JP2013120833A5 - - Google Patents

Download PDF

Info

Publication number
JP2013120833A5
JP2013120833A5 JP2011267800A JP2011267800A JP2013120833A5 JP 2013120833 A5 JP2013120833 A5 JP 2013120833A5 JP 2011267800 A JP2011267800 A JP 2011267800A JP 2011267800 A JP2011267800 A JP 2011267800A JP 2013120833 A5 JP2013120833 A5 JP 2013120833A5
Authority
JP
Japan
Prior art keywords
opening
charged particle
particle beam
aperture
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011267800A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013120833A (ja
JP5897888B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2011267800A priority Critical patent/JP5897888B2/ja
Priority claimed from JP2011267800A external-priority patent/JP5897888B2/ja
Priority to TW101142595A priority patent/TWI478213B/zh
Priority to KR1020120140874A priority patent/KR101456193B1/ko
Priority to US13/706,903 priority patent/US8791422B2/en
Publication of JP2013120833A publication Critical patent/JP2013120833A/ja
Publication of JP2013120833A5 publication Critical patent/JP2013120833A5/ja
Application granted granted Critical
Publication of JP5897888B2 publication Critical patent/JP5897888B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011267800A 2011-12-07 2011-12-07 荷電粒子ビーム描画装置 Active JP5897888B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011267800A JP5897888B2 (ja) 2011-12-07 2011-12-07 荷電粒子ビーム描画装置
TW101142595A TWI478213B (zh) 2011-12-07 2012-11-15 Charge particle beam drawing device and charged particle beam drawing method
KR1020120140874A KR101456193B1 (ko) 2011-12-07 2012-12-06 하전 입자빔 묘화 장치 및 하전 입자빔 묘화 방법
US13/706,903 US8791422B2 (en) 2011-12-07 2012-12-06 Charged particle beam writing apparatus and charged particle beam writing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011267800A JP5897888B2 (ja) 2011-12-07 2011-12-07 荷電粒子ビーム描画装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012268284A Division JP5859951B2 (ja) 2012-12-07 2012-12-07 荷電粒子ビーム描画装置および荷電粒子ビーム描画方法

Publications (3)

Publication Number Publication Date
JP2013120833A JP2013120833A (ja) 2013-06-17
JP2013120833A5 true JP2013120833A5 (https=) 2014-12-18
JP5897888B2 JP5897888B2 (ja) 2016-04-06

Family

ID=48572280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011267800A Active JP5897888B2 (ja) 2011-12-07 2011-12-07 荷電粒子ビーム描画装置

Country Status (4)

Country Link
US (1) US8791422B2 (https=)
JP (1) JP5897888B2 (https=)
KR (1) KR101456193B1 (https=)
TW (1) TWI478213B (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2627732C2 (ru) * 2012-06-01 2017-08-11 Сименс Акциенгезелльшафт Отклоняющая пластина и отклоняющее устройство для отклонения заряженных частиц
JP6349944B2 (ja) * 2014-05-13 2018-07-04 株式会社ニューフレアテクノロジー 電子ビーム描画装置及び電子ビーム描画方法
CN105070345A (zh) * 2015-08-28 2015-11-18 上海核工程研究设计院 一种可拆式辐照监督样品盒
CN111108582B (zh) * 2017-08-08 2024-07-05 Asml荷兰有限公司 带电粒子阻挡元件、包括这样的元件的曝光装置以及使用这样的曝光装置的方法
JP6819509B2 (ja) * 2017-08-10 2021-01-27 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置
JP7219660B2 (ja) * 2019-04-09 2023-02-08 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及びアパーチャ

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03174716A (ja) * 1989-08-07 1991-07-29 Hitachi Ltd 電子ビーム描画装置および描画方式
JPH0684492A (ja) * 1992-03-09 1994-03-25 Topcon Corp 電子顕微鏡
JP3288767B2 (ja) * 1992-09-30 2002-06-04 株式会社東芝 荷電ビーム描画装置
JP3118390B2 (ja) 1995-03-16 2000-12-18 ホーヤ株式会社 転写マスクの製造方法
JPH08315760A (ja) * 1995-05-23 1996-11-29 Hitachi Ltd ビーム成形絞りとその作成方法およびこれを用いた荷電粒子ビーム露光装置
JP2785790B2 (ja) * 1996-02-23 1998-08-13 日本電気株式会社 荷電粒子ビーム露光装置用アパーチャマスクとその製造方法
JP3422226B2 (ja) * 1997-07-16 2003-06-30 凸版印刷株式会社 アパーチャ及びその製造方法
JP2908433B1 (ja) 1998-06-05 1999-06-21 株式会社東芝 ビーム成形用アパーチャマスク及び荷電ビーム露光装置
JP2000243335A (ja) * 1999-02-18 2000-09-08 Nippon Telegr & Teleph Corp <Ntt> アパーチャ保持機構
JP2002075849A (ja) * 2000-09-04 2002-03-15 Advantest Corp 電子ビーム露光装置、荷電粒子線を整形する部材及びその製造方法
JP2002141271A (ja) * 2000-11-01 2002-05-17 Advantest Corp 電子ビーム露光装置
JP2002237441A (ja) * 2001-02-08 2002-08-23 Advantest Corp スリット製造方法、スリット、及び電子ビーム露光装置
DE10200645A1 (de) * 2002-01-10 2003-07-24 Leo Elektronenmikroskopie Gmbh Elektronenmikroskop mit ringförmiger Beleuchtungsapertur
ATE424037T1 (de) * 2005-07-20 2009-03-15 Zeiss Carl Sms Gmbh Teilchenstrahlbelichtungssystem und vorrichtung zur strahlbeeinflussung
DE102005040267B4 (de) * 2005-08-24 2007-12-27 Universität Karlsruhe Verfahren zum Herstellen einer mehrschichtigen elektrostatischen Linsenanordnung, insbesondere einer Phasenplatte und derartige Phasenplatte
JP5275396B2 (ja) * 2011-03-17 2013-08-28 株式会社東芝 電子ビーム照射装置

Similar Documents

Publication Publication Date Title
JP2013120833A5 (https=)
JP2014054670A5 (https=)
JP2013191571A5 (https=)
WO2015073391A3 (en) Laser processing of a bed of powdered material with variable masking
TWM490015U (en) Imaging lens and imaging apparatus equipped with the imaging lens
EP3335865A3 (en) Methods for formation of an ophthalmic lens with an insert utilizing voxel-based lithography techniques
EP2722867A3 (en) Configurable charged-particle beam apparatus
EP2951859A4 (en) CONTOUR-BASED ARRAY INSPECTION OF STRUCTURED DEFECTS
TWM490012U (en) Imaging lens and imaging apparatus including the imaging lens
EP2866892A4 (en) EMBEDDED PHOTONIC SYSTEMS AND METHOD FOR IRRADIATING A MEDIUM THEREFOR
EP2784481A3 (en) Particle measuring apparatus
WO2013151421A3 (en) Integrated optical and charged particle inspection apparatus
IL264811B1 (en) Methods for treating an immune disorder-related disease by reducing autoreactivity in a t cell compartment
WO2015095724A3 (en) Digital shearography ndt system for speckless objects
AU2016319010A8 (en) In vitro method for identifying a pregnancy related disease
EP2919051A3 (en) Actuator
JP2015038477A5 (https=)
EP2829443A3 (en) Vehicle pulling device, system for passing vehicle in two modes, and inspection system thereof
SG10201805252RA (en) Extreme ultraviolet lithography system having chuck assembly and method of manufacturing thereof
MX2013011264A (es) Metodo e instalacion para proteger contra los rayos, implementando un pararrayos con un dispositivo de unicio que comprende una fuente de radiacion electromagnetica.
EP2785038A3 (en) Illumination device, image reading apparatus, and image forming apparatus
JP2013241986A5 (https=)
EP2690478A3 (en) Photographing lens and photographing apparatus
JP2016516295A5 (https=)
WO2015185203A3 (en) Thermal heating device using light for binder activation and its integration in preforming device