JP2013247113A5 - - Google Patents

Download PDF

Info

Publication number
JP2013247113A5
JP2013247113A5 JP2013102688A JP2013102688A JP2013247113A5 JP 2013247113 A5 JP2013247113 A5 JP 2013247113A5 JP 2013102688 A JP2013102688 A JP 2013102688A JP 2013102688 A JP2013102688 A JP 2013102688A JP 2013247113 A5 JP2013247113 A5 JP 2013247113A5
Authority
JP
Japan
Prior art keywords
thin film
ctf
phase plate
phase
phase shift
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013102688A
Other languages
English (en)
Japanese (ja)
Other versions
JP6027942B2 (ja
JP2013247113A (ja
Filing date
Publication date
Priority claimed from EP20120168997 external-priority patent/EP2667399A1/en
Application filed filed Critical
Publication of JP2013247113A publication Critical patent/JP2013247113A/ja
Publication of JP2013247113A5 publication Critical patent/JP2013247113A5/ja
Application granted granted Critical
Publication of JP6027942B2 publication Critical patent/JP6027942B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013102688A 2012-05-23 2013-05-15 Tem用位相板 Active JP6027942B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP20120168997 EP2667399A1 (en) 2012-05-23 2012-05-23 Improved phase plate for a TEM
EP12168997.0 2012-05-23

Publications (3)

Publication Number Publication Date
JP2013247113A JP2013247113A (ja) 2013-12-09
JP2013247113A5 true JP2013247113A5 (https=) 2016-03-31
JP6027942B2 JP6027942B2 (ja) 2016-11-16

Family

ID=46149231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013102688A Active JP6027942B2 (ja) 2012-05-23 2013-05-15 Tem用位相板

Country Status (4)

Country Link
US (2) US8772716B2 (https=)
EP (1) EP2667399A1 (https=)
JP (1) JP6027942B2 (https=)
CN (1) CN103560067B (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2667399A1 (en) * 2012-05-23 2013-11-27 FEI Company Improved phase plate for a TEM
EP2690648B1 (en) * 2012-07-26 2014-10-15 Fei Company Method of preparing and imaging a lamella in a particle-optical apparatus
TWI544513B (zh) * 2012-12-18 2016-08-01 中央研究院 可釋出電荷的晶片式薄膜哲尼克相位板及用其觀察有機材料的方法
JP6286270B2 (ja) 2013-04-25 2018-02-28 エフ イー アイ カンパニFei Company 透過型電子顕微鏡内で位相版を用いる方法
DE102013019297A1 (de) 2013-11-19 2015-05-21 Fei Company Phasenplatte für ein Transmissionselektronenmikroskop
EP2881970A1 (en) * 2013-12-04 2015-06-10 Fei Company Method of producing a freestanding thin film of nano-crystalline carbon
US9953802B2 (en) * 2014-01-21 2018-04-24 Ramot At Tel-Aviv University Ltd. Method and device for manipulating particle beam
JP2016110767A (ja) * 2014-12-04 2016-06-20 日本電子株式会社 荷電粒子ビーム装置および画像取得方法
JP2016170951A (ja) * 2015-03-12 2016-09-23 日本電子株式会社 位相板およびその製造方法、ならびに電子顕微鏡
US10109453B2 (en) * 2015-03-18 2018-10-23 Battelle Memorial Institute Electron beam masks for compressive sensors
US10170274B2 (en) 2015-03-18 2019-01-01 Battelle Memorial Institute TEM phase contrast imaging with image plane phase grating
WO2017189212A1 (en) 2016-04-29 2017-11-02 Battelle Memorial Institute Compressive scanning spectroscopy
WO2018037444A1 (ja) * 2016-08-22 2018-03-01 株式会社日立ハイテクノロジーズ 電子顕微鏡および観察方法
US10295677B2 (en) 2017-05-08 2019-05-21 Battelle Memorial Institute Systems and methods for data storage and retrieval
JP7051591B2 (ja) * 2018-06-05 2022-04-11 株式会社日立製作所 透過電子顕微鏡
US12033829B2 (en) 2019-05-28 2024-07-09 The Board Of Trustees Of The Leland Stanford Junior University Optically-addressed phase modulator for electron beams

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3773389B2 (ja) * 2000-03-27 2006-05-10 日本電子株式会社 位相差電子顕微鏡用薄膜位相板並びに位相差電子顕微鏡及び位相板帯電防止法
JP4328044B2 (ja) * 2001-09-25 2009-09-09 日本電子株式会社 差分コントラスト電子顕微鏡および電子顕微鏡像のデータ処理方法
DE10200645A1 (de) * 2002-01-10 2003-07-24 Leo Elektronenmikroskopie Gmbh Elektronenmikroskop mit ringförmiger Beleuchtungsapertur
US7737412B2 (en) * 2004-07-12 2010-06-15 The Regents Of The University Of California Electron microscope phase enhancement
JP4625317B2 (ja) * 2004-12-03 2011-02-02 ナガヤマ アイピー ホールディングス リミテッド ライアビリティ カンパニー 位相差電子顕微鏡用位相板及びその製造方法並びに位相差電子顕微鏡
DE102005040267B4 (de) * 2005-08-24 2007-12-27 Universität Karlsruhe Verfahren zum Herstellen einer mehrschichtigen elektrostatischen Linsenanordnung, insbesondere einer Phasenplatte und derartige Phasenplatte
EP2091062A1 (en) 2008-02-13 2009-08-19 FEI Company TEM with aberration corrector and phase plate
EP2131385A1 (en) * 2008-06-05 2009-12-09 FEI Company Hybrid phase plate
US7977633B2 (en) 2008-08-27 2011-07-12 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E. V. Phase plate, in particular for an electron microscope
JP4896106B2 (ja) * 2008-09-30 2012-03-14 株式会社日立ハイテクノロジーズ 電子顕微鏡
EP2400522A1 (en) 2010-06-24 2011-12-28 Fei Company Blocking member for use in the diffraction plane of a TEM
WO2012009543A2 (en) 2010-07-14 2012-01-19 Fei Company Improved contrast for scanning confocal electron microscope
EP2485239A1 (en) * 2011-02-07 2012-08-08 FEI Company Method for centering an optical element in a TEM comprising a contrast enhancing element
EP2667399A1 (en) * 2012-05-23 2013-11-27 FEI Company Improved phase plate for a TEM
EP2704178B1 (en) 2012-08-30 2014-08-20 Fei Company Imaging a sample in a TEM equipped with a phase plate

Similar Documents

Publication Publication Date Title
JP2013247113A5 (https=)
JP6055643B2 (ja) 位相板
CN103681187B (zh) 对配备有相位板的tem中的样本进行成像
JP6027942B2 (ja) Tem用位相板
JP2014205902A5 (ja) 金属酸化物膜
JP2014186333A5 (ja) 透過型マスクブランク、透過型マスク及び半導体装置の製造方法
JP2014216319A5 (https=)
JP2019027927A5 (https=)
JP2014157364A5 (ja) 透過型マスクブランク、透過型マスク及び半導体装置の製造方法
JP2014055349A5 (ja) 金属酸化物膜
WO2020146029A3 (en) Color and multi-spectral image sensor based on 3d engineered material
JP2017227933A5 (ja) 反射型マスクブランク及びその製造方法、並びに反射型マスク及びその製造方法
JP2013153140A5 (ja) 半導体装置の作製方法
JP2013179270A5 (https=)
JP2014179281A5 (https=)
JP2014068330A5 (https=)
JP2014181910A5 (https=)
JP2014142339A5 (https=)
JP2017227936A5 (ja) 多層反射膜付き基板の製造方法、反射型マスクブランクの製造方法及び反射型マスクの製造方法
JP2016113358A5 (https=)
JP2016170951A (ja) 位相板およびその製造方法、ならびに電子顕微鏡
JP2018002139A5 (https=)
JP2018010031A5 (https=)
JP4726048B2 (ja) 位相回復方式の電子顕微鏡による観察方法
JP6422050B2 (ja) X線光学系基材、及びその製造方法