JP2013120833A5 - - Google Patents

Download PDF

Info

Publication number
JP2013120833A5
JP2013120833A5 JP2011267800A JP2011267800A JP2013120833A5 JP 2013120833 A5 JP2013120833 A5 JP 2013120833A5 JP 2011267800 A JP2011267800 A JP 2011267800A JP 2011267800 A JP2011267800 A JP 2011267800A JP 2013120833 A5 JP2013120833 A5 JP 2013120833A5
Authority
JP
Japan
Prior art keywords
opening
charged particle
particle beam
aperture
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011267800A
Other languages
English (en)
Japanese (ja)
Other versions
JP5897888B2 (ja
JP2013120833A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2011267800A priority Critical patent/JP5897888B2/ja
Priority claimed from JP2011267800A external-priority patent/JP5897888B2/ja
Priority to TW101142595A priority patent/TWI478213B/zh
Priority to US13/706,903 priority patent/US8791422B2/en
Priority to KR1020120140874A priority patent/KR101456193B1/ko
Publication of JP2013120833A publication Critical patent/JP2013120833A/ja
Publication of JP2013120833A5 publication Critical patent/JP2013120833A5/ja
Application granted granted Critical
Publication of JP5897888B2 publication Critical patent/JP5897888B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011267800A 2011-12-07 2011-12-07 荷電粒子ビーム描画装置 Active JP5897888B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011267800A JP5897888B2 (ja) 2011-12-07 2011-12-07 荷電粒子ビーム描画装置
TW101142595A TWI478213B (zh) 2011-12-07 2012-11-15 Charge particle beam drawing device and charged particle beam drawing method
US13/706,903 US8791422B2 (en) 2011-12-07 2012-12-06 Charged particle beam writing apparatus and charged particle beam writing method
KR1020120140874A KR101456193B1 (ko) 2011-12-07 2012-12-06 하전 입자빔 묘화 장치 및 하전 입자빔 묘화 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011267800A JP5897888B2 (ja) 2011-12-07 2011-12-07 荷電粒子ビーム描画装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012268284A Division JP5859951B2 (ja) 2012-12-07 2012-12-07 荷電粒子ビーム描画装置および荷電粒子ビーム描画方法

Publications (3)

Publication Number Publication Date
JP2013120833A JP2013120833A (ja) 2013-06-17
JP2013120833A5 true JP2013120833A5 (cg-RX-API-DMAC7.html) 2014-12-18
JP5897888B2 JP5897888B2 (ja) 2016-04-06

Family

ID=48572280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011267800A Active JP5897888B2 (ja) 2011-12-07 2011-12-07 荷電粒子ビーム描画装置

Country Status (4)

Country Link
US (1) US8791422B2 (cg-RX-API-DMAC7.html)
JP (1) JP5897888B2 (cg-RX-API-DMAC7.html)
KR (1) KR101456193B1 (cg-RX-API-DMAC7.html)
TW (1) TWI478213B (cg-RX-API-DMAC7.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2826345A1 (de) * 2012-06-01 2015-01-21 Siemens Aktiengesellschaft Ablenkplatte und ablenkvorrichtung zum ablenken geladener teilchen
JP6349944B2 (ja) * 2014-05-13 2018-07-04 株式会社ニューフレアテクノロジー 電子ビーム描画装置及び電子ビーム描画方法
CN105070345A (zh) * 2015-08-28 2015-11-18 上海核工程研究设计院 一种可拆式辐照监督样品盒
US11101099B2 (en) 2017-08-08 2021-08-24 Asml Netherlands B.V. Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus
JP6819509B2 (ja) * 2017-08-10 2021-01-27 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置
JP7219660B2 (ja) * 2019-04-09 2023-02-08 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及びアパーチャ

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03174716A (ja) * 1989-08-07 1991-07-29 Hitachi Ltd 電子ビーム描画装置および描画方式
JPH0684492A (ja) * 1992-03-09 1994-03-25 Topcon Corp 電子顕微鏡
JP3288767B2 (ja) * 1992-09-30 2002-06-04 株式会社東芝 荷電ビーム描画装置
JP3118390B2 (ja) 1995-03-16 2000-12-18 ホーヤ株式会社 転写マスクの製造方法
JPH08315760A (ja) * 1995-05-23 1996-11-29 Hitachi Ltd ビーム成形絞りとその作成方法およびこれを用いた荷電粒子ビーム露光装置
JP2785790B2 (ja) * 1996-02-23 1998-08-13 日本電気株式会社 荷電粒子ビーム露光装置用アパーチャマスクとその製造方法
JP3422226B2 (ja) * 1997-07-16 2003-06-30 凸版印刷株式会社 アパーチャ及びその製造方法
JP2908433B1 (ja) 1998-06-05 1999-06-21 株式会社東芝 ビーム成形用アパーチャマスク及び荷電ビーム露光装置
JP2000243335A (ja) * 1999-02-18 2000-09-08 Nippon Telegr & Teleph Corp <Ntt> アパーチャ保持機構
JP2002075849A (ja) 2000-09-04 2002-03-15 Advantest Corp 電子ビーム露光装置、荷電粒子線を整形する部材及びその製造方法
JP2002141271A (ja) 2000-11-01 2002-05-17 Advantest Corp 電子ビーム露光装置
JP2002237441A (ja) 2001-02-08 2002-08-23 Advantest Corp スリット製造方法、スリット、及び電子ビーム露光装置
DE10200645A1 (de) * 2002-01-10 2003-07-24 Leo Elektronenmikroskopie Gmbh Elektronenmikroskop mit ringförmiger Beleuchtungsapertur
DE602005012945D1 (de) * 2005-07-20 2009-04-09 Zeiss Carl Sms Gmbh Teilchenstrahlbelichtungssystem und Vorrichtung zur Strahlbeeinflussung
DE102005040267B4 (de) * 2005-08-24 2007-12-27 Universität Karlsruhe Verfahren zum Herstellen einer mehrschichtigen elektrostatischen Linsenanordnung, insbesondere einer Phasenplatte und derartige Phasenplatte
JP5275396B2 (ja) * 2011-03-17 2013-08-28 株式会社東芝 電子ビーム照射装置

Similar Documents

Publication Publication Date Title
JP2013120833A5 (cg-RX-API-DMAC7.html)
JP2014054670A5 (cg-RX-API-DMAC7.html)
JP2013191571A5 (cg-RX-API-DMAC7.html)
WO2015073391A3 (en) Laser processing of a bed of powdered material with variable masking
TWM490015U (en) Imaging lens and imaging apparatus equipped with the imaging lens
EP3335865A3 (en) Methods for formation of an ophthalmic lens with an insert utilizing voxel-based lithography techniques
EP2951859A4 (en) CONTOUR-BASED ARRAY INSPECTION OF STRUCTURED DEFECTS
EP2884248A3 (en) Forehead thermometer
MX2018006046A (es) Metodo y aparato para revisar neumaticos.
EP2866892A4 (en) EMBEDDED PHOTONIC SYSTEMS AND METHOD FOR IRRADIATING A MEDIUM THEREFOR
WO2014191834A3 (en) Spectometer
WO2015095724A3 (en) Digital shearography ndt system for speckless objects
JP2016513790A5 (cg-RX-API-DMAC7.html)
AU2016319010A8 (en) In vitro method for identifying a pregnancy related disease
EP4321085A3 (en) System and method for creating a customized anatomical model of an eye
WO2014186121A3 (en) Optical coherence tomography optical probe systems and methods to reduce artifacts
JP2015038477A5 (cg-RX-API-DMAC7.html)
EP2829443A3 (en) Vehicle pulling device, system for passing vehicle in two modes, and inspection system thereof
SG10201805252RA (en) Extreme ultraviolet lithography system having chuck assembly and method of manufacturing thereof
MX2013011264A (es) Metodo e instalacion para proteger contra los rayos, implementando un pararrayos con un dispositivo de unicio que comprende una fuente de radiacion electromagnetica.
EP2785038A3 (en) Illumination device, image reading apparatus, and image forming apparatus
JP2015215178A5 (cg-RX-API-DMAC7.html)
ES2664737T3 (es) Tratamiento de enfermedades intestinales inflamatorias con clinoptilolita
WO2015185203A3 (en) Thermal heating device using light for binder activation and its integration in preforming device
JP2014239012A5 (cg-RX-API-DMAC7.html)