JP2013153289A - 弾性波デバイス及び弾性波デバイスの製造方法 - Google Patents
弾性波デバイス及び弾性波デバイスの製造方法 Download PDFInfo
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Abstract
【解決手段】本発明は、圧電基板10と、圧電基板10の面10a上に設けられ、高周波信号が入力する入力端子Inと、入力端子Inに接続され、入力端子Inに入力された高周波信号が入力する共振子と、入力端子Inと圧電基板10との間に設けられ、圧電基板10より誘電率が小さい絶縁層24と、を具備する弾性波デバイス及び弾性波デバイスの製造方法である。
【選択図】図3
Description
10a、10b、50a 面
12 IDT
14 反射器
16、16a 配線
18 第1層
20 第2層
22 保護層
23、24 絶縁層
26 金属層
30 実装基板
38 リッド
42 シールド
50 基板
52 圧電薄膜
100、100a、200、300、300a、300b、400、400a、400b、500 弾性波デバイス
D1、D2 DMS共振子
GND 接地端子
In 入力端子
Out1、Out2、Out 出力端子
P1、P2、P3、P4 並列共振子
R1、R2 共振子
S1、S2、S3、S4 直列共振子
Claims (11)
- 基板と、
前記基板の第1面上に設けられ、高周波信号が入力する入力端子と、
前記入力端子と接続され、前記入力端子に入力された高周波信号が入力する共振子と、
前記入力端子と前記基板との間に設けられ、前記基板より誘電率が小さい絶縁層と、を具備することを特徴とする弾性波デバイス。 - 前記基板の前記第1面に対向する第2面上に設けられた金属層を具備することを特徴とする請求項1記載の弾性波デバイス。
- 前記金属層は前記第2面に接触していることを特徴とする請求項2記載の弾性波デバイス。
- 前記基板は、前記第1面が実装基板と対向するように前記実装基板にフリップチップ実装され、
前記金属層は前記基板を封止することを特徴とする請求項2又は3記載の弾性波デバイス。 - 前記絶縁層は、酸化シリコン又はポリイミドを含むことを特徴とする請求項1から4いずれか一項記載の弾性波デバイス。
- 前記基板は、圧電体を含む圧電基板であり、
前記共振子はIDTを含む弾性波共振子であることを特徴とする請求項1から5いずれか一項記載の弾性波デバイス。 - 前記共振子は圧電薄膜共振子であることを特徴とする請求項1から5いずれか一項記載の弾性波デバイス。
- 前記第1面上に設けられ、前記共振子から出力された高周波信号が出力される出力端子と、
前記第1面上に設けられ、複数の前記共振子を接続する配線と、を具備し、
前記絶縁層は、前記出力端子と前記基板との間、及び前記配線と前記基板との間に設けられていることを特徴とする請求項1から7いずれか一項記載の弾性波デバイス。 - 基板の第1面上に、前記基板より誘電率が小さい絶縁層を形成する工程と、
前記絶縁層上に、高周波信号が入力する入力端子を形成する工程と、
前記第1面上に、前記入力端子と接続され、前記入力端子に入力された高周波信号が入力する共振子を形成する工程と、を具備することを特徴とする弾性波デバイスの製造方法。 - 前記共振子を形成する工程は、前記第1面上にIDTを形成する工程を含み、
前記入力端子の少なくとも一部と前記IDTとは、同じ工程で形成されることを特徴とする請求項9記載の弾性波デバイスの製造方法。 - 前記共振子を形成する工程は、前記第1面上にIDTを形成する工程を含み、
前記絶縁層は前記IDT上に形成されることを特徴とする請求項9記載の弾性波デバイスの製造方法。
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JP2012012406A JP6116120B2 (ja) | 2012-01-24 | 2012-01-24 | 弾性波デバイス及び弾性波デバイスの製造方法 |
US13/715,037 US9484883B2 (en) | 2012-01-24 | 2012-12-14 | Acoustic wave device and fabrication method of the same |
DE102013000191A DE102013000191A1 (de) | 2012-01-24 | 2013-01-07 | Akustikwellenvorrichtung und Herstellungsverfahren hierfür |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2017085976A1 (ja) * | 2015-11-18 | 2017-05-26 | 株式会社村田製作所 | 弾性波フィルタ、デュプレクサ及び弾性波フィルタモジュール |
KR20200003145A (ko) | 2017-06-05 | 2020-01-08 | 가부시키가이샤 무라타 세이사쿠쇼 | 탄성파 필터 장치 |
JP2020205621A (ja) * | 2017-02-14 | 2020-12-24 | 京セラ株式会社 | 弾性波素子 |
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JP6330912B2 (ja) * | 2014-07-28 | 2018-05-30 | 株式会社村田製作所 | 弾性波装置 |
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US20130187730A1 (en) | 2013-07-25 |
DE102013000191A1 (de) | 2013-07-25 |
US9484883B2 (en) | 2016-11-01 |
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