JP2013250231A - 位相差検出装置、位相差検出プログラム及び位相差検出装置を用いたプラズマ処理システム - Google Patents

位相差検出装置、位相差検出プログラム及び位相差検出装置を用いたプラズマ処理システム Download PDF

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Publication number
JP2013250231A
JP2013250231A JP2012127048A JP2012127048A JP2013250231A JP 2013250231 A JP2013250231 A JP 2013250231A JP 2012127048 A JP2012127048 A JP 2012127048A JP 2012127048 A JP2012127048 A JP 2012127048A JP 2013250231 A JP2013250231 A JP 2013250231A
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Japan
Prior art keywords
signal
phase difference
frequency
value
cosine
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JP2012127048A
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English (en)
Japanese (ja)
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JP2013250231A5 (enExample
Inventor
Toyokazu Kitano
豊和 北野
Yoshinobu Kasai
善信 笠井
Yuji Yoshizako
裕司 吉迫
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Daihen Corp
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Daihen Corp
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Priority to JP2012127048A priority Critical patent/JP2013250231A/ja
Priority to US13/904,514 priority patent/US9110106B2/en
Publication of JP2013250231A publication Critical patent/JP2013250231A/ja
Publication of JP2013250231A5 publication Critical patent/JP2013250231A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R25/00—Arrangements for measuring phase angle between a voltage and a current or between voltages or currents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32926—Software, data control or modelling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/26—Matching networks

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Measuring Phase Differences (AREA)
  • Drying Of Semiconductors (AREA)
JP2012127048A 2012-06-04 2012-06-04 位相差検出装置、位相差検出プログラム及び位相差検出装置を用いたプラズマ処理システム Pending JP2013250231A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012127048A JP2013250231A (ja) 2012-06-04 2012-06-04 位相差検出装置、位相差検出プログラム及び位相差検出装置を用いたプラズマ処理システム
US13/904,514 US9110106B2 (en) 2012-06-04 2013-05-29 Phase difference detector, phase difference detection program, and plasma processing system using the phase difference detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012127048A JP2013250231A (ja) 2012-06-04 2012-06-04 位相差検出装置、位相差検出プログラム及び位相差検出装置を用いたプラズマ処理システム

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JP2013250231A true JP2013250231A (ja) 2013-12-12
JP2013250231A5 JP2013250231A5 (enExample) 2014-07-24

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JP2012127048A Pending JP2013250231A (ja) 2012-06-04 2012-06-04 位相差検出装置、位相差検出プログラム及び位相差検出装置を用いたプラズマ処理システム

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US (1) US9110106B2 (enExample)
JP (1) JP2013250231A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9312106B2 (en) * 2013-03-13 2016-04-12 Applied Materials, Inc. Digital phase controller for two-phase operation of a plasma reactor
US10048300B2 (en) 2014-04-25 2018-08-14 Qualcomm Technologies, Inc. Detector circuit
JP6541540B2 (ja) * 2015-10-06 2019-07-10 東京エレクトロン株式会社 プラズマ処理装置のインピーダンス整合のための方法
JP6589613B2 (ja) * 2015-12-10 2019-10-16 いすゞ自動車株式会社 リアクタンス測定装置
CN109164293B (zh) * 2018-07-10 2022-06-17 深圳市华宝新能源股份有限公司 一种市电掉电检测方法、电子设备、存储介质和储能系统
US10720305B2 (en) * 2018-12-21 2020-07-21 Advanced Energy Industries, Inc. Plasma delivery system for modulated plasma systems
US11515123B2 (en) * 2018-12-21 2022-11-29 Advanced Energy Industries, Inc. Apparatus and system for modulated plasma systems
US11804362B2 (en) * 2018-12-21 2023-10-31 Advanced Energy Industries, Inc. Frequency tuning for modulated plasma systems
US20240404789A1 (en) * 2021-10-18 2024-12-05 Lam Research Corporation Systems and methods for determining a phase difference between rf signals provided to electrodes
CN114828370B (zh) * 2022-03-18 2024-04-19 合肥工业大学 一种用于等离子体密度测量的自适应相位差计算方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04370772A (ja) * 1991-06-20 1992-12-24 Ono Sokki Co Ltd 信号特性測定装置
JPH09161994A (ja) * 1995-12-07 1997-06-20 Pearl Kogyo Kk 放電プラズマ発生用高周波電源装置及び半導体製造装置
JPH10326698A (ja) * 1996-05-15 1998-12-08 Daihen Corp プラズマ処理装置
JP2002329599A (ja) * 2001-04-06 2002-11-15 Eni Technologies Inc 位相検出及び電力を供給する装置
JP2008130398A (ja) * 2006-11-22 2008-06-05 Pearl Kogyo Co Ltd 高周波電源装置および高周波電力供給方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3875394A (en) * 1973-04-20 1975-04-01 Willis H Acting Admini Shapely Correlation type phase detector
US5953370A (en) * 1994-09-09 1999-09-14 Omnipoint Corporation Apparatus for receiving and correlating a spread spectrum signal
US5663992A (en) * 1996-03-14 1997-09-02 Trimble Navigation Limited Method and apparatus for correction of GPS carrier phase measurement
US6282228B1 (en) * 1997-03-20 2001-08-28 Xircom, Inc. Spread spectrum codes for use in communication
US6875366B2 (en) * 2000-09-12 2005-04-05 Hitachi, Ltd. Plasma processing apparatus and method with controlled biasing functions
US20030056157A1 (en) * 2001-09-07 2003-03-20 Fala Joseph M. Method and apparatus for testing network integrity
JP5389311B2 (ja) * 2005-04-21 2014-01-15 株式会社ダイヘン 信号処理装置
US7227346B1 (en) * 2005-08-23 2007-06-05 Timing Solutions Corporation Two channel digital phase detector
US7511469B2 (en) * 2006-07-24 2009-03-31 California Institute Of Technology Phase measurement device using inphase and quadrature components for phase estimation

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04370772A (ja) * 1991-06-20 1992-12-24 Ono Sokki Co Ltd 信号特性測定装置
JPH09161994A (ja) * 1995-12-07 1997-06-20 Pearl Kogyo Kk 放電プラズマ発生用高周波電源装置及び半導体製造装置
JPH10326698A (ja) * 1996-05-15 1998-12-08 Daihen Corp プラズマ処理装置
JP2002329599A (ja) * 2001-04-06 2002-11-15 Eni Technologies Inc 位相検出及び電力を供給する装置
JP2008130398A (ja) * 2006-11-22 2008-06-05 Pearl Kogyo Co Ltd 高周波電源装置および高周波電力供給方法

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US9110106B2 (en) 2015-08-18
US20130320852A1 (en) 2013-12-05

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