JP2014090181A5 - - Google Patents
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- Publication number
- JP2014090181A5 JP2014090181A5 JP2013243025A JP2013243025A JP2014090181A5 JP 2014090181 A5 JP2014090181 A5 JP 2014090181A5 JP 2013243025 A JP2013243025 A JP 2013243025A JP 2013243025 A JP2013243025 A JP 2013243025A JP 2014090181 A5 JP2014090181 A5 JP 2014090181A5
- Authority
- JP
- Japan
- Prior art keywords
- gas supply
- reaction gas
- substrate
- plasma processing
- processing region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012495 reaction gas Substances 0.000 description 15
- 239000000758 substrate Substances 0.000 description 12
- 239000007789 gas Substances 0.000 description 10
- 238000002407 reforming Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013243025A JP5692337B2 (ja) | 2013-11-25 | 2013-11-25 | 成膜装置、成膜方法及び記憶媒体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013243025A JP5692337B2 (ja) | 2013-11-25 | 2013-11-25 | 成膜装置、成膜方法及び記憶媒体 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010075900A Division JP5423529B2 (ja) | 2010-03-29 | 2010-03-29 | 成膜装置、成膜方法及び記憶媒体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014090181A JP2014090181A (ja) | 2014-05-15 |
| JP2014090181A5 true JP2014090181A5 (enExample) | 2014-06-26 |
| JP5692337B2 JP5692337B2 (ja) | 2015-04-01 |
Family
ID=50791821
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013243025A Active JP5692337B2 (ja) | 2013-11-25 | 2013-11-25 | 成膜装置、成膜方法及び記憶媒体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5692337B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7073924B2 (ja) * | 2018-06-06 | 2022-05-24 | 東京エレクトロン株式会社 | 原子層成長法を用いて基板上に薄膜を成膜する方法、または装置 |
| JP7712048B2 (ja) | 2021-09-30 | 2025-07-23 | 東京エレクトロン株式会社 | 成膜方法及び成膜装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100343134B1 (ko) * | 1998-07-09 | 2002-10-25 | 삼성전자 주식회사 | 유전막형성방법 |
| US20070065578A1 (en) * | 2005-09-21 | 2007-03-22 | Applied Materials, Inc. | Treatment processes for a batch ALD reactor |
| KR20090108747A (ko) * | 2008-04-14 | 2009-10-19 | 삼성전자주식회사 | 가변적 원자층 적층 온도를 이용한 반도체 및 그 제조 방법 |
| JP5423205B2 (ja) * | 2008-08-29 | 2014-02-19 | 東京エレクトロン株式会社 | 成膜装置 |
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2013
- 2013-11-25 JP JP2013243025A patent/JP5692337B2/ja active Active