JP2014130883A5 - - Google Patents

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Publication number
JP2014130883A5
JP2014130883A5 JP2012287121A JP2012287121A JP2014130883A5 JP 2014130883 A5 JP2014130883 A5 JP 2014130883A5 JP 2012287121 A JP2012287121 A JP 2012287121A JP 2012287121 A JP2012287121 A JP 2012287121A JP 2014130883 A5 JP2014130883 A5 JP 2014130883A5
Authority
JP
Japan
Prior art keywords
substrate
cleaning
unit
polished
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012287121A
Other languages
English (en)
Japanese (ja)
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JP2014130883A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2012287121A priority Critical patent/JP2014130883A/ja
Priority claimed from JP2012287121A external-priority patent/JP2014130883A/ja
Priority to KR1020130159803A priority patent/KR20140086846A/ko
Priority to US14/139,626 priority patent/US20140182632A1/en
Priority to TW102147709A priority patent/TWI610359B/zh
Publication of JP2014130883A publication Critical patent/JP2014130883A/ja
Publication of JP2014130883A5 publication Critical patent/JP2014130883A5/ja
Pending legal-status Critical Current

Links

JP2012287121A 2012-12-28 2012-12-28 基板洗浄装置及び基板洗浄方法 Pending JP2014130883A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012287121A JP2014130883A (ja) 2012-12-28 2012-12-28 基板洗浄装置及び基板洗浄方法
KR1020130159803A KR20140086846A (ko) 2012-12-28 2013-12-20 기판 세정 장치 및 기판 세정 방법
US14/139,626 US20140182632A1 (en) 2012-12-28 2013-12-23 Substrate cleaning apparatus and substrate cleaning method
TW102147709A TWI610359B (zh) 2012-12-28 2013-12-23 基板洗淨裝置及基板洗淨方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012287121A JP2014130883A (ja) 2012-12-28 2012-12-28 基板洗浄装置及び基板洗浄方法

Publications (2)

Publication Number Publication Date
JP2014130883A JP2014130883A (ja) 2014-07-10
JP2014130883A5 true JP2014130883A5 (enExample) 2015-08-27

Family

ID=51015749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012287121A Pending JP2014130883A (ja) 2012-12-28 2012-12-28 基板洗浄装置及び基板洗浄方法

Country Status (4)

Country Link
US (1) US20140182632A1 (enExample)
JP (1) JP2014130883A (enExample)
KR (1) KR20140086846A (enExample)
TW (1) TWI610359B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107359107B (zh) * 2014-11-18 2020-07-14 通富微电子股份有限公司 一种圆片清洗机用的喷头及圆片清洗机
KR101880232B1 (ko) * 2015-07-13 2018-07-19 주식회사 제우스 기판 액처리 장치 및 방법
CN105826224B (zh) * 2016-05-11 2019-05-21 中国电子科技集团公司第四十五研究所 一种用于半导体晶圆的清洁腔
JP7355618B2 (ja) * 2018-12-04 2023-10-03 株式会社ディスコ ウエーハ分割装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5778554A (en) * 1996-07-15 1998-07-14 Oliver Design, Inc. Wafer spin dryer and method of drying a wafer
JP4017680B2 (ja) * 1997-09-24 2007-12-05 アンテルユニヴェルシテール・ミクロ―エレクトロニカ・サントリュム・ヴェー・ゼッド・ドゥブルヴェ 表面から液体を除去する方法及び装置
US6352623B1 (en) * 1999-12-17 2002-03-05 Nutool, Inc. Vertically configured chamber used for multiple processes
KR100523635B1 (ko) * 2003-02-04 2005-10-25 동부아남반도체 주식회사 웨이퍼 표면의 슬러리 제거 장치 및 그 방법
WO2005104200A1 (ja) * 2004-04-23 2005-11-03 Tokyo Electron Limited 基板洗浄方法、基板洗浄装置、コンピュータプログラムおよびプログラム記憶媒体
JP2005353739A (ja) * 2004-06-09 2005-12-22 Dainippon Screen Mfg Co Ltd 基板洗浄装置
KR100940136B1 (ko) * 2006-08-29 2010-02-03 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리방법 및 기판처리장치
JP5686647B2 (ja) * 2011-03-28 2015-03-18 株式会社東芝 基板保持装置、基板洗浄装置および基板処理装置

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