JP2013060017A - 液体吐出装置上への非湿潤性コーティング - Google Patents
液体吐出装置上への非湿潤性コーティング Download PDFInfo
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- JP2013060017A JP2013060017A JP2012257320A JP2012257320A JP2013060017A JP 2013060017 A JP2013060017 A JP 2013060017A JP 2012257320 A JP2012257320 A JP 2012257320A JP 2012257320 A JP2012257320 A JP 2012257320A JP 2013060017 A JP2013060017 A JP 2013060017A
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- wetting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1606—Coating the nozzle area or the ink chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Nozzles (AREA)
- Coating Apparatus (AREA)
Abstract
【解決手段】第1の表面、第2の表面、および第2の表面と接触した液体を吐出できるオリフィス140を有する液体吐出装置において、少なくとも第1の表面上に露出された非湿潤性層、および第2の表面上に露出された保護層190を有し、保護層190は、非湿潤性層よりも湿潤性である。この装置の製造には、第1と第2の表面に非湿潤性層を堆積させ、第1の表面にマスキングし、必要に応じて、第2の表面から非湿潤性層を除去し、第2の表面上に保護層190を堆積させる各工程が含まれ得る。
【選択図】図1G
Description
110 流路モジュール
120 ノズル層
130 下降部
140 オリフィス
165 無機シード層
170 非湿潤性コーティング
172 アクチュエータ
174,178 電極層
176 圧電層
180 マスク
190 保護層
Claims (16)
- ノズルを有するノズル層であって、該ノズル層が第1の表面と第2の表面とを含むものであり、前記第1の表面が前記ノズル層の外面、前記第2の表面が前記ノズル層の内面であり、前記第1の表面に形成され、該第2の表面と接触した液体を吐出可能にするオリフィスを備えた前記ノズル層と、
前記第1の表面の少なくとも一部と前記第2の表面の少なくとも一部とを被覆する非湿潤性層と、
前記第1の表面の大部分ではなく前記第2の表面の少なくとも一部上に前記非湿潤性層を備えた前記第2の表面を被覆する保護層であって、前記非湿潤性層よりも湿潤性である前記保護層と、
を備えた液体吐出装置。 - 前記非湿潤性層が前記第2の表面を完全に被覆し、前記保護層が前記第2の表面上の前記非湿潤性層を完全に被覆するもものであることを特徴とする請求項1記載の液体吐出装置。
- 前記第1の表面および第2の表面上であって前記非湿潤性層および前記保護層より下に堆積されたシード層をさらに備えた請求項1または2記載の液体吐出装置。
- 前記ノズル層がシリコンからなることを特徴とする請求項1〜3のいずれか1項記載の液体吐出装置。
- 前記保護層が二酸化ケイ素からなることを特徴とする請求項1〜4のいずれか1項記載の液体吐出装置。
- ノズル層を備えた液体吐出装置上に非湿潤性層を形成する方法であって、
前記液体吐出装置の第1の表面および第2の表面上に非湿潤性層を堆積させる工程であって、前記第1の表面が前記液体吐出装置の外面であり、前記第2の表面が前記液体吐出装置の内面であり、前記ノズル層内に第2の表面に接触した液体を吐出可能にするオリフィスが形成されている前記工程と、
前記第2の表面から前記非湿潤性層の一部を除去する工程と、
前記第2の表面上の前記非湿潤性層のいかなる残存部分を含む前記第2の表面上に保護層を堆積させる工程であって、前記保護層が前記非湿潤性層よりも湿潤性である前記工程と、
を有してなる方法。 - 前記第2の表面から前記非湿潤性層の少なくとも一部を除去する前に前記第1の表面にマスクを施す工程をさらに含み、該マスクを施す工程が、テープ、フォトレジスト、またはワックスの内の少なくとも1つを施す工程を含むことを特徴とする請求項6記載の方法。
- 前記保護層を堆積させた後、前記第1の表面から前記マスクを除去する工程をさらに含むことを特徴とする請求項7記載の方法。
- 前記マスクを除去する工程が、前記マスク上に堆積された保護層も除去することを特徴とする請求項8記載の方法。
- 前記保護層を堆積させる前であるが、前記第2の表面から前記非湿潤性層の少なくとも一部を除去した後に、前記第1の表面から前記マスクを除去する工程をさらに含むことを特徴とする請求項8または9記載の方法。
- 前記非湿潤性層の少なくとも一部を除去する工程が、前記液体吐出装置を酸素プラズマに曝露する工程を含むことを特徴とする請求項10記載の方法。
- 前記非湿潤性層の少なくとも一部を除去する工程が、該非湿潤性層の全ては除去しないことを特徴とする請求項9〜11のいずれか1項記載の方法。
- 前記非湿潤性層を堆積させる前に、前記第1と第2の表面上に無機層を堆積させる工程をさらに含むことを特徴とする請求項6〜12のいずれか1項記載の方法。
- 前記非湿潤性層を蒸着により堆積させることを特徴とする請求項6〜13のいずれか1項記載の方法。
- 前記保護層を堆積させる工程が、無機酸化物を堆積させる工程を含むことを特徴とする請求項6〜14のいずれか1項記載の方法。
- 前記無機酸化物が二酸化ケイ素であることを特徴とする請求項15記載の方法。
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US86832806P | 2006-12-01 | 2006-12-01 | |
US60/868,328 | 2006-12-01 | ||
US86853606P | 2006-12-04 | 2006-12-04 | |
US60/868,536 | 2006-12-04 | ||
US87176306P | 2006-12-22 | 2006-12-22 | |
US60/871,763 | 2006-12-22 |
Related Parent Applications (1)
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JP2009539523A Division JP5357768B2 (ja) | 2006-12-01 | 2007-11-30 | 液体吐出装置上への非湿潤性コーティング |
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JP2013060017A true JP2013060017A (ja) | 2013-04-04 |
JP5633888B2 JP5633888B2 (ja) | 2014-12-03 |
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JP2009539523A Active JP5357768B2 (ja) | 2006-12-01 | 2007-11-30 | 液体吐出装置上への非湿潤性コーティング |
JP2012257320A Active JP5633888B2 (ja) | 2006-12-01 | 2012-11-26 | 液体吐出装置上への非湿潤性コーティング |
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Country Status (6)
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US (1) | US8128201B2 (ja) |
EP (1) | EP2089232B1 (ja) |
JP (2) | JP5357768B2 (ja) |
KR (1) | KR101389901B1 (ja) |
CN (2) | CN101541544B (ja) |
WO (1) | WO2008070573A2 (ja) |
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EP2089232B1 (en) | 2012-08-01 |
US20080136866A1 (en) | 2008-06-12 |
KR101389901B1 (ko) | 2014-04-29 |
US8128201B2 (en) | 2012-03-06 |
JP2010511533A (ja) | 2010-04-15 |
CN101541544B (zh) | 2012-06-20 |
CN101541544A (zh) | 2009-09-23 |
KR20090094354A (ko) | 2009-09-04 |
CN102642404A (zh) | 2012-08-22 |
EP2089232A2 (en) | 2009-08-19 |
JP5357768B2 (ja) | 2013-12-04 |
WO2008070573A3 (en) | 2008-09-04 |
WO2008070573A2 (en) | 2008-06-12 |
JP5633888B2 (ja) | 2014-12-03 |
EP2089232A4 (en) | 2011-01-26 |
CN102642404B (zh) | 2015-10-28 |
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