JP2013101879A5 - - Google Patents
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- Publication number
- JP2013101879A5 JP2013101879A5 JP2011245793A JP2011245793A JP2013101879A5 JP 2013101879 A5 JP2013101879 A5 JP 2013101879A5 JP 2011245793 A JP2011245793 A JP 2011245793A JP 2011245793 A JP2011245793 A JP 2011245793A JP 2013101879 A5 JP2013101879 A5 JP 2013101879A5
- Authority
- JP
- Japan
- Prior art keywords
- radiation generating
- tube
- cathode
- dielectric layer
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 description 128
- 239000000463 material Substances 0.000 description 57
- 239000010410 layer Substances 0.000 description 56
- 230000005684 electric field Effects 0.000 description 30
- 239000007788 liquid Substances 0.000 description 15
- 239000000758 substrate Substances 0.000 description 15
- 239000010408 film Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 11
- 238000005219 brazing Methods 0.000 description 10
- 238000003860 storage Methods 0.000 description 10
- 238000009826 distribution Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 239000013078 crystal Substances 0.000 description 8
- 238000010894 electron beam technology Methods 0.000 description 8
- 239000000956 alloy Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 7
- 229910052721 tungsten Inorganic materials 0.000 description 7
- 239000010937 tungsten Substances 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 230000005686 electrostatic field Effects 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 230000001186 cumulative effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000013077 target material Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 229910000833 kovar Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 229920002545 silicone oil Polymers 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000004380 ashing Methods 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 229920006332 epoxy adhesive Polymers 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 201000009310 astigmatism Diseases 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
- 230000036425 denaturation Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000010735 electrical insulating oil Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011245793A JP5921153B2 (ja) | 2011-11-09 | 2011-11-09 | 放射線発生管および放射線発生装置 |
| US14/356,578 US9887063B2 (en) | 2011-11-09 | 2012-10-25 | Radiation generating tube, radiation generating apparatus, radiography system and manufacturing method thereof |
| PCT/JP2012/006845 WO2013069222A1 (en) | 2011-11-09 | 2012-10-25 | Radiation generating tube and radiation generating apparatus |
| US15/856,838 US10068742B2 (en) | 2011-11-09 | 2017-12-28 | Radiation generating tube, radiation generating apparatus, radiography system and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011245793A JP5921153B2 (ja) | 2011-11-09 | 2011-11-09 | 放射線発生管および放射線発生装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013101879A JP2013101879A (ja) | 2013-05-23 |
| JP2013101879A5 true JP2013101879A5 (enExample) | 2014-12-25 |
| JP5921153B2 JP5921153B2 (ja) | 2016-05-24 |
Family
ID=47324311
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011245793A Active JP5921153B2 (ja) | 2011-11-09 | 2011-11-09 | 放射線発生管および放射線発生装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US9887063B2 (enExample) |
| JP (1) | JP5921153B2 (enExample) |
| WO (1) | WO2013069222A1 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6272043B2 (ja) | 2014-01-16 | 2018-01-31 | キヤノン株式会社 | Ｘ線発生管及びこれを用いたｘ線発生装置、ｘ線撮影システム |
| JP6388387B2 (ja) * | 2014-08-25 | 2018-09-12 | 東芝電子管デバイス株式会社 | Ｘ線管 |
| JP2016110744A (ja) * | 2014-12-03 | 2016-06-20 | 株式会社東芝 | Ｘ線管装置 |
| JP6262161B2 (ja) * | 2015-01-16 | 2018-01-17 | 双葉電子工業株式会社 | Ｘ線管 |
| JP6573380B2 (ja) * | 2015-07-27 | 2019-09-11 | キヤノン株式会社 | Ｘ線発生装置及びｘ線撮影システム |
| EP3396697B1 (en) * | 2015-12-25 | 2024-07-17 | Nikon Corporation | X-ray generating device, structure manufacturing method, and structure manufacturing system |
| US11201031B2 (en) | 2018-03-22 | 2021-12-14 | Varex Imaging Corporation | High voltage seals and structures having reduced electric fields |
| KR102367142B1 (ko) * | 2018-12-28 | 2022-02-23 | 캐논 아네르바 가부시키가이샤 | X선 발생관, x선 발생 장치 및 x선 촬상 장치 |
| US11315751B2 (en) * | 2019-04-25 | 2022-04-26 | The Boeing Company | Electromagnetic X-ray control |
| EP4006951B1 (en) * | 2019-09-03 | 2024-03-20 | Canon Anelva Corporation | X-ray generation device and x-ray imaging device |
| DE102022209314B3 (de) * | 2022-09-07 | 2024-02-29 | Siemens Healthcare Gmbh | Röntgenröhre mit zumindest einem elektrisch leitfähigen Gehäuseabschnitt |
| CN120584548A (zh) * | 2023-01-25 | 2025-09-02 | 佳能安内华股份有限公司 | X射线生成装置和x射线成像装置 |
| CN120584395A (zh) * | 2023-01-25 | 2025-09-02 | 佳能安内华股份有限公司 | X射线生成装置和x射线成像装置 |
| WO2025057338A1 (ja) * | 2023-09-13 | 2025-03-20 | キヤノンアネルバ株式会社 | Ｘ線発生装置およびｘ線撮像装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1614162C3 (de) * | 1967-05-26 | 1974-08-15 | C.H.F. Mueller Gmbh, 2000 Hamburg | Röntgenstrahier mit einer Festanodenröntgenröhre, die in einer mit Isolieröl gefüllten Haube angeordnet ist |
| JP2892403B2 (ja) * | 1989-11-15 | 1999-05-17 | 寛 磯部 | フラッシュｘ線管 |
| JPH07296754A (ja) | 1994-04-27 | 1995-11-10 | Toshiba Corp | 電子管及びその製造方法 |
| JP3514568B2 (ja) * | 1995-12-25 | 2004-03-31 | 浜松ホトニクス株式会社 | Ｘ線管の製造方法 |
| JP3594716B2 (ja) * | 1995-12-25 | 2004-12-02 | 浜松ホトニクス株式会社 | 透過型ｘ線管 |
| US6108402A (en) * | 1998-01-16 | 2000-08-22 | Medtronic Ave, Inc. | Diamond vacuum housing for miniature x-ray device |
| WO2006102359A2 (en) * | 2005-03-23 | 2006-09-28 | Abbott Laboratories | Delivery of highly lipophilic agents via medical devices |
| JP2009021032A (ja) * | 2007-07-10 | 2009-01-29 | Takasago Thermal Eng Co Ltd | Ｘ線発生管 |
| JP2009245806A (ja) | 2008-03-31 | 2009-10-22 | Hamamatsu Photonics Kk | Ｘ線管及びこのｘ線管を具備したｘ線発生装置 |
-
2011
- 2011-11-09 JP JP2011245793A patent/JP5921153B2/ja active Active
-
2012
- 2012-10-25 US US14/356,578 patent/US9887063B2/en active Active
- 2012-10-25 WO PCT/JP2012/006845 patent/WO2013069222A1/en not_active Ceased
-
2017
- 2017-12-28 US US15/856,838 patent/US10068742B2/en active Active
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