JP2014011408A - 半導体装置の製造方法および研磨装置 - Google Patents
半導体装置の製造方法および研磨装置 Download PDFInfo
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- JP2014011408A JP2014011408A JP2012148899A JP2012148899A JP2014011408A JP 2014011408 A JP2014011408 A JP 2014011408A JP 2012148899 A JP2012148899 A JP 2012148899A JP 2012148899 A JP2012148899 A JP 2012148899A JP 2014011408 A JP2014011408 A JP 2014011408A
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- polishing
- metal layer
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- semiconductor device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
- B24B49/105—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means using eddy currents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/7684—Smoothing; Planarisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
Abstract
【解決手段】実施形態に係る半導体装置の製造方法は、絶縁膜に配線溝を形成する工程と、前記絶縁膜の上面および前記配線溝の内面を覆うバリアメタル層と、前記配線溝の内部を埋め込み前記バリアメタル層を覆う金属層と、を形成する工程と、前記金属層に第1の荷重を加えて研磨する第1の研磨工程と、前記第1の荷重よりも重い第2の荷重を加え、前記研磨パッドにガスを吹き付けながら前記金属層を研磨する第2の研磨工程と、を備える。
【選択図】図1
Description
Claims (5)
- 絶縁膜に配線溝を形成する工程と、
前記絶縁膜の上面および前記配線溝の内面を覆うバリアメタル層と、前記配線溝の内部を埋め込み前記バリアメタル層を覆う金属層と、を形成する工程と、
前記金属層に第1の荷重を加えて研磨する第1の研磨工程と、
前記第1の荷重よりも重い第2の荷重を加え、前記研磨パッドにガスを吹き付ける第2の研磨工程と、
を備えた半導体装置の製造方法。 - 前記第1の研磨工程の終点を検出し、前記第2の研磨工程に連続して移行する請求項1記載の半導体装置の製造方法。
- 前記金属層は、銅(Cu)を含む請求項1または2に記載の半導体装置の製造方法。
- 前記研磨パッドに吹き付けるガスの流量は、毎分500リットル以下である請求項1〜3のいずれか1つに記載の半導体装置の製造方法。
- バリアメタル層の上に形成された金属層を研磨パッドに当接させて連続的に研磨するプログラムであって、
前記金属層の研磨の終点を検出するステップと、
前記金属層の研磨の終点を検出後、研磨荷重を第1の荷重から第2の荷重へ増加させ、前記研磨パッドへのガスの吹きつけを開始するステップと、
を有するプログラムを備えた研磨装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012148899A JP2014011408A (ja) | 2012-07-02 | 2012-07-02 | 半導体装置の製造方法および研磨装置 |
US13/779,093 US9012246B2 (en) | 2012-07-02 | 2013-02-27 | Manufacturing method of semiconductor device and polishing apparatus |
Applications Claiming Priority (1)
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---|---|---|---|
JP2012148899A JP2014011408A (ja) | 2012-07-02 | 2012-07-02 | 半導体装置の製造方法および研磨装置 |
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JP2014011408A true JP2014011408A (ja) | 2014-01-20 |
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JP2012148899A Pending JP2014011408A (ja) | 2012-07-02 | 2012-07-02 | 半導体装置の製造方法および研磨装置 |
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US (1) | US9012246B2 (ja) |
JP (1) | JP2014011408A (ja) |
Families Citing this family (1)
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CN109585315B (zh) * | 2017-09-29 | 2020-11-03 | 联华电子股份有限公司 | 半导体结构的制作方法 |
Citations (7)
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JPH02199832A (ja) * | 1989-01-30 | 1990-08-08 | Shin Etsu Handotai Co Ltd | ウエーハ研磨装置 |
JPH11347935A (ja) * | 1998-06-10 | 1999-12-21 | Ebara Corp | 研磨装置 |
JP2003031577A (ja) * | 2001-07-17 | 2003-01-31 | Matsushita Electric Ind Co Ltd | 堆積膜の平坦化方法 |
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JPH02199832A (ja) * | 1989-01-30 | 1990-08-08 | Shin Etsu Handotai Co Ltd | ウエーハ研磨装置 |
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US20140004628A1 (en) | 2014-01-02 |
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