JP2014035334A - 蛍光ｘ線分析方法及び蛍光ｘ線分析装置 - Google Patents

蛍光ｘ線分析方法及び蛍光ｘ線分析装置 Download PDF

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Publication number
JP2014035334A
JP2014035334A JP2012178365A JP2012178365A JP2014035334A JP 2014035334 A JP2014035334 A JP 2014035334A JP 2012178365 A JP2012178365 A JP 2012178365A JP 2012178365 A JP2012178365 A JP 2012178365A JP 2014035334 A JP2014035334 A JP 2014035334A
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Prior art keywords
analysis
determination
ray
sample
measurement
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JP2012178365A
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English (en)
Japanese (ja)
Inventor
masahiro Sakuta
昌博 佐久田
Noriaki Sakai
範昭 坂井
Kiyoshi Hasegawa
清 長谷川
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Hitachi High Tech Science Corp
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Hitachi High Tech Science Corp
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Priority to JP2012178365A priority Critical patent/JP2014035334A/ja
Priority to KR1020130094280A priority patent/KR20140020792A/ko
Priority to CN201310345457.1A priority patent/CN103575757A/zh
Publication of JP2014035334A publication Critical patent/JP2014035334A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/10—Different kinds of radiation or particles
    • G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
    • G01N2223/1016—X-ray
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/302—Accessories, mechanical or electrical features comparative arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/645—Specific applications or type of materials quality control

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2012178365A 2012-08-10 2012-08-10 蛍光ｘ線分析方法及び蛍光ｘ線分析装置 Pending JP2014035334A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012178365A JP2014035334A (ja) 2012-08-10 2012-08-10 蛍光ｘ線分析方法及び蛍光ｘ線分析装置
KR1020130094280A KR20140020792A (ko) 2012-08-10 2013-08-08 형광 x 선 분석 방법 및 형광 x 선 분석 장치
CN201310345457.1A CN103575757A (zh) 2012-08-10 2013-08-09 荧光x射线分析方法和荧光x射线分析装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012178365A JP2014035334A (ja) 2012-08-10 2012-08-10 蛍光ｘ線分析方法及び蛍光ｘ線分析装置

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JP2014035334A true JP2014035334A (ja) 2014-02-24

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JP (1) JP2014035334A (ko)
KR (1) KR20140020792A (ko)
CN (1) CN103575757A (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018159655A (ja) * 2017-03-23 2018-10-11 全星薬品工業株式会社 医薬品の製造工程の工程分析方法
JP2020165757A (ja) * 2019-03-29 2020-10-08 株式会社リガク 蛍光ｘ線分析装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016017823A (ja) * 2014-07-08 2016-02-01 株式会社日立ハイテクサイエンス Ｘ線分析用試料板及び蛍光ｘ線分析装置
JP6990460B2 (ja) * 2020-06-19 2022-01-12 株式会社リガク 蛍光ｘ線分析装置、判定方法及び判定プログラム

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0843329A (ja) * 1994-07-30 1996-02-16 Horiba Ltd 蛍光ｘ線分析方法
JP2000199749A (ja) * 1998-12-29 2000-07-18 Rigaku Industrial Co 蛍光ｘ線分析装置
WO2005106440A1 (ja) * 2004-04-28 2005-11-10 Matsushita Electric Industrial Co., Ltd. 蛍光ｘ線分析方法および蛍光ｘ線分析装置
JP2005534009A (ja) * 2002-07-24 2005-11-10 ヴァリアン メディカル システムズ テクノロジーズ インコーポレイテッド 密輸品についての物体の放射線走査
US20060029182A1 (en) * 2004-08-06 2006-02-09 Yoshiyuki Tani Fluorescent X-ray analysis method and fluorescent X-ray analysis apparatus
JP2006119108A (ja) * 2004-09-24 2006-05-11 Fujitsu Ltd 分析装置及び検査方法
JP2007057314A (ja) * 2005-08-23 2007-03-08 Matsushita Electric Ind Co Ltd 特定物質の含有判定方法およびその装置
JP2009092448A (ja) * 2007-10-05 2009-04-30 Rigaku Corp 蛍光ｘ線分析システムおよびそのシステムに用いるプログラム

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005106439A1 (ja) * 2004-04-28 2005-11-10 Matsushita Electric Industrial Co., Ltd. 蛍光ｘ線分析方法および装置
JP5235447B2 (ja) * 2008-02-22 2013-07-10 株式会社日立ハイテクサイエンス Ｘ線分析装置及びｘ線分析方法
JP5506288B2 (ja) * 2008-08-28 2014-05-28 株式会社日立ハイテクサイエンス 蛍光ｘ線分析装置

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0843329A (ja) * 1994-07-30 1996-02-16 Horiba Ltd 蛍光ｘ線分析方法
US5570406A (en) * 1994-07-30 1996-10-29 Horiba, Ltd. X-ray analyzer system and method of increasing response time
JP2000199749A (ja) * 1998-12-29 2000-07-18 Rigaku Industrial Co 蛍光ｘ線分析装置
JP2005534009A (ja) * 2002-07-24 2005-11-10 ヴァリアン メディカル システムズ テクノロジーズ インコーポレイテッド 密輸品についての物体の放射線走査
WO2005106440A1 (ja) * 2004-04-28 2005-11-10 Matsushita Electric Industrial Co., Ltd. 蛍光ｘ線分析方法および蛍光ｘ線分析装置
US20070248211A1 (en) * 2004-04-28 2007-10-25 Yoshiyuki Tani Fluorescent X-Ray Analysis Method and Fluorescent X-Ray Analysis Device
US20060029182A1 (en) * 2004-08-06 2006-02-09 Yoshiyuki Tani Fluorescent X-ray analysis method and fluorescent X-ray analysis apparatus
WO2006013728A1 (ja) * 2004-08-06 2006-02-09 Matsushita Electric Industrial Co., Ltd. 蛍光ｘ線分析方法および蛍光ｘ線分析装置
JP2006119108A (ja) * 2004-09-24 2006-05-11 Fujitsu Ltd 分析装置及び検査方法
JP2007057314A (ja) * 2005-08-23 2007-03-08 Matsushita Electric Ind Co Ltd 特定物質の含有判定方法およびその装置
JP2009092448A (ja) * 2007-10-05 2009-04-30 Rigaku Corp 蛍光ｘ線分析システムおよびそのシステムに用いるプログラム

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018159655A (ja) * 2017-03-23 2018-10-11 全星薬品工業株式会社 医薬品の製造工程の工程分析方法
JP7058470B2 (ja) 2017-03-23 2022-04-22 全星薬品工業株式会社 医薬品の製造工程の工程分析方法
JP2020165757A (ja) * 2019-03-29 2020-10-08 株式会社リガク 蛍光ｘ線分析装置
WO2020202644A1 (ja) * 2019-03-29 2020-10-08 株式会社リガク 蛍光ｘ線分析装置
CN113692533A (zh) * 2019-03-29 2021-11-23 株式会社理学 荧光x射线分析装置
US11402343B2 (en) 2019-03-29 2022-08-02 Rigaku Corporation X-ray fluorescence spectrometer

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CN103575757A (zh) 2014-02-12
KR20140020792A (ko) 2014-02-19

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