JP2012209402A - リード部品及びその製造方法、並びに半導体パッケージ - Google Patents
リード部品及びその製造方法、並びに半導体パッケージ Download PDFInfo
- Publication number
- JP2012209402A JP2012209402A JP2011073424A JP2011073424A JP2012209402A JP 2012209402 A JP2012209402 A JP 2012209402A JP 2011073424 A JP2011073424 A JP 2011073424A JP 2011073424 A JP2011073424 A JP 2011073424A JP 2012209402 A JP2012209402 A JP 2012209402A
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- Prior art keywords
- lead
- solder
- semiconductor chip
- lead component
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 166
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000000463 material Substances 0.000 claims abstract description 207
- 229910000679 solder Inorganic materials 0.000 claims abstract description 162
- 239000002184 metal Substances 0.000 claims abstract description 52
- 229910052751 metal Inorganic materials 0.000 claims abstract description 52
- 239000010409 thin film Substances 0.000 claims abstract description 42
- 238000005096 rolling process Methods 0.000 claims abstract description 16
- 229910052802 copper Inorganic materials 0.000 claims abstract description 13
- 229910052737 gold Inorganic materials 0.000 claims abstract description 12
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 11
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 11
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 11
- 229910052709 silver Inorganic materials 0.000 claims abstract description 9
- 238000005304 joining Methods 0.000 claims abstract description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 24
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- 229910007570 Zn-Al Inorganic materials 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 238000010030 laminating Methods 0.000 abstract description 3
- 150000002739 metals Chemical class 0.000 abstract description 3
- 239000010949 copper Substances 0.000 description 58
- 230000004048 modification Effects 0.000 description 28
- 238000012986 modification Methods 0.000 description 28
- 239000000758 substrate Substances 0.000 description 22
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- 229910052782 aluminium Inorganic materials 0.000 description 13
- 238000007747 plating Methods 0.000 description 13
- 239000010931 gold Substances 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 230000005496 eutectics Effects 0.000 description 11
- 229910052725 zinc Inorganic materials 0.000 description 10
- 239000007788 liquid Substances 0.000 description 9
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- 238000003825 pressing Methods 0.000 description 3
- 241000272168 Laridae Species 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
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- 229910000765 intermetallic Inorganic materials 0.000 description 2
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
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- 229910017518 Cu Zn Inorganic materials 0.000 description 1
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- 235000014676 Phragmites communis Nutrition 0.000 description 1
- PQIJHIWFHSVPMH-UHFFFAOYSA-N [Cu].[Ag].[Sn] Chemical group [Cu].[Ag].[Sn] PQIJHIWFHSVPMH-UHFFFAOYSA-N 0.000 description 1
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- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910000833 kovar Inorganic materials 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
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- 230000002093 peripheral effect Effects 0.000 description 1
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- 241000894007 species Species 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
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- 229910000969 tin-silver-copper Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
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Abstract
【解決手段】半導体チップと接続させる接続部を有する基材を備えたリード部品であって、前記基材上の前記接続部を含む所定領域に、Zn接合材、Al接合材を前記基材側より順次積層し圧延されてクラッド接合されてなるはんだ材を有し、さらに前記Al接合材の表面が、Au、Ag、Cu、Ni、Pd、Ptのうちの1種又は2種以上からなる金属薄膜で覆われている。
【選択図】 図1
Description
前記基材上の前記接続部を含む所定領域に、Zn接合材、Al接合材を前記基材側より順次積層し圧延されてクラッド接合されてなるはんだ材を有し、
さらに前記Al接合材の表面が、Au、Ag、Cu、Ni、Pd、Ptのうちの1種又は2種以上からなる金属薄膜で覆われていることを特徴とするリード部品が提供される。
前記エミッタ電極、前記ゲート電極、前記コレクタ電極のうちの少なくとも一つの電極が前記リード部品の前記所定領域に接続されていることが好ましい。
前記基材上に、Zn接合材、Al接合材、金属薄膜を前記基材側より順次積層してはんだ部を形成する工程と、
前記はんだ部を前記基材上とともに圧延してクラッド接合する工程と、を含むリード部品の製造方法が提供される。
前記基材上の前記接続部を含む所定領域に、Zn接合材、Al接合材、金属薄膜を基材側より順次積層してはんだ部を形成する工程と、
前記はんだ部を前記基材上の前記接続部を含む所定領域に圧延して埋め込んで、前記半導体チップと接続させる前記接続部を形成する工程と
を含むリード部品の製造方法が提供される。
本実施形態に係るリード部品について概要を説明する。
定領域の一部のみが接続部になることもある。Al接合材の表面を金属薄膜で覆うには、めっきによってもクラッド接合によってもよい。なお、前記Zn接合材は、Zn−Al系合金からなるZn接合材からなっていてもよい。
(第1の実施の形態)
(リード部品)
リード部品には、主として、半導体チップのエミッタ電極と接続するためのエミッタ側のリード部品と、半導体チップのコレクタ電極と接続するためのコレクタ側のリード部品とがある。なお、ゲート電極と接続するためのゲート側のリード部品もあり得る。
図1は、第1の実施の形態に係るパワー半導体チップ12のエミッタ電極12aを接続するためのエミッタ側のリード部品11を示す。図1の右側のA側部分(インナ)の接続部が、コレクタ側リード部品のヘッダ21上にダイボンドされたパワー半導体チップ12上面のエミッタ電極12aに接続される。B側部分(アウタ)の接続部が、コレクタ側リード部品のエミッタリード10の電極に接続される。これらの接続のために、リード部品11は、A側部分(インナ)よりもB側部分(アウタ)を押し下げるダウンセット加工がされている。
図1のような形態のリード部品を製造するには、まず、リードフレーム基材4のCu、はんだ材5のZn、Al、金属薄膜3のCuの圧延率を考慮して、これらについて所定の板厚、板幅を有する条材からなる素材をそれぞれ準備する。リードフレーム基材4のCu素材上の接続部を含む所定領域に、Zn素材、Al素材、Cu素材を順次積層して圧延を行う。圧延によって各金属素材は引き伸ばされ、新生な界面が形成されて良好なクラッド接合を得ることができる。その後、条材であるクラッド材を所定の幅、所定の長さに切断し、ダウンセット加工して図1のような形に成形する。
l層2、金属薄膜3の幅W2が狭くなっている。これはそれぞれの素材の幅を所定の幅としておき、それらを接続部を含む所定領域に重ね合わせた状態で圧延することで作製可能である。例えば、リードフレーム基材4のCu素材上の所定領域に、所定幅のZn接合材、Al接合材、金属薄膜3のCu材を圧延して埋め込むことにより、表面を平坦面としたインレイクラッド材を作製することができる。このようにして、リードフレーム基材4の表面にはんだ部22が露出したリード部品11を製造することができる。
図1のように、リードフレーム基材4の上にZn層1、Al層2、金属薄膜3という順序で積層する理由を述べる。リード部品11のインナA側において、パワー半導体チップ12を接合する時には、金属薄膜3をパワー半導体チップ12のエミッタ電極12aに押し付けた状態で加熱して、はんだ部22を溶融させて行う。この時の雰囲気は、通常、酸素濃度を低減させた窒素雰囲気か、あるいはそれに水素を数%加えたガスを用いる。水素を加えるのは、金属薄膜3のCuや、パワー半導体チップ12のエミッタ電極部を還元して、濡れ性を向上させるためであるが、いずれも表面が清浄でその必要が無い場合には、水素を添加する必要は無い。ここでは、金属薄膜3の表面が若干酸化している状態を想定し、水素添加雰囲気として述べる。
図1におけるはんだ部22の好適な構成の一例としては、インナA側において、Zn層厚45μm、Al層厚8μm、Cu金属薄膜厚1μmである。このような厚さとすることで、概ねZn−6mass%Alの共晶組成が得られ、AlによるZnの拡散抑制効果も得られ、またCuによるZnやAlの酸化防止効果が得られる。前述のようにCu自体は若干の酸化を生じる場合があるが、接合時の雰囲気を調整し、加熱することで還元することができるので接合性を阻害しない。
図2はエミッタ側のリード部品11の第1の実施の形態の第1の変形例を示す。第1の実施の形態と異なる点は、Zn層1に替えてZn−Al系合金からなるZn接合材でZn層6を形成し、これをリードフレーム基材4にクラッドしている点である。その表面にAl層2と金属薄膜3を積層してリードフレーム基材4にクラッドする点は第一の実施の形態と同じである。Zn−Al系合金からなるZn接合材で形成したZn層6とAl層2の平均組成はZn−6mass%Alなどになるように設計すればよい。このようにすることで、第一の実施例と同様な接続性が得られる。
図3は、エミッタ側のリード部品11の第1の実施形態の第2の変形例を示す。第1の実施の形態と異なる点は、Zn層1とリードフレーム基材4との間に、Ni層7を配置した点である。リードフレーム基材4には、前述のように各種の金属を用いることができるが、Cuを用いた場合、はんだ成分のZnとリードフレーム基材4のCuとが反応して金属間化合物を多く生成する場合も考えられる。そのような場合には、図3のように、Ni層7を下地とすることで、はんだ5とリードフレーム基材4との反応を抑制することができる。この下地層はNiに限定されるものではなく、一般的にはんだへの溶解が遅くバリアメタルとして用いられるPt、Pd、Tiなども適用することができる。Niを代表例として説明している。
図4はエミッタ側のリード部品11の第1の実施の形態の第3の変形例を示す。第2の変形例に加えて異なる点は、Ni層7がはんだ部22以外のリードフレーム基材4の表面にも形成されている状態を示している。このようにすることで、はんだ部22の成分とリードフレーム基材4との反応を確実に抑制することができる。
図5〜図8は、エミッタ側のリード部品11の第1の実施の形態の第4〜第7の変形例を示す。これらが第3の変形例に加えて異なる点は、接続性を高めるために、はんだ部22の接続部を凸型に加工した点である。以下、具体的に説明する。
濡れ広がるので、ボイドの巻き込みが少ない構造である。
(コレクタ側のリード部品)
これまでは、パワー半導体チップのエミッタ電極を接続するためのエミッタ側のリード部品について述べたが、つぎにパワー半導体チップのコレクタ電極と接続するためのコレクタ側のリード部品について述べる。なお、第2の実施の形態において、第1の実施の形態と同一乃至同様な構成については、同じ符号を付して説明は省略する。
ーム基材4の裏面が台形状凹型をしている。図9(e)は、頂部がフラットな台形状凸型をして、リードフレーム基材4の裏面がフラットになっている。
図11に、本発明の第2の実施の形態に係るリード部品を有するリードフレームにパワー半導体チップを搭載した上面図を示す。パワー半導体チップ12は、下面にコレクタ電極が、上面にエミッタ電極及びゲート電極13がそれぞれ形成されている。図11に示すように、リードフレーム30のはんだ部22の上にパワー半導体チップ12がダイボンドされ、その下面のコレクタ電極12bがコレクタリード9とつながれる。パワー半導体チップ12の上面に設けたエミッタ電極には、図1〜図8で述べたようなエミッタ側のリード部品11のインナA側が接続される。エミッタ側リード部品のアウタB側はエミッタリード10に接続される。これによりエミッタ電極はエミッタリード10とつながれる。
(第4〜第6の実施の形態)
(コレクタ側のリード部品)
図13および図14は、表面実装型リードフレームにおけるコレクタ側のリード部品を示す第4、第5の実施の形態の例を示す。上述した図12のリード部品の形態は、エミッタ、コレクタ、ゲートのそれぞれのリードを、プリント基板の穴に挿入して、フローはんだ接続を得るためのリードフレームである。これに対して、図13および図14は、プリント基板上に表面実装するためのリードをフォーミングしたリード部品(リードフレーム)である。また、図15は、図13と図14を用いて半導体チップ周りを樹脂モールドしてパッケージ化した第6の実施の形態の半導体パッケージを示すものであり、半導体パッケージの二つの側面からガルウイング状(L字状)のリードが出ている表面実装用のパッケージである。以下、これらについて説明する。なお、第4〜第6の実施の形態において、第1の実施の形態と同一乃至同様な構成については、同じ符号を付して説明は省略する。
図13に表面実装型のコレクタ側のリード部品を示す。コレクタ側のリード部品は、リードフレーム基材4を有する。リードフレーム基材4は、ヘッダ21と、これに一体形成
された複数本のコレクタリード9とを有する。複数本になっている理由は電流容量を大きく取るためである。複数本のコレクタリード9は、長さXのヘッダ21の長さ方向の一側から同じピンピッチで同じ方向に出ている。ここではコレクタリード9の本数は4本の例を示す。コレクタリード9は、表面実装するために、コレクタリード9を押し下げるダウンセット加工がされている。ヘッダ21の半導体チップを実装するはんだ部22の構成と凸型構造はこれまでに述べた挿入実装型のヘッダと類似している。このため図13(a)のD−D’線での断面構造は、図9(b)〜(e)と同様に、これらとそれぞれ対応するように、図13(b)〜(e)にまとめて図示した。
(エミッタ側のリード部品)
図14に表面実装型のエミッタ側のリード部品を示す。エミッタ側のリード部品は、基本的には図13に示すコレクタ側のリード部品と類似している。図14(a1)、(a2)のE−E’線での断面構造は、図9(b)〜(e)と同様に、これらとそれぞれ対応するように、図14(b)〜(e)にまとめて図示した。エミッタリード10も、電流容量を大きく取るため複数本形成されている。
図15は、図13および図14のリードフレームを用いてパワー半導体チップ12を接続し、モールド樹脂17でパッケージ化した半導体パッケージ40を複数例示したものである。この半導体パッケージ40は、半導体パッケージの二つの側面からガルウイング状(L字状)のリードフレーム基材4から構成されたリードが出ている。半導体パッケージ40の一つの側面から出るエミッタリード10は、半導体パッケージ40の他の側面から出るコレクタリード9よりもダウンセット加工の押し下げ距離を大きくして、両アウタが同一実装面上に揃うようにしてある。ここで、半導体パッケージ40は、パワー半導体チップ12と、リードフレームと、モールド樹脂17とから主に構成される。
濡れ広がり、その後冷却によって凝固されたものである。以下、それぞれの半導体パッケージについて説明する。
本実施の形態によれば、以下に挙げる一つ又はそれ以上の効果を有する。
るよう形成されていることにより、半導体チップと簡単に接続でき、接続性に優れたリード部品を提供できる。
上述した実施の形態は、はんだ部をリード部品の基材上の一部に圧延してクラッド接合し、クラッド接合したはんだ部をそのまま半導体チップと接続させる接続部とするものであった。しかし、はんだ部をリード部品の基材上の片面全面に圧延してクラッド接合し、クラッド接合したはんだ部のうち、リード部品の基材上の接続部を含む所定領域以外の領域のはんだ部をエッチング除去して、半導体チップと接続させる接続部を形成するリード部品の製造することも可能である。
また、上述した実施の形態は、主に個別に樹脂モールドされたパワー半導体パッケージに関するものであるが、いわゆるモジュール化されたパワー半導体製品に対しても適用することができる。例えば、大電力を扱うインバータモジュールでは、セラミック上にCuを貼り付けた基板に、パワー半導体チップを接続し、セラミック基板を別のフレームに固定し、全体をゲル状の樹脂で封止した構造などが用いられる。このようなモジュールでは、例えばこれまでに述べてきたようなコレクタ側のCu電極には、はんだ材をクラッド圧延したものを適用するのは難しい。その理由は、一般的にはCuとセラミックの接合は、更に高融点のろう材でろう付けされており、はんだ層をクラッドでCu上に形成しておいても、ろう付け時にはんだ層が溶解してしまうためである。
た。しかし、発熱量の大きなインバータモジュールでは、繰り返しの温度変化によって、ワイヤーの伸び縮みなども影響し、徐々に結線部が疲労して、最終的には大電流による断線が起こる懸念があった。図1から図8のようなリードフレームを適用することで、上記に述べた問題を解決することができる。
ので、放熱性を重視したパッケージに用いる。インバー合金、42アロイは熱膨張率が小さく、半導体チップに近い熱膨張率を有するので、接合後の残留応力が小さくなる。したがって、大型のチップなどに適用する場合に好適である。
2 Al層
3 金属薄膜
4 リードフレーム基材
5 はんだ材
7 Ni層
8 ゲートリード
9 コレクタリード
10 エミッタリード
11 リード部品
12 パワー半導体チップ
12a エミッタ電極
12b コレクタ電極
13 ゲート電極
14 一旦溶融した後凝固したはんだ材
15 ボンディングワイヤ
16 はんだ
17 モールド樹脂
18 バンプ
20 リードフレーム
22 はんだ部
21 ヘッダ
22a コレクタ電極
23 半導体チップ搭載部
24 取付用孔
30 リードフレーム
32 支持片
34 ダイバー
36 外枠
40 半導体パッケージ
Claims (8)
- 半導体チップと接続させる接続部を有する基材を備えたリード部品であって、
前記基材上の前記接続部を含む所定領域に、Zn接合材、Al接合材を前記基材側より順次積層し圧延されてクラッド接合されてなるはんだ材を有し、
さらに前記Al接合材の表面が、Au、Ag、Cu、Ni、Pd、Ptのうちの1種又は2種以上からなる金属薄膜で覆われていることを特徴とするリード部品。 - 前記Zn接合材は、Zn−Al系接合材からなる請求項1に記載のリード部品。
- 前記基材と前記はんだ材との間に、Ti、Pt、Pd、Niのうちの1種からなる金属層、又はこれらのいずれかを含む合金層が形成されている請求項1または2に記載のリード部品。
- 前記接続部が、前記半導体チップとの接続面側に凸型となるよう形成されている請求項1〜3のいずれかに記載のリード部品。
- 請求項1〜4のいずれかに記載のリード部品と、該リード部品の接続部を含む所定領域に接続される半導体チップとを備えた半導体パッケージ。
- 前記半導体チップが、表面にエミッタ電極とゲート電極とを有し、裏面にコレクタ電極を有するパワー半導体チップであり、
前記エミッタ電極、前記ゲート電極、前記コレクタ電極のうちの少なくとも一つの電極が前記リード部品の前記所定領域に接続されている請求項5に記載の半導体パッケージ。 - 半導体チップと接続させる接続部を有する基材を備えたリード部品の製造方法であって、
前記基材上に、Zn接合材、Al接合材、およびAu、Ag、Cu、Ni、Pd、Ptのうちの1種又は2種以上からなる金属薄膜材を、前記基材側より順次積層してはんだ部を形成する工程と、
前記はんだ部を前記基材とともに圧延してクラッド接合する工程と、
を含むことを特徴とするリード部品の製造方法。 - 前記クラッド接合したはんだ部のうち、前記基材上の前記接続部を含む所定領域以外の領域のはんだ部をエッチング除去して、前記半導体チップと接続させる前記接続部を形成する工程をさらに含む請求項7に記載のリード部品の製造方法。
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JP2014130894A (ja) * | 2012-12-28 | 2014-07-10 | Toyota Motor Corp | 半導体モジュール |
JP5874869B2 (ja) * | 2013-10-21 | 2016-03-02 | 日本精工株式会社 | 半導体モジュール |
WO2017111772A1 (en) * | 2015-12-23 | 2017-06-29 | Pietambaram Srinivas V | Multi-layer molded substrate with graded cte |
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EP2992553A4 (en) * | 2013-05-03 | 2017-03-08 | Honeywell International Inc. | Lead frame construct for lead-free solder connections |
CN103943594A (zh) * | 2014-03-26 | 2014-07-23 | 张轩 | 一种适用于大功率电器的引线框架 |
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