JP6308751B2 - 液体吐出ヘッド用基板の製造方法、液体吐出ヘッド用基板、液体吐出ヘッド、および記録装置 - Google Patents
液体吐出ヘッド用基板の製造方法、液体吐出ヘッド用基板、液体吐出ヘッド、および記録装置 Download PDFInfo
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- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
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- B—PERFORMING OPERATIONS; TRANSPORTING
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Description
(実施形態)
図1は、本実施形態に係る液体吐出ヘッドとしてのインクジェット記録ヘッド(以下「記録ヘッド」という)を用いるインクジェット記録装置(以下「記録装置」という)1000の構成を示す斜視図である。
図7を参照して、本実施例に係る吐出口11の形成方法について説明する。まず、図7(a)に示すように、液室形成層5上にレジスト6を形成する。液室形成層5は、基板1上にポジ型感光性樹脂を塗布し、露光、現像することで形成した。レジスト6は、エポキシ樹脂からなる固形分と、プロピレングリコールモノメチルエーテルアセテート(以下「PGMEA」とする)からなる溶媒と、光酸発生剤とを含有したネガ型のレジストである。光酸発生剤としてトリアリールスルホニウム塩からなる光酸発生剤を選択した。形成方法としてはスピンコート法を選択し、膜厚は10μmとした。
基本的な条件は実施例1と同じであるが、撥水剤7に添加する溶媒をPGMEAからテトラヒドロフラン(以下「THF」という)へと変更した。THFはPGMEAに比べて沸点が低く(PGMEAが146℃に対しTHFは67℃)、かつ飽和蒸気圧が高い(20℃雰囲気下において、PGMEAが28.5mmHgに対しTHFは141.8mmHg)ため揮発し易い。そのため溶媒の浸透深さが浅くなり、実施例1では膜厚1.5μmの相溶層14を形成したことに対し、本実施例では膜厚0.7μmの相溶層14を形成した。
実施例1ではレジスト6の上に撥水成分を含む撥水剤7を塗布したが、撥水剤7から撥水成分を除いた材料(「第2のネガ型感光性レジスト」とする)をレジスト6に塗布しても、実施例1と同じ形状の吐出口を形成することができる。撥水剤に含まれる撥水成分はパターニングには関与しないため、実施例1と同じプロセスを経ると、レジスト6と第2のネガ型感光性レジストとによって形成される相溶層14の膜厚および現像後の吐出口の形状は、撥水剤7を用いた実施例1と同様となる。
上記実施形態においては、液体吐出ヘッドとして、インクジェット記録装置に用いる記録ヘッドを例に挙げて説明した。しかしながら、本発明の製造方法は、バイオチップ作製や電子回路印刷用途の液体吐出ヘッドにも適用することができる。なお、液体吐出ヘッドとしては、インクジェット記録ヘッドの他にも、例えば、カラーフィルタ製造用ヘッド等が挙げられる。
6 レジスト(第1の層形成部材)
7 撥水剤(第2の層形成部材)
11 吐出口
101 記録素子基板(液体吐出ヘッド用基板)
Claims (6)
- 表面に開口し液体を吐出する吐出口が形成されている吐出口形成部材を備える液体吐出ヘッド用基板の製造方法であって、
溶媒および光酸発生剤を含んでいる第1の層形成部材を用いて、第1の層を形成する工程と、
前記第1の層に、溶媒および光酸発生剤を含んでいる第2の層形成部材を用いて、第2の層を形成する工程と、
前記第1の層および前記第2の層の一部の領域を硬化させ、前記一部の領域とは異なる領域を除去して前記吐出口を形成し、前記第1の層および前記第2の層を前記吐出口形成部材とする工程と、を含み、
前記第2の層形成部材として、前記第1の層形成部材を溶解する溶媒が含まれており且つ前記第1の層形成部材に含まれる光酸発生剤の酸の強度よりも弱い強度を有する光酸発生剤が含まれている部材を用い、
前記第2の層形成部材が含む溶媒の溶解度パラメータと前記第1の層形成部材が含む溶媒の溶解度パラメータとの差の絶対値が、4以下の所定の値であることを特徴とする液体吐出ヘッド用基板の製造方法。 - 前記第2の層形成部材に含まれる前記光酸発生剤の強度を前記第1の層形成部材に含まれる前記光酸発生剤の強度よりも弱い請求項1に記載の液体吐出ヘッド用基板の製造方法。
- 前記第2の層形成部材に含まれる溶媒は、前記第1の層形成部材に含まれる溶媒の沸点よりも沸点が低い請求項1または2に記載の液体吐出ヘッド用基板の製造方法。
- 前記第2の層形成部材には、撥水成分が含まれている請求項1ないし3のいずれか1項に記載の液体吐出ヘッド用基板の製造方法。
- 前記吐出口の開口端部における開口面積は、吐出方向上流側よりも吐出方向下流側の方が広い請求項1ないし4のいずれか1項に記載の液体吐出ヘッド用基板の製造方法。
- 前記吐出口の開口端部は角がない形状である請求項5に記載の液体吐出ヘッド用基板の製造方法。
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JP2013233787A JP6308751B2 (ja) | 2013-11-12 | 2013-11-12 | 液体吐出ヘッド用基板の製造方法、液体吐出ヘッド用基板、液体吐出ヘッド、および記録装置 |
US14/525,453 US9308721B2 (en) | 2013-11-12 | 2014-10-28 | Method of manufacturing substrate for liquid ejection head, substrate for liquid ejection head, liquid ejection head, and printing apparatus |
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JP3108771B2 (ja) * | 1991-01-08 | 2000-11-13 | セイコーエプソン株式会社 | インクジェット記録ヘッド |
JP3352723B2 (ja) * | 1992-09-03 | 2002-12-03 | 三菱化学株式会社 | 電子写真感光体の製造方法 |
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