JP2012507173A5 - - Google Patents

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Publication number
JP2012507173A5
JP2012507173A5 JP2011534488A JP2011534488A JP2012507173A5 JP 2012507173 A5 JP2012507173 A5 JP 2012507173A5 JP 2011534488 A JP2011534488 A JP 2011534488A JP 2011534488 A JP2011534488 A JP 2011534488A JP 2012507173 A5 JP2012507173 A5 JP 2012507173A5
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JP
Japan
Prior art keywords
substrate
template
alignment
detector
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011534488A
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English (en)
Japanese (ja)
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JP5159957B2 (ja
JP2012507173A (ja
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Publication date
Priority claimed from US12/580,324 external-priority patent/US8345242B2/en
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Publication of JP2012507173A publication Critical patent/JP2012507173A/ja
Publication of JP2012507173A5 publication Critical patent/JP2012507173A5/ja
Application granted granted Critical
Publication of JP5159957B2 publication Critical patent/JP5159957B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011534488A 2008-10-28 2009-10-20 ステージ制御用光学システム Expired - Fee Related JP5159957B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10894108P 2008-10-28 2008-10-28
US61/108,941 2008-10-28
US12/580,324 US8345242B2 (en) 2008-10-28 2009-10-16 Optical system for use in stage control
US12/580,324 2009-10-16
PCT/US2009/005690 WO2010051015A1 (en) 2008-10-28 2009-10-20 Optical system for use in stage control

Publications (3)

Publication Number Publication Date
JP2012507173A JP2012507173A (ja) 2012-03-22
JP2012507173A5 true JP2012507173A5 (enExample) 2012-12-06
JP5159957B2 JP5159957B2 (ja) 2013-03-13

Family

ID=42116699

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011534488A Expired - Fee Related JP5159957B2 (ja) 2008-10-28 2009-10-20 ステージ制御用光学システム

Country Status (3)

Country Link
US (1) US8345242B2 (enExample)
JP (1) JP5159957B2 (enExample)
WO (1) WO2010051015A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5498448B2 (ja) * 2011-07-21 2014-05-21 株式会社東芝 インプリント方法及びインプリントシステム
CN103631086A (zh) * 2012-08-21 2014-03-12 华中科技大学 一种用于集成光电子器件的微纳图形的制作方法及应用
US10248018B2 (en) * 2015-03-30 2019-04-02 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
DE102015110264A1 (de) * 2015-06-25 2016-12-29 Cl Schutzrechtsverwaltungs Gmbh Vorrichtung zur generativen Herstellung wenigstens eines dreidimensionalen Objekts
JP6799397B2 (ja) * 2015-08-10 2020-12-16 キヤノン株式会社 インプリント装置、および物品の製造方法
US11762284B2 (en) 2016-08-03 2023-09-19 Board Of Regents, The University Of Texas System Wafer-scale programmable films for semiconductor planarization and for imprint lithography
US10416576B2 (en) 2016-09-14 2019-09-17 Canon Kabushiki Kaisha Optical system for use in stage control
US9971147B2 (en) 2016-09-26 2018-05-15 Xerox Corporation Integrated micro-channel heatsink in DMD substrate for enhanced cooling capacity
JP6818522B2 (ja) * 2016-11-17 2021-01-20 キヤノン株式会社 インプリント装置、および物品製造方法
JP6827785B2 (ja) * 2016-11-30 2021-02-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6606567B2 (ja) * 2017-04-17 2019-11-13 キヤノン株式会社 インプリント装置及び物品の製造方法
US10998190B2 (en) * 2017-04-17 2021-05-04 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
CN110500968B (zh) * 2019-07-11 2021-04-20 北京理工大学 基于稀疏傅里叶变换的数字莫尔干涉相位实时测量方法

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2569544B2 (ja) * 1987-04-08 1997-01-08 株式会社ニコン 位置決め装置
JPH0613287A (ja) * 1992-04-27 1994-01-21 Nikon Corp アライメント装置
JPH08313842A (ja) * 1995-05-15 1996-11-29 Nikon Corp 照明光学系および該光学系を備えた露光装置
JP4136067B2 (ja) * 1997-05-02 2008-08-20 キヤノン株式会社 検出装置及びそれを用いた露光装置
TW520457B (en) 1997-09-30 2003-02-11 Toshiba Corp Display panel and position adjusting method for the display panel
EP1203264A4 (en) 1999-07-01 2004-09-15 DEVICE AND METHOD FOR IMPROVING IMAGE BY SPATIAL FILTERING
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US6462818B1 (en) 2000-06-22 2002-10-08 Kla-Tencor Corporation Overlay alignment mark design
EP2264522A3 (en) 2000-07-16 2011-12-14 The Board of Regents of The University of Texas System Method of forming a pattern on a substrate
EP1309897A2 (en) 2000-08-01 2003-05-14 Board Of Regents, The University Of Texas System Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
US7317531B2 (en) 2002-12-05 2008-01-08 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
JP3507865B2 (ja) * 2001-02-02 2004-03-15 和歌山大学長 Ｄｍｄを用いたｃｃｄカメラによる実時間形状計測方法と装置
US20050064344A1 (en) 2003-09-18 2005-03-24 University Of Texas System Board Of Regents Imprint lithography templates having alignment marks
EP1551807A4 (en) * 2002-07-11 2006-09-13 Scios Inc IMPROVED REAGENTS FOR THE AMINATION OF NITROGEN
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7070405B2 (en) 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
TW200500811A (en) 2002-12-13 2005-01-01 Molecular Imprints Inc Magnification correction employing out-of-plane distortion of a substrate
SG147288A1 (en) 2003-04-29 2008-11-28 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and angular encoder
EP1510868A1 (en) * 2003-08-29 2005-03-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4478424B2 (ja) * 2003-09-29 2010-06-09 キヤノン株式会社 微細加工装置およびデバイスの製造方法
US20050270516A1 (en) 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US7535549B2 (en) 2004-06-03 2009-05-19 Board Of Regents, University Of Texas System System and method for improvement of alignment and overlay for microlithography
TWI340875B (en) 2004-08-10 2011-04-21 Asml Netherlands Bv Imprint lithographic apparatus, device manufacturing method and device manufactured thereby
US7630067B2 (en) 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
US20070231421A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
US7292326B2 (en) 2004-11-30 2007-11-06 Molecular Imprints, Inc. Interferometric analysis for the manufacture of nano-scale devices
EP1825502A4 (en) 2004-12-01 2008-01-23 Molecular Imprints Inc EXPOSURE METHODS FOR THERMAL MANAGEMENT OF PRINTING LITHOGRAPHY METHODS
WO2007117524A2 (en) 2006-04-03 2007-10-18 Molecular Imprints, Inc. Method of concurrently patterning a substrate having a plurality of fields and alignment marks
US7547398B2 (en) 2006-04-18 2009-06-16 Molecular Imprints, Inc. Self-aligned process for fabricating imprint templates containing variously etched features
JP4795300B2 (ja) 2006-04-18 2011-10-19 キヤノン株式会社 位置合わせ方法、インプリント方法、位置合わせ装置、インプリント装置、及び位置計測方法
US7837907B2 (en) 2007-07-20 2010-11-23 Molecular Imprints, Inc. Alignment system and method for a substrate in a nano-imprint process
US20090147237A1 (en) 2007-12-05 2009-06-11 Molecular Imprints, Inc. Spatial Phase Feature Location

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