WO2005106440A1 - 蛍光x線分析方法および蛍光x線分析装置 - Google Patents
蛍光x線分析方法および蛍光x線分析装置 Download PDFInfo
- Publication number
- WO2005106440A1 WO2005106440A1 PCT/JP2005/007977 JP2005007977W WO2005106440A1 WO 2005106440 A1 WO2005106440 A1 WO 2005106440A1 JP 2005007977 W JP2005007977 W JP 2005007977W WO 2005106440 A1 WO2005106440 A1 WO 2005106440A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- measurement
- accuracy
- value
- fluorescent
- concentration
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Definitions
- Procedures for quantifying the concentration of element contained in a sample using this type of analysis method are generally well known. A method as an example will be described with reference to FIG. 11 (see Patent Document 1).
- the present invention has been made in view of the above problems that have been found based on the experiments of the inventor, and an object of the present invention is to provide a fluorescent X-ray analysis method and a fluorescent X-ray capable of shortening measurement time and improving operability.
- An object of the present invention is to provide a line analyzer.
- the fluorescent X-ray analysis method is a fluorescent X-ray analysis method for analyzing constituent elements of a fluorescent X-ray force sample generated from a sample irradiated with X-rays, the setting step, It comprises a measuring step, a deriving step, an ending step, and an output step.
- the setting step sets the measurement conditions of the sample.
- the fluorescent X-ray is measured.
- the deriving step derives the measurement concentration and measurement accuracy of the constituent elements from the measurement result.
- the end step ends the measurement of the fluorescent X-ray when the measurement accuracy satisfies the measurement conditions.
- the output step outputs the measured concentration or the measurement accuracy.
- ⁇ 1 is the value of the upper limit target value set in step 121
- kl is the value of the accuracy coefficient set in step 121. That is, when it is determined that the measurement accuracy of the calculation result in the calculation unit 202 is less than the set value ( ⁇ lZkl), the process proceeds to step 126, and the measurement ends (see step 126). .
- the ending condition is indicated using an inequality sign ( ⁇ ) in the expression (3 ′), the part may be an inequality sign [equal sign] ( ⁇ ).
- Each judgment result is displayed by a symbol or the like.
- the judgment result is displayed as ⁇ ⁇ '' when the measurement concentration X satisfies X ⁇ Xtl, ⁇ ⁇ '' when Xtl ⁇ X ⁇ Xt2 is satisfied, and ⁇ X '' when Xt2 ⁇ X ⁇ Xt2 is satisfied. It is done by doing.
- measurement accuracy ⁇ X if the measurement accuracy ⁇ ⁇ ⁇ satisfies ⁇ ⁇ atl, “ ⁇ ”, if ⁇ tl ⁇ ⁇ ⁇ t23 ⁇ 4- This is done by displaying “X” when ⁇ ⁇ ⁇ is satisfied.
- the display of the judgment result is not limited to this, and any display may be used. However, it is preferable that the display be a display that is easy for the user to recognize.
- the set value a which is the smaller value of ( ⁇ lZkl) and ( ⁇ 2 / k2), and the measurement accuracy ⁇ X is determined, and measurement is performed until a stricter one of the measurement conditions set in step 141a is satisfied.
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05737192.4A EP1757925B1 (en) | 2004-04-28 | 2005-04-27 | Fluorescent x-ray analysis method and fluorescent x-ray analysis device |
JP2006512798A JP4928938B2 (ja) | 2004-04-28 | 2005-04-27 | 蛍光x線分析方法および蛍光x線分析装置 |
US11/587,856 US7382855B2 (en) | 2004-04-28 | 2005-04-27 | Fluorescent x-ray analysis method and fluorescent x-ray analysis device |
CN200580013286.6A CN1947003B (zh) | 2004-04-28 | 2005-04-27 | 荧光x射线分析方法及荧光x射线分析装置 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004133135 | 2004-04-28 | ||
JP2004-133135 | 2004-04-28 | ||
JP2004-318844 | 2004-11-02 | ||
JP2004318844 | 2004-11-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005106440A1 true WO2005106440A1 (ja) | 2005-11-10 |
Family
ID=35241783
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2005/007977 WO2005106440A1 (ja) | 2004-04-28 | 2005-04-27 | 蛍光x線分析方法および蛍光x線分析装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7382855B2 (ja) |
EP (1) | EP1757925B1 (ja) |
JP (1) | JP4928938B2 (ja) |
CN (1) | CN1947003B (ja) |
WO (1) | WO2005106440A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009097957A (ja) * | 2007-10-16 | 2009-05-07 | Jeol Ltd | X線スペクトルを用いる分析方法 |
JP2014035334A (ja) * | 2012-08-10 | 2014-02-24 | Hitachi High-Tech Science Corp | 蛍光x線分析方法及び蛍光x線分析装置 |
JP2015520855A (ja) * | 2012-05-22 | 2015-07-23 | クロメック リミテッドKromek Limited | 放射線検出装置および放射線検出方法 |
JP2017049098A (ja) * | 2015-09-01 | 2017-03-09 | 株式会社堀場製作所 | 蛍光x線分析装置、蛍光x線分析方法及びコンピュータプログラム |
WO2020202644A1 (ja) * | 2019-03-29 | 2020-10-08 | 株式会社リガク | 蛍光x線分析装置 |
JP6917668B1 (ja) * | 2019-12-19 | 2021-08-11 | 株式会社リガク | エネルギー分散型蛍光x線分析装置、評価方法及び評価プログラム |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8223917B2 (en) | 2005-09-01 | 2012-07-17 | Kabushiki Kaisha Toshiba | Method of quantitative analysis of hexavalent chromium in chromate coating and method for controlling hazardous element in encapsulating resin of resin encapsulation semiconductor device |
CN101776622B (zh) * | 2009-12-29 | 2012-06-13 | 聚光科技(杭州)股份有限公司 | 一种土壤测量方法 |
CN110998300B (zh) * | 2017-08-07 | 2022-12-09 | 上村工业株式会社 | 荧光x射线分析的测定方法以及荧光x射线分析的测定装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0843329A (ja) | 1994-07-30 | 1996-02-16 | Horiba Ltd | 蛍光x線分析方法 |
JP2001099795A (ja) * | 1999-09-30 | 2001-04-13 | Shimadzu Corp | 元素マッピング装置 |
US20040030506A1 (en) | 2000-10-09 | 2004-02-12 | Bodo Krebs | Method for shortening the statistical measurement times in the domain of radioactivity measurements |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2821656B2 (ja) * | 1992-10-11 | 1998-11-05 | 株式会社堀場製作所 | 複数条件蛍光x線定性分析方法 |
DE19739321C2 (de) * | 1997-09-09 | 2001-09-27 | Helmut Fischer Gmbh & Co | Verfahren und Einrichtung zum Bestimmen der Meßunsicherheit bei Röntgenfluoreszenz-Schichtdickenmessungen |
US6130931A (en) * | 1998-09-17 | 2000-10-10 | Process Control, Inc. | X-ray fluorescence elemental analyzer |
CN2491832Y (zh) * | 2001-02-27 | 2002-05-15 | 成都理工学院 | 便携式管激发x射线荧光仪 |
-
2005
- 2005-04-27 CN CN200580013286.6A patent/CN1947003B/zh active Active
- 2005-04-27 JP JP2006512798A patent/JP4928938B2/ja active Active
- 2005-04-27 WO PCT/JP2005/007977 patent/WO2005106440A1/ja active Application Filing
- 2005-04-27 EP EP05737192.4A patent/EP1757925B1/en active Active
- 2005-04-27 US US11/587,856 patent/US7382855B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0843329A (ja) | 1994-07-30 | 1996-02-16 | Horiba Ltd | 蛍光x線分析方法 |
US5570406A (en) | 1994-07-30 | 1996-10-29 | Horiba, Ltd. | X-ray analyzer system and method of increasing response time |
JP2001099795A (ja) * | 1999-09-30 | 2001-04-13 | Shimadzu Corp | 元素マッピング装置 |
US20040030506A1 (en) | 2000-10-09 | 2004-02-12 | Bodo Krebs | Method for shortening the statistical measurement times in the domain of radioactivity measurements |
Non-Patent Citations (1)
Title |
---|
SIA AFSHARI ET AL.: "Quantitative Measurement of Lead in Paint by XRF Analysis Without Manual Substrate Correction", APPL. RADIAT. ISOT., vol. 48, no. 10-12, 1997, pages 1425 - 1431, XP004101730, DOI: doi:10.1016/S0969-8043(97)00138-3 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009097957A (ja) * | 2007-10-16 | 2009-05-07 | Jeol Ltd | X線スペクトルを用いる分析方法 |
JP2015520855A (ja) * | 2012-05-22 | 2015-07-23 | クロメック リミテッドKromek Limited | 放射線検出装置および放射線検出方法 |
JP2014035334A (ja) * | 2012-08-10 | 2014-02-24 | Hitachi High-Tech Science Corp | 蛍光x線分析方法及び蛍光x線分析装置 |
JP2017049098A (ja) * | 2015-09-01 | 2017-03-09 | 株式会社堀場製作所 | 蛍光x線分析装置、蛍光x線分析方法及びコンピュータプログラム |
WO2020202644A1 (ja) * | 2019-03-29 | 2020-10-08 | 株式会社リガク | 蛍光x線分析装置 |
CN113692533A (zh) * | 2019-03-29 | 2021-11-23 | 株式会社理学 | 荧光x射线分析装置 |
US11402343B2 (en) | 2019-03-29 | 2022-08-02 | Rigaku Corporation | X-ray fluorescence spectrometer |
JP6917668B1 (ja) * | 2019-12-19 | 2021-08-11 | 株式会社リガク | エネルギー分散型蛍光x線分析装置、評価方法及び評価プログラム |
Also Published As
Publication number | Publication date |
---|---|
CN1947003A (zh) | 2007-04-11 |
CN1947003B (zh) | 2010-12-29 |
EP1757925A1 (en) | 2007-02-28 |
EP1757925A4 (en) | 2007-12-19 |
JPWO2005106440A1 (ja) | 2007-12-13 |
JP4928938B2 (ja) | 2012-05-09 |
EP1757925B1 (en) | 2014-05-07 |
US7382855B2 (en) | 2008-06-03 |
US20070248211A1 (en) | 2007-10-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2005106440A1 (ja) | 蛍光x線分析方法および蛍光x線分析装置 | |
JP4755594B2 (ja) | 蛍光x線分析方法および蛍光x線分析装置 | |
JP6325338B2 (ja) | 分析装置及び校正方法 | |
EP3091350B1 (en) | Sample analyzer and sample analyzing method | |
WO2015056304A1 (ja) | 蛍光x線分析方法及び蛍光x線分析装置 | |
WO2013161737A1 (ja) | 質量分析装置及び質量分析方法 | |
US5570406A (en) | X-ray analyzer system and method of increasing response time | |
JP5697388B2 (ja) | X線分析方法,x線分析装置及びそのプログラム | |
US7289598B2 (en) | X-ray fluorescent analysis apparatus | |
JP2021128027A (ja) | 定量分析方法、定量分析プログラム及び蛍光x線分析装置 | |
US10557808B2 (en) | Method and apparatus for discriminating resin | |
CN107076860B (zh) | 放射性材料测定 | |
JP3965173B2 (ja) | 蛍光x線分析装置およびそれに用いるプログラム | |
JP4523958B2 (ja) | 蛍光x線分析装置およびそれに用いるプログラム | |
JP2014035334A (ja) | 蛍光x線分析方法及び蛍光x線分析装置 | |
JP2017020924A (ja) | 樹脂判別装置及び樹脂判別方法 | |
US20090262890A1 (en) | X-ray fluorescence analysis to determine levels of hazardous substances | |
JP6438865B2 (ja) | 蛍光x線分析装置、蛍光x線分析方法及びコンピュータプログラム | |
JP6191408B2 (ja) | 蛍光x線分析装置 | |
JP5634763B2 (ja) | 蛍光x線分析装置及びコンピュータプログラム | |
JP3291253B2 (ja) | 蛍光x線分析装置 | |
JP2015135310A (ja) | 血液凝固分析装置 | |
JP4607565B2 (ja) | 分析方法及び装置 | |
JP2019090652A (ja) | 分析装置 | |
WO2023210136A1 (ja) | 蛍光x線分析装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 200580013286.6 Country of ref document: CN |
|
WWE | Wipo information: entry into national phase |
Ref document number: 11587856 Country of ref document: US Ref document number: 2006512798 Country of ref document: JP |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2005737192 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 2005737192 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 11587856 Country of ref document: US |