JP2012522373A5 - - Google Patents

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Publication number
JP2012522373A5
JP2012522373A5 JP2012502068A JP2012502068A JP2012522373A5 JP 2012522373 A5 JP2012522373 A5 JP 2012522373A5 JP 2012502068 A JP2012502068 A JP 2012502068A JP 2012502068 A JP2012502068 A JP 2012502068A JP 2012522373 A5 JP2012522373 A5 JP 2012522373A5
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JP
Japan
Prior art keywords
stage
axis
motor
motors
reaction force
Prior art date
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Granted
Application number
JP2012502068A
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English (en)
Japanese (ja)
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JP5718894B2 (ja
JP2012522373A (ja
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Publication date
Priority claimed from US12/510,630 external-priority patent/US8735774B2/en
Application filed filed Critical
Publication of JP2012522373A publication Critical patent/JP2012522373A/ja
Publication of JP2012522373A5 publication Critical patent/JP2012522373A5/ja
Application granted granted Critical
Publication of JP5718894B2 publication Critical patent/JP5718894B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012502068A 2009-03-27 2010-02-26 反力補償システム Expired - Fee Related JP5718894B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US16438209P 2009-03-27 2009-03-27
US61/164,382 2009-03-27
US12/510,630 2009-07-28
US12/510,630 US8735774B2 (en) 2009-03-27 2009-07-28 Force reaction compensation system
PCT/US2010/025591 WO2010110990A2 (en) 2009-03-27 2010-02-26 Force reaction compensation system

Publications (3)

Publication Number Publication Date
JP2012522373A JP2012522373A (ja) 2012-09-20
JP2012522373A5 true JP2012522373A5 (enExample) 2013-04-11
JP5718894B2 JP5718894B2 (ja) 2015-05-13

Family

ID=42781748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012502068A Expired - Fee Related JP5718894B2 (ja) 2009-03-27 2010-02-26 反力補償システム

Country Status (6)

Country Link
US (1) US8735774B2 (enExample)
JP (1) JP5718894B2 (enExample)
KR (1) KR20120002603A (enExample)
CN (1) CN102349147A (enExample)
TW (1) TW201039957A (enExample)
WO (1) WO2010110990A2 (enExample)

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Publication number Priority date Publication date Assignee Title
JP2014229787A (ja) * 2013-05-23 2014-12-08 東京エレクトロン株式会社 接合装置、接合システム、接合方法、プログラム及びコンピュータ記憶媒体
JP6308852B2 (ja) * 2014-04-15 2018-04-11 キヤノン株式会社 駆動装置、リソグラフィ装置、および物品の製造方法
NL2014487A (en) * 2014-04-17 2015-11-02 Asml Netherlands Bv Lithographic Apparatus and Device Manufacturing Method.
TWI616269B (zh) * 2016-08-01 2018-03-01 Reaction force elimination platform device
US10374530B2 (en) 2017-02-21 2019-08-06 Invetech, Inc. Dual-axis linear motion system
WO2018156663A1 (en) 2017-02-21 2018-08-30 Invetech, Inc. Single-axis linear motion system
KR102449594B1 (ko) 2017-09-04 2022-10-04 에이에스엠엘 네델란즈 비.브이. 전자 빔 검사 장치 스테이지 위치설정
DE102018122717A1 (de) * 2018-09-17 2020-03-19 Trumpf Werkzeugmaschinen Gmbh + Co. Kg Verfahren zur schneidenden Bearbeitung von Rohren in einer Laserrohrschneidmaschine sowie Laserrohrschneidmaschine
NL2022539B1 (en) * 2019-02-08 2020-08-19 Dutch United Instr B V Positioning system for positioning an object
US11209373B2 (en) 2019-06-21 2021-12-28 Kla Corporation Six degree of freedom workpiece stage
CN110711958B (zh) * 2019-11-15 2021-11-02 安徽同兴科技发展有限责任公司 抗扰度高精密直线电机驱动的激光切割机及其控制方法
KR20230088475A (ko) * 2020-10-19 2023-06-19 어플라이드 머티어리얼스, 인코포레이티드 공급 어레인지먼트, 진공 프로세싱 시스템, 및 진공 프로세싱 시스템에서 이동하는 디바이스를 공급하는 방법
CN118180660B (zh) * 2024-05-16 2024-09-06 江苏盛捷半导体材料有限公司 一种半导体器件加工用激光切割设备

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JP3548353B2 (ja) * 1996-10-15 2004-07-28 キヤノン株式会社 ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
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