JP2012084912A5 - - Google Patents
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- JP2012084912A5 JP2012084912A5 JP2011278688A JP2011278688A JP2012084912A5 JP 2012084912 A5 JP2012084912 A5 JP 2012084912A5 JP 2011278688 A JP2011278688 A JP 2011278688A JP 2011278688 A JP2011278688 A JP 2011278688A JP 2012084912 A5 JP2012084912 A5 JP 2012084912A5
- Authority
- JP
- Japan
- Prior art keywords
- porogen
- composition
- precursor
- atomic
- cyclooctane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000000203 mixture Substances 0.000 claims description 28
- 239000003361 porogen Substances 0.000 claims description 24
- 239000002243 precursor Substances 0.000 claims description 19
- NBBQQQJUOYRZCA-UHFFFAOYSA-N diethoxymethylsilane Chemical compound CCOC([SiH3])OCC NBBQQQJUOYRZCA-UHFFFAOYSA-N 0.000 claims description 10
- DMEGYFMYUHOHGS-UHFFFAOYSA-N cycloheptane Chemical compound C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 claims description 8
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical compound C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 claims description 8
- 239000004914 cyclooctane Substances 0.000 claims description 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 6
- 239000004913 cyclooctene Substances 0.000 claims description 6
- URYYVOIYTNXXBN-UPHRSURJSA-N cyclooctene Chemical compound C1CCC\C=C/CC1 URYYVOIYTNXXBN-UPHRSURJSA-N 0.000 claims description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 5
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 claims description 5
- XYYQWMDBQFSCPB-UHFFFAOYSA-N dimethoxymethylsilane Chemical compound COC([SiH3])OC XYYQWMDBQFSCPB-UHFFFAOYSA-N 0.000 claims description 5
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims description 5
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 claims description 4
- ZXIJMRYMVAMXQP-UHFFFAOYSA-N cycloheptene Chemical compound C1CCC=CCC1 ZXIJMRYMVAMXQP-UHFFFAOYSA-N 0.000 claims description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 4
- 125000005375 organosiloxane group Chemical group 0.000 claims description 4
- JZTYABBFHFUJSS-UHFFFAOYSA-N CC(C)OC([SiH3])OC(C)C Chemical compound CC(C)OC([SiH3])OC(C)C JZTYABBFHFUJSS-UHFFFAOYSA-N 0.000 claims description 3
- LMWRZXGRVUIGGC-UHFFFAOYSA-N bis[(2-methylpropan-2-yl)oxy]methylsilane Chemical compound CC(C)(C)OC([SiH3])OC(C)(C)C LMWRZXGRVUIGGC-UHFFFAOYSA-N 0.000 claims description 3
- 238000005229 chemical vapour deposition Methods 0.000 claims description 3
- BGPNEHJZZDIFND-UHFFFAOYSA-N dimethyl-bis[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](C)(C)OC(C)(C)C BGPNEHJZZDIFND-UHFFFAOYSA-N 0.000 claims description 3
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims description 3
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 claims description 3
- AHQDZKRRVNGIQL-UHFFFAOYSA-N methyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](C)(OC(C)(C)C)OC(C)(C)C AHQDZKRRVNGIQL-UHFFFAOYSA-N 0.000 claims description 3
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 3
- GWYPDXLJACEENP-UHFFFAOYSA-N 1,3-cycloheptadiene Chemical compound C1CC=CC=CC1 GWYPDXLJACEENP-UHFFFAOYSA-N 0.000 claims description 2
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 claims description 2
- CHVJITGCYZJHLR-UHFFFAOYSA-N cyclohepta-1,3,5-triene Chemical compound C1C=CC=CC=C1 CHVJITGCYZJHLR-UHFFFAOYSA-N 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims description 2
- AONDIGWFVXEZGD-UHFFFAOYSA-N diacetyloxy(methyl)silicon Chemical compound CC(=O)O[Si](C)OC(C)=O AONDIGWFVXEZGD-UHFFFAOYSA-N 0.000 claims description 2
- DRUOQOFQRYFQGB-UHFFFAOYSA-N ethoxy(dimethyl)silicon Chemical compound CCO[Si](C)C DRUOQOFQRYFQGB-UHFFFAOYSA-N 0.000 claims description 2
- KMXGQGAYTQGRNN-UHFFFAOYSA-N ethoxy-methyl-silyloxysilane Chemical compound CCO[SiH](C)O[SiH3] KMXGQGAYTQGRNN-UHFFFAOYSA-N 0.000 claims description 2
- 150000001282 organosilanes Chemical class 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 claims description 2
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 claims description 2
- DJYGUVIGOGFJOF-UHFFFAOYSA-N trimethoxy(trimethoxysilylmethyl)silane Chemical compound CO[Si](OC)(OC)C[Si](OC)(OC)OC DJYGUVIGOGFJOF-UHFFFAOYSA-N 0.000 claims description 2
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 claims description 2
- 241000282376 Panthera tigris Species 0.000 claims 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 239000004615 ingredient Substances 0.000 claims 1
- YHZBUJHAUIOWDL-UHFFFAOYSA-N methyl-bis[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[SiH](C)OC(C)(C)C YHZBUJHAUIOWDL-UHFFFAOYSA-N 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 241000894007 species Species 0.000 claims 1
- 229940094989 trimethylsilane Drugs 0.000 claims 1
- 238000000034 method Methods 0.000 description 22
- 229920006395 saturated elastomer Polymers 0.000 description 21
- 125000004122 cyclic group Chemical group 0.000 description 19
- 229910052799 carbon Inorganic materials 0.000 description 14
- 229910052739 hydrogen Inorganic materials 0.000 description 14
- 229930195733 hydrocarbon Natural products 0.000 description 13
- 150000002430 hydrocarbons Chemical class 0.000 description 13
- 125000003118 aryl group Chemical group 0.000 description 12
- 239000004215 Carbon black (E152) Substances 0.000 description 8
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 3
- 229910018557 Si O Inorganic materials 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- BPXCAJONOPIXJI-UHFFFAOYSA-N dimethyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(C)OC(C)C BPXCAJONOPIXJI-UHFFFAOYSA-N 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- -1 Cyclic siloxane Chemical class 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/115,087 US20080268177A1 (en) | 2002-05-17 | 2008-05-05 | Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants |
| US12/115,087 | 2008-05-05 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009112216A Division JP5270442B2 (ja) | 2008-05-05 | 2009-05-01 | ポロゲン、ポロゲン化前駆体、および低誘電定数を有する多孔性有機シリカガラスフィルムを得るためにそれらを用いる方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012084912A JP2012084912A (ja) | 2012-04-26 |
| JP2012084912A5 true JP2012084912A5 (enExample) | 2012-06-14 |
Family
ID=40996827
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009112216A Active JP5270442B2 (ja) | 2008-05-05 | 2009-05-01 | ポロゲン、ポロゲン化前駆体、および低誘電定数を有する多孔性有機シリカガラスフィルムを得るためにそれらを用いる方法 |
| JP2011278688A Pending JP2012084912A (ja) | 2008-05-05 | 2011-12-20 | ポロゲン、ポロゲン化前駆体、及び低誘電定数を有する多孔性有機シリカガラスフィルムを得るためにそれらを用いる方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009112216A Active JP5270442B2 (ja) | 2008-05-05 | 2009-05-01 | ポロゲン、ポロゲン化前駆体、および低誘電定数を有する多孔性有機シリカガラスフィルムを得るためにそれらを用いる方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20080268177A1 (enExample) |
| EP (1) | EP2116632A3 (enExample) |
| JP (2) | JP5270442B2 (enExample) |
| KR (5) | KR20090115915A (enExample) |
| CN (2) | CN101575700A (enExample) |
| TW (1) | TWI397606B (enExample) |
Families Citing this family (26)
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| EP2363512A1 (en) * | 2010-02-04 | 2011-09-07 | Air Products And Chemicals, Inc. | Methods to prepare silicon-containing films |
| US8703625B2 (en) * | 2010-02-04 | 2014-04-22 | Air Products And Chemicals, Inc. | Methods to prepare silicon-containing films |
| CN102859666B (zh) * | 2010-02-09 | 2015-05-13 | 西江大学校产学协力团 | 纳米多孔超低介电薄膜及其包括高温臭氧处理的制备方法 |
| CN102762763B (zh) * | 2010-02-17 | 2014-12-31 | 乔治洛德方法研究和开发液化空气有限公司 | SiCOH低K膜的气相沉积法 |
| JP2013520841A (ja) * | 2010-02-25 | 2013-06-06 | アプライド マテリアルズ インコーポレイテッド | プラズマ化学気相堆積による、有機官能基と共にシリコンを含有するハイブリッド前駆体を使用する超低誘電材料 |
| CN101789418B (zh) * | 2010-03-11 | 2011-12-28 | 复旦大学 | 一种多孔超低介电常数材料薄膜及其制备方法 |
| US8460753B2 (en) * | 2010-12-09 | 2013-06-11 | Air Products And Chemicals, Inc. | Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes |
| US8441006B2 (en) * | 2010-12-23 | 2013-05-14 | Intel Corporation | Cyclic carbosilane dielectric films |
| US8772154B2 (en) * | 2011-06-17 | 2014-07-08 | GlobalFoundries, Inc. | Integrated circuits including barrier polish stop layers and methods for the manufacture thereof |
| US9054110B2 (en) * | 2011-08-05 | 2015-06-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Low-K dielectric layer and porogen |
| DE102013215400A1 (de) * | 2013-08-06 | 2015-02-12 | Robert Bosch Gmbh | Silicat-Aerogel und Verfahren zu seiner Herstellung |
| CN104008997A (zh) * | 2014-06-04 | 2014-08-27 | 复旦大学 | 一种超低介电常数绝缘薄膜及其制备方法 |
| US9922818B2 (en) * | 2014-06-16 | 2018-03-20 | Versum Materials Us, Llc | Alkyl-alkoxysilacyclic compounds |
| KR20190141034A (ko) * | 2015-02-06 | 2019-12-20 | 버슘머트리얼즈 유에스, 엘엘씨 | 탄소 도핑된 규소 함유 필름을 위한 조성물 및 이의 사용 방법 |
| CN107636852B (zh) * | 2015-03-09 | 2021-06-25 | 弗萨姆材料美国有限责任公司 | 用于沉积用作电阻随机存取存储器的多孔有机硅酸盐玻璃膜的方法 |
| US20170125241A1 (en) * | 2015-10-30 | 2017-05-04 | Applied Materials, Inc. | Low temp single precursor arc hard mask for multilayer patterning application |
| US10249489B2 (en) * | 2016-11-02 | 2019-04-02 | Versum Materials Us, Llc | Use of silyl bridged alkyl compounds for dense OSG films |
| US11749563B2 (en) * | 2018-06-27 | 2023-09-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Interlayer dielectric layer |
| KR102409869B1 (ko) | 2018-08-10 | 2022-06-16 | 버슘머트리얼즈 유에스, 엘엘씨 | 규소 화합물 및 이를 사용하여 막을 증착시키는 방법 |
| CN116288249B (zh) * | 2018-08-10 | 2025-05-09 | 弗萨姆材料美国有限责任公司 | 硅化合物和使用硅化合物沉积膜的方法 |
| SG11202105522QA (en) * | 2018-11-27 | 2021-06-29 | Versum Materials Us Llc | 1-methyl-1-iso-propoxy-silacycloalkanes and dense organosilica films made therefrom |
| FI4010441T3 (fi) * | 2019-08-09 | 2023-12-07 | Merck Patent Gmbh | Matalan dielektrisyysvakion omaavan piikalvon valmistuskoostumus ja menetelmä kovetetun kalvon valmistamiseksi ja kalvoa käyttävä elektroninen laite |
| CN114616652A (zh) * | 2019-09-13 | 2022-06-10 | 弗萨姆材料美国有限责任公司 | 单烷氧基硅烷及由其制备的致密有机二氧化硅膜 |
| KR20220061161A (ko) * | 2019-09-13 | 2022-05-12 | 버슘머트리얼즈 유에스, 엘엘씨 | 모노알콕시실란 및 디알콕시실란과 이로부터 제조된 고밀도 오가노실리카 필름 |
| CN115516129A (zh) * | 2020-03-31 | 2022-12-23 | 弗萨姆材料美国有限责任公司 | 用于沉积具有高弹性模量的膜的新前体 |
| US11572622B2 (en) * | 2020-09-14 | 2023-02-07 | Applied Materials, Inc. | Systems and methods for cleaning low-k deposition chambers |
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-
2008
- 2008-05-05 US US12/115,087 patent/US20080268177A1/en not_active Abandoned
-
2009
- 2009-05-01 JP JP2009112216A patent/JP5270442B2/ja active Active
- 2009-05-04 EP EP09159354A patent/EP2116632A3/en not_active Withdrawn
- 2009-05-04 KR KR1020090038919A patent/KR20090115915A/ko not_active Ceased
- 2009-05-04 TW TW098114769A patent/TWI397606B/zh active
- 2009-05-05 CN CNA2009101380007A patent/CN101575700A/zh active Pending
- 2009-05-05 CN CN2013100740001A patent/CN103147066A/zh active Pending
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2011
- 2011-12-20 JP JP2011278688A patent/JP2012084912A/ja active Pending
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2012
- 2012-06-05 KR KR1020120060323A patent/KR20120073190A/ko not_active Ceased
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2015
- 2015-04-30 KR KR1020150061429A patent/KR20150059149A/ko not_active Ceased
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2017
- 2017-07-21 KR KR1020170092987A patent/KR101912534B1/ko active Active
- 2017-07-21 KR KR1020170092984A patent/KR101911798B1/ko active Active
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