JP2013536150A5 - - Google Patents

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Publication number
JP2013536150A5
JP2013536150A5 JP2013525412A JP2013525412A JP2013536150A5 JP 2013536150 A5 JP2013536150 A5 JP 2013536150A5 JP 2013525412 A JP2013525412 A JP 2013525412A JP 2013525412 A JP2013525412 A JP 2013525412A JP 2013536150 A5 JP2013536150 A5 JP 2013536150A5
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JP
Japan
Prior art keywords
crucible
layer
silicon
polysilazane
forming
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Application number
JP2013525412A
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English (en)
Japanese (ja)
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JP5975994B2 (ja
JP2013536150A (ja
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Priority claimed from FR1056804A external-priority patent/FR2964117B1/fr
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Publication of JP2013536150A publication Critical patent/JP2013536150A/ja
Publication of JP2013536150A5 publication Critical patent/JP2013536150A5/ja
Application granted granted Critical
Publication of JP5975994B2 publication Critical patent/JP5975994B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013525412A 2010-08-27 2011-08-26 シリコンインゴットを凝固させるためのるつぼ Expired - Fee Related JP5975994B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1056804 2010-08-27
FR1056804A FR2964117B1 (fr) 2010-08-27 2010-08-27 Creuset pour la solidification de lingot de silicium
PCT/IB2011/053748 WO2012025905A1 (fr) 2010-08-27 2011-08-26 Creuset pour la solidification de lingot de silicium

Publications (3)

Publication Number Publication Date
JP2013536150A JP2013536150A (ja) 2013-09-19
JP2013536150A5 true JP2013536150A5 (enExample) 2014-10-09
JP5975994B2 JP5975994B2 (ja) 2016-08-23

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ID=43037050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013525412A Expired - Fee Related JP5975994B2 (ja) 2010-08-27 2011-08-26 シリコンインゴットを凝固させるためのるつぼ

Country Status (8)

Country Link
US (1) US20130247334A1 (enExample)
EP (1) EP2609043A1 (enExample)
JP (1) JP5975994B2 (enExample)
KR (1) KR20130097186A (enExample)
CN (1) CN103080028B (enExample)
BR (1) BR112013004537A2 (enExample)
FR (1) FR2964117B1 (enExample)
WO (1) WO2012025905A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5557334B2 (ja) * 2010-12-27 2014-07-23 コバレントマテリアル株式会社 シリコン単結晶引上げ用シリカガラスルツボ
US9352389B2 (en) 2011-09-16 2016-05-31 Silicor Materials, Inc. Directional solidification system and method
FR2986228B1 (fr) * 2012-01-31 2014-02-28 Commissariat Energie Atomique Creuset pour la solidification de lingot de silicium.
DE102012019519B4 (de) 2012-10-05 2015-11-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung einer diffusionshemmenden Beschichtung, Tiegel zum Schmelzen und/oder Kristallisieren von Nichteisenmetallen sowie Verwendungszwecke
TWI643983B (zh) 2013-03-14 2018-12-11 美商希利柯爾材料股份有限公司 定向凝固系統及方法
DE102016201495B4 (de) 2016-02-01 2019-05-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Tiegel mit einer Innenbeschichtung aus SiC als Diffusionsbarriere für Metalle sowie Verfahren zu dessen Herstellung, Verwendung und darin hergestellte Halbleiterkristalle
JP6564151B1 (ja) * 2019-02-28 2019-08-21 株式会社アドマップ ＳｉＣ膜単体構造体
CN112457027B (zh) * 2020-11-26 2022-10-11 西安鑫垚陶瓷复合材料有限公司 大尺寸圆截面陶瓷基复合材料构件熔融渗硅工装及方法
KR102677112B1 (ko) * 2022-05-09 2024-06-20 (주)셀릭 저저항 대구경 잉곳 제조장치
CN116462520A (zh) * 2023-04-28 2023-07-21 长沙新立硅材料科技有限公司 一种用于单晶硅拉制的无氧氮化硅坩埚的制作方法

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JPH0365581A (ja) * 1989-08-01 1991-03-20 Nkk Corp 炭素焼結体の耐酸化性向上方法
US5114749A (en) * 1989-08-01 1992-05-19 Nkk Corporation Method for manufacturing carbon material having good resistance to oxidation by coating the carbon material with an inorganic polysilazane and then heating
JPH0365574A (ja) * 1989-08-01 1991-03-20 Nkk Corp 炭素と炭化ケイ素からなる多孔体の製造方法
US5322825A (en) 1992-05-29 1994-06-21 Allied-Signal Inc. Silicon oxycarbonitride by pyrolysis of polycyclosiloxanes in ammonia
US5837318A (en) * 1995-04-26 1998-11-17 Mcdonnell Douglas Corporation Process for production of low dielectric ceramic composites
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DE112004001567B4 (de) * 2003-08-26 2010-09-30 Kyocera Corp. Auf Siliciumnitrid basierendes Sintermaterial und Verfahren zur Erzeugung desselben und ein schmelzfestes Bauteil und ein verschleissfestes Bauteil unter Verwendung desselben
DE10342042A1 (de) * 2003-09-11 2005-04-07 Wacker-Chemie Gmbh Verfahren zur Herstellung eines Si3N4 beschichteten SiO2-Formkörpers
DE102005032790A1 (de) * 2005-06-06 2006-12-07 Deutsche Solar Ag Behälter mit Beschichtung und Herstellungsverfahren
DE102005042944A1 (de) 2005-09-08 2007-03-22 Clariant International Limited Polysilazane enthaltende Beschichtungen für Metall- und Polymeroberflächen
TWI400369B (zh) * 2005-10-06 2013-07-01 Vesuvius Crucible Co 用於矽結晶的坩堝及其製造方法
DE102006008308A1 (de) * 2006-02-23 2007-08-30 Clariant International Limited Polysilazane enthaltende Beschichtungen zur Vermeidung von Zunderbildung und Korrosion
DE102007053284A1 (de) * 2007-11-08 2009-05-20 Esk Ceramics Gmbh & Co. Kg Fest haftende siliciumnitridhaltige Trennschicht
JP2010030851A (ja) * 2008-03-24 2010-02-12 Kyocera Corp 結晶シリコン粒子の製造方法、坩堝及びその製造方法、並びに結晶シリコン粒子の製造装置
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