporation Composition durcissable
US20120270961A1 (en) * 2009-10-30 2012-10-25 Kaneka Corporation Curable composition
JP2012136685A (ja) * 2010-12-09 2012-07-19 Kaneka Corp （メタ）アクリル系重合体を含有する硬化性組成物

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015120880A (ja) * 2013-11-19 2015-07-02 Jsr株式会社 電子デバイス、有機ｅｌ素子および液晶表示素子
WO2016063978A1 (ja) * 2014-10-24 2016-04-28 セメダイン株式会社 光硬化性組成物
JPWO2016063978A1 (ja) * 2014-10-24 2017-08-10 セメダイン株式会社 光硬化性組成物
TWI720976B (zh) * 2015-04-09 2021-03-11 日商積水化學工業股份有限公司 光與濕氣硬化型樹脂組成物、電子零件用接著劑、及顯示元件用接著劑
WO2016163353A1 (ja) * 2015-04-09 2016-10-13 積水化学工業株式会社 光湿気硬化型樹脂組成物、電子部品用接着剤、及び、表示素子用接着剤
JPWO2016163353A1 (ja) * 2015-04-09 2018-02-01 積水化学工業株式会社 光湿気硬化型樹脂組成物、電子部品用接着剤、及び、表示素子用接着剤
WO2017018459A1 (ja) * 2015-07-29 2017-02-02 日立化成株式会社 接着剤組成物、硬化物、半導体装置及びその製造方法
JPWO2017018459A1 (ja) * 2015-07-29 2018-06-07 日立化成株式会社 接着剤組成物、硬化物、半導体装置及びその製造方法
US10947326B2 (en) 2015-07-29 2021-03-16 Showa Denko Materials Co., Ltd. Adhesive composition, cured article, semiconductor device, and production method for same
US11550217B2 (en) 2015-12-31 2023-01-10 Rohm And Haas Electronic Materials Llc Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device
US10509315B2 (en) 2015-12-31 2019-12-17 Rohm And Haas Electronic Materials, Llc Photoacid generator
US10317795B2 (en) 2015-12-31 2019-06-11 Rohm And Haas Electronic Materials Llc Photoacid generator
JP2017125007A (ja) * 2015-12-31 2017-07-20 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 光酸発生剤
US11960206B2 (en) 2015-12-31 2024-04-16 Rohm and Hass Electronic Materials LLC Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device
JP2020147698A (ja) * 2019-03-14 2020-09-17 セメダイン株式会社 光硬化性粘着剤組成物
JP7385168B2 (ja) 2019-03-14 2023-11-22 セメダイン株式会社 光硬化性粘着剤組成物
EP4012000A1 (en) 2020-12-11 2022-06-15 Bostik SA Photocurable adhesive composition
WO2022123004A1 (en) 2020-12-11 2022-06-16 Bostik Sa Photocurable adhesive composition
WO2023127551A1 (ja) * 2021-12-28 2023-07-06 東洋紡株式会社 硬化性樹脂組成物及びホットメルト接着剤
WO2024090459A1 (ja) * 2022-10-27 2024-05-02 積水フーラー株式会社 光硬化性樹脂組成物及び光学用接着剤

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Publication number Publication date
KR20140092748A (ko) 2014-07-24

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