JP2013084669A5 - - Google Patents

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Publication number
JP2013084669A5
JP2013084669A5 JP2011221980A JP2011221980A JP2013084669A5 JP 2013084669 A5 JP2013084669 A5 JP 2013084669A5 JP 2011221980 A JP2011221980 A JP 2011221980A JP 2011221980 A JP2011221980 A JP 2011221980A JP 2013084669 A5 JP2013084669 A5 JP 2013084669A5
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JP
Japan
Prior art keywords
display
manufacturing
display device
thin film
film transistor
Prior art date
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Application number
JP2011221980A
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English (en)
Japanese (ja)
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JP2013084669A (ja
JP5927602B2 (ja
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Publication date
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Priority to JP2011221980A priority Critical patent/JP5927602B2/ja
Priority claimed from JP2011221980A external-priority patent/JP5927602B2/ja
Priority to US13/613,337 priority patent/US8815619B2/en
Publication of JP2013084669A publication Critical patent/JP2013084669A/ja
Publication of JP2013084669A5 publication Critical patent/JP2013084669A5/ja
Application granted granted Critical
Publication of JP5927602B2 publication Critical patent/JP5927602B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011221980A 2011-10-06 2011-10-06 表示装置の製造方法 Active JP5927602B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011221980A JP5927602B2 (ja) 2011-10-06 2011-10-06 表示装置の製造方法
US13/613,337 US8815619B2 (en) 2011-10-06 2012-09-13 Method of manufacturing display unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011221980A JP5927602B2 (ja) 2011-10-06 2011-10-06 表示装置の製造方法

Publications (3)

Publication Number Publication Date
JP2013084669A JP2013084669A (ja) 2013-05-09
JP2013084669A5 true JP2013084669A5 (enExample) 2014-10-02
JP5927602B2 JP5927602B2 (ja) 2016-06-01

Family

ID=48042334

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011221980A Active JP5927602B2 (ja) 2011-10-06 2011-10-06 表示装置の製造方法

Country Status (2)

Country Link
US (1) US8815619B2 (enExample)
JP (1) JP5927602B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07121322B2 (ja) 1991-08-30 1995-12-25 株式会社東芝 水切り洗浄方法および水切り洗浄装置
JP3109871B2 (ja) 1991-10-21 2000-11-20 関東電化工業株式会社 物品の水切り・乾燥方法及び装置
KR101930383B1 (ko) 2012-10-31 2019-03-11 엘지디스플레이 주식회사 유기발광장치 및 그 제조방법
US9012261B2 (en) 2013-03-13 2015-04-21 Intermolecular, Inc. High productivity combinatorial screening for stable metal oxide TFTs
WO2015107606A1 (ja) * 2014-01-15 2015-07-23 株式会社Ｊｏｌｅｄ 表示装置及び薄膜トランジスタ基板
US9337030B2 (en) 2014-03-26 2016-05-10 Intermolecular, Inc. Method to grow in-situ crystalline IGZO using co-sputtering targets
JP6274968B2 (ja) * 2014-05-16 2018-02-07 ローム株式会社 半導体装置
JP6673731B2 (ja) * 2016-03-23 2020-03-25 株式会社ジャパンディスプレイ 表示装置及びその製造方法
KR102485169B1 (ko) * 2017-09-08 2023-01-09 삼성디스플레이 주식회사 표시 장치, 이의 제조 방법, 및 전극 형성 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH088213A (ja) * 1994-06-23 1996-01-12 Casio Comput Co Ltd スパッタ法およびその装置
JP4470029B2 (ja) 1999-06-01 2010-06-02 東ソー株式会社 分割ｉｔｏスパッタリングターゲット
WO2010090197A1 (ja) * 2009-02-04 2010-08-12 シャープ株式会社 透明導電膜形成体及びその製造方法
US8174021B2 (en) * 2009-02-06 2012-05-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of manufacturing the semiconductor device
US8450144B2 (en) * 2009-03-26 2013-05-28 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same

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