KR101877092B1 - 연마 장치 및 연마 방법 - Google Patents

연마 장치 및 연마 방법 Download PDF

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Publication number
KR101877092B1
KR101877092B1 KR1020140008386A KR20140008386A KR101877092B1 KR 101877092 B1 KR101877092 B1 KR 101877092B1 KR 1020140008386 A KR1020140008386 A KR 1020140008386A KR 20140008386 A KR20140008386 A KR 20140008386A KR 101877092 B1 KR101877092 B1 KR 101877092B1
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South Korea
Prior art keywords
polishing
substrate
stopper
pressing member
pressing
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KR1020140008386A
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English (en)
Korean (ko)
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KR20140098683A (ko
Inventor
마사야 세키
데츠지 도가와
Original Assignee
가부시키가이샤 에바라 세이사꾸쇼
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/002—Machines or devices using grinding or polishing belts; Accessories therefor for grinding edges or bevels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/004—Machines or devices using grinding or polishing belts; Accessories therefor using abrasive rolled strips
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/18—Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0606—Position monitoring, e.g. misposition detection or presence detection

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
KR1020140008386A 2013-01-31 2014-01-23 연마 장치 및 연마 방법 Active KR101877092B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013017192A JP6130677B2 (ja) 2013-01-31 2013-01-31 研磨装置および研磨方法
JPJP-P-2013-017192 2013-01-31

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020180063619A Division KR102008100B1 (ko) 2013-01-31 2018-06-01 연마 장치 및 연마 방법

Publications (2)

Publication Number Publication Date
KR20140098683A KR20140098683A (ko) 2014-08-08
KR101877092B1 true KR101877092B1 (ko) 2018-07-10

Family

ID=51223438

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020140008386A Active KR101877092B1 (ko) 2013-01-31 2014-01-23 연마 장치 및 연마 방법
KR1020180063619A Active KR102008100B1 (ko) 2013-01-31 2018-06-01 연마 장치 및 연마 방법
KR1020190076393A Active KR102073919B1 (ko) 2013-01-31 2019-06-26 연마 장치 및 연마 방법

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020180063619A Active KR102008100B1 (ko) 2013-01-31 2018-06-01 연마 장치 및 연마 방법
KR1020190076393A Active KR102073919B1 (ko) 2013-01-31 2019-06-26 연마 장치 및 연마 방법

Country Status (5)

Country Link
US (2) US9561573B2 (enExample)
JP (1) JP6130677B2 (enExample)
KR (3) KR101877092B1 (enExample)
CN (1) CN103962939B (enExample)
TW (1) TWI634596B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017148931A (ja) * 2016-02-19 2017-08-31 株式会社荏原製作所 研磨装置および研磨方法
JP6568006B2 (ja) * 2016-04-08 2019-08-28 株式会社荏原製作所 研磨装置および研磨方法
CN106625216A (zh) * 2016-11-25 2017-05-10 新乡市振英机械设备有限公司 防尘罩磨边时使用的旋转架
JP6920849B2 (ja) * 2017-03-27 2021-08-18 株式会社荏原製作所 基板処理方法および装置
JP6840617B2 (ja) * 2017-05-15 2021-03-10 株式会社荏原製作所 研磨装置および研磨方法
US10571069B2 (en) * 2017-09-14 2020-02-25 Applied Materials, Inc. Gimbal assembly for heater pedestal
JP6899298B2 (ja) * 2017-09-27 2021-07-07 株式会社荏原製作所 研磨方法および研磨装置
CN108807228B (zh) * 2018-06-05 2020-10-16 安徽省华腾农业科技有限公司经开区分公司 一种半导体芯片生产工艺
JP7121572B2 (ja) 2018-07-20 2022-08-18 株式会社荏原製作所 研磨装置および研磨方法
JP7169210B2 (ja) * 2019-01-28 2022-11-10 株式会社荏原製作所 研磨方法および研磨装置
JP7099757B1 (ja) * 2021-02-09 2022-07-12 株式会社Ｂｂｓ金明 半導体ウェハーの研磨装置
CN113714905A (zh) * 2021-09-03 2021-11-30 安徽永茂泰铝业有限公司 一种用于汽车铸造件的环保型打磨设备及其打磨方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004154874A (ja) * 2002-11-05 2004-06-03 Ebara Corp ポリッシング装置及びポリッシング方法
KR20110124371A (ko) * 2004-11-01 2011-11-16 가부시키가이샤 에바라 세이사꾸쇼 폴리싱장치
KR20120109342A (ko) * 2011-03-25 2012-10-08 가부시키가이샤 에바라 세이사꾸쇼 연마 장치 및 연마 방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3415017A (en) * 1965-05-13 1968-12-10 Zech Murray Corp Apparatus for finishing workpieces under controlled pressures
US6126512A (en) * 1998-07-10 2000-10-03 Aplex Inc. Robust belt tracking and control system for hostile environment
KR20010030213A (ko) * 1999-09-02 2001-04-16 아끼모토 유미 연마 헤드, 이것을 이용한 연마 장치, 및 연마 상태 검출방법
JP2001205549A (ja) * 2000-01-25 2001-07-31 Speedfam Co Ltd 基板エッジ部の片面研磨方法およびその装置
JP2005305586A (ja) * 2004-04-20 2005-11-04 Nihon Micro Coating Co Ltd 研磨装置
KR101236472B1 (ko) * 2007-10-15 2013-02-22 삼성전자주식회사 웨이퍼 베벨 영역 폴리싱 장치 및 그 장치에서의 연마종말점 검출 방법
JP5192355B2 (ja) 2008-11-28 2013-05-08 株式会社ディスコ ウエーハの面取り部除去方法および研削装置
US8741097B2 (en) * 2009-10-27 2014-06-03 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
JP5257408B2 (ja) 2010-06-01 2013-08-07 王子ホールディングス株式会社 植物の挿し木苗製造方法
JP2013103318A (ja) * 2011-11-16 2013-05-30 Toshiba Corp 研磨装置及び研磨方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004154874A (ja) * 2002-11-05 2004-06-03 Ebara Corp ポリッシング装置及びポリッシング方法
KR20050072468A (ko) * 2002-11-05 2005-07-11 가부시키가이샤 에바라 세이사꾸쇼 폴리싱 장치
KR20110124371A (ko) * 2004-11-01 2011-11-16 가부시키가이샤 에바라 세이사꾸쇼 폴리싱장치
KR20120109342A (ko) * 2011-03-25 2012-10-08 가부시키가이샤 에바라 세이사꾸쇼 연마 장치 및 연마 방법

Also Published As

Publication number Publication date
KR20190083319A (ko) 2019-07-11
KR102008100B1 (ko) 2019-08-06
JP2014150131A (ja) 2014-08-21
TW201434082A (zh) 2014-09-01
CN103962939B (zh) 2018-01-12
US20140213154A1 (en) 2014-07-31
KR102073919B1 (ko) 2020-02-06
CN103962939A (zh) 2014-08-06
KR20140098683A (ko) 2014-08-08
US20170100813A1 (en) 2017-04-13
US9694467B2 (en) 2017-07-04
JP6130677B2 (ja) 2017-05-17
TWI634596B (zh) 2018-09-01
US9561573B2 (en) 2017-02-07
KR20180064359A (ko) 2018-06-14

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