JP2013511815A5 - - Google Patents

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JP2013511815A5
JP2013511815A5 JP2012540099A JP2012540099A JP2013511815A5 JP 2013511815 A5 JP2013511815 A5 JP 2013511815A5 JP 2012540099 A JP2012540099 A JP 2012540099A JP 2012540099 A JP2012540099 A JP 2012540099A JP 2013511815 A5 JP2013511815 A5 JP 2013511815A5
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voltage
open loop
response
change
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JP2012540099A
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JP5837503B2 (ja
JP2013511815A (ja
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JP2012540099A 2009-11-19 2010-11-19 プラズマ処理システム内でプラズマの閉じ込め状態を検出するための方法および装置 Active JP5837503B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US26288609P 2009-11-19 2009-11-19
US61/262,886 2009-11-19
US30362810P 2010-02-11 2010-02-11
US61/303,628 2010-02-11
US12/907,859 US8901935B2 (en) 2009-11-19 2010-10-19 Methods and apparatus for detecting the confinement state of plasma in a plasma processing system
US12/907,859 2010-10-19
PCT/US2010/057478 WO2011063262A2 (en) 2009-11-19 2010-11-19 Methods and apparatus for detecting the confinement state of plasma in a plasma processing system

Publications (3)

Publication Number Publication Date
JP2013511815A JP2013511815A (ja) 2013-04-04
JP2013511815A5 true JP2013511815A5 (enExample) 2014-01-09
JP5837503B2 JP5837503B2 (ja) 2015-12-24

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JP2012540099A Active JP5837503B2 (ja) 2009-11-19 2010-11-19 プラズマ処理システム内でプラズマの閉じ込め状態を検出するための方法および装置

Country Status (7)

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US (1) US8901935B2 (enExample)
JP (1) JP5837503B2 (enExample)
KR (1) KR101821424B1 (enExample)
CN (1) CN102612738B (enExample)
SG (1) SG10201406957PA (enExample)
TW (1) TWI529844B (enExample)
WO (1) WO2011063262A2 (enExample)

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