JP2014150131A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2014150131A5 JP2014150131A5 JP2013017192A JP2013017192A JP2014150131A5 JP 2014150131 A5 JP2014150131 A5 JP 2014150131A5 JP 2013017192 A JP2013017192 A JP 2013017192A JP 2013017192 A JP2013017192 A JP 2013017192A JP 2014150131 A5 JP2014150131 A5 JP 2014150131A5
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- stopper
- substrate
- pressing member
- pressing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 6
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013017192A JP6130677B2 (ja) | 2013-01-31 | 2013-01-31 | 研磨装置および研磨方法 |
| KR1020140008386A KR101877092B1 (ko) | 2013-01-31 | 2014-01-23 | 연마 장치 및 연마 방법 |
| TW103103080A TWI634596B (zh) | 2013-01-31 | 2014-01-28 | 研磨裝置及研磨方法 |
| US14/167,129 US9561573B2 (en) | 2013-01-31 | 2014-01-29 | Polishing apparatus |
| CN201410043555.4A CN103962939B (zh) | 2013-01-31 | 2014-01-29 | 研磨装置及研磨方法 |
| US15/386,624 US9694467B2 (en) | 2013-01-31 | 2016-12-21 | Polishing method of polishing a substrate |
| KR1020180063619A KR102008100B1 (ko) | 2013-01-31 | 2018-06-01 | 연마 장치 및 연마 방법 |
| KR1020190076393A KR102073919B1 (ko) | 2013-01-31 | 2019-06-26 | 연마 장치 및 연마 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013017192A JP6130677B2 (ja) | 2013-01-31 | 2013-01-31 | 研磨装置および研磨方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014150131A JP2014150131A (ja) | 2014-08-21 |
| JP2014150131A5 true JP2014150131A5 (enExample) | 2015-11-19 |
| JP6130677B2 JP6130677B2 (ja) | 2017-05-17 |
Family
ID=51223438
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013017192A Active JP6130677B2 (ja) | 2013-01-31 | 2013-01-31 | 研磨装置および研磨方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9561573B2 (enExample) |
| JP (1) | JP6130677B2 (enExample) |
| KR (3) | KR101877092B1 (enExample) |
| CN (1) | CN103962939B (enExample) |
| TW (1) | TWI634596B (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017148931A (ja) * | 2016-02-19 | 2017-08-31 | 株式会社荏原製作所 | 研磨装置および研磨方法 |
| JP6568006B2 (ja) * | 2016-04-08 | 2019-08-28 | 株式会社荏原製作所 | 研磨装置および研磨方法 |
| CN106625216A (zh) * | 2016-11-25 | 2017-05-10 | 新乡市振英机械设备有限公司 | 防尘罩磨边时使用的旋转架 |
| JP6920849B2 (ja) * | 2017-03-27 | 2021-08-18 | 株式会社荏原製作所 | 基板処理方法および装置 |
| JP6840617B2 (ja) * | 2017-05-15 | 2021-03-10 | 株式会社荏原製作所 | 研磨装置および研磨方法 |
| US10571069B2 (en) * | 2017-09-14 | 2020-02-25 | Applied Materials, Inc. | Gimbal assembly for heater pedestal |
| JP6899298B2 (ja) * | 2017-09-27 | 2021-07-07 | 株式会社荏原製作所 | 研磨方法および研磨装置 |
| CN108807228B (zh) * | 2018-06-05 | 2020-10-16 | 安徽省华腾农业科技有限公司经开区分公司 | 一种半导体芯片生产工艺 |
| JP7121572B2 (ja) | 2018-07-20 | 2022-08-18 | 株式会社荏原製作所 | 研磨装置および研磨方法 |
| JP7169210B2 (ja) * | 2019-01-28 | 2022-11-10 | 株式会社荏原製作所 | 研磨方法および研磨装置 |
| JP7099757B1 (ja) | 2021-02-09 | 2022-07-12 | 株式会社Bbs金明 | 半導体ウェハーの研磨装置 |
| CN113714905A (zh) * | 2021-09-03 | 2021-11-30 | 安徽永茂泰铝业有限公司 | 一种用于汽车铸造件的环保型打磨设备及其打磨方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3415017A (en) * | 1965-05-13 | 1968-12-10 | Zech Murray Corp | Apparatus for finishing workpieces under controlled pressures |
| US6126512A (en) * | 1998-07-10 | 2000-10-03 | Aplex Inc. | Robust belt tracking and control system for hostile environment |
| EP1080841A3 (en) * | 1999-09-02 | 2001-07-11 | Mitsubishi Materials Corporation | Carrier head, polishing apparatus using the carrier head, and method for sensing polished surface state |
| JP2001205549A (ja) * | 2000-01-25 | 2001-07-31 | Speedfam Co Ltd | 基板エッジ部の片面研磨方法およびその装置 |
| JP2004154874A (ja) * | 2002-11-05 | 2004-06-03 | Ebara Corp | ポリッシング装置及びポリッシング方法 |
| JP2005305586A (ja) * | 2004-04-20 | 2005-11-04 | Nihon Micro Coating Co Ltd | 研磨装置 |
| CN101934491B (zh) * | 2004-11-01 | 2012-07-25 | 株式会社荏原制作所 | 抛光设备 |
| KR101236472B1 (ko) * | 2007-10-15 | 2013-02-22 | 삼성전자주식회사 | 웨이퍼 베벨 영역 폴리싱 장치 및 그 장치에서의 연마종말점 검출 방법 |
| JP5192355B2 (ja) * | 2008-11-28 | 2013-05-08 | 株式会社ディスコ | ウエーハの面取り部除去方法および研削装置 |
| US8741097B2 (en) * | 2009-10-27 | 2014-06-03 | Tokyo Electron Limited | Plasma processing apparatus and plasma processing method |
| JP5257408B2 (ja) * | 2010-06-01 | 2013-08-07 | 王子ホールディングス株式会社 | 植物の挿し木苗製造方法 |
| JP5886602B2 (ja) * | 2011-03-25 | 2016-03-16 | 株式会社荏原製作所 | 研磨装置および研磨方法 |
| JP2013103318A (ja) * | 2011-11-16 | 2013-05-30 | Toshiba Corp | 研磨装置及び研磨方法 |
-
2013
- 2013-01-31 JP JP2013017192A patent/JP6130677B2/ja active Active
-
2014
- 2014-01-23 KR KR1020140008386A patent/KR101877092B1/ko active Active
- 2014-01-28 TW TW103103080A patent/TWI634596B/zh active
- 2014-01-29 CN CN201410043555.4A patent/CN103962939B/zh active Active
- 2014-01-29 US US14/167,129 patent/US9561573B2/en active Active
-
2016
- 2016-12-21 US US15/386,624 patent/US9694467B2/en active Active
-
2018
- 2018-06-01 KR KR1020180063619A patent/KR102008100B1/ko active Active
-
2019
- 2019-06-26 KR KR1020190076393A patent/KR102073919B1/ko active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2014150131A5 (enExample) | ||
| JP2016010543A5 (enExample) | ||
| JP2016533484A5 (enExample) | ||
| JP2013058517A5 (enExample) | ||
| JP2012186390A5 (enExample) | ||
| JP2016518959A5 (enExample) | ||
| JP2015092958A5 (enExample) | ||
| JP2015134130A5 (enExample) | ||
| JP2013515313A5 (enExample) | ||
| MY181343A (en) | Applicator | |
| HK1243379A1 (zh) | 用於天花板和墙壁钻孔的移动机器人式钻孔装置及方法 | |
| JP2016140956A5 (enExample) | ||
| JP2014061892A5 (enExample) | ||
| JP2017006534A5 (enExample) | ||
| JP2017124744A5 (enExample) | ||
| EP2740568A3 (en) | Automated polishing systems and methods | |
| JP2017087223A5 (enExample) | ||
| WO2014151686A3 (en) | Focus assembly for camera | |
| JP2016195183A5 (enExample) | ||
| JP2015112576A5 (enExample) | ||
| MX2017012838A (es) | Metodo y aparato para controlar el posicionamiento de un dispositivo de camara, un dispositivo de camara y un dispositivo de terminal. | |
| EP2636485A3 (en) | Eyeglass lens processing apparatus | |
| JP2014004678A5 (enExample) | ||
| JP2011083856A5 (ja) | 研磨装置及び研磨方法 | |
| SG11201908381RA (en) | Substrate polishing device and substrate polishing method |