JP2014086569A - 縦型パワーmosfet - Google Patents
縦型パワーmosfet Download PDFInfo
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- JP2014086569A JP2014086569A JP2012234524A JP2012234524A JP2014086569A JP 2014086569 A JP2014086569 A JP 2014086569A JP 2012234524 A JP2012234524 A JP 2012234524A JP 2012234524 A JP2012234524 A JP 2012234524A JP 2014086569 A JP2014086569 A JP 2014086569A
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- 210000000746 body region Anatomy 0.000 claims abstract description 62
- 239000004065 semiconductor Substances 0.000 claims description 69
- 239000000758 substrate Substances 0.000 claims description 54
- 239000012535 impurity Substances 0.000 claims description 42
- 229910052751 metal Inorganic materials 0.000 claims description 41
- 239000002184 metal Substances 0.000 claims description 41
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 19
- 239000010703 silicon Substances 0.000 claims description 19
- 238000005468 ion implantation Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 description 70
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 25
- 238000000034 method Methods 0.000 description 23
- 229910052814 silicon oxide Inorganic materials 0.000 description 22
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 17
- 229920005591 polysilicon Polymers 0.000 description 17
- 239000010410 layer Substances 0.000 description 15
- 238000012545 processing Methods 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 12
- 230000015556 catabolic process Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 8
- 238000002161 passivation Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 239000011229 interlayer Substances 0.000 description 7
- 230000004048 modification Effects 0.000 description 7
- 238000012986 modification Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 5
- 238000004380 ashing Methods 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000002513 implantation Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 238000001459 lithography Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 230000000737 periodic effect Effects 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 239000005380 borophosphosilicate glass Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 229910021332 silicide Inorganic materials 0.000 description 3
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000002636 symptomatic treatment Methods 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910008599 TiW Inorganic materials 0.000 description 1
- HIVGXUNKSAJJDN-UHFFFAOYSA-N [Si].[P] Chemical compound [Si].[P] HIVGXUNKSAJJDN-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229940104869 fluorosilicate Drugs 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000005360 phosphosilicate glass Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- -1 that is Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66674—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/66712—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/66727—Vertical DMOS transistors, i.e. VDMOS transistors with a step of recessing the source electrode
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7811—Vertical DMOS transistors, i.e. VDMOS transistors with an edge termination structure
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/0445—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising crystalline silicon carbide
- H01L21/0455—Making n or p doped regions or layers, e.g. using diffusion
- H01L21/046—Making n or p doped regions or layers, e.g. using diffusion using ion implantation
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- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/063—Reduced surface field [RESURF] pn-junction structures
- H01L29/0634—Multiple reduced surface field (multi-RESURF) structures, e.g. double RESURF, charge compensation, cool, superjunction (SJ), 3D-RESURF, composite buffer (CB) structures
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- H01L29/0692—Surface layout
- H01L29/0696—Surface layout of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
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- H01L29/0843—Source or drain regions of field-effect devices
- H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
- H01L29/0852—Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
- H01L29/0856—Source regions
- H01L29/0865—Disposition
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- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0843—Source or drain regions of field-effect devices
- H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
- H01L29/0852—Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
- H01L29/0856—Source regions
- H01L29/0869—Shape
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- H—ELECTRICITY
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0843—Source or drain regions of field-effect devices
- H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
- H01L29/0852—Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
- H01L29/0873—Drain regions
- H01L29/0878—Impurity concentration or distribution
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- H—ELECTRICITY
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- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0843—Source or drain regions of field-effect devices
- H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
- H01L29/0852—Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
- H01L29/0873—Drain regions
- H01L29/0882—Disposition
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- H—ELECTRICITY
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- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1095—Body region, i.e. base region, of DMOS transistors or IGBTs
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- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1608—Silicon carbide
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Abstract
【解決手段】本願発明は、スーパジャンクション構造を有する縦型パワーMOSFETにおいて、ゲート電極下の第1導電型ドリフト領域の表面領域に、第2導電型ボディ領域よりも浅く、前記第1導電型ドリフト領域よりも濃度が高い第1導電型を有するゲート下高濃度N型領域を有するものである。
【選択図】図4
Description
先ず、本願において開示される代表的な実施の形態について概要を説明する。
(a)第1の主面および第2の主面を有する半導体基板;
(b)前記半導体基板の前記第1の主面上から内部に亘り設けられたセル領域;
(b)前記第2の主面の表面内に設けられた第1導電型を有するドレイン領域;
(c)前記セル領域内であって、前記ドレイン領域との境界から前記第1の主面までの主要部に形成されたカラム状第1導電型ドリフト領域および、前記第1導電型と反対導電型の第2導電型を有するカラム状第2導電型ドリフト領域が交互に繰り返されたドリフト領域;
(d)前記第1の主面側の表面領域であって、各カラム状第1導電型ドリフト領域の表面上にゲート絶縁膜を介して設けられたゲート電極;
(e)前記第1の主面側の前記ドリフト領域の表面であって、各カラム状第2導電型ドリフト領域から、それに隣接する前記カラム状第1導電型ドリフト領域内に亘って形成された前記第2導電型を有するボディ領域;
(f)各カラム状第1導電型ドリフト領域の前記ゲート電極に沿った表面であって、一対の隣接する前記ボディ領域間に設けられ、前記ボディ領域よりも深さが浅く、そのカラム状第1導電型ドリフト領域よりも濃度が高い前記第1導電型を有するゲート下高濃度N型領域;
(g)各ボディ領域の表面であって、前記ゲート電極の端部近傍から外部に亘って設けられ、前記ゲート下高濃度N型領域よりも高濃度の前記第1導電型を有するソース領域;
(h)前記半導体基板の前記第1の主面上に設けられ、前記ボディ領域および前記ソース領域に電気的に接続されたメタルソース電極;
(i)前記半導体基板の前記第2の主面上に設けられ、前記ドレイン領域に電気的に接続されたメタルドレイン電極。
1.本願において、実施の態様の記載は、必要に応じて、便宜上複数のパートおよびセクションに分けて記載する場合もあるが、特にそうでない旨明示した場合を除き、これらは相互に独立別個のものではなく、単一の例の各部分、一方が他方の一部詳細または一部または全部の変形例等である。また、原則として、同様の部分は繰り返しを省略する。また、実施の態様における各構成要素は、特にそうでない旨明示した場合、理論的にその数に限定される場合および文脈から明らかにそうでない場合を除き、必須のものではない。
実施の形態について更に詳述する。各図中において、同一または同様の部分は同一または類似の記号または参照番号で示し、説明は原則として繰り返さない。
ここでは、応用回路事態を説明するのが主要な目的ではないので、原理的に最も簡単なものを例に取り説明する。すなわち、制御対象としては、比較的単純なモータを、制御方式としては、PWM(Pulse Width Modulation)方式を、駆動回路としては、フルブリッジ(Full Bridge)回路を例に取り説明する。しかし、制御対象としては、多相(たとえば、3相)ブラシレス(Brushless)モータ等であってもよく、制御方式としては、たとえばPAM(Pulse Amplitude Modulation)方式であってもよく、駆動回路としては、たとえば、3分岐(Three Leg)等の多分岐(Multi−Leg)のハーフブリッジ回路であってもよい。
以下では、主にシリコン単結晶基板(エピタキシャル基板を含む)等、すなわちシリコン系半導体基板上(裏面および内部を含む)にデバイスを形成したものを例に取り具体的に説明するが、以下の例は、それに限定されるものではなく、たとえば、SiC系半導体基板やその他の半導体基板上にデバイスを形成したものにも適用できることは言うまでもない。
このセクションでは、セクション2で説明したデバイス構造に対する製造プロセスの要部の一例を示す。これらは、一例であり、種々、変形可能であることは言うまでもない。
(1)第1ステップ:イオン種:ボロン、注入エネルギ:たとえば200keV程度、ドーズ量:たとえば1013/cm2のオーダ程度;
(2)第1ステップ:イオン種:ボロン、注入エネルギ:たとえば75keV程度、ドーズ量:たとえば1012/cm2のオーダ程度を好適な範囲として例示することができる(濃度としては、たとえば1017/cm3のオーダ程度)。その後、不要になったPボディ領域導入用レジスト膜37をたとえば、アッシング等により全面除去する。
図23は本願の前記一実施の形態の縦型パワーMOSFETのデバイス構造のアウトラインを説明するためのデバイス要部断面図である。図24はゲート下高濃度N型領域を有する縦型プレーナパワーMOSFET(本願の前記一実施の形態)とゲート下高濃度N型領域を有さない縦型プレーナパワーMOSFET(比較例)のゲート−ドレイン間容量Cgdのドレイン−ソース間電圧Vdsの推移による変化の様子を示すシミュレーション結果プロット図である。図25は図4のチャネル−P型ボディ−Nカラム断面Aおよびゲート下高濃度N型領域−Nカラム断面Bの基板表面から深さ方向のネットドーピング濃度プロファイルプロット(Net Doping concentration Profile Plot)図である。図26は図1のゲート駆動信号の一例を示す信号波形図である。図27は本願の前記一実施の形態の縦型パワーMOSFETのゲート構造に関する変形例(トレンチゲート縦型パワーMOSFET)のセル構造を説明するための図4にほぼ対応するデバイス模式断面図である。これらに基づいて、前記実施の形態(変形例を含む)に関する補足的説明並びに全般についての考察を行う。
たとえば、家庭用エアコンディショナ(Air Conditioner)においては、図1のようなモータ駆動回路用素子として、IGBT(Insulated Gate Bipolar Transistor)が還流ダイオード(Fly−Back Diode)と組み合わせられて使用されていた。しかし、IGBTは、バイポーラ素子であるため、スイッチング損失が大きいという問題があった。このため、IGBTをよりオン抵抗が小さく、且つ、高速スイッチングが可能なスーパジャンクションを有するパワーMOSFETに置き換えることが検討されている。このパワーMOSFETには、更に、ボディダイオード(Body Diode)を必然的に内蔵しているというメリットがあり、還流ダイオードを省略することが可能となる。
このため、本願の前記一実施の形態のスーパジャンクションを有する縦型パワーMOSFETにおいては、以下のような構成としている。すなわち、ゲート電極15に沿ったカラム状第1導電型ドリフト領域11nの表面であって、一対の隣接する第2導電型を有するボディ領域6間に、ボディ領域6よりも深さが浅く、そのカラム状第1導電型ドリフト領域11nよりも濃度が高い第1導電型を有するゲート下高濃度N型領域8を設けている。ここで、ゲート電極構造は、プレーナゲートでもトレンチゲートでも良い。
このサブセクションでは、セクション2で説明した本願の前記一実施の形態のスーパジャンクションを有する縦型プレーナパワーMOSFET(ゲート下高濃度N型領域を付加したもの、すなわち、「実施形態デバイス」)と、その他は同一の構造で、ゲート下高濃度N型領域がないもの、すなわち、「比較例デバイス」の特性を比較して、説明する。
このサブセクションでは、前記実施の形態における要部の不純物濃度の関係を明確にするために、図4のチャネル−P型ボディ−Nカラム断面Aにおける不純物濃度プロファイルRpaとゲート下高濃度N型領域−Nカラム断面Bにおける不純物濃度プロファイルRpbを図25に例示して示す。図25に示すように、ゲート下高濃度N型領域8(第1導電型を有するゲート下高濃度N型領域)の濃度ピークPh(図4断面B)は、P型ボディ領域6(第2導電型を有するボディ領域)の濃度ピークPb(図4断面A)よりも浅い位置にある。すなわち、ゲート下高濃度N型領域8は、ボディ領域よりも深さが浅い。なお、ここでは、濃度ピークPh(図4断面B)は、基板内から表面に近づくときに平坦になる部分をとっている。
図1のインバータ回路に対するゲート駆動信号Φa,Φb,Φc,Φd(各添え字は、図1のMOSFETおよびボディダイオード部の各添え字が対応する)の具体的一例を図26に示す。図26に示すように、図1の回路に於いては、対角的に同期して、交互にオン−オフが繰り返される。すなわち、MOSFET(71a、71d)からなる第1組とMOSFET(71b、71c)からなる第2組が、それぞれ同期して、オン−オフが繰り返される。しかし、第1組と第2組が同時にオンする時間が有ると、大きな貫通電流が流れて、電力損失が大きくなるので、通常、マスキング時間Tm(たとえば、50n秒程度)すなわち、両組ともにオフの期間を設けている。このマスキング時間Tmにおいて、その直前までオン状態であった分岐(Leg)の反対側のMOSFET内のボディダイオード部がオンして、フライホイール(Fly Wheel)電流が流れる。具体的には、たとえば、MOSFET(71a、71d)がオフ状態となったとき、ボディダイオード部(72b、72c)がオン状態となり、フライホイール電流が流れることとなる。
このサブセクションで説明する例は、セクション2(図4等)で説明したプレーナ型MOSFETのゲート構造に関する変形例である。
以上本発明者によってなされた発明を実施形態に基づいて具体的に説明したが、本発明はそれに限定されるものではなく、その要旨を逸脱しない範囲において種々変更可能であることは言うまでもない。
1a ウエハ又は半導体チップのデバイス主面(第1の主面)
1b ウエハ又は半導体チップの裏面(第2の主面)
1f デバイス主面側の表面領域
1s ウエハ又は半導体チップの半導体基板部(エピタキシャル半導体基板)
2 半導体チップ又はチップ領域(半導体基板、シリコン系半導体基板)
3 メタルガードリング
4 セル領域
5 メタルソース電極
6 P型ボディ領域(第2導電型を有するボディ領域)
7 メタルゲート電極
7w メタルゲート配線
8 ゲート下高濃度N型領域(第1導電型を有するゲート下高濃度N型領域)
9 MOSFET単位セル部
10n N型エピタキシャル領域
10p P型エピタキシャル領域
11 ドリフト領域
11n カラム状N型ドリフト領域(カラム状第1導電型ドリフト領域またはNカラム領域)
11p カラム状P型ドリフト領域(カラム状第2導電型ドリフト領域またはPカラム領域)
14 バックグラインディングで除去される上端部
15 ポリシリコンゲート電極(ゲート電極又はポリシリコン膜)
19 ゲート収納トレンチ
20 トレンチ(埋め込み用トレンチ)
23 P+型ボディコンタクト領域
24 裏面メタルドレイン電極(メタルドレイン電極)
25 N+型ドレイン領域(ドレイン領域またはN型単結晶シリコン基板)
26 N+型ソース領域(ソース領域)
27 ゲート絶縁膜
29 層間絶縁膜
33 トレンチ加工用ハードマスク膜
34 フィールド絶縁膜
35 コンタクト開口形成用レジスト膜
36 コンタクト開口
37 Pボディ領域導入用レジスト膜
39 基板コンタクト溝
62 メタルフィールドプレート
71a,71b,71c,71d 駆動MOSFET
72,72a,72b,72c,72d ボディダイオード部
A チャネル−P型ボディ−Nカラム断面
B ゲート下高濃度N型領域−Nカラム断面
Cgd ゲート−ドレイン間容量
Db P型ボディ領域の深さ
Dh ゲート下高濃度N型領域の深さ
Gnd 接地電圧端子
MW モータ巻き線
Nd カラム状N型ドリフト領域の不純物濃度
Nh ゲート下高濃度N型領域の不純物濃度
Pb P型ボディ領域の濃度ピーク
Ph ゲート下高濃度N型領域の濃度ピーク
PM パルス変調ゲート駆動回路
R1 セル部切出領域
Rpa チャネル−P型ボディ−Nカラム断面におけるネットドーピング濃度プロファイル
Rpb ゲート下高濃度N型領域−Nカラム断面におけるネットドーピング濃度プロファイル
Tm マスキング時間
Vdd 直流電源電圧端子
Vds ドレイン−ソース間電圧
Wn Nカラムの厚さ
Wp Pカラムの厚さ
Φa,Φb,Φc,Φd 各MOSFETのゲートに供給されるパルス波形
Claims (12)
- 以下を含む縦型パワーMOSFET:
(a)第1の主面および第2の主面を有する半導体基板;
(b)前記半導体基板の前記第1の主面上から内部に亘り設けられたセル領域;
(b)前記第2の主面の表面内に設けられた第1導電型を有するドレイン領域;
(c)前記セル領域内であって、前記ドレイン領域との境界から前記第1の主面までの主要部に形成されたカラム状第1導電型ドリフト領域および、前記第1導電型と反対導電型の第2導電型を有するカラム状第2導電型ドリフト領域が交互に繰り返されたドリフト領域;
(d)前記第1の主面側の表面領域であって、各カラム状第1導電型ドリフト領域の表面上にゲート絶縁膜を介して設けられたゲート電極;
(e)前記第1の主面側の前記ドリフト領域の表面であって、各カラム状第2導電型ドリフト領域から、それに隣接する前記カラム状第1導電型ドリフト領域内に亘って形成された前記第2導電型を有するボディ領域;
(f)各カラム状第1導電型ドリフト領域の前記ゲート電極に沿った表面であって、一対の隣接する前記ボディ領域間に設けられ、前記ボディ領域よりも深さが浅く、そのカラム状第1導電型ドリフト領域よりも濃度が高い前記第1導電型を有するゲート下高濃度N型領域;
(g)各ボディ領域の表面であって、前記ゲート電極の端部近傍から外部に亘って設けられ、前記ゲート下高濃度N型領域よりも高濃度の前記第1導電型を有するソース領域;
(h)前記半導体基板の前記第1の主面上に設けられ、前記ボディ領域および前記ソース領域に電気的に接続されたメタルソース電極;
(i)前記半導体基板の前記第2の主面上に設けられ、前記ドレイン領域に電気的に接続されたメタルドレイン電極。 - 請求項1の縦型パワーMOSFETにおいて、前記半導体基板は、シリコン系半導体基板である。
- 請求項2の縦型パワーMOSFETにおいて、前記第1導電型はN型である。
- 請求項3の縦型パワーMOSFETにおいて、前記ゲート下高濃度N型領域の不純物濃度は、前記カラム状第2導電型ドリフト領域の不純物濃度よりも高い。
- 請求項4の縦型パワーMOSFETにおいて、前記ゲート下高濃度N型領域を形成するための前記第1導電型を有する不純物は、イオン注入によって導入される。
- 請求項5の縦型パワーMOSFETにおいて、前記ゲート下高濃度N型領域の濃度は、前記ボディ領域の濃度よりも低い。
- 請求項6の縦型パワーMOSFETにおいて、前記ゲート下高濃度N型領域を形成するための前記第1導電型を有する不純物は、前記一対の隣接するボディ領域の間の領域よりも広い領域に導入される。
- 請求項7の縦型パワーMOSFETにおいて、前記ゲート下高濃度N型領域を形成するための前記第1導電型を有する不純物は、前記セル領域のほぼ全域に導入される。
- 請求項8の縦型パワーMOSFETにおいて、前記ゲート下高濃度N型領域上に対向する部分の全面に前記ゲート電極が設けられている。
- 請求項9の縦型パワーMOSFETは、モータドライブ用である。
- 請求項8の縦型パワーMOSFETは、プレーナゲート型である。
- 請求項8の縦型パワーMOSFETは、トレンチゲート型である。
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JP2012234524A JP2014086569A (ja) | 2012-10-24 | 2012-10-24 | 縦型パワーmosfet |
US14/027,956 US9536943B2 (en) | 2012-10-24 | 2013-09-16 | Vertical power MOSFET |
US15/355,583 US20170069751A1 (en) | 2012-10-24 | 2016-11-18 | Vertical power mosfet |
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US9614043B2 (en) | 2012-02-09 | 2017-04-04 | Vishay-Siliconix | MOSFET termination trench |
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TW201430957A (zh) * | 2013-01-25 | 2014-08-01 | Anpec Electronics Corp | 半導體功率元件的製作方法 |
US9887259B2 (en) | 2014-06-23 | 2018-02-06 | Vishay-Siliconix | Modulated super junction power MOSFET devices |
CN104051540B (zh) * | 2014-07-03 | 2019-03-12 | 肖胜安 | 超级结器件及其制造方法 |
KR20160005928A (ko) * | 2014-07-08 | 2016-01-18 | 삼성전기주식회사 | 전력 반도체 소자 |
EP3183754A4 (en) | 2014-08-19 | 2018-05-02 | Vishay-Siliconix | Super-junction metal oxide semiconductor field effect transistor |
JP6526579B2 (ja) * | 2016-01-15 | 2019-06-05 | 株式会社東芝 | 半導体装置 |
JP6907233B2 (ja) * | 2016-02-02 | 2021-07-21 | アーベーベー・シュバイツ・アーゲーABB Schweiz AG | パワー半導体デバイス |
US10243039B2 (en) | 2016-03-22 | 2019-03-26 | General Electric Company | Super-junction semiconductor power devices with fast switching capability |
US10896959B2 (en) * | 2016-06-17 | 2021-01-19 | HUNTECK SEMICONDUCTOR (SHANGHAI) CO. Ltd. | Top structure of super junction MOSFETs and methods of fabrication |
DE102017113864A1 (de) * | 2017-06-22 | 2018-12-27 | Infineon Technologies Austria Ag | Verfahren zum Herstellen einer Justiermarke |
US10622257B2 (en) | 2017-12-15 | 2020-04-14 | International Business Machines Corporation | VFET device design for top contact resistance measurement |
US10655217B2 (en) * | 2018-05-01 | 2020-05-19 | Spts Technologies Limited | Method of forming a passivation layer on a substrate |
JP7055534B2 (ja) * | 2018-09-10 | 2022-04-18 | 株式会社東芝 | 半導体装置の製造方法 |
CN110034175A (zh) * | 2019-03-07 | 2019-07-19 | 电子科技大学 | 纵向可集成功率器件 |
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