JP2014061652A - 液滴吐出ヘッドの製造方法 - Google Patents
液滴吐出ヘッドの製造方法 Download PDFInfo
- Publication number
- JP2014061652A JP2014061652A JP2012208131A JP2012208131A JP2014061652A JP 2014061652 A JP2014061652 A JP 2014061652A JP 2012208131 A JP2012208131 A JP 2012208131A JP 2012208131 A JP2012208131 A JP 2012208131A JP 2014061652 A JP2014061652 A JP 2014061652A
- Authority
- JP
- Japan
- Prior art keywords
- forming layer
- layer
- water repellent
- repellent layer
- discharge port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 239000005871 repellent Substances 0.000 claims abstract description 71
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 63
- 230000002940 repellent Effects 0.000 claims abstract description 58
- 239000000463 material Substances 0.000 claims abstract description 54
- 239000007788 liquid Substances 0.000 claims abstract description 40
- 239000002904 solvent Substances 0.000 claims abstract description 34
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 229920005989 resin Polymers 0.000 claims abstract description 26
- 239000011347 resin Substances 0.000 claims abstract description 26
- 238000001035 drying Methods 0.000 claims abstract description 24
- 238000009835 boiling Methods 0.000 claims abstract description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 14
- 239000003822 epoxy resin Substances 0.000 claims description 10
- 229920000647 polyepoxide Polymers 0.000 claims description 10
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 7
- 238000007599 discharging Methods 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 description 13
- 239000003999 initiator Substances 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000002585 base Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- 229920002614 Polyether block amide Polymers 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910004200 TaSiN Inorganic materials 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000007859 condensation product Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000009429 electrical wiring Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 125000005409 triarylsulfonium group Chemical group 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- HHPPHUYKUOAWJV-UHFFFAOYSA-N triethoxy-[4-(oxiran-2-yl)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCCC1CO1 HHPPHUYKUOAWJV-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- BMNGOGRNWBJJKB-UHFFFAOYSA-N 1-azidopyrene Chemical compound C1=C2C(N=[N+]=[N-])=CC=C(C=C3)C2=C2C3=CC=CC2=C1 BMNGOGRNWBJJKB-UHFFFAOYSA-N 0.000 description 1
- -1 For example Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1635—Manufacturing processes dividing the wafer into individual chips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
【解決手段】液体を吐出するためのエネルギー発生素子及び配線を備える基板を準備する工程と、基板上にネガ型の感光性樹脂を含む流路壁形成層を形成する工程と、流路壁形成層の流路壁となる部分を露光する工程と、流路壁形成層上にネガ型の感光性樹脂を含む吐出口形成層を形成する工程と、吐出口形成層上に撥水層の材料を塗布する工程と、塗布された撥水層の材料に含まれる溶媒を乾燥して撥水層を形成する工程と、吐出口形成層及び前記撥水層の吐出口となる部分以外の領域を露光する工程と、流路壁形成層、吐出口形成層及び撥水層の各未露光部分を溶解除去する工程とを含む液滴吐出ヘッドの製造方法であって、撥水層の材料に含まれる溶媒の沸点が、乾燥により撥水層を形成する工程における乾燥温度以下である方法。
【選択図】図1
Description
ここで、γは表面張力、ΔHはモル蒸発熱、Vはモル体積、Tは絶対温度、Rは気体定
数である。Kは実験的に定数であることが知られており、K=0.07147とした。表面張力は、自動表面張力計DY−300(製品名、協和界面科学株式会社製)により測定した値である。また、流路壁形成層6の材料よりも吐出口形成層14の材料の方が光重合開始剤を多く含むことが、吐出口形成層14の感度を高め、後述する吐出口のパターニングの際に流路壁形成層6の未露光部6bを硬化させないようにすることができるため好ましい。
図1を用いて、本実施例における液体吐出ヘッドの製造方法について説明する。
実施例1の図1(D)に示される工程において、撥水層7の材料に含まれる溶媒の乾燥温度を90℃に変更した以外は実施例1と同様に液体吐出ヘッドを作製した。その結果、溶媒の浸透による流路壁形成層6の未露光部6bへの光重合開始剤の拡散は生じず、撥水層7の密着性は確保できた。流路壁形成層6の未露光部6bが流動し、所望の流路高さに対し約2μm流路高さが低くなったが、比較例1に対してリフィル性は高く、高速吐出可能であることを確認した。前記液滴吐出ヘッドを用いて実施例1と同様に印字を行った。その結果、ワイピングにより撥水層7が剥れないことを確認した。
実施例1の図1(D)に示される工程において、撥水層7の材料に含まれる溶媒としてPGMEAを用いた以外は実施例1と同様に液体吐出ヘッドを作製した。PGMEAの沸点は146℃で乾燥温度(70℃)よりも高い。また、PGMEAの溶解度パラメータ(SP値)は8.7である。その結果、撥水層7と吐出口形成層14は相溶し、撥水層7の密着性は確保できたが、所望の流路高さに対し約3μm流路高さが低くなった。前記液滴吐出ヘッドを用いて実施例1と同様の条件で印字を行った。ワイピングにより撥水層7が剥れることはなかったが、流路高さが所望の高さに対し低くなったためリフィル性が低下し、高速印字を行った場合不吐出による印字不良が発生することを確認した。
実施例1の図1(D)に示される工程において、撥水層7の材料に含まれる溶媒としてエタノールを用いた以外は実施例1と同様に液体吐出ヘッドを作製した。エタノールの沸点は78℃で乾燥温度(70℃)よりも高い。また、エタノールの溶解度パラメータ(SP値)は12.7であり、吐出口形成層14に含まれるエポキシ樹脂のSP値(9.7)との差の絶対値は3以上である。その結果、撥水層7と吐出口形成層14とは相溶しなかった。前記液滴吐出ヘッドを用いて実施例1と同様の条件で印字を行った。撥水層7と吐出口形成層14とが相溶しなかったため、ワイピングなどの物理的外力による撥水層7の剥れを確認した。
2 エネルギー発生素子
4 絶縁保護膜
6 流路壁形成層
6a 流路壁形成層露光部
6b 流路壁形成層未露光部
7 撥水層
7a 撥水層露光部
7b 撥水層未露光部
11 液体供給口
12 流路
13 吐出口
14 吐出口形成層
14a 吐出口形成層露光部
14b 吐出口形成層未露光部
15 流路壁形成層一部感光部
Claims (7)
- 液体を吐出するためのエネルギー発生素子及び配線を備える基板を準備する工程と、
前記基板上にネガ型の感光性樹脂を含む流路壁形成層を形成する工程と、
前記流路壁形成層の流路壁となる部分を露光する工程と、
前記流路壁形成層上にネガ型の感光性樹脂を含む吐出口形成層を形成する工程と、
前記吐出口形成層上に撥水層の材料を塗布する工程と、
前記塗布された撥水層の材料に含まれる溶媒を乾燥して撥水層を形成する工程と、
前記吐出口形成層及び前記撥水層の吐出口となる部分以外の領域を露光する工程と、
前記流路壁形成層、前記吐出口形成層及び前記撥水層の各未露光部分を溶解除去する工程と、
を含む液滴吐出ヘッドの製造方法であって、
前記撥水層の材料に含まれる溶媒の沸点が、前記乾燥により撥水層を形成する工程における乾燥温度以下である液滴吐出ヘッドの製造方法。 - 前記吐出口形成層の厚みが5μm以上、10μm以下である請求項1に記載の液滴吐出ヘッドの製造方法。
- 前記吐出口形成層に含まれる感光性樹脂と、前記撥水層の材料に含まれる溶媒との溶解度パラメータ(SP値)の差の絶対値が3未満である請求項1又は2に記載の液滴吐出ヘッドの製造方法。
- 前記乾燥により撥水層を形成する工程における乾燥温度が40℃以上、70℃以下である請求項1から3のいずれか1項に記載の液滴吐出ヘッドの製造方法。
- 前記吐出口形成層に含まれる感光性樹脂がエポキシ樹脂であり、前記撥水層の材料に含まれる溶媒がテトラヒドロフランである請求項1から4のいずれか1項に記載の液滴吐出ヘッドの製造方法。
- 前記吐出口形成層がネガ型の感光性樹脂を含むドライフィルムの載置により形成される請求項1から5のいずれか1項に記載の液滴吐出ヘッドの製造方法。
- 前記流路壁形成層に含まれる感光性樹脂と、前記吐出口形成層に含まれる感光性樹脂とが同じ樹脂である請求項1から6のいずれか1項に記載の液滴吐出ヘッドの製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012208131A JP6112809B2 (ja) | 2012-09-21 | 2012-09-21 | 液滴吐出ヘッドの製造方法 |
US14/011,940 US9216570B2 (en) | 2012-09-21 | 2013-08-28 | Process for producing liquid ejection head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012208131A JP6112809B2 (ja) | 2012-09-21 | 2012-09-21 | 液滴吐出ヘッドの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014061652A true JP2014061652A (ja) | 2014-04-10 |
JP6112809B2 JP6112809B2 (ja) | 2017-04-12 |
Family
ID=50337859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012208131A Expired - Fee Related JP6112809B2 (ja) | 2012-09-21 | 2012-09-21 | 液滴吐出ヘッドの製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US9216570B2 (ja) |
JP (1) | JP6112809B2 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016175312A (ja) * | 2015-03-20 | 2016-10-06 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
JP2016221866A (ja) * | 2015-06-01 | 2016-12-28 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
JP2017209951A (ja) * | 2016-05-27 | 2017-11-30 | キヤノン株式会社 | 構造体の製造方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6041527B2 (ja) * | 2012-05-16 | 2016-12-07 | キヤノン株式会社 | 液体吐出ヘッド |
JP6308751B2 (ja) | 2013-11-12 | 2018-04-11 | キヤノン株式会社 | 液体吐出ヘッド用基板の製造方法、液体吐出ヘッド用基板、液体吐出ヘッド、および記録装置 |
US9599893B2 (en) * | 2014-09-25 | 2017-03-21 | Canon Kabushiki Kaisha | Production process for optically shaped product and production process for liquid discharge head |
US9855566B1 (en) * | 2016-10-17 | 2018-01-02 | Funai Electric Co., Ltd. | Fluid ejection head and process for making a fluid ejection head structure |
JP2019043106A (ja) | 2017-09-06 | 2019-03-22 | キヤノン株式会社 | 液体吐出ヘッドの製造方法、および構造体の製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04211959A (ja) * | 1990-07-21 | 1992-08-03 | Canon Inc | インクジェット記録ヘッド及びそれを用いた記録装置 |
JPH04216952A (ja) * | 1990-12-19 | 1992-08-07 | Canon Inc | 液体噴射記録ヘッド、その製造方法、及び液体噴射記録ヘッドを備えた記録装置 |
JP2007230234A (ja) * | 2006-02-02 | 2007-09-13 | Canon Inc | インクジェット記録ヘッドの製造方法 |
JP2012504059A (ja) * | 2008-09-30 | 2012-02-16 | イーストマン コダック カンパニー | 自己整合穴を有する液滴吐出器 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69127801T2 (de) | 1990-12-19 | 1998-02-05 | Canon Kk | Herstellungsverfahren für flüssigkeitsausströmenden Aufzeichnungskopf |
EP0531535B1 (en) * | 1991-02-04 | 1998-11-25 | Seiko Epson Corporation | Ink-jet printing head and method of making said head |
JP3559697B2 (ja) * | 1997-12-01 | 2004-09-02 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
DE60221819T2 (de) * | 2001-04-02 | 2008-04-30 | Matsushita Electric Industrial Co., Ltd., Kadoma | Wasserabweisender film und verfahren zu seiner herstellung sowie damit ausgerüsteter tintenstrahlkopf und entsprechendes tintenstrahldruckverfahren |
US6869541B2 (en) * | 2002-02-21 | 2005-03-22 | Canon Kabushiki Kaisha | Epoxy resin composition, surface treating method, ink-jet recording head, and ink-jet recording apparatus |
JP2004330681A (ja) * | 2003-05-09 | 2004-11-25 | Hitachi Printing Solutions Ltd | インクジェットヘッド、及びこれを用いたインクジェットプリンタ及びインクジェットヘッドの製造方法 |
US7325902B2 (en) * | 2003-10-22 | 2008-02-05 | Ricoh Printing Systems, Ltd. | Ink-jet printer head and a manufacturing method thereof |
KR20080067925A (ko) * | 2007-01-17 | 2008-07-22 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
JP2008179039A (ja) * | 2007-01-24 | 2008-08-07 | Canon Inc | 液体吐出ヘッド及び液体吐出ヘッドの製造方法 |
JP2009255415A (ja) | 2008-04-17 | 2009-11-05 | Canon Inc | インクジェット記録ヘッドの製造方法 |
US20120074434A1 (en) * | 2010-09-24 | 2012-03-29 | Jun Seok Park | Light emitting device package and lighting apparatus using the same |
US9062213B2 (en) * | 2013-03-12 | 2015-06-23 | Dow Corning Corporation | Non-aqueous emulsions and methods of preparing surface-treated articles |
-
2012
- 2012-09-21 JP JP2012208131A patent/JP6112809B2/ja not_active Expired - Fee Related
-
2013
- 2013-08-28 US US14/011,940 patent/US9216570B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04211959A (ja) * | 1990-07-21 | 1992-08-03 | Canon Inc | インクジェット記録ヘッド及びそれを用いた記録装置 |
JPH04216952A (ja) * | 1990-12-19 | 1992-08-07 | Canon Inc | 液体噴射記録ヘッド、その製造方法、及び液体噴射記録ヘッドを備えた記録装置 |
JP2007230234A (ja) * | 2006-02-02 | 2007-09-13 | Canon Inc | インクジェット記録ヘッドの製造方法 |
JP2012504059A (ja) * | 2008-09-30 | 2012-02-16 | イーストマン コダック カンパニー | 自己整合穴を有する液滴吐出器 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016175312A (ja) * | 2015-03-20 | 2016-10-06 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
US10201974B2 (en) | 2015-03-20 | 2019-02-12 | Canon Kabushiki Kaisha | Process for producing liquid discharge head |
JP2016221866A (ja) * | 2015-06-01 | 2016-12-28 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
JP2017209951A (ja) * | 2016-05-27 | 2017-11-30 | キヤノン株式会社 | 構造体の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP6112809B2 (ja) | 2017-04-12 |
US9216570B2 (en) | 2015-12-22 |
US20140083974A1 (en) | 2014-03-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6112809B2 (ja) | 液滴吐出ヘッドの製造方法 | |
KR100591654B1 (ko) | 미세 구조체의 제조 방법, 액체 토출 헤드의 제조 방법,및 이 제조 방법으로 제조된 액체 토출 헤드 | |
US20040070643A1 (en) | Method of manufacturing microstructure, method of manufacturing liquid discharge head, and liquid discharge head | |
US20180154637A1 (en) | Method for manufacturing liquid discharge head | |
JP5224771B2 (ja) | 記録ヘッド基板の製造方法 | |
US10343406B2 (en) | Liquid ejection head manufacturing method | |
JP5546504B2 (ja) | 記録ヘッドの製造方法 | |
JP6039259B2 (ja) | 液体吐出ヘッド、およびその製造方法 | |
US8277023B2 (en) | Inkjet printhead and method of manufacturing the same | |
JP2012210757A (ja) | インク吐出ヘッド及びインク吐出ヘッドの製造方法 | |
JP6821467B2 (ja) | 液体吐出ヘッドの製造方法及び液体吐出ヘッド | |
JP2004042396A (ja) | 微細構造体の製造方法、液体吐出ヘッドの製造方法および液体吐出ヘッド | |
JP5328606B2 (ja) | 液体吐出ヘッドの製造方法 | |
JP2021109385A (ja) | 液体吐出ヘッド及び液体吐出ヘッドの製造方法 | |
US8226209B2 (en) | Inkjet printhead and method of manufacturing the same | |
JP2014198386A (ja) | インク吐出ヘッドの製造方法 | |
JP2014128923A (ja) | 液体吐出ヘッドの製造方法 | |
JP2009172871A (ja) | 液体吐出ヘッドの製造方法 | |
US20130244183A1 (en) | Process for producing ink jet recording head | |
JP2014069354A (ja) | インク吐出ヘッドの製造方法及びインク吐出ヘッド | |
JP2019043106A (ja) | 液体吐出ヘッドの製造方法、および構造体の製造方法 | |
JP2014094529A (ja) | インクジェット記録ヘッドおよびその製造方法 | |
JP2012192713A (ja) | インク吐出ヘッドの製造方法 | |
US20130341302A1 (en) | Method for manufacturing liquid discharge head | |
JP2016215466A (ja) | 液体吐出ヘッドの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20140430 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150910 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160712 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20160713 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160902 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170214 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170314 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 6112809 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
LAPS | Cancellation because of no payment of annual fees |