JP2012522373A5 - - Google Patents
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- Publication number
- JP2012522373A5 JP2012522373A5 JP2012502068A JP2012502068A JP2012522373A5 JP 2012522373 A5 JP2012522373 A5 JP 2012522373A5 JP 2012502068 A JP2012502068 A JP 2012502068A JP 2012502068 A JP2012502068 A JP 2012502068A JP 2012522373 A5 JP2012522373 A5 JP 2012522373A5
- Authority
- JP
- Japan
- Prior art keywords
- stage
- axis
- motor
- motors
- reaction force
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 7
- 230000003287 optical effect Effects 0.000 claims 2
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16438209P | 2009-03-27 | 2009-03-27 | |
| US61/164,382 | 2009-03-27 | ||
| US12/510,630 | 2009-07-28 | ||
| US12/510,630 US8735774B2 (en) | 2009-03-27 | 2009-07-28 | Force reaction compensation system |
| PCT/US2010/025591 WO2010110990A2 (en) | 2009-03-27 | 2010-02-26 | Force reaction compensation system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012522373A JP2012522373A (ja) | 2012-09-20 |
| JP2012522373A5 true JP2012522373A5 (enExample) | 2013-04-11 |
| JP5718894B2 JP5718894B2 (ja) | 2015-05-13 |
Family
ID=42781748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012502068A Expired - Fee Related JP5718894B2 (ja) | 2009-03-27 | 2010-02-26 | 反力補償システム |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8735774B2 (enExample) |
| JP (1) | JP5718894B2 (enExample) |
| KR (1) | KR20120002603A (enExample) |
| CN (1) | CN102349147A (enExample) |
| TW (1) | TW201039957A (enExample) |
| WO (1) | WO2010110990A2 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014229787A (ja) * | 2013-05-23 | 2014-12-08 | 東京エレクトロン株式会社 | 接合装置、接合システム、接合方法、プログラム及びコンピュータ記憶媒体 |
| JP6308852B2 (ja) * | 2014-04-15 | 2018-04-11 | キヤノン株式会社 | 駆動装置、リソグラフィ装置、および物品の製造方法 |
| NL2014487A (en) * | 2014-04-17 | 2015-11-02 | Asml Netherlands Bv | Lithographic Apparatus and Device Manufacturing Method. |
| TWI616269B (zh) * | 2016-08-01 | 2018-03-01 | Reaction force elimination platform device | |
| US10374530B2 (en) | 2017-02-21 | 2019-08-06 | Invetech, Inc. | Dual-axis linear motion system |
| WO2018156663A1 (en) | 2017-02-21 | 2018-08-30 | Invetech, Inc. | Single-axis linear motion system |
| KR102449594B1 (ko) | 2017-09-04 | 2022-10-04 | 에이에스엠엘 네델란즈 비.브이. | 전자 빔 검사 장치 스테이지 위치설정 |
| DE102018122717A1 (de) * | 2018-09-17 | 2020-03-19 | Trumpf Werkzeugmaschinen Gmbh + Co. Kg | Verfahren zur schneidenden Bearbeitung von Rohren in einer Laserrohrschneidmaschine sowie Laserrohrschneidmaschine |
| NL2022539B1 (en) * | 2019-02-08 | 2020-08-19 | Dutch United Instr B V | Positioning system for positioning an object |
| US11209373B2 (en) | 2019-06-21 | 2021-12-28 | Kla Corporation | Six degree of freedom workpiece stage |
| CN110711958B (zh) * | 2019-11-15 | 2021-11-02 | 安徽同兴科技发展有限责任公司 | 抗扰度高精密直线电机驱动的激光切割机及其控制方法 |
| KR20230088475A (ko) * | 2020-10-19 | 2023-06-19 | 어플라이드 머티어리얼스, 인코포레이티드 | 공급 어레인지먼트, 진공 프로세싱 시스템, 및 진공 프로세싱 시스템에서 이동하는 디바이스를 공급하는 방법 |
| CN118180660B (zh) * | 2024-05-16 | 2024-09-06 | 江苏盛捷半导体材料有限公司 | 一种半导体器件加工用激光切割设备 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5363029A (en) * | 1993-04-19 | 1994-11-08 | Kabushiki Kaisha Yaskawa Denki | Laser-beam machine using two-dimensional stepping motor |
| JP3548353B2 (ja) * | 1996-10-15 | 2004-07-28 | キヤノン株式会社 | ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法 |
| JPH10293611A (ja) | 1997-04-21 | 1998-11-04 | Canon Inc | 位置決め装置 |
| GB2328636A (en) * | 1997-08-29 | 1999-03-03 | Rye Machinery Ltd | A support for a laser tool |
| US6408045B1 (en) * | 1997-11-11 | 2002-06-18 | Canon Kabushiki Kaisha | Stage system and exposure apparatus with the same |
| JPH11147192A (ja) * | 1997-11-12 | 1999-06-02 | Koike Sanso Kogyo Co Ltd | レーザー切断装置 |
| US6040553A (en) * | 1998-10-29 | 2000-03-21 | Gebo Conveyors Consultants & Systems, Inc. | Method of manufacturing air conveyor panels by laser ablation drilling |
| JP3312297B2 (ja) * | 1999-07-02 | 2002-08-05 | 住友重機械工業株式会社 | ステージ位置制御装置 |
| DE10117460A1 (de) * | 2001-04-06 | 2002-11-07 | Siemens Ag | Impulsgekoppelter Transmissionsantrieb |
| JP4223714B2 (ja) * | 2001-11-30 | 2009-02-12 | 住友重機械工業株式会社 | ステージ装置 |
| JP2004304034A (ja) | 2003-03-31 | 2004-10-28 | Nikon Corp | ステージ装置、露光装置及びデバイスの製造方法 |
| JP2005203567A (ja) * | 2004-01-15 | 2005-07-28 | Canon Inc | 駆動装置、露光装置及びデバイス製造方法 |
| WO2006006730A1 (ja) * | 2004-07-15 | 2006-01-19 | Nikon Corporation | 平面モータ装置、ステージ装置、露光装置及びデバイスの製造方法 |
| JP2006032788A (ja) | 2004-07-20 | 2006-02-02 | Canon Inc | 露光装置及び半導体デバイスの製造方法 |
| JP2006049384A (ja) * | 2004-07-30 | 2006-02-16 | Laserfront Technologies Inc | ガントリー型xyステージ |
| US20060170382A1 (en) * | 2005-01-28 | 2006-08-03 | Nikon Corporation | Linear motor force ripple identification and compensation with iterative learning control |
| WO2006104219A1 (en) * | 2005-03-29 | 2006-10-05 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus and method for manufacturing semiconductor device |
| WO2007026270A1 (en) * | 2005-08-29 | 2007-03-08 | Koninklijke Philips Electronics, N.V. | Ironless magnetic linear motors having levitating and transversal force capacities |
| US7603785B2 (en) * | 2007-02-20 | 2009-10-20 | Electro Scientific Industries, Inc. | Air bearing assembly for guiding motion of optical components of a laser processing system |
| US7889322B2 (en) * | 2007-02-20 | 2011-02-15 | Electro Scientific Industries, Inc. | Specimen inspection stage implemented with processing stage coupling mechanism |
| JP2009037391A (ja) * | 2007-08-01 | 2009-02-19 | Nikon Corp | 温度調整装置、露光装置、アクチュエータ装置、保持装置、及びデバイス製造方法 |
| JP4970410B2 (ja) * | 2008-12-02 | 2012-07-04 | 住友重機械工業株式会社 | ステージ装置及び半導体検査装置 |
-
2009
- 2009-07-28 US US12/510,630 patent/US8735774B2/en not_active Expired - Fee Related
-
2010
- 2010-02-26 WO PCT/US2010/025591 patent/WO2010110990A2/en not_active Ceased
- 2010-02-26 CN CN201080011565XA patent/CN102349147A/zh active Pending
- 2010-02-26 JP JP2012502068A patent/JP5718894B2/ja not_active Expired - Fee Related
- 2010-02-26 KR KR1020117025375A patent/KR20120002603A/ko not_active Withdrawn
- 2010-03-01 TW TW099105848A patent/TW201039957A/zh unknown
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